CN101886253B - 潘宁放电离子源柔性材料真空镀膜机 - Google Patents
潘宁放电离子源柔性材料真空镀膜机 Download PDFInfo
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- CN101886253B CN101886253B CN 201010210467 CN201010210467A CN101886253B CN 101886253 B CN101886253 B CN 101886253B CN 201010210467 CN201010210467 CN 201010210467 CN 201010210467 A CN201010210467 A CN 201010210467A CN 101886253 B CN101886253 B CN 101886253B
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- 238000005240 physical vapour deposition Methods 0.000 description 3
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
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- 239000004411 aluminium Substances 0.000 description 1
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
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- 238000007738 vacuum evaporation Methods 0.000 description 1
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Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201010210467 CN101886253B (zh) | 2010-06-25 | 2010-06-25 | 潘宁放电离子源柔性材料真空镀膜机 |
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CN 201010210467 CN101886253B (zh) | 2010-06-25 | 2010-06-25 | 潘宁放电离子源柔性材料真空镀膜机 |
Publications (2)
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CN101886253A CN101886253A (zh) | 2010-11-17 |
CN101886253B true CN101886253B (zh) | 2013-09-11 |
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CN 201010210467 Active CN101886253B (zh) | 2010-06-25 | 2010-06-25 | 潘宁放电离子源柔性材料真空镀膜机 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102677020B (zh) * | 2012-05-22 | 2014-04-23 | 山东力诺太阳能电力股份有限公司 | 一种晶体硅太阳能电池双层镀膜设备 |
CN102683250B (zh) * | 2012-05-22 | 2015-02-04 | 山东力诺太阳能电力股份有限公司 | 晶体硅太阳能电池镀膜设备 |
KR101619152B1 (ko) * | 2012-12-05 | 2016-05-12 | (주)에스엔텍 | 플라즈마 화학기상 장치 |
CN103741120B (zh) * | 2013-12-24 | 2016-01-20 | 北京北印东源新材料科技有限公司 | Pecvd镀膜装置的电极结构 |
CN110624356A (zh) * | 2018-06-21 | 2019-12-31 | 东泰高科装备科技有限公司 | 废气处理装置、真空镀膜系统以及废气处理装置的操作方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1648283A (zh) * | 2004-01-30 | 2005-08-03 | 三星电子株式会社 | 等离子体化学气相沉积系统及涂覆衬底两侧的方法 |
CN101126148A (zh) * | 2007-07-27 | 2008-02-20 | 北京印刷学院 | 一种具有阻隔兼防护功能的纳米薄膜及其制做方法 |
CN101611168A (zh) * | 2007-02-13 | 2009-12-23 | 株式会社神户制钢所 | 连续成膜装置 |
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- 2010-06-25 CN CN 201010210467 patent/CN101886253B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1648283A (zh) * | 2004-01-30 | 2005-08-03 | 三星电子株式会社 | 等离子体化学气相沉积系统及涂覆衬底两侧的方法 |
CN101611168A (zh) * | 2007-02-13 | 2009-12-23 | 株式会社神户制钢所 | 连续成膜装置 |
CN101126148A (zh) * | 2007-07-27 | 2008-02-20 | 北京印刷学院 | 一种具有阻隔兼防护功能的纳米薄膜及其制做方法 |
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