CN102180016B - 超疏油和超疏水表面及其制备方法 - Google Patents
超疏油和超疏水表面及其制备方法 Download PDFInfo
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- CN102180016B CN102180016B CN201010624394.XA CN201010624394A CN102180016B CN 102180016 B CN102180016 B CN 102180016B CN 201010624394 A CN201010624394 A CN 201010624394A CN 102180016 B CN102180016 B CN 102180016B
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Abstract
制备具有超疏油表面的柔性装置的方法,其包括提供柔性衬底;在该柔性衬底上设置硅层;使用光刻法在该衬底上的该硅层中生成网纹图案,其中该网纹图案包括沟槽结构;以及通过在其上设置保形疏油涂层化学修饰该网纹表面;从而提供具有超疏油表面的柔性装置。
Description
技术领域
本文披露了制备具有超疏油表面的柔性装置的方法,其包括提供柔性衬底;在该柔性衬底上设置硅层;使用光刻法在该衬底上的该硅层中生成网纹图案,其中该网纹图案包括沟槽结构;以及通过在其上设置氟硅烷涂层化学修饰该网纹表面;从而提供具有超疏油表面的柔性装置。在特定的实施方式中,该柔性、超疏油装置可用作喷墨印刷头的前侧表面。
背景技术
液体喷墨系统通常包括一个或多个印刷头,其具有多个喷墨器(inkjets),液滴从该喷墨器喷向记录介质。印刷头的喷墨器从油墨供应室或印刷头歧管接收油墨,后者进而从源头(例如熔融油墨贮存器或油墨盒)接收油墨。每个喷墨器包括具有一端与油墨供应歧管流体联通的通道。该油墨通道的另一端具有用于喷射油墨滴的孔口或喷嘴。该喷墨器的喷嘴可形成于具有对应于喷墨器喷嘴的开口的窄孔或喷嘴板中。在操作过程中,液滴喷射信号激活喷墨器中的促动器,从而将液滴从该喷墨器喷嘴排出到记录介质上。通过选择性激活喷墨器的促动器以在记录介质和/或印刷头组件相对运动时喷射液滴,沉积的液滴可被精确地图案化以在记录介质上形成特定的文字和图形图像。全宽阵列印刷头的范例描述于美国专利公布20090046125中。可在该种印刷头中喷射的可紫外固化凝胶油墨的范例描述于美国专利公布20070123606中,其在此全文引入作为参考。能在该种印刷头中喷射的固体油墨的范例为可从Xerox公司获得的XeroxColorQubeTM青绿色固体油墨。美国专利5,867,189描述了一种喷墨器印刷头,其包括了再印刷头外侧结合了电抛光油墨接触或孔口表面的油墨喷射组件。
液体油墨喷射系统所面临的一个困难在于印刷头前端面上的油墨的润湿、滴料或溢流。印刷头前端面的各种污染物可导致或引起喷墨器喷嘴和通道的堵塞,这一问题或者它与润湿、污染前端面的组合可导致或引起在记录介质上不能发射或漏发液滴、偏小或尺寸错误的液滴、伴随或错误定向的液滴,并因而导致下降的印刷质量。目前的印刷头前端面涂层通常是喷溅的聚四氟乙烯涂层。当印刷头倾斜时,温度为约75℃下的UV凝胶油墨(75℃通常为UV凝胶油墨的喷射温度)和温度为约105℃下的固体油墨(105℃通常为固体油墨的喷射温度)不能容易地在该印刷头前侧表面滑动。相反地,这些油墨沿着印刷头前端面流动,并在该印刷头上留下了油墨膜或残留物,这会干扰喷射。处于这种原因,UV和固体油墨印刷头的前端面易于被UV和固体油墨所污染。在一些情况下,该污染的印刷头可被维护单元复新或清洁。然而,这个过程带来了系统复杂性、硬件成本问题,偶尔还带来可靠性问题。
对于制备具有单独的超疏油特性或同时具有超疏油和超疏水特性的装置的材料和方法存在着需求。此外,尽管已有的用于喷墨器印刷头前端面的涂层可满足其目标用途,对于能够减少或消除印刷头前端面上润湿、滴料、溢流或者UV或固体油墨污染的改良的印刷头前端面设计存在着需求。进一步对于疏油墨的(即,疏油的)且具有能够承受印刷头前端面擦拭等维护步骤的强度的改良的印刷头前端面设计存在着需求。进一步地,对于超疏油的,在实施方式中同时超疏油和超疏水的改良的印刷头前端面设计存在着需求。进一步地,对于容易清洁或能自我清洁,从而降低硬件复杂性(例如消除对于维护单元的需求)、减少运行成本和提高系统可靠性的改良的印刷头存在需求。
发明内容
此处描述了制备具有超疏油表面的柔性装置的方法,其包括提供柔性衬底;在该柔性衬底上设置硅层;使用光刻法在该衬底上的该硅层中生成网纹图案,其中该网纹图案包括沟槽结构;以及通过在其上设置保形疏油涂层化学修饰该网纹表面;从而提供具有超疏油表面的柔性装置。
此处还描述了具有超疏油表面的柔性装置,该表面包含具有塑料膜的柔性衬底;设置在该柔性衬底上的硅层,其中该硅层包含具有沟槽结构的网纹图案;以及设置在该网纹表面上的保形疏油涂层。
此处进一步描述了包含前端面的喷墨印刷头,该前端面包含具有塑料膜的柔性衬底;设置在该柔性衬底上的硅层,其中该硅层包含具有沟槽结构的网纹图案;以及设置在该网纹表面上的氟硅烷涂层。
附图说明
图1是根据本发明的披露内容在柔性衬底上制备氟化、网纹表面的工艺路线图,其中该网纹表面包含具有沟槽结构的网纹图型,且在该网纹表面上设置了氟硅烷涂层。
图2是根据本发明另一实施方式,在柔性衬底上制备氟化、网纹表面的工艺路线图,其中该网纹表面包含具有沟槽结构,且在该网纹表面上设置了氟硅烷涂层。
图3是包含了具有网纹(波浪)侧壁的沟槽结构的氟硅烷涂层网纹表面的显微照相。
图4是图3的表面的替代图像。
图5包括了显示了平行方向(左列)和垂直方向(右列)上在沟槽结构上的水、十六烷(HD)以及固体油墨的固着液滴的照片。
具体实施方式
此处描述了制备具有高疏油表面或者超疏油表面的柔性装置的方法,其包括提供柔性衬底;在该柔性衬底上设置硅层;采用光刻法在该柔性衬底上生成网纹图案,其中埃网纹图案包含沟槽结构;以及通过在其上设置保形、疏油涂层化学修饰该网纹表面;提供具有高疏油表面或超疏油表面的柔性装置,在一个实施方式中,提供具有同时超疏油和超疏水的表面的柔性装置。
此处所述的高疏油可被描述为当烃基液体(例如,油墨)的液滴与表面形成高接触角(例如从约130°-约175°或从约135°-约170°的接触角)时。此处所述的超疏油可被描述为当烃基液体(例如,油墨)的液滴与表面形成高接触角(例如大于150°,或从大于约150°-约175°或从大于约150°-约160°的接触角)时。
此处所述的超疏油还可被描述为当烃基液体(例如,十六烷)的液滴与表面形成约1°至小于约30°或约1°至小于约25°的滑移角,或小于约25°的滑移角,或小于约15°的滑移角,或小于约10°的滑移角时。
此处所述的高疏水可被描述为当水的液滴与表面形成高接触角(例如从约130°-约180°的接触角)时。此处所述的超疏水可被描述为当水的液滴与表面形成高接触角(例如大于约150°,或从大于约150°-约180°的接触角)时。
此处所述的超疏水还可被描述为当水的液滴与表面形成约1°至小于约30°或约1°至小于约25°的滑移角,或小于约25°的滑移角,或小于约15°的滑移角,或小于约10°的滑移角时。
此处的具有超疏油表面的柔性装置可通过任意合适的方法制备。参考图1,在实施方式中,此处的具有超疏油表面的柔性装置可通过沉积硅薄层制备,可通过例如在柔性衬底12的大面积上喷溅无定形硅10。该硅薄层可具有任意合适的厚度。在一个实施方式中,该硅层可以从约500至约5000纳米或约3000纳米的厚度沉积在该柔性衬底上。在进一步的实施方式中,其中该硅层包括以从约1至约5微米厚度沉积的无定形硅。
任意合适的材料可被选作此处的柔性衬底。在实施方式中,该柔性衬底可以是塑料膜。在特定的实施方式中,该柔性衬底可选自聚亚胺膜、聚乙烯萘亚甲酯膜、聚乙烯对苯二酸酯膜、聚醚砜、聚醚酰亚胺等,或其组合,尽管上述并非限制。
柔性衬底可以具有任意合适的厚度。在实施方式中,该衬底是厚度为从约5微米至约100微米或从约10微米至约50微米的塑料膜。
硅层10可通过任意合适的方法被沉积到该柔性衬底12上。在实施方式中,硅薄层通过溅射或化学气相沉积、极高频等离子增强化学气相沉积、微波等离子增强化学气相沉积、等离子增强化学气相沉积、在直接插入处理中采用超声喷嘴等等被沉积。
包含了沟槽结构(在实施方式中,微米尺寸的沟槽)的网纹图案可提供在该柔性衬底上。在实施方式中,该沟槽结构包含网纹或波浪图案化的竖直侧壁以及定义在该沟槽结构顶表面的突出内曲结构,或两者。此处所用的网纹或波浪侧壁可表示在侧壁上的亚微米范围的粗糙。在实施方式中,该波浪侧壁可具有250纳米波浪结构,每个波浪对应于下文所述的一个蚀刻循环。
网纹图案包括可通过光刻法技术在硅涂层衬底上生成的沟槽结构。例如,该该柔性衬底12上的硅层10可根据已知的光刻法进行制备和清洁。然后可应用光刻胶14,通过例如旋涂或缝模涂层将该光刻胶材料14涂覆在硅层10上。可选用任意合适的光刻胶。在实施方式中,该光刻胶可以是能从RohmandHaas获得的MegaTMPositTMSPRTM700光刻胶。
光刻胶14随后可根据本领域已知的方法被暴露和显影,通常是通过暴露至紫外光和暴露至有机显影剂如含氢氧化钠的显影剂或无金属离子显影剂(例如四甲基氢氧化铵)。
包括沟槽结构16的网纹图案可通过本领域已知的任意合适方法蚀刻得到。一般而言,蚀刻可包括采用液体或等离子化学试剂去除未被掩模14所保护的硅层。在实施方式中,可采用深反应离子蚀刻技术来生成具有波浪侧壁的沟槽结构。
蚀刻过程后,光刻胶可通过任意合适的方法去除。例如,光刻胶可通过采用液体脱胶剂或含等离子氧去除。在实施方式中,光刻胶可采用O2等离子处理剥除,例如采用可由加利福尼亚SantaClara的SurplusProcessEquipmentCorporation获得的GaSonicsAura1000灰化系统剥除。在剥除后,可清洁该衬底,例如在热piranha清洁工艺中进行清洁。
在该柔性衬底上形成表面生成表面网纹后,该表面网纹可被化学修饰。化学修饰此处所用的网纹衬底可包括任意合适的衬底化学处理,例如,提供或增强网纹表面的疏油性。在实施方式中,化学修饰网纹衬底表面包括在该网纹硅表面上设置由全氟化烷基链组成的自组装层。多种技术,例如分子气相沉积技术、化学气相沉积技术或者溶液涂覆技术可被用于将该全氟化烷基链的自组装层沉积到该网纹硅表面上。在实施方式中,化学修饰该网纹衬底包括通过分子气相沉积、化学气相沉积或溶液自组装技术将氟硅烷涂层保形地自组装在网纹表面上的化学修饰。在特定的实施方式中,化学修饰网纹衬底包括采用分子气相沉积技术或溶液涂层技术沉积由十三氟-1,1,2,2-四氢辛基三氯硅烷、十三氟-1,1,2,2-四氢辛基三甲氧基硅烷、十三氟-1,1,2,2-四氢辛基三乙氧基硅烷、十七氟-1,1,2,2-四氢辛基三氯硅烷、十七氟-1,1,2,2-四氢辛基三甲氧基硅烷、十七氟-1,1,2,2-四氢辛基三乙氧基硅烷或其组合等等组装的层。
在特定的实施方式中,包括脉冲或时间复用蚀刻的Bosch深反应离子蚀刻工艺被用于生成网纹沟槽表面结构。该Bosch工艺可包括采用多个蚀刻循环来生成竖直蚀刻,其中每个循环包括三个独立的步骤:1)沉积保护性钝化层,2)蚀刻1,在需要处去除钝化层的蚀刻循环,以及3)蚀刻2,各向同性蚀刻硅的蚀刻循环。每个步骤持续数秒。钝化层由C4F8生成,其与类似,并能保护整个衬底不受进一步化学攻击和防止进一步蚀刻。然而,在蚀刻1阶段,攻击衬底的定向离子(directionalion)在需要处攻击该钝化层。该离子与该钝化层碰撞并将其溅开,将该衬底上的所需区域在蚀刻2中暴露至化学蚀刻剂。蚀刻2用于在短时间内(例如,约5-约10秒)各向同性刻蚀硅。更短的蚀刻2步骤得到更小的波周期(5秒可带来约250纳米),更长的蚀刻2得到更长的波周期(10秒可带来约880纳米)。该蚀刻循环可被重复至获得所需的沟槽高度。因此,在此处的实施方式中,光刻法包括采用多个蚀刻循环来生成竖直蚀刻,其中该多个蚀刻循环的每一个包括a)沉积保护性钝化层,b)在需要处蚀刻去除钝化层,和c)各向同性蚀刻硅;以及d)重复步骤a)至c)直至获得所需的沟槽结构构造。在该方法中,可生成具有网纹或波浪侧壁的沟槽结构,其中每个波浪对应于一个蚀刻循环。在实施方式中,该沟槽结构包括波浪侧壁,突出的内曲结构,或其组合。
周期性“波浪”结构的大小可以是任意合适的大小。在此处特定的实施方式中,该沟槽结构的波浪侧壁的每个“波浪”的大小为从约100纳米至约1000纳米,或约250纳米。
转向图2,本方法的一个实施方式包括在柔性衬底上生成网纹结构,其包含在最顶层上具有突出内曲结构的沟槽结构。该方法包括采用两种氟蚀刻方法(CH3F/O2和SF6/O2)的组合的类似方法。参考图2,该方法可包括提供柔性衬底200,其上具有清洁的硅层,在该清洁的硅层201上沉积SiO2薄膜202(例如通过溅射或等离子增强化学气相沉积),向该柔性衬底200上的硅层201涂覆的硅氧化物202应用光刻胶材料204,(例如采用SPRTM700-1.2光刻胶通过5∶1光刻法)对该光刻胶材料204进行暴露和显影,采用氟基反应离子(CH3F/O2)蚀刻以在该SiO2层中限定沟槽图案206,采用第二氟基反应离子(SF6/O2)蚀刻过程,然后通过热剥除和piranha清洁生成在最顶层上具有突出内曲结构210的网纹沟槽208。然后可用保形疏油涂层212涂覆该图案化阵列以提供包括了在顶表面具有突出内曲结构的网纹沟槽的超疏油柔性装置。
在特定的实施方式中,此处所述的具有超疏油表面的柔性装置可采用滚动条式制网(roll-to-rollwebfabrication)技术进行制备。该实施方式通常包括在柔性塑料卷上生成具有超疏油表面的柔性装置。例如,一个包含了柔性衬底的卷通过第一站,在该站中通过例如化学气相沉积或溅射将一个无定形硅层沉积在柔性衬底上,然后通过缝模涂覆光刻胶,然后通过第二站,其包括掩模和暴露/显影站,然后通过蚀刻站,继而通过清洁站。该网纹、柔性衬底可随后通过涂层站,其中可通过保形疏油涂层修饰该网纹、柔性衬底。
通常采用两种状态来描述粗糙表面上的液滴之间的复合液-固界面:Cassie-Baxter状态和Wenzel状态。在Cassie-Baxter状态和Wenzel状态下的液滴的静态接触角分别由方程(1)和(2)给出。
其中f是计划润湿面积的面积分数,Rf是润湿面积上的粗糙度比,Rff是固体面积分数,r是粗糙度比,而是液滴与平坦表面的接触角。
在Cassie-Baxter状态下,液滴主要“位于”空气中,并具有极大的接触角根据该方程,当液体和表面高度排斥时(例如在时),液滴处于Cassie-Baxter状态。
在此处的实施方式中,具有此处的网纹表面的装置是超疏水的,其具有大于约150°的极高的水接触角和小于或等于约10°的低滑移角。
对于烃基液体(例如油墨,以十六烷为范例),在实施方式中,包含了在顶表面形成突出内曲结构的沟槽结构的网纹表面赋予该表面足够的“排斥性”(即,),从而导致十六烷液滴在网纹、疏油表面的液-固界面形成Cassie-Baxter状态。然而,随着表面涂层的疏油性下降,该网纹表面实际上由Cassie-Baxter状态过渡至Wenzel状态。在此处的实施方式中,表面网纹和化学修饰(例如设置在该网纹表面上的FOTS涂层)的组合使得该网纹表面具有超疏油性。在平坦表面上,疏油性涂层表示该涂层具有大于约100°的水接触角和大于约50°的十六烷接触角。在此处的实施方式中,疏油性表示
此处所用超疏水可被描述为当水或液体的液滴与表面形成高接触角(例如从约130°-约180°的接触角,或从大于约150°的接触角)时。
图3提供了根据本发明的包含氟硅烷涂层沟槽(宽3微米,节距6微米)的结构的显微照相。图4提供了图3的结构的替代图像,显示了顶表面形成突出内曲结构的波浪侧壁。
该沟槽结构可具有任意合适的间距或密度或固体区域范围。在实施方式中,该沟槽结构具有从0.5%至约40%或从约1至约20%的固体区域范围。
该沟槽结构可具有任意合适的宽度和节距。在特定的实施方式中,该沟槽结构的宽度为从约0.5至约10微米,或从约1至约5微米,或约3微米。此外,在实施方式中,该沟槽结构的节距为从约2至约15微米,或从约3至约12微米,或约6微米。
该沟槽结构可具有任意合适的形状。在实施方式中,该总体的沟槽结构可具有设计形成特定图案的构造。例如,在实施方式中,该沟槽结构可具有以选定的流动方式引导液体流的构造。
该沟槽结构可限定为任意合适的或需要的总体高度。在实施方式中,该网纹表面可包含总高度为从约0.3至约5微米、从约0.3至约4微米或从约0.5至约4微米的沟槽图案。
可通过测定静态和动态接触角两者研究氟化网纹表面的表面属性。图5是显示了平行方向(左列)和垂直方向(右列)上在根据此处所述步骤(但以硅晶片取代柔性衬底)在硅晶片上制备的包含沟槽结构的氟硅烷涂层网纹表面上的水和十六烷(HD)的固着液滴的一组照片。不希望受限于理论,本发明人相信观察到的水和十六烷对于FOTS网纹表面的高接触角是表面网纹化和氟化的组合的结构。在特定的实施方式中,此处的网纹装置包括了至少一个波浪侧壁特征或沟槽结构顶表面的突出内曲结构,以提供柔性超疏油装置。不希望受限于理论,本发明人相信在顶表面的内曲结构可明显提高超疏油性。
本发明人已经证明了超疏油表面(例如,其中十六烷液滴与表面形成大于约150的接触角和小于约10的滑移角)可通过简单的光刻法和表面修饰技术在硅晶片上制造。所制备的超疏油表面是极为“疏油墨的”,并具有喷墨印刷头的前端面所亟需的表面特性,例如,针对超脱水(de-wetting)和高维持压(holdingpressure)的高接触角和针对自清洁和易清洁的低滑移角。一般而言,油墨接触角越大,维持压越好(越高)。维持压衡量光圈挡板避免油墨罐(贮存器)中压强升高时油墨滴出喷嘴开口的能力。表1总结了根据本发明的沟槽结构对于水、十六烷和固体油墨的接触角数据和滑移角数据。接触角和滑移角以测试液体的液滴进行测量。根据本披露的实施方式制备的超疏油表面包含了宽3微米、节距6微米的沟槽化表面。在实施例1中,该沟槽结构包括了具有波浪侧壁的沟槽,其中液滴的滑移与沟槽方向平行。在实施例2中,该沟槽结构包括了具有波浪侧壁的沟槽,其中液滴的滑移与沟槽方向垂直。在实施方式中,此处的柔性装置包括了超疏油表面,其中十六烷在与沟槽方向平行时或与沟槽方向垂直时与表面具有从大于约110°至约175°的接触角。在进一步的实施方式中,此处的具有超疏油表面的柔性装置包括了一种表面,其中在与沟槽方向平行时十六烷与该表面的滑移角小于约30°。
表1
此处所述的超疏油表面特别适合用作喷墨印刷头的前端面材料。在实施方式中,此处的喷墨印刷头包含前端面,该前端面包含具有塑料膜的柔性衬底;设置在该柔性衬底上的硅层,其中该硅层包含具有沟槽图案的网纹图案;以及设置在该网纹表面上的氟硅烷涂层。
在实施方式中,采用光刻法通过滚动条式网制造工艺制备,且由此处所述的柔性硅膜上的网纹沟槽图案组成的超疏油膜可被加工用作喷墨印刷头部件。喷嘴可通过例如激光消融技术或机械手段(例如穿孔)在膜上生成。印刷头尺寸的膜可被切割、对其并附着至(例如粘合至)用于喷墨印刷头应用的喷嘴前面板。该网纹喷嘴前端面将具有超疏油性,并将克服在某些现有印刷头中遇到的润湿和滴料问题。如果需要,该网纹图案可具有3微米的高度。此外,超疏油性可通过低至微米的图案高度得到维持。通过更低的图案高度,该浅网纹图案的机械粗强度增加。在人工摩擦这些超疏油图案时,未观察到或仅观察到极少的表面损伤。
在各种实施方式中,提供了对于制备具有单独的超疏油特性或同时具有超疏油和超疏水特性的装置的材料和方法。此外,在实施方式中,提供了改良的印刷头前端面设计,其减少或消除了UV或固体油墨在印刷头前端面的润湿、滴料、溢流或污染问题,即,它是疏油墨的(即,疏油的),且具有能够承受印刷头前端面擦拭等维护步骤的强度。在进一步的实施方式中,具有超疏油性且在实施方式中同时具有超疏油性和超疏水性的改良的印刷头前端面设计是容易清洁的或自清洁的,从而消除了硬件复杂性(例如对维护单元的需求)、降低的运行成本并提高了系统可靠性。
在进一步的实施方式中,该沟槽结构提供了改良的机械强度和平行方向极低的滑移角,从而得到了有利的定向自清洁特性,使其可作为固体油墨和UV油墨印刷头的自清洁、免维护前端面。这种各向异性润湿和定向清洁对于临近喷嘴边缘的区域以及远离喷嘴的区域具有极大的优势。垂直方向的高接触角可帮助残留油墨固定而平行方向的定向自清洁帮助油墨重新定向远离喷嘴并最终从前端面去除油墨。相应地,残留油墨将不会在喷嘴临近处混凝,也不会积聚在前端板上,因而不会导致印刷头前端面上的例如油墨润湿/滴料/溢流的问题。
Claims (14)
1.制备具有超疏油表面的柔性装置的方法,其包括:
提供柔性衬底;
在该柔性衬底上设置硅层;
使用光刻法在该衬底上的该硅层中生成网纹图案,其中该网纹图案包括沟槽结构,并且其中该沟槽结构包括突出内曲结构;以及
通过在其上设置保形疏油涂层化学修饰该网纹表面;
从而提供具有超疏油表面的柔性装置,
其中该沟槽结构包括网纹波浪侧壁,该波浪侧壁的每个波浪的大小为从100纳米至1000纳米,其中该沟槽结构的总高度是从0.3至4微米,且其中该沟槽结构具有从0.5%至40%的固体区域范围。
2.如权利要求1所述的方法,其中该柔性衬底包含塑料膜。
3.如权利要求1所述的方法,其中该硅层包括无定形硅。
4.如权利要求1所述的方法,其中该硅层包括以从1至5微米厚度沉积的无定形硅。
5.如权利要求1所述的方法,其中化学修饰该网纹衬底包括通过分子气相沉积、化学气相沉积或溶液自组装技术将氟硅烷涂层保形地自组装在该网纹表面上的化学修饰。
6.如权利要求1所述的方法,其中用于该保形疏油涂层的前体是十三氟-1,1,2,2-四氢辛基三氯硅烷、十三氟-1,1,2,2-四氢辛基三甲氧基硅烷、十三氟-1,1,2,2-四氢辛基三乙氧基硅烷、十七氟-1,1,2,2-四氢辛基三氯硅烷、十七氟-1,1,2,2-四氢辛基三甲氧基硅烷、十七氟-1,1,2,2-四氢辛基三乙氧基硅烷或其组合。
7.如权利要求1所述的方法,进一步包括:
使用滚动条式制网技术制备具有超疏油表面的柔性装置。
8.如权利要求1所述的方法,其中该光刻法包括采用多个蚀刻循环来生成竖直蚀刻,其中该多个蚀刻循环的每一个包括a)沉积保护性钝化层,b)在需要处蚀刻去除钝化层,和c)各向同性蚀刻硅;以及d)重复步骤a)至c)直至获得所需的沟槽结构构造。
9.如权利要求1所述的方法,其中该沟槽结构包括适于以选定的流动方式引导液体流的构造。
10.具有超疏油表面的柔性装置,其包括:
包含塑料膜的柔性衬底;
设置在该柔性衬底上的硅层,其中该硅层包含网纹沟槽图案,并且其中该沟槽图案包括突出内曲结构;以及
设置在该网纹表面上的保形疏油涂层,
其中该沟槽图案包括网纹波浪侧壁,该波浪侧壁的每个波浪的大小为从100纳米至1000纳米,其中该沟槽结构的总高度是从0.3至4微米,且其中该沟槽结构具有从0.5%至40%的固体区域范围。
11.如权利要求10所述的具有超疏油表面的柔性装置,其中超疏油表面包括其中十六烷在与沟槽方向平行时或与沟槽方向垂直时与该表面具有从大于110°至175°的接触角的表面。
12.如权利要求10所述的具有超疏油表面的柔性装置,其中该超疏油表面包括其中十六烷在与沟槽方向平行时与该表面具有小于30°的滑移角的表面。
13.喷墨印刷头,其包括:
前端面,其包含具有塑料膜的柔性衬底;
设置在该柔性衬底上的硅层,其中该硅层包含具有沟槽结构的网纹图案;以及
设置在该网纹表面上的保形疏油涂层,
其中该沟槽结构包括网纹波浪侧壁,该波浪侧壁的每个波浪的大小为从100纳米至1000纳米;其中该沟槽结构包括突出内曲结构;其中该沟槽结构的总高度是从0.3至4微米;其中该沟槽结构具有从0.5%至40%的固体区域范围;以及其中当液滴与沟槽方向平行滑动时,十六烷与该网纹表面具有小于30°的低滑移角。
14.如权利要求13所述的喷墨印刷头,其中该沟槽结构提供自清洁喷墨印刷头前表面。
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-
2009
- 2009-12-28 US US12/647,977 patent/US8292404B2/en active Active
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2010
- 2010-12-28 CN CN201010624394.XA patent/CN102180016B/zh not_active Expired - Fee Related
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US20110157277A1 (en) | 2011-06-30 |
JP2011136559A (ja) | 2011-07-14 |
CN102180016A (zh) | 2011-09-14 |
US8292404B2 (en) | 2012-10-23 |
JP5723592B2 (ja) | 2015-05-27 |
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