CN101829647B - Decompression drying device - Google Patents
Decompression drying device Download PDFInfo
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- CN101829647B CN101829647B CN2010101190556A CN201010119055A CN101829647B CN 101829647 B CN101829647 B CN 101829647B CN 2010101190556 A CN2010101190556 A CN 2010101190556A CN 201010119055 A CN201010119055 A CN 201010119055A CN 101829647 B CN101829647 B CN 101829647B
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- 230000006837 decompression Effects 0.000 title claims abstract description 33
- 238000001035 drying Methods 0.000 title abstract description 25
- 239000000758 substrate Substances 0.000 claims description 147
- 230000004308 accommodation Effects 0.000 claims description 63
- 238000007599 discharging Methods 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 239000012530 fluid Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000009958 sewing Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/007—After-treatment
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- Drying Of Solid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
The invention provides a decompression drying device, capable of preventing uneven drying on a base plate coating film. The decompression drying device comprises: a housing portion for housing the base plate; a base plate keeping portion for keeping the base plate at the preset position of the housing portion; an exhaust port arranged at the position opposite to the base plate center position kept by the base plate keeping portion and for exhausting the air of the housing portion; an annular suction port comprising an opening portion opening along the cirumferential edge of the base plate kept by the base plate keeping portion and formed by annular communication along the cirumferential edge of the base plate, wherein the exhaust port is communicated with the annular suction port and when suction force is generated by the exhaust port, the air in the housing portion is exhausted from the exhaust port by the opening portion.
Description
Technical field
The present invention relates to by making to be coated on coating fluid drying under reduced pressure on substrate, form thus the decompression dry device of coated film on substrate.
Background technology
In the flat-panel monitors such as liquid crystal display or plasma display, use the substrate (being called coated substrates) that is coated with resist liquid on substrate.This coated substrates by utilize apparatus for coating on substrate evenly painting erosion resistant agent liquid to form coated film, then to utilize decompression dry device to make the coated film drying be produced.
This decompression dry device, as shown in following patent documentation 1, substrate is being contained under the state of the accommodation section that is formed with upper chamber and lower chamber, is reducing the pressure in accommodation section by the atmosphere of discharging accommodation section from exhaust outlet, so that the coated film drying on substrate.
Now, the flat board of mounting substrate plays the effect as cowling panel, can be suppressed at thus on the coated film on substrate that to form uneven drying even.That is,, if use vavuum pump etc. make attraction force acts in exhaust outlet, near atmosphere substrate flow into exhaust outlet by the periphery avris of cowling panel.And exhaust outlet along mounting, have near the inboard, neighboring in zone of substrate be arranged with a plurality of so that can effectively be reclaimed at short notice by the atmosphere of cowling panel periphery avris.Thus, near atmosphere substrate can be discharged from almost evenly, thereby prevents from forming drying mark on coated film.
Patent documentation 1: TOHKEMY 2005-329303 communique
But, even the decompression dry device that above-mentioned patent documentation 1 is put down in writing can not be restrained drying mark sometimes.That is, due near exhaust outlet is arranged on, along mounting, the inboard, neighboring in zone of substrate arranged, therefore dispose exhaust outlet near, its attraction is more local by force than other.Therefore, even in the situation that be provided with cowling panel, near exhaust outlet, also can produce powerful air-flow, on the coated film on substrate, form along air flow form, striated irregular.So, carry out drying without any processing, there is thus the problem that produces drying mark on coated film.
Summary of the invention
The present invention is point in view of the above problems, and its purpose is to provide a kind of can be suppressed at the decompression dry device that forms drying mark on coated film.
In order to address the above problem, decompression dry device of the present invention comprises: accommodation section, for holding substrate; The substrate maintaining part, for remaining on substrate the assigned position of described accommodation section; Exhaust outlet, be arranged on relative with the center of the substrate kept by described substrate maintaining part and, on the position of putting, be used for discharging the atmosphere of described accommodation section; Ring-type attracts mouth, comprises along the peristome of the neighboring opening of the substrate kept by described substrate maintaining part, and described ring-type attracts the neighboring of the described substrate of opening's edge to be connected to form with ring-type; Wherein, by described exhaust outlet and described ring-type, attract the connection of mouth to be connected, while on described exhaust outlet, producing attraction, the atmosphere of accommodation section attracts mouth and discharges from exhaust outlet by described ring-type.
According to described decompression dry device, when exhaust outlet produces attraction, the atmosphere of accommodation section equally attracts the peristome of mouth to be attracted by described ring-type.; because ring-type attracts mouth to be connected with exhaust outlet and exhaust outlet is configured on position of putting relative to the center of substrate; therefore in attraction force acts during in exhaust outlet; this attraction in whole ring-type, attract mouthful around on towards the exhaust outlet direction generation effect that is positioned at the substrate center position, and in whole ring-type, attract mouthful around produce almost equal attraction.In addition, because described ring-type attracts opening's edge substrate neighboring, there is peristome, therefore can make whole this peristome produce almost attraction uniformly.The direction of the atmosphere of accommodation section from the middle body of substrate to the peristome that is positioned at the neighboring side equally is attracted thus, and attracts mouthful from exhaust outlet, to discharge by ring-type.Thus, the atmosphere of accommodation section equally is attracted, therefore with situation in the past, compare, from inboard, neighboring because of along substrate near be provided with a plurality of exhaust outlets dispose exhaust outlet near the attraction that produces with other place exist strong and weak different situations to compare, can suppress drying mark.
In addition, described ring-type attracts mouth also can form by following manner: it is formed on described substrate maintaining part, and in the mode that is positioned at equidistant position from this neighboring, forms on the whole neighboring of the substrate kept by described substrate maintaining part.
According to described structure, be in the neighboring from maintained substrate on the substrate maintaining part of equidistant position because ring-type attracts interruption-forming, so towards the ring-type that is positioned at substrate periphery avris, attract the direction generation of mouth to equate and uniform attraction from the middle body of substrate.Therefore do not need cowling panel in the past is set, thereby can reduce the volume of accommodation section.Thus, can suppress to follow the increase of accommodation section and be created in the bubble in coated film, can suppress the generation of drying mark.
In addition, described peristome also can form by following manner: openings that it attracts mouthful for being communicated with described accommodation section and ring-type, and this openings forms along the neighboring of the substrate kept by described substrate maintaining part.
According to described structure, even be created in attraction that ring-type attracts mouthful in a circumferential direction in unequal situation, the mode such as configuration that also can be by suitable adjusting openings and can attract almost evenly the atmosphere of accommodation section.
As the specific embodiment, can form by following manner: have and be communicated with to connect the connected entrance that described exhaust outlet and ring-type attract mouthful, and be formed on the ring-type be connected with described connected entrance and attract the openings of notch portion to be less than the openings that is formed on other parts.
According to described structure, in being connected with the exhaust outlet part of connected entrance, be greater than the attraction of other parts from the attraction of exhaust outlet.Therefore, by making the openings in this part, according to the mode that is less than the openings in other parts, form, thereby can make the attraction of described part be less than the attraction of other parts, can make thus the attraction of peristome integral body become almost even.
Further specifically, the structure of described openings attracts the connection coupling part larger mode of this openings far away of mouth to form according to the described connected entrance of distance and ring-type, therefore can be by suitably regulating and make the attraction of peristome integral body become even.
According to decompression dry device of the present invention, can suppress to be formed at the drying mark on coated film.
The accompanying drawing explanation
Fig. 1 is the chamber cap of decompression dry device and the stereogram of the state that cavity main body separates in expression an embodiment of the present invention;
The top view of the cavity main body that Fig. 2 is above-mentioned decompression dry device;
Fig. 3 is for meaning the top view of above-mentioned cavity main body base portion;
Fig. 4 is for meaning that substrate is loaded in the partial cross section figure of the state of above-mentioned cavity main body;
Fig. 5 is accommodated in the figure of the state in decompression dry device for meaning substrate.
Description of reference numerals
1 substrate
10 chamber caps
11 flat parts
12 side wall portions
20 cavity main bodies
21 base portions
21a sells accommodation hole
22 boards
The 22a pin-and-hole
The 22b openings
23 jacking pins
24 exhaust outlets
25 ring-types attract mouth
The 25a peristome
26 connected entrances
30 substrate accommodation sections
The specific embodiment
Utilize accompanying drawing to describe embodiments of the present invention.
Fig. 1～Fig. 5 is the figure that roughly means the decompression dry device of an embodiment of the present invention, and wherein, Fig. 1 is the chamber cap 10 of expression decompression dry device and the stereogram of the state that cavity main body 20 separates; The top view that Fig. 2 is cavity main body; Fig. 3 is for meaning the figure of cavity main body base portion 21; Fig. 4 is positioned in the partial cross section figure of the state of above-mentioned cavity main body 20 for meaning substrate 1; Fig. 5 is accommodated in the figure of the state in decompression dry device for meaning substrate.
As shown in Fig. 1～Fig. 5, decompression dry device is that the coated film to being formed on resist liquid on substrate 1 etc. is carried out dry device, and it comprises cavity main body 20 (substrate maintaining part 20) and chamber cap 10.As shown in Figure 5, be formed with by described cavity main body 20 and chamber described later cap 10 the substrate accommodation section 30 that holds substrate 1.And, maintain the mode of reduced pressure atmosphere by making described substrate accommodation section 30, can carry out drying to the substrate 1 be contained in substrate accommodation section 30.
In addition, in the following description, the top using the paper upside in Fig. 1 as decompression dry device, the below using the paper downside in Fig. 1 as decompression dry device and describe.
Cavity main body 20 is parts that the substrate 1 to being formed with coated film is kept.Described cavity main body 20 comprises base portion 21 and is arranged on the board 22 above described base portion 21.Be formed with a plurality of pin-and-hole 22a in described board 22, and form from the outstanding mode of described pin-and-hole 22a according to jacking pin 23.So the leading section of a plurality of jacking pins 23 that substrate 1 can be outstanding by this assigns to be kept.
Specifically, in base portion 21, be formed with pin accommodation hole 21a on the position corresponding with pin-and-hole 22a, and be embedded with jacking pin 23 in this pin accommodation hole 21a.Described jacking pin 23 is connected with the drive unit that is arranged on base portion 21 downsides (not shown), and by driving described drive unit, jacking pin 23 carries out lifting action, and stops on can be at an arbitrary position.In the present embodiment, jacking pin 23 be set to can be in being contained in base portion 21 accommodated position, give prominence to and join the substrate transfer position of substrate 1, the dry place that carries out drying process from board 22 and stop.And, if substrate 1 is positioned at the fore-end that is positioned in jacking pin 23 under the state of substrate transfer position at jacking pin 23, by not shown detent mechanism, substrate 1 is positioned on pre-set position, then makes the jacking pin descend so that substrate 1 is held being positioned under the state of dry place.Therefore in addition, in described pin accommodation hole 21a, be provided with seal member, even under outstanding state, also can prevent that the atmosphere of substrate accommodation section 30 from sewing from pin accommodation hole 21a at jacking pin 23.
In addition, cavity main body 20 has exhaust outlet 24, by this exhaust outlet 24, the atmosphere of substrate accommodation section 30 is discharged, and can make thus 30 decompressions of substrate accommodation section.In described exhaust outlet 24, not shown vavuum pump is connected with pipe arrangement, and by making vavuum pump work, attraction force acts is in exhaust outlet 24, and the atmosphere of substrate accommodation section 30 is attracted.Thus, substrate accommodation section 30 can be less than atmospheric mode with its pressure and is depressurized.Exhaust outlet 24 in present embodiment only is provided with one at the middle body that is positioned at base portion 21 and for the relative position of putting, center be maintained at the substrate 1 on dry place by jacking pin 23.Therefore, the atmosphere of substrate accommodation section 30 is towards relative with the center of substrate 1 and the direction of putting occurs to flow and pass through exhaust outlet 24 discharges.Yet in the present embodiment, the exhaust outlet 24 consisted of a hole is relative in the center with substrate 1 and only be provided with one on the position of putting, but can be also the exhaust outlet 24 consisted of a plurality of holes.Even in this case, as long as it is relative with the center of maintained substrate 1 and on the position of putting that the center of the exhaust gas region of the exhaust outlet 24 that consists of a plurality of holes is arranged on, can ring-type attract mouthfuls 25 whole around on the uniform attraction of generation.
In addition, cavity main body 20 has ring-type attraction mouth 25 and is connected the connected entrance 26 that this ring-type attracts mouth 25 and exhaust outlet 24 with mode of communicating.Specifically, ring-type attraction mouth 25 and connected entrance 26 are (with reference to Fig. 4, Fig. 5) that the groove by being formed at base portion 21 and the board 22 that covers these grooves form.And ring-type attracts to be formed with towards the peristome 25a of substrate accommodation section 30 openings in mouth 25.Therefore, if produce attraction at exhaust outlet 24, the atmosphere of substrate accommodation section 30 can be discharged from exhaust outlet 24 from peristome 25a after ring-type attracts mouth 25 and connected entrance 26.
Ring-type attracts mouthful mode of 25 neighborings according to the substrate 1 along being kept by jacking pin 23 to form.Specifically, ring-type attracts mouthfuls 25 to have and roughly be tetragonal cross sectional shape (with reference to Fig. 5), and the mode with ring-type forms along the neighboring of maintained substrate 1.That is the ring-type that, roughly is tetragonal cross sectional shape attract mouthful 25 neighborings along maintained substrate 1 according to continuously and the mode of surrounding maintained substrate 1 form.And ring-type attracts mouthfuls 25 to be equidistant mode according to the whole neighboring from maintained substrate 1 and to form, in the present embodiment, as shown in Figure 3, ring-type attracts on mouthfuls 25 positions that to be formed on apart from maintained substrate 1 distance be α.So if attraction is created in exhaust outlet 24, around whole ring-type attraction mouth 25, produce equal attraction, the attraction that therefore acts on substrate 1 integral body is almost equal.Wherein, the dotted line in Fig. 2, Fig. 3 means the position that the position of maintained substrate 1 is supposed.
In addition, ring-type attracts mouth 25 to be connected with substrate accommodation section 30 by peristome 25a.In the present embodiment, be formed with a plurality of openings 22b on board 22, and ring-type attracts mouth 25 and substrate accommodation section 30 to be connected by this openings 22b.That is, peristome 25a is formed by this openings 22b.
This openings 22b forms continuously along the neighboring of the substrate 1 kept by jacking pin 23, and forms in the mode of surrounding maintained substrate 1.And the mode that openings 22b is equidistant β with the whole neighboring from maintained substrate 1 forms.Thus, if produce attraction at exhaust outlet 24, in whole ring-type, attract attractions that produce around mouthfuls 25 to produce almost evenly attraction on whole openings 22b, and can equally produce middle body from substrate 1 towards the mobile air-flow of openings 22b (peristome 25a).
In addition, be formed on ring-type attract mouthfuls 25 and the openings 22b of the cross section of connected entrance 26 be formed on openings 22b away from this cross section and compare and form littlely.In the present embodiment, formed openings according to from cross section the distance more away from the larger mode of its openings form.Thus, being created in ring-type attracts the attraction on mouth 25 can evenly to be attracted by openings 22b.That is, produce and to act on whole ring-type from the attraction of exhaust outlet 24 by connected entrance 26 and attract mouthfuls 25, but in ring-type attracts mouthfuls 25 from the part close to connected entrance 26, ring-type attract mouthfuls 25 and the cross section of connected entrance 26 produce slightly strong attraction.Therefore, by the cross section formation that attracts mouth 25 and connected entrance 26 in this ring-type, the mode of less openings 22b reduces the traffic attraction of atmosphere, and increase more atmosphere traffic attraction by the mode that forms in addition larger openings 22b at this cross section, can make to be created in by the mode that forms the big or small openings 22b of difference the attraction homogenising that ring-type attracts mouth 25 thus.Therefore, the atmosphere of substrate accommodation section 30 produces uniform attraction on whole peristome 25a, in substrate accommodation section 30, can equally produce middle body from substrate 1 towards the mobile air-flow of openings 22b (peristome 25a).Be somebody's turn to do and equate air-flow by generation, can suppress to be formed on the drying mark on the coated film of substrate 1.
In addition, be provided with not shown supply port in cavity main body 20, by this gas supply port, supply with N
2gas, can make the decompression state in substrate accommodation section 30 turn back to atmospheric pressure state thus.
In addition, as shown in Figure 4, Figure 5, chamber cap 10 forms and can carry out contact separation with cavity main body 20 according to mode that can lifting.And, towards the close also butt of cavity main body 20, can form the substrate accommodation section 30 that hold substrate by chamber cap 10 and cavity main body 20 by this chamber cap 10 thus.
This chamber cap 10 has the shape that covers the substrate 1 kept by cavity main body 20, and it comprises: flat part 11, with cavity main body 20 mutually in the face of and be tabular; Side wall portion 12, side-prominent and there is the shape of surrounding maintained substrate 1 towards cavity main body 20 from the neighboring of described flat part 11.
Substrate accommodation section 30 sides of flat part 11 form level and smooth flat condition, and form according to the uncrossed mode of air-flow (flowing of atmosphere) of substrate accommodation section 30.In addition, in the inside of substrate accommodation section 30 side, ribs (not shown) is installed, can prevents flat part 11 distortion when substrate accommodation section 30 is depressurized.Thus, even under the state be depressurized in substrate accommodation section 30, substrate accommodation section 30 sides of flat part 11 also can maintain flatness, thereby can suppress the air turbulence in substrate accommodation section 30 and can suppress the generation of drying mark.
In addition, substrate accommodation section 30 sides and the flat part 11 of side wall portion 12 form level and smooth flat condition equally, and form according to the uncrossed mode of the Atmospheric Flow of substrate accommodation section 30.In addition, in side wall portion 12, on the face connected at the base portion 21 with cavity main body 20, be provided with seal member.The mode that the sealing parts surround maintained substrate 1 with ring-type forms.Thus, if chamber cap 10 is descended, base portion 21 butts of seal member and cavity main body 20, so that substrate accommodation section 30 is sealed.
Below, the action of decompression dry device is described.
At first, carry out the supply of substrate 1.Specifically, under the state that chamber cap 10 is risen, the substrate 1 that will be coated with coating fluid by not shown manipulator etc. loads in stopping at fore-end on substrate transfer position, jacking pin 23.And, behind substrate 1 location, by making drive unit work, jacking pin 23 is driven, make thus substrate 1 be positioned on dry place.
Secondly, substrate 1 is carried out to drying.That is, chamber cap 10 descended and substrate accommodation section 30 is sealed, then making vavuum pump work so that 30 inside, substrate accommodation section in decompression state, make the coating fluid drying on substrate 1 thus.Specifically, if make vavuum pump work, at exhaust outlet 24, produce attraction, this attraction acts on ring-type attraction mouth 25 by connected entrance 26.That is ring-type that, attraction force acts forms in the neighboring along maintained substrate 1 attract mouthfuls 25 whole around.Now, in ring-type, attract in mouth 25, larger a little than the attraction of the other parts beyond cross section with the attraction of connected entrance 26 cross sections, but as around whole ring-type attraction mouth 25, producing almost equal attraction.In addition, this attraction is to act on substrate accommodation section 30 by this openings 22b (peristome 25a), and from ring-type attract mouthfuls 25 and the cross section of connected entrance 26 more away from openings 22b larger, therefore by whole peristome 25a, produce almost uniform attraction.Therefore, in maintained substrate 1, from middle body, towards the ring-type that is positioned at the periphery avris, attract mouthful equal air-flow of generation.
Secondly, by making substrate accommodation section 30, maintain at the appointed time the drying under reduced pressure state again, thus coating fluid is carried out to drying, then take out coated substrates 1.Specifically, by gas supply port by N
2gas supplying substrate accommodation section 30 and make the internal pressure of substrate accommodation section 30 be back to atmospheric pressure state.Then make chamber cap 10 increase and take out coated substrates 1, complete thus a series of actions of decompression dry device.
According to decompression dry device as described above, because exhaust outlet 24 only is configured on position of putting relative to the center of substrate 1, if therefore attraction force acts is in exhaust outlet 24, in ring-type, attract to produce almost uniform attraction in mouth 25 on around whole ring-type attraction mouth.And this ring-type attracts to have the openings 22b (peristome 25a) along the neighboring of substrate 1 in mouth 25, therefore can make whole peristome 25a produce almost attraction uniformly.Thus, the atmosphere of substrate accommodation section 30 attracts and attracts mouth 25 to discharge from exhaust outlet 24 by ring-type from the middle body attraction that the direction of perimeter sides is equated outward of substrate 1.Because the atmosphere of substrate accommodation section 30 is attracted by equal attraction, therefore from produced strong and weak different attractions in the past, owing near inboard, substrate neighboring, being provided with a plurality of exhaust outlets, therefore be created in the different situation of power that disposes near the of the exhaust outlet attraction local with other and compare that can to suppress uneven drying even.In addition, in above-mentioned decompression dry device, ring-type attracts mouth 25 to be formed on cavity main body 20 (substrate maintaining part) above and attracts the peristome 25a place of mouth 25 to produce uniform attraction in this ring-type, so does not need setting cowling panel in the past.Therefore thus, can make the volume of substrate accommodation section 30 reduce, can suppress to follow the increase of substrate accommodation section 30 and be created in bubble coated film in, the while can make whole equipment miniaturization.
In addition, in the above-described embodiment, for the openings 22b as peristome 25a along with from ring-type, attract mouthfuls 25 and the cross section of connected entrance 26 from openings away from must be more just larger example be illustrated, but can be also the increase along with the distance from cross section, the openings that the formation stages change is large.That is, can be the one group of openings 22b that has formed a plurality of openings 22b with prescribed level, and the size of formed described every group of openings 22b be increasing along with the increase of the distance from described cross section.That is, as long as there is following structure: utilize the size of openings 22b to regulate the attraction size that ring-type attracts mouth 25, so that whole peristome 25a produces uniform attraction.Yet, if ring-type attracts the attraction of mouth 25 constant, can be also the openings 22b that all there is even size.
In addition, in the above-described embodiment, the example that peristome 25a is formed on to the openings 22b on board 22 is illustrated, but also can be openings as described below: board 22 does not cover ring-type and attracts the opening portion of mouth 25 and attract the opening portion of mouth 25 as peristome 25a ring-type.Even, in the situation that have said structure, ring-type attracts mouth 25 also to form according to the mode of surrounding substrate 1 with ring-type, so the atmosphere of substrate accommodation section 30 equally is attracted towards the direction of peristome 25a from the middle body of substrate 1.
In addition, in the above-described embodiment, the example that connected entrance 26 is extended from exhaust outlet 24 towards four direction is illustrated, but without being limited to above-mentioned four direction.That is, because ring-type attraction mouthful 25 modes that are communicated with ring-type form, therefore do not limit the quantity of connected entrance 26, just can make identical attraction force acts around whole ring-type attraction mouth 25.Yet, suppose that quantity because setting connected entrance 26, when ring-type attracts on mouthfuls 25 to produce strong and weak slightly different attraction, can make the attraction that is created in peristome 25a become almost even by the method to set up of openings 22b.
Claims (5)
1. a decompression dry device, is characterized in that, comprising:
Accommodation section, for holding substrate;
The substrate maintaining part, for remaining on described substrate the assigned position of described accommodation section;
Exhaust outlet, be arranged on relative with the substrate center position kept by described substrate maintaining part and, on the position of putting, be used for discharging the atmosphere of described accommodation section;
Ring-type attracts mouth, comprise along the neighboring of the substrate kept by described substrate maintaining part and on the Di position, position than this maintained substrate with the peristome of the mode opening that surrounds this maintained substrate, described ring-type attracts the neighboring of the described substrate of opening's edge to be connected to form with ring-type;
Wherein, by described exhaust outlet and described ring-type, attract the connection of mouth to be connected, while on described exhaust outlet, producing attraction, the atmosphere of described accommodation section attracts mouth by described ring-type and discharges from described exhaust outlet.
2. decompression dry device as claimed in claim 1, it is characterized in that, described ring-type attracts interruption-forming on described substrate maintaining part, and is formed at from described neighboring and is on equidistant position on the whole neighboring of the substrate kept by described substrate maintaining part.
3. decompression dry device as claimed in claim 1 or 2, is characterized in that, described peristome attracts the openings of mouth for being communicated with described accommodation section and described ring-type, and described openings forms along the neighboring of the substrate kept by described substrate maintaining part.
4. decompression dry device as claimed in claim 3, it is characterized in that, comprise the connected entrance that is communicated with described exhaust outlet and described ring-type attraction mouth, be formed on the ring-type be connected with described connected entrance and attract the openings of notch portion to be less than the openings that is formed on other parts.
5. decompression dry device as claimed in claim 4, is characterized in that, described openings according to the part that attracts mouth to be connected from described connected entrance and described ring-type more away from the larger mode of described openings form.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009057343A JP5344690B2 (en) | 2009-03-11 | 2009-03-11 | Vacuum dryer |
| JP2009-057343 | 2009-03-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101829647A CN101829647A (en) | 2010-09-15 |
| CN101829647B true CN101829647B (en) | 2013-12-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010101190556A Expired - Fee Related CN101829647B (en) | 2009-03-11 | 2010-03-08 | Decompression drying device |
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| Country | Link |
|---|---|
| JP (1) | JP5344690B2 (en) |
| KR (1) | KR20100102528A (en) |
| CN (1) | CN101829647B (en) |
| TW (1) | TWI509209B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102072614A (en) * | 2010-12-31 | 2011-05-25 | 苏州普锐晶科技有限公司 | Application of suction drying to frequency chip washing and drying engineering |
| JP6033593B2 (en) * | 2012-07-18 | 2016-11-30 | 東レエンジニアリング株式会社 | Substrate transfer device |
| CN104296520A (en) * | 2013-07-17 | 2015-01-21 | 上海和辉光电有限公司 | Exhaust system and method of vacuum drying chamber |
| JP6872328B2 (en) * | 2016-09-06 | 2021-05-19 | 株式会社Ｓｃｒｅｅｎホールディングス | Vacuum drying device, vacuum drying system, vacuum drying method |
| CN114963742A (en) * | 2021-06-29 | 2022-08-30 | 南昌工学院 | Air uniform heating equipment for heating based on lacquer |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006059844A (en) * | 2004-08-17 | 2006-03-02 | Seiko Epson Corp | Reduced pressure drying apparatus |
| JP2006156613A (en) * | 2004-11-29 | 2006-06-15 | Seiko Epson Corp | Reduced pressure drying apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3831478B2 (en) * | 1997-05-14 | 2006-10-11 | 芝浦メカトロニクス株式会社 | Vacuum drying processing equipment |
| JPH10335437A (en) * | 1997-05-27 | 1998-12-18 | Dainippon Screen Mfg Co Ltd | Wafer processor |
| JP5192747B2 (en) * | 2007-08-06 | 2013-05-08 | 東レエンジニアリング株式会社 | Vacuum dryer |
-
2009
- 2009-03-11 JP JP2009057343A patent/JP5344690B2/en not_active Expired - Fee Related
-
2010
- 2010-02-01 TW TW099102819A patent/TWI509209B/en active
- 2010-02-22 KR KR1020100015638A patent/KR20100102528A/en not_active Application Discontinuation
- 2010-03-08 CN CN2010101190556A patent/CN101829647B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006059844A (en) * | 2004-08-17 | 2006-03-02 | Seiko Epson Corp | Reduced pressure drying apparatus |
| JP2006156613A (en) * | 2004-11-29 | 2006-06-15 | Seiko Epson Corp | Reduced pressure drying apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101829647A (en) | 2010-09-15 |
| TWI509209B (en) | 2015-11-21 |
| TW201037251A (en) | 2010-10-16 |
| JP5344690B2 (en) | 2013-11-20 |
| JP2010207739A (en) | 2010-09-24 |
| KR20100102528A (en) | 2010-09-24 |
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