CN102191486A - 激光加工装置 - Google Patents
激光加工装置 Download PDFInfo
- Publication number
- CN102191486A CN102191486A CN2011100220154A CN201110022015A CN102191486A CN 102191486 A CN102191486 A CN 102191486A CN 2011100220154 A CN2011100220154 A CN 2011100220154A CN 201110022015 A CN201110022015 A CN 201110022015A CN 102191486 A CN102191486 A CN 102191486A
- Authority
- CN
- China
- Prior art keywords
- laser
- processing part
- unstripped gas
- air
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP010481/10 | 2010-01-20 | ||
JP2010010481A JP5476519B2 (ja) | 2010-01-20 | 2010-01-20 | レーザ加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102191486A true CN102191486A (zh) | 2011-09-21 |
CN102191486B CN102191486B (zh) | 2014-04-30 |
Family
ID=44536294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110022015.4A Active CN102191486B (zh) | 2010-01-20 | 2011-01-20 | 激光加工装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5476519B2 (zh) |
KR (1) | KR101302903B1 (zh) |
CN (1) | CN102191486B (zh) |
TW (1) | TWI421142B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103014672A (zh) * | 2012-12-21 | 2013-04-03 | 深圳市华星光电技术有限公司 | 镀膜方法及装置 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5994090B2 (ja) * | 2012-02-29 | 2016-09-21 | 株式会社ブイ・テクノロジー | レーザ加工装置 |
KR101765244B1 (ko) * | 2015-12-14 | 2017-08-07 | 참엔지니어링(주) | 증착 장치 및 증착 방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03120829A (ja) * | 1989-10-04 | 1991-05-23 | Nec Corp | レーザcvd装置 |
EP1521293A1 (en) * | 2003-10-01 | 2005-04-06 | Hitachi High-Technologies Corporation | Submicron size metal deposit apparatus |
CN1727970A (zh) * | 2004-07-30 | 2006-02-01 | 激光先进技术股份公司 | 移动式xy载物台 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3036687B2 (ja) * | 1997-05-23 | 2000-04-24 | 日本電気株式会社 | レーザcvd装置 |
JP3082716B2 (ja) * | 1997-08-08 | 2000-08-28 | 日本電気株式会社 | レーザcvd装置及び方法 |
JP4018841B2 (ja) * | 1999-04-30 | 2007-12-05 | 日本パイオニクス株式会社 | 気化器及び気化供給方法 |
JP3525841B2 (ja) * | 2000-01-26 | 2004-05-10 | 日本電気株式会社 | レーザリペア方法および装置 |
JP4334308B2 (ja) * | 2003-09-24 | 2009-09-30 | オムロンレーザーフロント株式会社 | 配線修正装置 |
JP2010001560A (ja) * | 2008-11-04 | 2010-01-07 | Philtech Inc | 膜形成方法および膜形成装置 |
-
2010
- 2010-01-20 JP JP2010010481A patent/JP5476519B2/ja active Active
-
2011
- 2011-01-19 KR KR1020110005304A patent/KR101302903B1/ko active IP Right Grant
- 2011-01-19 TW TW100101923A patent/TWI421142B/zh active
- 2011-01-20 CN CN201110022015.4A patent/CN102191486B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03120829A (ja) * | 1989-10-04 | 1991-05-23 | Nec Corp | レーザcvd装置 |
EP1521293A1 (en) * | 2003-10-01 | 2005-04-06 | Hitachi High-Technologies Corporation | Submicron size metal deposit apparatus |
CN1727970A (zh) * | 2004-07-30 | 2006-02-01 | 激光先进技术股份公司 | 移动式xy载物台 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103014672A (zh) * | 2012-12-21 | 2013-04-03 | 深圳市华星光电技术有限公司 | 镀膜方法及装置 |
CN103014672B (zh) * | 2012-12-21 | 2015-11-25 | 深圳市华星光电技术有限公司 | 镀膜方法及装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI421142B (zh) | 2014-01-01 |
TW201132441A (en) | 2011-10-01 |
KR101302903B1 (ko) | 2013-09-06 |
CN102191486B (zh) | 2014-04-30 |
KR20110085923A (ko) | 2011-07-27 |
JP2011149046A (ja) | 2011-08-04 |
JP5476519B2 (ja) | 2014-04-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: OMRON LASER ADVANCED CO., LTD. Free format text: FORMER OWNER: OMRON CORPORATION Effective date: 20131010 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20131010 Address after: Kanagawa Applicant after: OMRON laser advanced Corporation Address before: Kyoto Japan Applicant before: Omron Corporation |
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ASS | Succession or assignment of patent right |
Owner name: TECHNOLOGY CO. LTD V. Free format text: FORMER OWNER: OMRON LASER ADVANCED CO., LTD. Effective date: 20140113 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20140113 Address after: Kanagawa Applicant after: Technology Co. Ltd V. Address before: Kanagawa Applicant before: OMRON laser advanced Corporation |
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C14 | Grant of patent or utility model | ||
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