CN101956171B - 离子注入和等离子体沉积设备以及采用等离子体处理薄膜的方法 - Google Patents
离子注入和等离子体沉积设备以及采用等离子体处理薄膜的方法 Download PDFInfo
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Abstract
Description
实验号 | 膜层组成 | 膜层厚度 | 测试情况 | 结论 | 备注 |
实施例2 | 注入铜+沉积铜 | 25(纳米) | 没有脱落 | 好 | 双面沉积 |
实施例3 | 注入铜+沉积铜 | 200(纳米) | 没有脱落 | 好 | 双面沉积 |
实施例4 | 注入镍+沉积镍+沉积铜 | 100(纳米) | 没有脱落 | 好 | 双面沉积 |
实施例5 | 注入铬+沉积铬+沉积铜 | 50(纳米) | 没有脱落 | 好 | 双面沉积 |
实施例6 | 注入铜+沉积镍+沉积铜 | 50(纳米) | 没有脱落 | 好 | 双面沉积 |
实施例7 | 沉积镍+沉积铜 | 50(纳米) | 没有脱落 | 好 | 双面沉积 |
实施例8 | 沉积钼+沉积镍 | 50(纳米) | 没有脱落 | 好 | 双面沉积 |
实施例9 | 注入镍+沉积镍+沉积铜 | 50(纳米) | 没有脱落 | 好 | 单面沉积 |
Claims (12)
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CN 201010510359 CN101956171B (zh) | 2010-09-30 | 2010-09-30 | 离子注入和等离子体沉积设备以及采用等离子体处理薄膜的方法 |
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Families Citing this family (6)
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CN103225067A (zh) * | 2013-05-20 | 2013-07-31 | 中国科学院上海硅酸盐研究所 | 注入钙离子对聚醚醚酮表面进行改性的方法 |
CN104975267B (zh) * | 2014-04-09 | 2017-08-11 | 中国科学院上海硅酸盐研究所 | 一种对聚醚醚酮材料进行表面改性的方法 |
CN105734510B (zh) * | 2014-12-08 | 2018-04-20 | 宁夏巨能机器人股份有限公司 | 一种机器臂滑轨的表面处理方法 |
CN105873352B (zh) * | 2015-11-06 | 2019-02-01 | 武汉光谷创元电子有限公司 | 高频通信用基板及其制造方法 |
CN110578124B (zh) * | 2019-10-22 | 2021-10-01 | 北京市辐射中心 | 在柔性基体上制备硬质薄膜的方法及相关产品 |
CN115537749A (zh) * | 2022-09-08 | 2022-12-30 | 核工业西南物理研究院 | 一种用于连续人工磁通钉扎制备的离子辐照装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2706479Y (zh) * | 2004-04-14 | 2005-06-29 | 衡阳市真空机电设备有限公司 | 双面溅射真空卷绕连续镀膜设备 |
CN2887889Y (zh) * | 2006-03-06 | 2007-04-11 | 中国科学院物理研究所 | 多元弧等离子体全方位离子注入与沉积的表面处理装置 |
CN101348896A (zh) * | 2008-08-27 | 2009-01-21 | 浙江大学 | 卷绕式双面镀膜设备 |
CN201826010U (zh) * | 2010-09-30 | 2011-05-11 | 深圳市信诺泰创业投资企业(普通合伙) | 一种离子注入和等离子体沉积薄膜的设备 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN2706479Y (zh) * | 2004-04-14 | 2005-06-29 | 衡阳市真空机电设备有限公司 | 双面溅射真空卷绕连续镀膜设备 |
CN2887889Y (zh) * | 2006-03-06 | 2007-04-11 | 中国科学院物理研究所 | 多元弧等离子体全方位离子注入与沉积的表面处理装置 |
CN101348896A (zh) * | 2008-08-27 | 2009-01-21 | 浙江大学 | 卷绕式双面镀膜设备 |
CN201826010U (zh) * | 2010-09-30 | 2011-05-11 | 深圳市信诺泰创业投资企业(普通合伙) | 一种离子注入和等离子体沉积薄膜的设备 |
Non-Patent Citations (1)
Title |
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JP特开P2006-36904A 2006.02.09 |
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