CN101897022A - 半导体模块 - Google Patents

半导体模块 Download PDF

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CN101897022A
CN101897022A CN2008801199922A CN200880119992A CN101897022A CN 101897022 A CN101897022 A CN 101897022A CN 2008801199922 A CN2008801199922 A CN 2008801199922A CN 200880119992 A CN200880119992 A CN 200880119992A CN 101897022 A CN101897022 A CN 101897022A
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relaxation layer
stress relaxation
slit
semiconductor element
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小川尚纪
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Toyota Motor Corp
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Abstract

在半导体模块100中,在安装半导体元件10(IGBT11、二极管12)的陶瓷基板20和位于陶瓷基板20背面侧的冷却器之间配置应力缓和层45,并且这些各部分构成了一体。另外,应力缓和层45通过两个狭缝461、462被分割为多个单片部45A、45B、45C、45D。另外,当从应力缓和层45的厚度方向观察时,狭缝461、462处于半导体元件之间,并且不处于半导体元件的投影区域内。

Description

半导体模块
技术领域
本发明涉及半导体模块,所述半导体模块是通过安装有半导体元件的绝缘基板和冷却部件夹持应力缓和层而被组装成的。
背景技术
在搭载于混合动力汽车或电动汽车等中的用于高耐压、大电流的功率模块中,半导体元件动作时自身发热量很大。因此,车载功率模块需要具备具有高散热性的冷却构造。
图6示出了具备冷却构造的功率模块的一个例子。功率模块90包括多个半导体元件10、安装半导体元件10的陶瓷基板20、以及内部具有冷媒流道的冷却器30。功率模块90通过冷却器30散发从半导体元件10产生的热量。
在具备这种构造的功率模块90中,可能会产生由线膨胀率差异引起的应力集中。即,陶瓷基板20的线膨胀率小,为4~6ppm/℃。另一方面,作为冷却器30的材料的铝的线膨胀率比较大,为23ppm/℃。
因此,为了吸收上述线膨胀率差,在陶瓷基板20和冷却器30之间设置由具有高的热传导性并且线膨胀率与冷却器30相近的材料(高纯度铝等)形成的应力缓和层40(例如,专利文献1)。如图7所示,在该应力缓和层40中设置有多个通孔41,这些通孔41吸收陶瓷基板20和冷却器30的线膨胀变形。
专利文献1:日本专利申请公开公报第2006-294699号。
发明内容
发明所要解决的问题
近年进行了这样的研究,即:如图8所示,准备大尺寸的陶瓷基板20,并将比以前更多的半导体元件10(例如,IGBT11、二极管12)配置在一个陶瓷基板20上。由此,能够缩小半导体元件10、10之间的空间,其结果是,能够实现功率模块整体的紧凑化。
但是,利用大尺寸陶瓷基板20时存在以下的问题。即,虽然能够促进功率模块整体的小型化,但陶瓷基板20自身的规模却变大了。并且,随着陶瓷基板20的规模变大,应力缓和层40的尺寸也变大。因此,应力缓和层40(主要是其外周部)产生的变形变大,应力缓和效果不足。其结果是,陶瓷基板20会产生弯曲(翘曲)、裂纹等问题。尤其,如果在半导体元件10的正下方或附近产生裂纹,损坏就会很大。
专利文献1的应力缓和层如图7所示,除通孔41以外的部分处于连结状态。应力缓和层和陶瓷基板的应力变形随着外周尺寸的变大而变大。因此,当利用半导体元件的载置面尺寸大的陶瓷基板20时,应力缓和效果不足。
另外,可以考虑增多通孔41的数量或者加大孔径来提高应力缓和效果。但是,通孔41是空间,热传导率低。并且,如果在应力缓和层40上形成多个空间,传热路径就会被这些空间切断。因此,为了确保高散热性,通孔41优选尽可能少并且小。即,由于应力缓和层40兼有向冷却器30传热的功能,因此,提高应力缓和效果与确保高热传导性之间存在折衷关系。
本发明就是为了解决上述现有的半导体装置所具有的问题而完成的。即,其目的在于,提供一种兼顾提高应力缓和效果和确保高热传导性的半导体模块。
为了解决上述问题的半导体模块的特征在于包括:冷却部件(散热器);绝缘基板,在该绝缘基板上配置有多个半导体元件;以及应力缓和层,其一个面与绝缘基板接合,另一个面与冷却部件接合,并且该应力缓和层兼具传热功能以及应力缓和功能;其中,在应力缓和层中设置有将所述应力缓和层分离为多个单片部的至少一个狭缝,狭缝在应力缓和层的面内位于从应力缓和层的厚度方向观察时处于半导体元件的投影区域以外的区域、即非半导体元件区域内。
本发明的半导体模块在安装半导体元件的绝缘基板和冷却部件之间配置应力缓和层,并且这些各部分通过接合构成了一体。另外,应力缓和层通过至少一个狭缝被分割为多个单片部。因此,即使由于在进行冷热循环等的可靠性评估时或者在市场上使用时温度发生变化,而导致冷却部件的收缩量和绝缘基板的伸缩量产生了差异,各单片部所负担的应力变形也小。因此能够可靠地吸收应力变形,防止绝缘基板或接合材料的开裂或弯曲,能够确保高可靠性。
另外,当在从应力缓和层的厚度方向观察的情况下将应力缓和层的面内的区域区分为半导体元件的投影区域和作为投影区域以外的区域的非半导体元件区域时,狭缝位于非半导体元件区域内。即,作为空间的狭缝没有被配置在半导体元件区域内。因此,狭缝对传热路径的影响小。因此能够确保高导热性。
另外,即使绝缘基板万一产生裂纹,该裂纹也很可能在远离半导体元件的非半导体元件区域内产生。因此,能够避免在裂纹的初始阶段产生致命的损伤。
另外,更优选狭缝中的至少一个狭缝位于半导体元件之间。由此,半导体元件被分散配置在各单片部。因此,应力变形被各单片部分担,各单片部能够在各自的应力缓和能力的范围内发挥其效果。
另外,优选狭缝中的至少一个狭缝横截应力缓和层。即,通过设置横截应力缓和层的狭缝,能够减小各单片部的外周尺寸。由此,各单片部能够更加可靠地发挥应力缓和能力。
另外,优选应力缓和层的各单片部的尺寸依照半导体元件的配置而不同。即,配合半导体元件来设计狭缝的位置。由此,各单片部能够更加可靠地发挥应力缓和能力,并且有关半导体元件的配置的设计自由度高。
发明效果
根据本发明,实现了兼顾提高应力缓和效果和确保高导热性的半导体模块。
附图说明
图1是表示涉及实施方式的功率模块的结构的简要截面图;
图2是表示涉及实施方式的应力缓和层的结构的立体图;
图3是表示涉及实施方式的半导体元件和狭缝间配置关系的平面透视图;
图4是表示涉及实施方式的应力缓和层的区域的简要情况的图;
图5是表示涉及应用例的半导体元件和狭缝间配置关系的平面透视图。
图6是表示涉及现有方式的功率模块的结构的简要截面图;
图7是表示涉及现有方式的应力缓和层的结构的立体图;
图8是表示涉及现有方式的半导体元件和狭缝间配置关系的平面透视图。
具体实施方式
以下,参照附图来详细说明本发明的具体实施方式。另外,在以下的方式中,本发明被应用于混合动力汽车用的智能功率模块。
如图1所示,本实施方式的功率模块100包括:作为发热体的半导体元件10;安装半导体元件10的陶瓷基板20;内部具有冷媒流道的冷却器30;以及应力缓和层45,其位于陶瓷基板20和冷却器30之间,具有缓和由于两者的线膨胀率差而引起的应力变形的应力缓和功能。功率模块100将来自半导体元件10的热量经由陶瓷基板20和应力缓和层45散发到冷却器30。
半导体元件10是构成逆变器电路的电子部件(在本实施方式中将IGBT记为11,将二极管记为12)。多个半导体元件10被安装在陶瓷基板20上,并通过锡焊被固定在陶瓷基板20上。在车载用的功率模块上安装很多半导体元件,但在本说明书中为了简化说明,仅简要示出其一部分。
陶瓷基板20可通过满足必要的绝缘特性、热传导率以及机械强度的任意的陶瓷形成。例如,可使用氧化铝或氮化铝。在本实施方式中,陶瓷基板20采用氮化铝(AIN)。并且,其线膨胀率是与基材的AIN大致相等的4.6ppm/℃。
另外,在陶瓷基板20的上表面设置有金属的图案层21。图案层21只要是导电率高、并且与焊锡的润湿性优良的图案层即可。例如可使用在高纯度铝上实施了镀镍的图案层。另一方面,在陶瓷基板20的下表面设置有金属层22。金属层22只要是导热率高、与钎料的润湿性优良的金属层即可。例如可使用高纯度铝。
在应力缓和层45上设置有吸收由铝制冷却器30和陶瓷基板20的线膨胀率差引起的应力变形的应力吸收空间。本实施方式的应力缓和层45是纯度为99.99%以上的铝板。作为高纯度铝的应力缓和层45的线膨胀率与铝的固有值相等,即为23.5ppm/℃。高纯度铝是杨氏模量为70.3GPa的比较柔软的材料,对应力的变形大。因此,能够缓和冷却器30和陶瓷基板20之间的应力变形。
并且,作为应力缓和层45的材料的高纯度铝具有高导热性。因此,应力缓和层45具有将来自半导体元件10的热量沿应力缓和层45的平面方向散热并传导至冷却器30的功能。即,应力缓和层45兼具应力缓和功能以及传热功能。
另外,如图2所示,应力缓和层45在与陶瓷基板20的接合面内设置有两个狭缝461、462。在应力缓和层45中狭缝461、462成为应力吸收空间。另外,狭缝461、462在厚度方向(图1中的上下方向)上贯穿应力缓和层45,并且在俯视的情况下,一个狭缝461横截应力缓和层45,另一个狭缝462纵截应力缓和层45。即,应力缓和层45通过狭缝461、462被彻底分割成多个单片。具体地说,本实施方式的应力缓和层45通过狭缝461、462被四分成单片部45A、45B、45C、45D各单片。关于狭缝461、462和半导体元件10的位置关系,将在后面进行说明。
冷却器30具有在其内部被等间隔配置成列状的冷却片31,在相邻的冷却片31、31之间形成冷媒流道35。构成冷却器30的各个部件可采用具有高导热性且重量轻的铝。冷媒可采用液体和气体中的任一种。
为了将来自半导体元件10的热量有效地传递至冷却器30,陶瓷基板20和应力缓和层45通过钎焊直接接合在冷却器30上。钎料可采用Al-Si系合金、Al-Si-Mg系合金等铝钎料。在本实施方式中,使用Al-Si系合金在将近600℃的温度下进行钎焊。另外,也可以在形成冷却器30同时,进行冷却器30与应力缓和层45等的接合。
接着,参照图3至图4,对本实施方式的功率模块100中半导体元件10与应力缓和层45的狭缝461、462在陶瓷基板20上的配置关系进行详细说明。
图3在俯视情况下示出了陶瓷基板20上的半导体元件10(IGBT11、二极管12)的配置的一个例子。并且,在图3中用虚线分别示出了应力缓和层45的单片部45A、45B、45C、45D的配置。在本实施方式中,当从应力缓和层45的厚度方向观察时,在各单片部45A、45B、45C、45D上各配置有一个IGBT11和一个二极管12。更具体地说,IGBT11和各二极管12被配置成不跨过相邻的单片部之间而被纳入在一个单片部内。
即,应力缓和层45的狭缝461、462不位于半导体元件10之下。图4示出了在从应力缓和层的厚度方向观察时应力缓和层45的面内被分为处于半导体元件10之下并成为半导体元件10的投影区域的元件区域45X和不处于半导体元件10之下的非元件区域45Y的情况。设置狭缝461、462以被纳入非元件区域45Y内的方式设置,不跨过元件区域45X。
在本实施方式的功率模块100中,应力缓和层45通过狭缝461、462被分成各个单片。因此,即使随着陶瓷基板20的尺寸变大而整个应力缓和层45的尺寸变大,各单片部45A、45B、45C、45D的尺寸也小。因此,各单片部45A、45B、45C、45D上产生的应力变形小,作为应力缓和层45整体能够充分发挥应力缓和效果。
另外,狭缝461、462被配置在半导体元件之间,以使半导体元件11、12被均匀地配置在各单片部45A、45B、45C、45D上。由此,半导体元件11、12被分散配置在各单片部45A、45B、45C、45D上。因此,应力变形被各单片部45A、45B、45C、45D分担,各单片部45A、45B、45C、45D能够在各自的应力缓和能力的范围内发挥其效果。
另外,应力缓和层45和陶瓷基板20的应力在分割而成的单片部45A、45B、45C、45D的外周附近变为最大。单片部45A、45B、45C、45D和陶瓷基板20相接合的部位处于陶瓷基板20被单片部45A、45B、45C、45D支持的状态,强度高。因此,当陶瓷基板20达到极限而产生裂纹时,从未与单片部45A、45B、45C、45D接合的部分起产生裂纹的可能性高。即,在与狭缝461、462相对的部分容易产生裂纹。
但是,在本实施方式中,半导体元件10仅被安装在陶瓷基板20上的存在单片部45A、45B、45C、45D的部分。换言之,狭缝461、462仅存在于半导体元件之间、即非元件区域45Y。因此,即使万一陶瓷基板20产生了裂纹,该裂纹也会在半导体元件10、10之间产生。因此,能够避免致命的问题。
设置狭缝461、462,可能导致应力缓和层45的传热功能下降,但狭缝461、462没有被设置在作为发热体的半导体元件10之下。即,在最要求热传导性的元件区域45X中,无缝隙地存在应力缓和层45。因此,对散热性的影响小。
另外,本实施方式的应力缓和层45通过狭缝461、462被分成尺寸大致相同的单片部45A、45B、45C、45D,但不限于此。例如,也可以如图5所示,根据半导体元件10的配置来调节单片部的尺寸。在图5所示的半导体模块中,在应力缓和层中设置有三个狭缝463、464、465,只有狭缝463横截应力缓和层,其他狭缝464、465以避开半导体元件10的位置的方式配置。应力缓和层通过这些狭缝被分成单片部45A、45B、45C、45D,各单片部的尺寸不同。即,应力缓和层的狭缝不妨碍半导体元件10的配置的设计自由。即,单片部的尺寸可以在由铝和陶瓷的线膨胀率差引起的应力变形不超过陶瓷基板20的强度的范围内(例如,20mm见方×1mm厚度)进行调节。
另外,在本实施方式中,在一个单片部配置了两个半导体元件11、12,但也可以还在半导体元件11、12之间设置狭缝,从而在一个单片部上设置一个半导体元件。另外,如果处于能够吸收应力变形的范围内,则也可以在一个单片部上配置三个以上的半导体元件。
如以上详细说明的那样,在本实施方式的半导体模块100中,应力缓和层45通过狭缝461、462被分为四个单片部45A、45B、45C、45D。即,即使应力缓和层45整体的尺寸大,如果关注单片部45A、45B、45C、45D则其尺寸小。因此,即使由于在进行冷热循环等的可靠性评估时或者在市面上使用时温度发生变化,而冷却部件的伸缩量和绝缘基板的伸缩量产生了差异,各单片部所负担的应力变形也小。由此能够可靠地吸收应力变形,防止陶瓷基板20或接合材料的开裂或弯曲,能够确保高可靠性。
另外,狭缝461、462处于非元件区域45Y内。即,狭缝461、462未被配置在元件区域45X上,对传热路径的影响小。因此,能够确保高的热传导性。因此实现了兼顾提高应力缓和效果和确保高导热性的半导体模块。
另外,即使应力缓和层45整体的尺寸大,也可确保应力缓和层45的应力缓和效果和高导热性。因此,有助于陶瓷基板20的大型化,其结果有助于功率模块的小型化。
本实施方式只不过是一个例示,对于本发明不具有任何限定作用。因此,本发明当然能够在不脱离其主旨的范围内进行各种改进、变形。例如,在本实施方式的应力缓和层中,仅设置狭缝作为应力吸收空间,但也可以与狭缝一起还设置通孔。由此能够使得分割而成的各区域进一步发挥应力缓和效果。
另外,散发来自半导体元件的热量的部件不限于具有冷媒流道的冷却器。例如也可以是利用了由廉价且具有高导热性的材料(铝或铜等)形成的金属板的散热板。

Claims (4)

1.一种半导体模块,其特征在于,包括:
冷却部件;
绝缘基板,在该绝缘基板上配置有多个半导体元件;以及
应力缓和层,其一个面与所述绝缘基板接合,另一个面与所述冷却部件接合,并且该应力缓和层兼具传热功能以及应力缓和功能;
其中,在所述应力缓和层中设置有将所述应力缓和层分离为多个单片部的至少一个狭缝,
所述狭缝在所述应力缓和层的面内位于从所述应力缓和层的厚度方向观察时处于所述半导体元件的投影区域以外的区域、即非半导体元件区域内。
2.如权利要求1所述的半导体模块,其特征在于,
所述狭缝中的至少一个狭缝位于半导体元件之间。
3.如权利要求1或2所述的半导体模块,其特征在于,
所述狭缝中的至少一个狭缝横截所述应力缓和层。
4.如权利要求1至3中任一项所述的半导体模块,其特征在于,
所述应力缓和层的各单片部的尺寸依照半导体元件的配置而不同。
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102738138A (zh) * 2012-06-05 2012-10-17 嘉兴斯达微电子有限公司 一种针对电动汽车应用的igbt功率模块
CN103811477A (zh) * 2012-11-01 2014-05-21 株式会社丰田自动织机 半导体单元

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5512377B2 (ja) * 2010-04-28 2014-06-04 本田技研工業株式会社 回路基板
DE102012208767A1 (de) * 2011-06-17 2012-12-20 Robert Bosch Gmbh Elektronische Schaltungsanordnung mit Verlustwärme abgebenden Komponenten
JP5548722B2 (ja) * 2012-03-30 2014-07-16 三菱マテリアル株式会社 ヒートシンク付パワーモジュール用基板、及び、ヒートシンク付パワーモジュール用基板の製造方法
JP6154248B2 (ja) * 2012-08-24 2017-06-28 京セラ株式会社 流路部材およびこれを用いた熱交換器ならびに半導体製造装置
JP6232697B2 (ja) * 2012-11-08 2017-11-22 ダイキン工業株式会社 パワーモジュール
DE102014101926A1 (de) * 2014-02-17 2015-05-07 Semikron Elektronik Gmbh & Co. Kg Leistungshalbleitermodul
US9449867B2 (en) * 2014-06-17 2016-09-20 Taiwan Semiconductor Manufacturing Co., Ltd. VHF etch barrier for semiconductor integrated microsystem
JP1528484S (zh) * 2015-01-14 2015-07-13
JP1528936S (zh) * 2015-01-14 2015-07-13
JP1528485S (zh) * 2015-01-14 2015-07-13
JP2019079958A (ja) * 2017-10-25 2019-05-23 株式会社豊田中央研究所 パワーモジュール
JP7159620B2 (ja) * 2018-05-30 2022-10-25 富士電機株式会社 半導体装置、冷却モジュール、電力変換装置及び電動車両
JP7147610B2 (ja) * 2019-02-12 2022-10-05 三菱マテリアル株式会社 絶縁回路基板及びその製造方法
US11388839B2 (en) * 2020-08-14 2022-07-12 Toyota Motor Engineering & Manufacturing North America, Inc. Power electronics cooling assemblies and methods for making the same
WO2022097792A1 (ko) * 2020-11-04 2022-05-12 주식회사 리빙케어 대용량 열전모듈
DE102022208583A1 (de) 2022-08-18 2023-08-03 Zf Friedrichshafen Ag Leistungshalbleitermodul mit innerem kühlkanal

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0422558B1 (en) * 1989-10-09 2001-03-28 Mitsubishi Materials Corporation Ceramic substrate used for fabricating electric or electronic circuit
JPH083372A (ja) * 1994-06-17 1996-01-09 Ube Ind Ltd 大型車両用タイヤ
JPH088372A (ja) * 1994-06-23 1996-01-12 Toshiba Corp 放熱装置
JPH08274228A (ja) * 1995-03-29 1996-10-18 Origin Electric Co Ltd 半導体搭載基板、電力用半導体装置及び電子回路装置
JP2002343911A (ja) * 2001-05-16 2002-11-29 Hitachi Metals Ltd 基 板
JP3793562B2 (ja) * 2001-09-27 2006-07-05 京セラ株式会社 セラミック回路基板
JP2003163315A (ja) * 2001-11-29 2003-06-06 Denki Kagaku Kogyo Kk モジュール
JP2006165409A (ja) * 2004-12-10 2006-06-22 Hitachi Ltd 電力変換装置
JP4621531B2 (ja) * 2005-04-06 2011-01-26 株式会社豊田自動織機 放熱装置
DE102006011995B3 (de) * 2006-03-16 2007-11-08 Semikron Elektronik Gmbh & Co. Kg Leistungshalbleitermodul mit segmentierter Grundplatte

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102738138A (zh) * 2012-06-05 2012-10-17 嘉兴斯达微电子有限公司 一种针对电动汽车应用的igbt功率模块
CN103811477A (zh) * 2012-11-01 2014-05-21 株式会社丰田自动织机 半导体单元

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