JP2006077712A - Pump unit for supply of chemical - Google Patents

Pump unit for supply of chemical Download PDF

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JP2006077712A
JP2006077712A JP2004264423A JP2004264423A JP2006077712A JP 2006077712 A JP2006077712 A JP 2006077712A JP 2004264423 A JP2004264423 A JP 2004264423A JP 2004264423 A JP2004264423 A JP 2004264423A JP 2006077712 A JP2006077712 A JP 2006077712A
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pump
discharge
suction
valve
flow path
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JP4723218B2 (en
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Katsuya Okumura
勝弥 奥村
Kazuhiro Arakawa
和弘 荒川
Shigenobu Ito
重伸 伊藤
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CKD Corp
Octec Inc
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CKD Corp
Octec Inc
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Priority to JP2004264423A priority Critical patent/JP4723218B2/en
Priority to PCT/JP2005/013920 priority patent/WO2006027909A1/en
Priority to CNB2005800289947A priority patent/CN100562664C/en
Priority to KR1020077008115A priority patent/KR101118239B1/en
Priority to US11/662,019 priority patent/US20070258837A1/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
    • F04B53/06—Venting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
    • F04B43/06—Pumps having fluid drive
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Abstract

<P>PROBLEM TO BE SOLVED: To provide a chemical supplying pump unit which is reduced in size by manufacturing a pump and each of opening and closing valves before and behind the pump as a unit and which can prevent the occurrence of air bubbles or the retention of the chemical in the chemical flow path in the unit. <P>SOLUTION: In the pump unit 10, a suction-side flow path member 17 in which a suction-side shutoff valve 13 is integrally provided and a discharge-side flow path member 18 in which a discharge-side shutoff valve 14 is integrally provided, are assembled integrally with the pump 11(pump housings 21, 22) so that suction passages 17a, 21b communicating with a pump chamber 25 and discharge passages 18a, 21c are extended on the same straight line L1. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、例えば半導体製造装置の薬液使用工程において、フォトレジスト液等の薬液を各半導体ウェハに所定量ずつ塗布するのに好適な薬液供給用ポンプユニットに関する。   The present invention relates to a chemical solution supply pump unit suitable for applying a predetermined amount of a chemical solution such as a photoresist solution to each semiconductor wafer in a chemical solution use step of a semiconductor manufacturing apparatus, for example.

フォトレジスト液等の薬液をボトルから汲み上げて各半導体ウェハに所定量ずつ塗布する薬液供給システムにおいては、従来、ポンプやポンプ前後に必要な各開閉弁を個別に配置し、それらを配管により接続して構成していた。しかしながら、このようなシステム構成では、配管にて接続する毎に継手が必要になり、この配管や継手を配置するスペースが薬液供給システムの大型化を招く。   In a chemical solution supply system that draws a chemical solution such as a photoresist solution from a bottle and applies it to each semiconductor wafer in a predetermined amount, conventionally, a pump and each on-off valve required before and after the pump are individually arranged and connected by piping. Was configured. However, in such a system configuration, a joint is required every time the pipe is connected, and the space for arranging the pipe and the joint causes an increase in the size of the chemical solution supply system.

また、複数の半導体ウェハに薬液を同時に塗布するために、処理槽（半導体ウェハに薬液を塗布する部屋）が上下方向に複数段積み重ねられて設けられているのが一般的である。しかしながら、この処理槽は狭い空間で構成されることから、該処理槽には薬液を吐出するノズルから吐出側開閉弁、ポンプ、ひいては吸入側開閉弁までを配置することができず、ノズルから吐出側開閉弁が配置される程度で、ポンプや吸入側開閉弁等は処理槽の下段に設けられる収容部に集められている。そのため、ポンプ後の配管長さや高低差（揚程差）が処理槽毎に異なり、圧力損失が異なってしまう。これは処理槽毎の薬液の吐出量等に差を生じさせる要因となるため、いずれの処理槽においても同様な吐出量を確保する設定が難しかった。   Further, in order to simultaneously apply chemicals to a plurality of semiconductor wafers, it is common to provide a plurality of processing tanks (chambers for applying chemicals to semiconductor wafers) stacked in a vertical direction. However, since this processing tank is constituted by a narrow space, it is not possible to arrange from the nozzle that discharges the chemical solution to the discharge side on-off valve, the pump, and the suction side on-off valve in the processing tank. The pump, the suction-side on-off valve, and the like are collected in a storage section provided at the lower stage of the processing tank to the extent that the side on-off valve is arranged. Therefore, the pipe length and height difference (lift difference) after the pump are different for each treatment tank, and the pressure loss is different. Since this causes a difference in the discharge amount of the chemical solution for each processing tank, it is difficult to set the same discharge amount in any of the processing tanks.

そこで、例えば特許文献１にて開示されている薬液供給システムでは、ポンプ及びポンプ前後に必要な各開閉弁（入力バルブ及び出力バルブ）を一体的に組み付けてユニット化している。つまり、ポンプと各開閉弁と間の配管やそれにかかる継手を省略してポンプユニットとして小型化し、処理槽毎にポンプユニットを配置可能としている。これにより、配管長さやポンプからノズルまでの高低差（揚程差）を処理槽毎で同様にできるので、いずれの処理槽においても同様な吐出量を確保するのが容易となる。   Therefore, for example, in the chemical solution supply system disclosed in Patent Document 1, the pump and the respective on-off valves (input valve and output valve) necessary before and after the pump are integrally assembled into a unit. That is, the piping between the pump and each on-off valve and the joints thereof are omitted to reduce the size of the pump unit, and the pump unit can be arranged for each processing tank. Thereby, since the pipe length and the height difference (lifting height difference) from the pump to the nozzle can be made the same for each processing tank, it becomes easy to secure the same discharge amount in any processing tank.

ところで、空になったボトルから新たに薬液の充填されたボトルに交換した直後など、薬液流路中に気泡が混入する場合がある。この気泡は薬液の定量吐出の妨げとなるため、薬液流路から気泡を抜く必要があって、この場合、所定量の薬液をノズルからパージ（放出）する気泡抜きが行われる。   By the way, there is a case where bubbles are mixed into the chemical liquid flow path, for example, immediately after the empty bottle is replaced with a new bottle filled with the chemical liquid. Since the bubbles hinder the quantitative discharge of the chemical liquid, it is necessary to remove the bubbles from the chemical liquid flow path. In this case, the air bubbles are purged (released) from the nozzle.

しかしながら、フォトレジスト液等の薬液は高価である。そのため、薬液のパージ量をできるだけ少なくして気泡抜きさせる必要があるが、特許文献１のポンプユニットでは、入力ポートにおける薬液の導入方向と出力ポートにおける薬液の吐出方向とが９０°異なる方向をそれぞれ向いており、しかも入力ポートから出力ポートまでのポンプユニット内の薬液流路が複雑に屈曲している。つまり、薬液流路中に気泡が滞留する部分が生じるため、少ないパージ量では気泡抜きを良好に行えず、パージ量が多くなるという問題があった。また、このように気泡が滞留する部分は薬液が滞留する部分でもあり、この部分で長期間滞留により薬液を劣化させてしまう問題もあった。
特開２００３−４９７７８号公報 However, a chemical solution such as a photoresist solution is expensive. Therefore, it is necessary to reduce the purge amount of the chemical solution as much as possible to remove the bubbles. However, in the pump unit of Patent Document 1, the introduction direction of the chemical solution at the input port and the discharge direction of the chemical solution at the output port are different from each other by 90 °. Furthermore, the chemical liquid flow path in the pump unit from the input port to the output port is bent in a complicated manner. In other words, there is a portion in which bubbles stay in the chemical flow path, so that there is a problem that bubbles cannot be removed well with a small purge amount, and the purge amount increases. Further, the portion where the bubbles stay is also a portion where the chemical solution stays, and there is a problem that the chemical solution deteriorates due to the stay for a long time in this portion.
JP 2003-49778 A

本発明は、ポンプやポンプ前後の各開閉弁をユニット化して小型化を図りつつ、ユニットの薬液流路中において気泡や薬液の滞留を低減することができる薬液供給用ポンプユニットを提供することを主たる目的とするものである。   It is an object of the present invention to provide a chemical liquid supply pump unit capable of reducing the stagnation of bubbles and chemical liquid in the chemical liquid flow path of the unit while reducing the size by making the pump and the on-off valves before and after the pump into a unit. This is the main purpose.

以下、上記課題を解決するのに有効な手段等につき、必要に応じて効果等を示しつつ説明する。なお以下では、理解を容易にするため、発明の実施の形態において対応する構成を括弧書き等で適宜示すが、この括弧書き等で示した具体的構成に限定されるものではない。   Hereinafter, effective means for solving the above-described problems will be described while showing effects and the like as necessary. In the following, in order to facilitate understanding, the corresponding configuration in the embodiment of the invention is appropriately shown in parentheses, but is not limited to the specific configuration shown in parentheses.

手段１．薬液（レジスト液Ｒ）の吐出吸入を行うポンプ室（ポンプ室２５）を有するポンプ（ポンプ１１）と、前記ポンプ室と連通して該ポンプ室に前記薬液を吸入する吸入通路（吸入通路１７ａ，２１ｂ）の開閉を行うための吸入側開閉弁（吸入側遮断弁１３）と、前記ポンプ室と連通して該ポンプ室から前記薬液を吐出する吐出通路（吐出通路１８ａ，２１ｃ）の開閉を行うための吐出側開閉弁（吐出側遮断弁１４）とを有する薬液供給用ポンプユニットであって、
前記吸入通路及び前記吐出通路を共に略直線状として同一直線（直線Ｌ１）上に配置し、前記ポンプ、前記吸入側開閉弁及び前記吐出側開閉弁を一体的に組み付けたことを特徴とする薬液供給用ポンプユニット。 Means 1. A pump (pump 11) having a pump chamber (pump chamber 25) that discharges and sucks the chemical solution (resist solution R), and a suction passage (suction passage 17a, inhaling the chemical solution into the pump chamber in communication with the pump chamber) 21b) for opening and closing the suction side on-off valve (suction side shutoff valve 13) and the discharge passages (discharge passages 18a and 21c) for communicating with the pump chamber and discharging the chemical liquid from the pump chamber. A chemical liquid supply pump unit having a discharge side on-off valve (discharge side shut-off valve 14) for
The suction passage and the discharge passage are both substantially straight and arranged on the same straight line (straight line L1), and the pump, the suction-side on-off valve, and the discharge-side on-off valve are integrally assembled. Supply pump unit.

手段１によれば、薬液供給用ポンプユニットは、ポンプ室と連通する吸入通路及び吐出通路が共に略直線状とされ、吸入通路及び吐出通路が同一直線上となるように、ポンプ、吸入通路を開閉する吸入側開閉弁及び吐出通路を開閉する吐出側開閉弁が一体的に組み付けられて構成される。すなわち、ポンプ、吸入側開閉弁、及び吐出側開閉弁が一体的に組み付けられることにより、ポンプと吸入側開閉弁との間の配管及びそれにかかる継手や、ポンプと吐出側開閉弁との間の配管及びそれにかかる継手を省略でき、ポンプユニットが小型化される。そのため、仕様によって処理槽に配置させる場合、ポンプユニットの小型化はその処理槽への配置を可能とし、これにより処理槽毎にポンプ後の配管長さや高低差（揚程差）が同様となり吐出量等に差が生じることが防止される。また、ポンプ室と連通する吸入通路及び吐出通路が共に略直線状とされて同一直線上に配置されるので、ポンプユニットの薬液流路中に気泡や薬液が滞留する部分を極力低減することができる。従って、薬液流路中における気泡や薬液の滞留を低減できるため、少ないパージ量で気泡抜きを良好に行うことができ、薬液の長期間の滞留が低減されることで劣化した薬液の生成を低減することができる。   According to the means 1, the pump unit for supplying a chemical solution includes the pump and the suction passage so that both the suction passage and the discharge passage communicating with the pump chamber are substantially linear, and the suction passage and the discharge passage are on the same straight line. A suction-side on-off valve that opens and closes and a discharge-side on-off valve that opens and closes the discharge passage are integrally assembled. That is, the pump, the suction-side on-off valve, and the discharge-side on-off valve are assembled together so that the piping between the pump and the suction-side on-off valve and the joints between them, and between the pump and the discharge-side on-off valve Piping and a joint related to it can be omitted, and the pump unit can be downsized. Therefore, when placed in the treatment tank according to the specifications, downsizing of the pump unit makes it possible to place it in the treatment tank, which makes the pipe length and height difference (lift difference) after pumping the same for each treatment tank, and the discharge amount It is possible to prevent the difference from occurring. In addition, since the suction passage and the discharge passage communicating with the pump chamber are both substantially straight and arranged on the same straight line, it is possible to reduce the portion where bubbles and chemicals stay in the chemical flow path of the pump unit as much as possible. it can. Therefore, it is possible to reduce the retention of bubbles and chemicals in the chemical flow path, so that bubbles can be removed well with a small purge amount, and the generation of deteriorated chemicals is reduced by reducing the long-term retention of chemicals. can do.

手段２．薬液（レジスト液Ｒ）の吐出吸入を行うポンプ室（ポンプ室２５）を有するポンプ（ポンプ１１）と、前記ポンプ室と連通して該ポンプ室に前記薬液を吸入する吸入通路（吸入通路１７ａ，２１ｂ）の開閉を行うための吸入側開閉弁（吸入側遮断弁１３）と、前記ポンプ室と連通して該ポンプ室から前記薬液を吐出する吐出通路（吐出通路１８ａ，２１ｃ）の開閉を行うための吐出側開閉弁（吐出側遮断弁１４）とを有する薬液供給用ポンプユニットであって、
略直線状の内部通路（吸入通路１７ａ）を有し前記吸入側開閉弁を一体的に組み付けてなる吸入側流路部材（吸入側流路部材１７）と、略直線状の内部通路（吐出通路１８ａ）を有し前記吐出側開閉弁を一体的に組み付けてなる吐出側流路部材（吐出側流路部材１８）とを備えると共に、
前記ポンプは、そのポンプハウジング（ポンプハウジング２１，２２）内に、前記内部通路と連通して前記吸入通路を構成する略直線状の内部通路（吸入通路２１ｂ）と、前記内部通路と連通して前記吐出通路を構成する略直線状の内部通路（吐出通路２１ｃ）とを備えるものであり、
前記吸入通路及び前記吐出通路が同一直線（直線Ｌ１）上となるように、前記ポンプハウジングに対して前記吸入側流路部材と前記吐出側流路部材とを一体的に組み付けたことを特徴とする薬液供給用ポンプユニット。 Mean 2. A pump (pump 11) having a pump chamber (pump chamber 25) that discharges and sucks the chemical solution (resist solution R), and a suction passage (suction passage 17a, inhaling the chemical solution into the pump chamber in communication with the pump chamber) 21b) for opening and closing the suction side on-off valve (suction side shutoff valve 13) and the discharge passages (discharge passages 18a and 21c) for communicating with the pump chamber and discharging the chemical liquid from the pump chamber. A chemical liquid supply pump unit having a discharge side on-off valve (discharge side shut-off valve 14) for
A suction side flow path member (suction side flow path member 17) having a substantially linear internal path (suction path 17a) and integrally integrating the suction side on-off valve, and a substantially linear internal path (discharge path). 18a) and a discharge side flow path member (discharge side flow path member 18) formed by integrally assembling the discharge side on-off valve,
In the pump housing (pump housings 21 and 22), the pump communicates with the internal passage and a substantially linear internal passage (suction passage 21b) that constitutes the suction passage and the internal passage. A substantially linear internal passage (discharge passage 21c) constituting the discharge passage,
The suction-side flow path member and the discharge-side flow path member are integrally assembled to the pump housing so that the suction passage and the discharge passage are on the same straight line (straight line L1). A pump unit for supplying chemicals.

手段２によれば、薬液供給用ポンプユニットは、ポンプ室と連通する吸入通路（ポンプハウジングと吸入側流路部材の内部通路）及び吐出通路（ポンプハウジングと吐出側流路部材の内部通路）が共に略直線状とされ、吸入通路及び吐出通路が同一直線上となるように、ポンプハウジングに対して吸入側流路部材と吐出側流路部材とが一体的に組み付けられて構成される。つまり、吸入側流路部材には吸入側開閉弁が一体的に設けられ、吐出側流路部材には吐出側開閉弁が一体的に設けられているので、ポンプと吸入側開閉弁との間の配管及びそれにかかる継手や、ポンプと吐出側開閉弁との間の配管及びそれにかかる継手を省略でき、ポンプユニットが小型化される。そのため、仕様によって処理槽に配置させる場合、ポンプユニットの小型化はその処理槽への配置を可能とし、これにより処理槽毎にポンプ後の配管長さや高低差（揚程差）が同様となり吐出量等に差が生じることが防止される。また、ポンプ室と連通する吸入通路及び吐出通路が共に略直線状とされて同一直線上に配置されるので、ポンプユニットの薬液流路中に気泡や薬液が滞留する部分を極力低減することができる。従って、薬液流路中における気泡や薬液の滞留を低減できるため、少ないパージ量で気泡抜きを良好に行うことができ、薬液の長期間の滞留が低減されることで劣化した薬液の生成を低減することができる。   According to the means 2, the chemical liquid supply pump unit has a suction passage (an internal passage between the pump housing and the suction side flow passage member) and a discharge passage (an internal passage between the pump housing and the discharge side flow passage member) communicating with the pump chamber. Both are substantially linear, and the suction side flow path member and the discharge side flow path member are integrally assembled with the pump housing so that the suction path and the discharge path are on the same straight line. In other words, the suction side opening / closing valve is integrally provided in the suction side flow path member, and the discharge side opening / closing valve is integrally provided in the discharge side flow path member. And the joint between them, the pipe between the pump and the discharge side on-off valve, and the joint therewith can be omitted, and the pump unit can be miniaturized. Therefore, when placed in the treatment tank according to the specifications, downsizing of the pump unit makes it possible to place it in the treatment tank, which makes the pipe length and height difference (lift difference) after pumping the same for each treatment tank, and the discharge amount It is possible to prevent the difference from occurring. In addition, since the suction passage and the discharge passage communicating with the pump chamber are both substantially straight and arranged on the same straight line, it is possible to reduce the portion where bubbles and chemicals stay in the chemical flow path of the pump unit as much as possible. it can. Therefore, it is possible to reduce the retention of bubbles and chemicals in the chemical flow path, so that bubbles can be removed well with a small purge amount, and the generation of deteriorated chemicals is reduced by reducing the long-term retention of chemicals. can do.

手段３．前記ポンプハウジングと前記各流路部材との間には、両部材間の隙間から前記通路内の薬液が漏れ出さないようにシールするシールリング（シールリング３３，３４）が介在されるものであって、
前記シールリングの内周面（内周面３３ａ，３４ａ）は、該シールリング前後の前記通路の内周面と滑らかに連続する形状に形成されていることを特徴とする手段２に記載の薬液供給用ポンプユニット。 Means 3. A seal ring (seal ring 33, 34) is interposed between the pump housing and each flow path member so as to prevent the chemical solution in the passage from leaking from the gap between the two members. And
3. The chemical solution according to means 2, wherein the inner peripheral surface (inner peripheral surfaces 33a, 34a) of the seal ring is formed in a shape that is smoothly continuous with the inner peripheral surface of the passage before and after the seal ring. Supply pump unit.

手段３によれば、シールリングの内周面は、ポンプハウジングと各流路部材とに設けられる該シールリング前後の通路の内周面と滑らかに連続する。ここで、滑らかな形状とは、シールリングと前後の通路との間で鋭角の窪みが生じない形状、例えば前後の通路の内周面から中央部に向かうほど次第に径方向外側に凹となる形状である。このようにすれば、シールリングの部分における薬液の流れがスムーズとなり、薬液や気泡が滞留するのを防止することができる。   According to the means 3, the inner peripheral surface of the seal ring is smoothly continuous with the inner peripheral surface of the passage before and after the seal ring provided in the pump housing and each flow path member. Here, the smooth shape is a shape that does not cause an acute-angle depression between the seal ring and the front and rear passages, for example, a shape that gradually becomes concave outward in the radial direction from the inner peripheral surface of the front and rear passages toward the central portion. It is. If it does in this way, the flow of the chemical | medical solution in the part of a seal ring becomes smooth, and it can prevent that a chemical | medical solution and a bubble stay.

手段４．前記ポンプハウジングは、内部にダイアフラム（ダイアフラム２３）を備えた薄型な扁平形状をなしており、
前記吸入側流路部材及び前記吐出側流路部材は、共に棒状をなしており、前記ポンプハウジングの扁平方向に沿ってそれぞれ配置され、
前記吸入側開閉弁及び前記吐出側開閉弁は、前記吸入側流路部材及び前記吐出側流路部材に対して直交する方向で、かつ前記ポンプハウジングの扁平方向に沿うようにそれぞれ配置されていることを特徴とする請求項２又は３に記載の薬液供給用ポンプユニット。 Means 4. The pump housing has a thin flat shape with a diaphragm (diaphragm 23) inside,
Both the suction side flow path member and the discharge side flow path member have a rod shape, and are respectively disposed along the flat direction of the pump housing,
The suction-side on-off valve and the discharge-side on-off valve are respectively arranged in a direction orthogonal to the suction-side flow path member and the discharge-side flow path member and along the flat direction of the pump housing. The chemical solution supply pump unit according to claim 2 or 3,

手段４によれば、ダイアフラムを備えるポンプ（ポンプハウジング）はそのダイアフラムの広がる方向に沿って薄型な扁平形状をなしている。このようなポンプハウジングの扁平方向に沿って棒状の吸入側流路部材及び吐出側流路部材を配置すれば、該流路部材が扁平方向と直交する方向に突出しない、若しくは大きく突出しない。更に、このような吸入側流路部材及び吐出側流路部材に対して直交する方向で、かつポンプハウジングの扁平方向に沿って吸入側開閉弁及び吐出側開閉弁を配置すれば、該開閉弁が扁平方向と直交する方向に突出しない、若しくは大きく突出しないばかりか、扁平方向においても大きく突出しない。これにより、ポンプユニットの薄型化を含めた小型化を図ることができる。   According to the means 4, the pump (pump housing) provided with the diaphragm has a thin flat shape along the direction in which the diaphragm spreads. If the rod-like suction side flow path member and the discharge side flow path member are arranged along the flat direction of the pump housing, the flow path member does not protrude in the direction orthogonal to the flat direction or does not protrude greatly. Furthermore, if the suction-side on-off valve and the discharge-side on-off valve are arranged in a direction orthogonal to the suction-side flow path member and the discharge-side flow path member and along the flat direction of the pump housing, the on-off valve Does not protrude in the direction perpendicular to the flat direction or does not protrude greatly, and does not protrude significantly in the flat direction. Thereby, size reduction including thickness reduction of a pump unit can be achieved.

手段５．前記吐出側開閉弁の下流側に、前記吐出通路内の前記薬液を所定量引き込むサックバック弁（サックバック弁１５）を一体的に組み付けたことを特徴とする手段１〜４のいずれかに記載の薬液供給用ポンプユニット。   Means 5. Any one of means 1 to 4, wherein a suck back valve (suck back valve 15) for drawing a predetermined amount of the chemical solution in the discharge passage is integrally assembled downstream of the discharge side on-off valve. Pump unit for chemical liquid supply.

手段５よれば、サックバック弁は吐出側開閉弁の下流側（例えば、薬液流路の最下流部）に設ける必要のある弁であり、処理槽内に配置する可能性が高いため、このようなサックバック弁を薬液供給用ポンプユニットに一体的に組み付けたことにより、サックバック弁を接続するための配管や継手を省略できる。そのため、サックバック弁を個別に設ける場合と比べて、配管や継手等の省略分、薬液供給用ポンプユニットの小型化を図ることができる。因みに、このサックバック弁も、上記手段４の開閉弁のように、ポンプの扁平方向に沿って配置すれば、ポンプユニットの小型化（薄型化）に貢献することができる。   According to the means 5, the suck back valve is a valve that needs to be provided on the downstream side of the discharge side on-off valve (for example, the most downstream portion of the chemical liquid flow path) and is likely to be disposed in the treatment tank. By integrating a simple suck back valve into the chemical solution supply pump unit, piping and joints for connecting the suck back valve can be omitted. Therefore, compared with the case where a suck-back valve is provided individually, it is possible to reduce the size of the chemical supply pump unit by omitting piping and joints. Incidentally, if this suck back valve is also arranged along the flat direction of the pump, like the on-off valve of the means 4, it can contribute to miniaturization (thinning) of the pump unit.

手段６．前記各弁の少なくとも１個は作動エアを給排させることにより動作するものであり、その作動エアを制御する電空レギュレータ（電空レギュレータ３８，３９）の少なくとも１個を一体的に組み付けたことを特徴とする手段１〜５のいずれかに記載の薬液供給用ポンプユニット。   Means 6. At least one of the valves operates by supplying and discharging the working air, and at least one of the electropneumatic regulators (electropneumatic regulators 38 and 39) for controlling the working air is integrally assembled. A pump unit for supplying a chemical solution according to any one of means 1 to 5.

手段６によれば、前記各弁を動作させる作動エアを制御する電空レギュレータを薬液供給用ポンプユニット近傍に配置するスペースがある場合など、その電空レギュレータをポンプユニットに一体的に組み付けたので、薬液供給システムに組み付ける部品点数を少なくすることができる。因みに、この電空レギュレータも、上記手段４の開閉弁のように、ポンプの扁平方向に沿って配置すれば、ポンプユニットの小型化（薄型化）に貢献することができる。   According to the means 6, the electropneumatic regulator is integrally assembled to the pump unit when there is a space for arranging the electropneumatic regulator for controlling the operation air for operating the valves in the vicinity of the chemical liquid supply pump unit. The number of parts assembled in the chemical solution supply system can be reduced. Incidentally, if this electropneumatic regulator is also arranged along the flat direction of the pump, like the on-off valve of the means 4, it can contribute to the downsizing (thinning) of the pump unit.

以下、本発明を半導体装置等の製造ラインにて使用される薬液供給システムのポンプユニットに具体化した一実施の形態を図面に従って説明する。なお、図１及び図２はシステムの主要部であるポンプユニット１０を示し、図３は薬液供給システム全体を示す。   Hereinafter, an embodiment in which the present invention is embodied in a pump unit of a chemical solution supply system used in a production line for semiconductor devices or the like will be described with reference to the drawings. 1 and 2 show a pump unit 10 which is a main part of the system, and FIG. 3 shows an entire chemical solution supply system.

図１及び図２に示すように、ポンプユニット１０は、ポンプ１１、電磁切換弁１２、吸入側遮断弁１３、吐出側遮断弁１４、サックバック弁１５、レギュレータ装置１６、吸入側流路部材１７及び吐出側流路部材１８を一体的に組み付けてユニット化している。   As shown in FIGS. 1 and 2, the pump unit 10 includes a pump 11, an electromagnetic switching valve 12, a suction side cutoff valve 13, a discharge side cutoff valve 14, a suck back valve 15, a regulator device 16, and a suction side flow path member 17. In addition, the discharge side flow path member 18 is integrally assembled into a unit.

ポンプ１１は、略正方形の角柱状で薄型な扁平形状をなしており、一対のポンプハウジング２１，２２を有している。各ポンプハウジング２１，２２には、それぞれ対向する面の中央に略円形ドーム状に凹設される凹設部２１ａ，２２ａが形成されている。ポンプハウジング２１，２２は、凹設部２１ａ，２２ａの周縁で円形のフッ素樹脂などの可撓性膜よりなるダイアフラム２３の周縁を挟持し、互いが８個のネジ２４により固定されている。   The pump 11 is a substantially square prismatic and thin flat shape, and has a pair of pump housings 21 and 22. The pump housings 21 and 22 are respectively provided with recessed portions 21a and 22a that are recessed in a substantially circular dome shape at the center of the opposing surfaces. The pump housings 21 and 22 sandwich the periphery of a diaphragm 23 made of a flexible film such as a circular fluororesin at the periphery of the recessed portions 21 a and 22 a, and are fixed to each other by eight screws 24.

ダイアフラム２３は、ポンプハウジング２１，２２の両凹設部２１ａ，２２ａにて形成される空間を仕切っており、ポンプハウジング２１側（図２においてダイアフラム２３の左側）の空間をポンプ室２５とし、ポンプハウジング２２側（図２においてダイアフラム２３の右側）の空間を作動室２６としている。ポンプ室２５は薬液としてのレジスト液Ｒ（図３参照）を給排するための空間であり、作動室２６はダイアフラム２３を駆動する作動エアを給排するための空間である。   The diaphragm 23 partitions the space formed by the two recessed portions 21a and 22a of the pump housings 21 and 22, and the space on the pump housing 21 side (left side of the diaphragm 23 in FIG. 2) serves as a pump chamber 25. The space on the housing 22 side (the right side of the diaphragm 23 in FIG. 2) is used as the working chamber 26. The pump chamber 25 is a space for supplying and discharging a resist solution R (see FIG. 3) as a chemical solution, and the working chamber 26 is a space for supplying and discharging operating air that drives the diaphragm 23.

ポンプ室２５側のポンプハウジング２１には、ポンプ室２５と連通して下方に直線状に延びる吸入通路２１ｂが形成されている。吸入通路２１ｂは、吸入側流路部材１７の吸入通路１７ａと連通する。また、このポンプハウジング２１には、ポンプ室２５と連通して上方に直線状に延びる吐出通路２１ｃが形成されている。吐出通路２１ｃは、吐出側流路部材１８の吐出通路１８ａと連通する。また、この吐出通路２１ｃは、吸入通路２１ｂと同一直線Ｌ１上に設けられている。なお、本実施の形態のポンプ室２５はダイアフラム２３の厚み方向において薄い空間で形成されるので、このようなポンプ室２５と連通する吸入通路２１ｂ及び吐出通路２１ｃの近傍部分が接続に必要な分（通路幅程度）、直角に屈曲されている（図２参照）。そのため、この部分でのレジスト液Ｒの流れはスムーズであり、ポンプ１１内のレジスト液Ｒの流れに大きな影響（抵抗）を与えるものではない。   The pump housing 21 on the pump chamber 25 side is formed with a suction passage 21b that communicates with the pump chamber 25 and extends downward linearly. The suction passage 21 b communicates with the suction passage 17 a of the suction side flow path member 17. The pump housing 21 is formed with a discharge passage 21c that communicates with the pump chamber 25 and extends linearly upward. The discharge passage 21 c communicates with the discharge passage 18 a of the discharge side flow path member 18. The discharge passage 21c is provided on the same straight line L1 as the suction passage 21b. Since the pump chamber 25 of the present embodiment is formed in a thin space in the thickness direction of the diaphragm 23, the vicinity of the suction passage 21b and the discharge passage 21c communicating with the pump chamber 25 is necessary for connection. It is bent at a right angle (about the passage width) (see FIG. 2). Therefore, the flow of the resist solution R in this portion is smooth, and does not have a great influence (resistance) on the flow of the resist solution R in the pump 11.

作動室２６側のポンプハウジング２２には、該作動室２６内に作動エアを給排する給排通路２２ｂが形成されている。給排通路２２ｂは、ポンプハウジング２２に固定される電磁切換弁１２に接続されている。ここで、電磁切換弁１２は、図３に示すように、途中に電空レギュレータ２７を有する給気配管２８を介して供給源２９に接続されている。電空レギュレータ２７は、排気ポートが大気開放されるものであり、供給源２９からポンプ１１に供給する作動エアの圧力が設定圧一定となるようにコントローラ５０にて調整されている。そして、電磁切換弁１２はコントローラ５０により作動室２６を給気配管２８に接続するか大気開放するかのいずれかに切換動作され、この切換動作により作動室２６に作動エアが給排され、ポンプ１１の吐出・吸入動作が切り換えられる。   The pump housing 22 on the working chamber 26 side is formed with a supply / discharge passage 22 b for supplying and discharging working air into the working chamber 26. The supply / discharge passage 22 b is connected to the electromagnetic switching valve 12 fixed to the pump housing 22. Here, as shown in FIG. 3, the electromagnetic switching valve 12 is connected to a supply source 29 via an air supply pipe 28 having an electropneumatic regulator 27 on the way. The electropneumatic regulator 27 has an exhaust port open to the atmosphere, and is adjusted by the controller 50 so that the pressure of the working air supplied from the supply source 29 to the pump 11 becomes constant. The electromagnetic switching valve 12 is switched by the controller 50 to either connect the working chamber 26 to the air supply pipe 28 or open to the atmosphere. By this switching operation, the working air is supplied to and discharged from the working chamber 26. 11 discharge / suction operations are switched.

つまり、電磁切換弁１２の動作により作動室２６に作動エアが供給されると、作動室２６内が加圧されてダイアフラム２３がポンプ室２５側に作動し、ポンプ室２５内に充填されたレジスト液Ｒが吐出通路２１ｃを介して下流側に吐出される。一方、電磁切換弁１２の動作により作動室２６内の作動エアが大気中に排出されると、ポンプ室２５側に作動していたダイアフラム２３が作動室２６側の作動して中間位置に復帰し、上流側から吸入通路２１ｂを介してポンプ室２５内にレジスト液Ｒが導入される。   That is, when the working air is supplied to the working chamber 26 by the operation of the electromagnetic switching valve 12, the inside of the working chamber 26 is pressurized and the diaphragm 23 is actuated to the pump chamber 25 side, and the resist filled in the pump chamber 25 is filled. The liquid R is discharged downstream via the discharge passage 21c. On the other hand, when the working air in the working chamber 26 is discharged into the atmosphere by the operation of the electromagnetic switching valve 12, the diaphragm 23 that has been working on the pump chamber 25 side is actuated on the working chamber 26 side to return to the intermediate position. The resist solution R is introduced into the pump chamber 25 from the upstream side through the suction passage 21b.

ポンプハウジング２１，２２の下部中央には、棒状をなす吸入側流路部材１７が固定されている。吸入側流路部材１７は、ポンプ１１の扁平方向に沿うように設けられる。吸入側流路部材１７には、下方に略直線状に延びる吸入通路１７ａが形成されている。この吸入通路１７ａは、前記ポンプ１１の吸入通路２１ｂと同一直線Ｌ１上に設けられている。また、吸入側流路部材１７のポンプハウジング２１との対向面には、吸入通路１７ａ周りに収容凹部１７ｂが形成されており、該収容凹部１７ｂには、シールリング３３が収容されている。シールリング３３は、吸入側流路部材１７とポンプハウジング２１との間に介在され、両部材間の隙間から吸入通路１７ａ，２１ｂ内のレジスト液Ｒが漏れ出さないようにシールする。   A suction-side flow path member 17 having a rod shape is fixed to the lower center of the pump housings 21 and 22. The suction side flow path member 17 is provided along the flat direction of the pump 11. A suction passage 17a is formed in the suction-side flow path member 17 so as to extend downward substantially linearly. The suction passage 17a is provided on the same straight line L1 as the suction passage 21b of the pump 11. A housing recess 17b is formed around the suction passage 17a on the surface of the suction side flow path member 17 facing the pump housing 21, and a seal ring 33 is housed in the housing recess 17b. The seal ring 33 is interposed between the suction-side flow path member 17 and the pump housing 21, and seals the resist solution R in the suction passages 17a and 21b from leaking from the gap between the two members.

また、シールリング３３は、その内周面３３ａが各吸入通路１７ａ，２１ｂの内周面と滑らかに繋がる形状をなしており、具体的には各吸入通路１７ａ，２１ｂから中央部に向かうほど次第に径方向外側に凹となる形状をなしている。つまり、シールリング３３の部分におけるレジスト液Ｒの流れをスムーズとし、レジスト液Ｒや気泡が滞留するのが防止されている。因みに、一般的に用いられる断面円形状のシールリング（Ｏリング）を用いた場合では、該シールリングと各吸入通路１７ａ，２１ｂとの間で鋭角の窪みが生じて該通路１７ａ，２１ｂの内周面と滑らかに繋がらない形状となるため、これがレジスト液Ｒや気泡が滞留する部分となり、好ましくない。そして、吸入側流路部材１７は、先端部に設けられる継手１９を用いて、図３に示すように、一端がレジストボトル３０に充填されているレジスト液Ｒ内に導かれた吸入配管３１のもう一端と接続される。なお、レジストボトル３０内は図示しない加圧装置により加圧されている。   The seal ring 33 has a shape in which the inner peripheral surface 33a thereof is smoothly connected to the inner peripheral surfaces of the suction passages 17a and 21b. Specifically, the seal ring 33 gradually increases from the suction passages 17a and 21b toward the central portion. It has a concave shape on the outside in the radial direction. That is, the flow of the resist solution R in the seal ring 33 is made smooth, and the resist solution R and bubbles are prevented from staying. Incidentally, when a generally used circular seal ring (O-ring) is used, an acute-angle depression is generated between the seal ring and each of the suction passages 17a and 21b. Since the shape does not smoothly connect to the peripheral surface, this becomes a portion where the resist solution R and bubbles stay, which is not preferable. As shown in FIG. 3, the suction-side flow path member 17 uses a joint 19 provided at the tip portion of the suction pipe 31 led into the resist solution R filled in the resist bottle 30 as shown in FIG. Connected to the other end. Note that the inside of the resist bottle 30 is pressurized by a pressure device (not shown).

また、吸入側流路部材１７には、エアオペレイトバルブよりなる吸入側遮断弁１３が一体的に組み付けられている。吸入側遮断弁１３は、略四角柱状をなしており、吸入側流路部材１７に対して直交する方向で、かつポンプ１１（ポンプハウジング２１，２２）の扁平方向に沿うように設けられる。ここで、吸入側遮断弁１３は、図３に示すように、コントローラ５０の制御に基づく電空レギュレータ３２の切換動作により、吸入通路１７ａの遮断・開放の切換を行う。すなわち、吸入側遮断弁１３は、図１に示すように、その給排室１３ａが電空レギュレータ３２の切換動作により大気に開放されると、弁体１３ｂがスプリング１３ｃからの付勢力を受けて吸入通路１７ａを遮断し、給排室１３ａに供給源２９から作動エアが供給されると、弁体１３ｂがスプリング１３ｃの付勢力に抗して没入して吸入通路１７ａを開放するように構成されている。なお、弁体１３ｂの近傍部分の吸入通路１７ａは、該弁体１３ｂによる開放又は遮断を確実に行うのに必要な分（通路幅程度）、直角に屈曲されている。そのため、この部分においてもレジスト液Ｒの流れはスムーズであり、流路部材１７内のレジスト液Ｒの流れに大きな影響（抵抗）を与えるものではない。   In addition, a suction side shutoff valve 13 made up of an air operated valve is integrally assembled with the suction side flow path member 17. The suction side shut-off valve 13 has a substantially rectangular column shape, and is provided in a direction orthogonal to the suction side flow path member 17 and along the flat direction of the pump 11 (pump housings 21 and 22). Here, as shown in FIG. 3, the suction side shutoff valve 13 switches between shutting off and opening the suction passage 17 a by the switching operation of the electropneumatic regulator 32 based on the control of the controller 50. That is, as shown in FIG. 1, when the supply / discharge chamber 13a is opened to the atmosphere by the switching operation of the electropneumatic regulator 32, the suction side shut-off valve 13 receives the urging force from the spring 13c. When the suction passage 17a is shut off and the working air is supplied from the supply source 29 to the supply / discharge chamber 13a, the valve body 13b is immersed against the urging force of the spring 13c to open the suction passage 17a. ing. Note that the suction passage 17a in the vicinity of the valve body 13b is bent at a right angle by an amount necessary for reliably opening or shutting off the valve body 13b (about the passage width). For this reason, the flow of the resist solution R is smooth even in this portion, and the flow of the resist solution R in the flow path member 17 is not greatly affected (resistance).

ポンプハウジング２１，２２の上部中央には、棒状をなす吐出側流路部材１８が固定されている。吐出側流路部材１８は、ポンプ１１の扁平方向に沿うように設けられる。吐出側流路部材１８には、上方に略直線状に延びる吐出通路１８ａが形成されている。この吐出通路１８ａは、前記ポンプ１１の吐出通路２１ｃと同一直線Ｌ１上に設けられている。また、吐出側流路部材１８のポンプハウジング２１との対向面には、吐出通路１８ａ周りに収容凹部１８ｂが形成されており、該収容凹部１８ｂには、シールリング３４が収容されている。シールリング３４は、吐出側流路部材１８とポンプハウジング２１との間に介在され、両部材間の隙間から吐出通路１８ａ，２１ｃ内のレジスト液Ｒが漏れ出さないようにシールする。   A discharge side flow path member 18 having a rod shape is fixed to the upper center of the pump housings 21 and 22. The discharge-side flow path member 18 is provided along the flat direction of the pump 11. A discharge passage 18 a that extends substantially linearly upward is formed in the discharge-side flow path member 18. The discharge passage 18a is provided on the same straight line L1 as the discharge passage 21c of the pump 11. An accommodation recess 18b is formed around the discharge passage 18a on the surface of the discharge-side flow path member 18 facing the pump housing 21, and a seal ring 34 is accommodated in the accommodation recess 18b. The seal ring 34 is interposed between the discharge-side flow path member 18 and the pump housing 21 and seals the resist solution R in the discharge passages 18a and 21c from leaking from the gap between the members.

また、シールリング３４は、前記シールリング３３と同様に、その内周面３４ａが各吐出通路１８ａ，２１ｃの内周面と滑らかに繋がる形状をなしており、レジスト液Ｒや気泡が滞留するのを防止する構造になっている。そして、吐出側流路部材１８は、先端部に設けられる継手２０を用いて、図３に示すように、一端にノズル３５ａを有する吐出配管３５のもう一端と接続される。ノズル３５ａは、下方に指向されるとともに、回転板３６上に載置されて該回転板３６とともに回転する半導体ウェハ３７の中心位置にレジスト液Ｒが滴下される位置に配置されている。   Further, like the seal ring 33, the seal ring 34 has a shape in which the inner peripheral surface 34a thereof is smoothly connected to the inner peripheral surfaces of the discharge passages 18a and 21c, and the resist solution R and bubbles remain. It is the structure which prevents. And the discharge side flow path member 18 is connected with the other end of the discharge piping 35 which has the nozzle 35a at one end using the coupling 20 provided in the front-end | tip part, as shown in FIG. The nozzle 35 a is directed downward, and is disposed at a position where the resist solution R is dropped at the center position of the semiconductor wafer 37 that is placed on the rotating plate 36 and rotates together with the rotating plate 36.

また、吐出側流路部材１８には、エアオペレイトバルブよりなる吐出側遮断弁１４が一体的に組み付けられている。吐出側遮断弁１４は、略四角柱状をなしており、吐出側流路部材１８に対して直交する方向で、かつポンプ１１（ポンプハウジング２１，２２）の扁平方向に沿うように設けられる。ここで、吐出側遮断弁１４は、前記吸入側遮断弁１３と同様に構成され、図３に示すように、コントローラ５０の制御に基づく電空レギュレータ３８の切換動作により、吐出通路１８ａの遮断・開放の切換を行う。すなわち、吐出側遮断弁１４は、図１に示すように、その給排室１４ａが電空レギュレータ３８の切換動作により大気に開放されると、弁体１４ｂがスプリング１４ｃからの付勢力を受けて吐出通路１８ａを遮断し、給排室１４ａに供給源２９から作動エアが供給されると、弁体１４ｂがスプリング１４ｃの付勢力に抗して没入して吐出通路１８ａを開放するように構成されている。なお、弁体１４ｂの近傍部分の吐出通路１８ａは、該弁体１４ｂによる開放又は遮断を確実に行うのに必要な分（通路幅程度）、直角に屈曲されている。そのため、この部分においてもレジスト液Ｒの流れはスムーズであり、流路部材１８内のレジスト液Ｒの流れに大きな影響（抵抗）を与えるものではない。   Further, the discharge side flow path member 18 is integrally assembled with a discharge side shut-off valve 14 formed of an air operated valve. The discharge side shut-off valve 14 has a substantially square column shape, and is provided in a direction orthogonal to the discharge side flow path member 18 and along the flat direction of the pump 11 (pump housings 21 and 22). Here, the discharge-side shut-off valve 14 is configured in the same manner as the suction-side shut-off valve 13, and, as shown in FIG. Switch open. That is, as shown in FIG. 1, when the supply / discharge chamber 14a is opened to the atmosphere by the switching operation of the electropneumatic regulator 38, the discharge side shut-off valve 14 receives the urging force from the spring 14c. When the discharge passage 18a is shut off and the working air is supplied from the supply source 29 to the supply / discharge chamber 14a, the valve body 14b is immersed against the urging force of the spring 14c to open the discharge passage 18a. ing. The discharge passage 18a in the vicinity of the valve body 14b is bent at a right angle by an amount necessary for reliably opening or shutting off the valve body 14b (about the passage width). For this reason, the flow of the resist solution R is smooth even in this portion, and the flow of the resist solution R in the flow path member 18 is not greatly affected (resistance).

また、吐出側流路部材１８には、エアオペレイトバルブよりなるサックバック弁１５が吐出側遮断弁１４よりも下流側に該遮断弁１４と並ぶようにして一体的に組み付けられている。サックバック弁１５も同様に略四角柱状をなしており、吐出側流路部材１８に対して直交する方向で、かつポンプ１１（ポンプハウジング２１，２２）の扁平方向に沿うように設けられる。ここで、サックバック弁１５は、図３に示すように、コントローラ５０の制御に基づく電空レギュレータ３９の切換動作により、該弁１５より下流側流路内にあるレジスト液Ｒを上流側に所定量引き込んで、ノズル３５ａからレジスト液Ｒの不意な滴下を防止するものである。すなわち、サックバック弁１５は、図１に示すように、その給排室１５ａが電空レギュレータ３９の切換動作により大気に開放されると、弁体１５ｂがスプリング１５ｃからの付勢力を受けて没入して吐出通路１８ａと連通して設けられている容積拡大室１８ｃの容積を大きくし、該容積拡大室１８ｃにレジスト液Ｒを所定量引き込む。一方、給排室１５ａに供給源２９から作動エアが供給されると、弁体１５ｂがスプリング１５ｃの付勢力に抗して突出して吐出通路１８ａに設けられる容積拡大室１８ｃを小さくするように構成されている。   Further, a suck-back valve 15 made of an air operated valve is integrally assembled with the discharge side flow path member 18 so as to be aligned with the shutoff valve 14 on the downstream side of the discharge side shutoff valve 14. Similarly, the suck-back valve 15 has a substantially quadrangular prism shape, and is provided in a direction orthogonal to the discharge-side flow path member 18 and along the flat direction of the pump 11 (pump housings 21 and 22). Here, as shown in FIG. 3, the suck back valve 15 places the resist solution R in the flow path downstream from the valve 15 on the upstream side by the switching operation of the electropneumatic regulator 39 based on the control of the controller 50. The fixed amount is drawn to prevent the dripping of the resist solution R from the nozzle 35a. That is, as shown in FIG. 1, when the supply / discharge chamber 15a is opened to the atmosphere by the switching operation of the electropneumatic regulator 39, the valve body 15b receives the urging force from the spring 15c and is immersed. Then, the volume of the volume expansion chamber 18c provided in communication with the discharge passage 18a is increased, and a predetermined amount of the resist solution R is drawn into the volume expansion chamber 18c. On the other hand, when the working air is supplied from the supply source 29 to the supply / discharge chamber 15a, the valve body 15b protrudes against the urging force of the spring 15c to reduce the volume expansion chamber 18c provided in the discharge passage 18a. Has been.

更に、吐出側流路部材１８には、略直方体形状をなすレギュレータ装置１６が吐出側遮断弁１４及びサックバック弁１５とは反対側に固定されている。すなわち、レギュレータ装置１６は、ポンプ１１の扁平方向に沿うように吐出側流路部材１８に対して設けられる。レギュレータ装置１６は、そのベース部材４１が吐出側流路部材１８に対して固定されている。ベース部材４１には固定台４２が固定されており、該固定台４２には吐出側遮断弁１４及びサックバック弁１５を切り換える各電空レギュレータ３８，３９が固定されている。この固定台４２には、電空レギュレータ３８，３９をカバーするカバー部材４３が取り付けられている。また、固定台４２及びベース部材４１には、各電空レギュレータ３８，３９と連通する連通通路４５，４６がそれぞれ形成され、各連通通路４５，４６は、図示しないが吐出側遮断弁１４及びサックバック弁１５の給排室１４ａ，１５ａにそれぞれ連通している。各電空レギュレータ３８，３９は、コントローラ５０の制御に基づいて吐出側遮断弁１４及びサックバック弁１５の給排室１４ａ，１５ａに作動エアを給排させ、吐出側遮断弁１４及びサックバック弁１５を作動させる。   Further, a regulator device 16 having a substantially rectangular parallelepiped shape is fixed to the discharge side flow path member 18 on the side opposite to the discharge side shutoff valve 14 and the suck back valve 15. That is, the regulator device 16 is provided with respect to the discharge-side flow path member 18 along the flat direction of the pump 11. The regulator device 16 has a base member 41 fixed to the discharge-side flow path member 18. A fixed base 42 is fixed to the base member 41, and electropneumatic regulators 38 and 39 for switching the discharge side shut-off valve 14 and the suck back valve 15 are fixed to the fixed base 42. A cover member 43 that covers the electropneumatic regulators 38 and 39 is attached to the fixed base 42. Further, the fixed base 42 and the base member 41 are respectively formed with communication passages 45 and 46 communicating with the electropneumatic regulators 38 and 39. The communication passages 45 and 46 are not shown, but are connected to the discharge side shut-off valve 14 and the sucker. The back valve 15 communicates with the supply / discharge chambers 14a and 15a, respectively. The electropneumatic regulators 38 and 39 supply and discharge operating air to and from the supply / discharge chambers 14a and 15a of the discharge side shut-off valve 14 and suck back valve 15 based on the control of the controller 50, respectively. 15 is activated.

このように構成されるポンプユニット１０において、レジスト液Ｒの流路となっている吸入側流路部材１７内の吸入通路１７ａと、ポンプ１１内の吸入通路２１ｂ及び吐出通路２１ｃと、吐出側流路部材１８の吐出通路１８ａとを共に直線状とし同一直線Ｌ１上に配置した構造となっている。つまり、このポンプユニット１０は、レジスト液Ｒの流路長さを極力短くしつつ、レジスト液Ｒの流路中においてレジスト液Ｒや気泡が滞留する部分を極力低減する構造となっている。また、シールリング３３，３４においても、レジスト液Ｒや気泡が滞留する部分を極力低減する構造となっている。   In the pump unit 10 configured as described above, the suction passage 17a in the suction-side flow path member 17 that is the flow path of the resist solution R, the suction passage 21b and the discharge passage 21c in the pump 11, and the discharge side flow Both the discharge passage 18a of the path member 18 are linear and are arranged on the same straight line L1. In other words, the pump unit 10 has a structure in which the resist solution R and bubbles are retained in the flow path of the resist solution R as much as possible while reducing the flow path length of the resist solution R as much as possible. Also, the seal rings 33 and 34 have a structure in which the portion where the resist solution R and bubbles stay is reduced as much as possible.

図３に示すように、コントローラ５０は、ポンプ１１に供給する作動エアが設定圧となるように電空レギュレータ２７を制御すると共に、ポンプ１１の切換動作を行う電磁切換弁１２や吸入側遮断弁１３を切換動作させる電空レギュレータ３２、吐出側遮断弁１４及びサックバック弁１５を作動させる電空レギュレータ３８，３９を制御し、薬液供給システムの一連の動作を制御している。   As shown in FIG. 3, the controller 50 controls the electropneumatic regulator 27 so that the working air supplied to the pump 11 becomes a set pressure, and also performs an electromagnetic switching valve 12 and a suction side shut-off valve that perform a switching operation of the pump 11. 13 controls the electropneumatic regulator 32 that switches the operation 13, the electropneumatic regulators 38 and 39 that operate the discharge side shut-off valve 14 and the suck back valve 15, and controls a series of operations of the chemical solution supply system.

すなわち、薬液供給システムの動作を開始する指令が生じると、コントローラ５０は、先ず、電空レギュレータ３２を制御して吸入側遮断弁１３を切り換え、吸入通路１７ａを遮断状態とする。これにより、ポンプ１１とレジストボトル３０とが遮断された状態となる。また、コントローラ５０は、電磁切換弁１２を切り換え、設定圧に調整された作動エアをポンプ１１内の作動室２６に供給する。これによりダイアフラム２３がポンプ室２５側に作動しようとし、ポンプ室２５内に充填されたレジスト液Ｒを加圧する。なお、システムの初期動作時等、ポンプ室２５内にレジスト液Ｒが充填されていない場合はポンプ室２５内を加圧する。このとき、ポンプ１１下流側の吐出側遮断弁１４により吐出通路１８ａが遮断状態となっており、レジスト液Ｒは吐出されない。   That is, when a command to start the operation of the chemical solution supply system is generated, the controller 50 first controls the electropneumatic regulator 32 to switch the suction side shutoff valve 13 and put the suction passage 17a into a shutoff state. As a result, the pump 11 and the resist bottle 30 are shut off. Further, the controller 50 switches the electromagnetic switching valve 12 and supplies the working air adjusted to the set pressure to the working chamber 26 in the pump 11. As a result, the diaphragm 23 tries to operate toward the pump chamber 25 and pressurizes the resist solution R filled in the pump chamber 25. When the resist solution R is not filled in the pump chamber 25, such as during the initial operation of the system, the inside of the pump chamber 25 is pressurized. At this time, the discharge passage 18a is shut off by the discharge side shut-off valve 14 on the downstream side of the pump 11, and the resist solution R is not discharged.

次いで、コントローラ５０は、電空レギュレータ３８を制御して吐出側遮断弁１４を切り換え吐出通路１８ａを開放すると共に、電空レギュレータ３９を制御してサックバック弁１５によるレジスト液Ｒの引き込みを解除する。このとき、ダイアフラム２３によりポンプ室２５のレジスト液Ｒが加圧されているので、ポンプ１１からレジスト液Ｒが吐出され、そのレジスト液Ｒが吐出通路１８ａを介して吐出配管３５先端のノズル３５ａから半導体ウェハ３７上に一定量滴下される。   Next, the controller 50 controls the electropneumatic regulator 38 to switch the discharge side shut-off valve 14 to open the discharge passage 18a, and also controls the electropneumatic regulator 39 to release the drawing of the resist solution R by the suck back valve 15. . At this time, since the resist solution R in the pump chamber 25 is pressurized by the diaphragm 23, the resist solution R is discharged from the pump 11, and the resist solution R is discharged from the nozzle 35a at the tip of the discharge pipe 35 through the discharge passage 18a. A predetermined amount is dropped on the semiconductor wafer 37.

次いで、コントローラ５０は、電空レギュレータ３８を制御して吐出側遮断弁１４を切り換え、吐出通路１８ａを遮断する。これにより、ノズル３５ａからのレジスト液Ｒの吐出が停止される。また、コントローラ５０は、電空レギュレータ３９を制御してサックバック弁１５による所定量のレジスト液Ｒの引き込みを行い、ノズル３５ａからレジスト液Ｒの不意な滴下を防止する。   Next, the controller 50 controls the electropneumatic regulator 38 to switch the discharge side shutoff valve 14 and shut off the discharge passage 18a. Thereby, the discharge of the resist solution R from the nozzle 35a is stopped. Further, the controller 50 controls the electropneumatic regulator 39 to draw a predetermined amount of the resist solution R by the suck back valve 15, and prevents the resist solution R from dripping unexpectedly from the nozzle 35a.

次いで、コントローラ５０は、電空レギュレータ３２を制御して吸入側遮断弁１３を切り換え、吸入通路１７ａを開放する。これにより、ポンプ１１とレジストボトル３０とが連通された状態となる。また、コントローラ５０は、電磁切換弁１２を切り換え、作動室２６を大気に開放させる。すると、作動室２６内の作動エアが大気に排出されてダイアフラム２３が復帰する。この場合、レジストボトル３０内は加圧されているので、このダイアフラム２３の復帰動作に基づいて、レジスト液Ｒがポンプ室２５内に導入され充填される。これ以降においては、コントローラ５０は上記動作を繰り返し、次々と搬送されてくる各半導体ウェハ３７上にレジスト液Ｒを一定量ずつ滴下するようになっている。   Next, the controller 50 controls the electropneumatic regulator 32 to switch the suction side shutoff valve 13 and open the suction passage 17a. As a result, the pump 11 and the resist bottle 30 are in communication with each other. In addition, the controller 50 switches the electromagnetic switching valve 12 to open the working chamber 26 to the atmosphere. Then, the working air in the working chamber 26 is discharged to the atmosphere, and the diaphragm 23 returns. In this case, since the inside of the resist bottle 30 is pressurized, the resist solution R is introduced into the pump chamber 25 and filled based on the return operation of the diaphragm 23. Thereafter, the controller 50 repeats the above-described operation so that a predetermined amount of the resist solution R is dropped onto each semiconductor wafer 37 that is successively transferred.

次に、このような本実施の形態の特徴的な作用効果を記載する。   Next, the characteristic operational effects of the present embodiment will be described.

本実施の形態のポンプユニット１０は、ポンプ室２５と連通する吸入通路１７ａ，２１ｂ及び吐出通路１８ａ，２１ｃが同一直線Ｌ１上となるように、ポンプ１１（ポンプハウジング２１，２２）に対して吸入側流路部材１７と吐出側流路部材１８とが一体的に組み付けられて構成される。つまり、吸入側流路部材１７には吸入側遮断弁１３が一体的に設けられ、吐出側流路部材１８には吐出側遮断弁１４が一体的に設けられているので、ポンプ１１と吸入側遮断弁１３との間の配管及びそれにかかる継手や、ポンプ１１と吐出側遮断弁１４との間の配管及びそれにかかる継手を省略でき、ポンプユニット１０が小型化される。そのため、仕様によって処理槽に配置させる場合、ポンプユニット１０の小型化はその処理槽への配置を可能とし、これにより処理槽毎にポンプ１１後の配管長さや高低差（揚程差）が同様となり吐出量等に差が生じることが防止される。   The pump unit 10 according to the present embodiment suctions the pump 11 (pump housings 21, 22) so that the suction passages 17a, 21b and the discharge passages 18a, 21c communicating with the pump chamber 25 are on the same straight line L1. The side flow path member 17 and the discharge side flow path member 18 are integrally assembled. That is, since the suction side shutoff valve 13 is integrally provided in the suction side flow path member 17 and the discharge side shutoff valve 14 is integrally provided in the discharge side flow path member 18, the pump 11 and the suction side shutoff valve 14 are integrally provided. The piping between the shutoff valve 13 and its joint, and the piping between the pump 11 and the discharge side shutoff valve 14 and its joint can be omitted, and the pump unit 10 is downsized. Therefore, when it arrange | positions to a processing tank by specification, size reduction of the pump unit 10 enables the arrangement | positioning to the processing tank, and, thereby, the piping length and height difference (lift difference) after the pump 11 become the same for every processing tank. It is possible to prevent a difference in the discharge amount and the like.

また、ポンプ室２５と連通する吸入通路１７ａ，２１ｂ及び吐出通路１８ａ，２１ｃが共に略直線状とされて同一直線Ｌ１上に配置されるので、ポンプユニット１０の薬液流路中に気泡や薬液が滞留する部分を極力低減することができる。従って、薬液流路中における気泡や薬液の滞留を低減できるため、少ないパージ量で気泡抜きを良好に行うことができ、薬液の長期間の滞留が低減されることで劣化した薬液の生成を低減することができる。   In addition, since the suction passages 17a and 21b and the discharge passages 18a and 21c communicating with the pump chamber 25 are both substantially straight and arranged on the same straight line L1, bubbles and chemicals are introduced into the chemical flow channel of the pump unit 10. The staying part can be reduced as much as possible. Therefore, it is possible to reduce the retention of bubbles and chemicals in the chemical flow path, so that bubbles can be removed well with a small purge amount, and the generation of deteriorated chemicals is reduced by reducing the long-term retention of chemicals. can do.

更に、吸入側流路部材１７の先端部を地側に向け、吐出側流路部材１８を天側に向け、薬液流路が天地方向に向くようにポンプユニット１０を取り付けると、気泡抜きを行う際、薬液流路中の気泡が自然に吐出側に向かうため、気泡抜きをより良好に行うことが可能となる。従って、本実施の形態のポンプユニット１０はこのように取り付けることが望ましい。   Further, when the pump unit 10 is attached so that the tip end portion of the suction side flow channel member 17 is directed to the ground side, the discharge side flow channel member 18 is directed to the top side, and the chemical liquid flow channel is directed to the top and bottom direction, bubbles are removed. At this time, since the bubbles in the chemical liquid flow channel naturally move toward the discharge side, it is possible to perform the bubble removal more favorably. Therefore, it is desirable to install the pump unit 10 of the present embodiment in this way.

また本実施の形態では、シールリング３３，３４の内周面３３ａ，３４ａは、該シールリング３３，３４前後の通路１７ａ，２１ｂ，１８ａ，２１ｃの内周面と滑らかに連続する形状（前後の通路１７ａ，２１ｂ，１８ａ，２１ｃの内周面から中央部に向かうほど次第に径方向外側に凹となる形状）に形成されている。これにより、シールリング３３，３４と前後の通路１７ａ，２１ｂ，１８ａ，２１ｃとの間で鋭角の窪みが生じないため、シールリング３３，３４の部分におけるレジスト液Ｒの流れがスムーズとなり、レジスト液Ｒや気泡が滞留するのを防止することができる。   In the present embodiment, the inner peripheral surfaces 33a, 34a of the seal rings 33, 34 are smoothly continuous with the inner peripheral surfaces of the passages 17a, 21b, 18a, 21c before and after the seal rings 33, 34 (front and rear The passages 17a, 21b, 18a, and 21c are formed in a shape that gradually becomes concave outward in the radial direction from the inner peripheral surface toward the central portion. As a result, no acute-angle depressions are formed between the seal rings 33, 34 and the front and rear passages 17a, 21b, 18a, 21c. Therefore, the flow of the resist solution R in the seal rings 33, 34 becomes smooth, and the resist solution R and bubbles can be prevented from staying.

また本実施の形態では、薄型な扁平形状をなすポンプ１１（ポンプハウジング２１，２２）の扁平方向に沿って棒状の吸入側流路部材１７及び吐出側流路部材１８が配置され、更に流路部材１７，１８に対して直交する方向で、かつポンプハウジング２１，２２の扁平方向に沿って吸入側遮断弁１３及び吐出側遮断弁１４が配置されている。従って、このようなポンプハウジング２１，２２の扁平方向に沿って棒状の流路部材１７，１８を配置すれば、該流路部材１７，１８が扁平方向と直交する方向に本形態では突出しない。更に、このような流路部材１７，１８に対して直交する方向で、かつポンプハウジング２１，２２の扁平方向に沿って遮断弁１３，１４を配置すれば、該開閉弁１３，１４が扁平方向と直交する方向に本形態では突出しないばかりか、扁平方向においても大きく突出しない。これにより、ポンプユニット１０の薄型化を含めた小型化を図ることができる。   Further, in the present embodiment, the rod-like suction side flow path member 17 and the discharge side flow path member 18 are arranged along the flat direction of the pump 11 (pump housings 21 and 22) having a thin flat shape. The suction-side cutoff valve 13 and the discharge-side cutoff valve 14 are arranged in a direction orthogonal to the members 17 and 18 and along the flat direction of the pump housings 21 and 22. Therefore, if the rod-like flow path members 17 and 18 are disposed along the flat direction of the pump housings 21 and 22, the flow path members 17 and 18 do not protrude in the direction perpendicular to the flat direction. Further, if the shutoff valves 13 and 14 are arranged in a direction orthogonal to the flow path members 17 and 18 and along the flat direction of the pump housings 21 and 22, the on-off valves 13 and 14 are flattened. In this embodiment, it does not protrude in a direction perpendicular to the direction, and does not protrude greatly in the flat direction. Thereby, size reduction including thickness reduction of the pump unit 10 can be achieved.

また、サックバック弁１５や電空レギュレータ３８，３９についてもポンプ１１の扁平方向に沿うように配置しているので、これによってもポンプユニット１０の小型化（薄型化）が図られている。   Further, since the suck back valve 15 and the electropneumatic regulators 38 and 39 are also arranged along the flat direction of the pump 11, the size (thinning) of the pump unit 10 is also reduced.

また本実施の形態では、サックバック弁１５は吐出側遮断弁１４の下流側（薬液流路の最下流部）に設ける必要のある弁であり、処理槽内に配置する可能性が高いため、このようなサックバック弁１５を吐出側流路部材１８に一体的に組み付けたことにより、サックバック弁１５を接続するための配管や継手を省略できる。そのため、サックバック弁１５を個別に設ける場合と比べて、配管や継手等の省略分、ポンプユニット１０の小型化を図ることができる。   Further, in the present embodiment, the suck back valve 15 is a valve that needs to be provided on the downstream side of the discharge side shutoff valve 14 (the most downstream portion of the chemical liquid flow path), and is likely to be disposed in the processing tank. By integrally assembling such a suck-back valve 15 to the discharge-side flow path member 18, piping and joints for connecting the suck-back valve 15 can be omitted. Therefore, compared with the case where the suck back valve 15 is provided individually, the pump unit 10 can be reduced in size by omitting piping and joints.

また本実施の形態では、吐出側遮断弁１４及びサックバック弁１５を動作させるための作動エアを制御する電空レギュレータ３８，３９をポンプユニット１０近傍に配置するスペースがある場合など、その電空レギュレータ３８，３９をポンプユニット１０に一体的に組み付けたので、薬液供給システムに組み付ける部品点数を少なくすることができる。   Further, in the present embodiment, when there is a space in which the electropneumatic regulators 38 and 39 for controlling the working air for operating the discharge side shutoff valve 14 and the suck back valve 15 are arranged in the vicinity of the pump unit 10, the electropneumatic Since the regulators 38 and 39 are integrally assembled to the pump unit 10, the number of parts to be assembled to the chemical solution supply system can be reduced.

なお、本発明は上記実施の形態の記載内容に限定されず、例えば次のように実施しても良い。   In addition, this invention is not limited to the content of description of the said embodiment, For example, you may implement as follows.

上記実施の形態では、ダイアフラム２３を用いたポンプ１１であったが、これ以外、例えばチューブやベローズを用いたポンプであっても良い。   In the above embodiment, the pump 11 uses the diaphragm 23. However, other than this, for example, a pump using a tube or a bellows may be used.

上記実施の形態では、吸入側流路部材１７と吐出側流路部材１８とをポンプ１１に一体的に組み付けるようにしたが、ポンプ１１に対して吸入側流路部材１７及び吐出側流路部材１８に相当する部分を一体形成しても良い。   In the above embodiment, the suction-side flow path member 17 and the discharge-side flow path member 18 are integrally assembled with the pump 11, but the suction-side flow path member 17 and the discharge-side flow path member with respect to the pump 11. A portion corresponding to 18 may be integrally formed.

上記実施の形態では、電空レギュレータ３８，３９を吐出側流路部材１８に一体的に組み付けたが、別に設けても良い。逆に、吸入側遮断弁１３を動作させる電空レギュレータ３２を例えば吸入側流路部材１７に一体的に組み付けても良い。   In the above embodiment, the electropneumatic regulators 38 and 39 are integrally assembled with the discharge-side flow path member 18, but may be provided separately. Conversely, the electropneumatic regulator 32 that operates the suction side shutoff valve 13 may be integrally assembled with the suction side flow path member 17, for example.

上記実施の形態では、遮断弁１３，１４及びサックバック弁１５を作動エアにより動作するエアオペレイトバルブで構成したが、電磁駆動式のバルブやモータ駆動式のバルブなどで構成しても良い。   In the above embodiment, the shutoff valves 13 and 14 and the suck back valve 15 are constituted by air operated valves that are operated by operating air, but may be constituted by electromagnetically driven valves or motor driven valves.

上記実施の形態の遮断弁１４に代えて、開閉速度が若干緩やかとなるように調整可能な開閉弁を用いても良い。   Instead of the shut-off valve 14 of the above embodiment, an on-off valve that can be adjusted so that the opening / closing speed is slightly gentle may be used.

上記実施の形態では、サックバック弁１５を用いたが、サックバック弁１５を省略しても良い。   Although the suck back valve 15 is used in the above embodiment, the suck back valve 15 may be omitted.

上記実施の形態において、電磁切換弁１２は作動室２６を給気配管２８に接続するか大気開放するかのいずれかに切換動作されるものであったが、大気開放するポートを負圧発生源に接続しても良い。このように負圧を用いることにより、ポンプ１１のレジスト液Ｒの吸入時にダイアフラム２３の吸引力が増すので、上記実施の形態のようにレジストボトル３０内の加圧を取り止めることが可能になる。   In the above embodiment, the electromagnetic switching valve 12 is switched to connect the working chamber 26 to the air supply pipe 28 or open to the atmosphere. You may connect to. By using the negative pressure in this manner, the suction force of the diaphragm 23 increases when the resist solution R of the pump 11 is sucked, so that the pressurization in the resist bottle 30 can be stopped as in the above embodiment.

上記実施の形態では、作動エア（空気）を例に挙げて説明したが、空気以外にも窒素等の他の気体を用いても良い。   In the above embodiment, the working air (air) has been described as an example, but other gases such as nitrogen may be used in addition to air.

上記実施の形態では、薬液としてレジスト液Ｒを用いた例を示したが、これは薬液の滴下対象が半導体ウェハ３７を前提としたためである。従って、薬液及び該薬液の滴下対象はそれ以外のものでも良い。   In the above-described embodiment, the example in which the resist solution R is used as the chemical solution has been described. This is because the chemical solution is to be dropped on the semiconductor wafer 37. Therefore, the chemical solution and the dripping target of the chemical solution may be other than that.

薬液供給システム中、ポンプユニットを示す正断面図である。It is a front sectional view showing a pump unit in a chemical solution supply system. （ａ）はポンプユニットの側断面図、（ｂ）は（ａ）の拡大断面図である。(A) is a sectional side view of a pump unit, (b) is an expanded sectional view of (a). 薬液供給システムの全体回路を示す回路説明図である。It is circuit explanatory drawing which shows the whole circuit of a chemical | medical solution supply system.

符号の説明Explanation of symbols

１１…ポンプ、１３…吸入側遮断弁（吸入側開閉弁）、１４…吐出側遮断弁（吐出側開閉弁）、１５…サックバック弁、１７…吸入側流路部材、１７ａ…吸入通路、１８…吐出側流路部材、１８ａ…吐出通路、２１，２２…ポンプハウジング、２１ｂ…吸入通路、２１ｃ…吐出通路、２５…ポンプ室、３３，３４…シールリング、３３ａ，３４ａ…内周面、Ｌ１…直線、Ｒ…レジスト液。   DESCRIPTION OF SYMBOLS 11 ... Pump, 13 ... Suction side shutoff valve (suction side on / off valve), 14 ... Discharge side shutoff valve (discharge side on / off valve), 15 ... Suck back valve, 17 ... Suction side flow path member, 17a ... Suction passage, 18 ... discharge side flow path member, 18a ... discharge passage, 21, 22 ... pump housing, 21b ... suction passage, 21c ... discharge passage, 25 ... pump chamber, 33, 34 ... seal ring, 33a, 34a ... inner peripheral surface, L1 ... straight line, R ... resist solution.

Claims (6)

薬液の吐出吸入を行うポンプ室を有するポンプと、前記ポンプ室と連通して該ポンプ室に前記薬液を吸入する吸入通路の開閉を行うための吸入側開閉弁と、前記ポンプ室と連通して該ポンプ室から前記薬液を吐出する吐出通路の開閉を行うための吐出側開閉弁とを有する薬液供給用ポンプユニットであって、
前記吸入通路及び前記吐出通路を共に略直線状として同一直線上に配置し、前記ポンプ、前記吸入側開閉弁及び前記吐出側開閉弁を一体的に組み付けたことを特徴とする薬液供給用ポンプユニット。 A pump having a pump chamber for discharging and inhaling a chemical, a suction-side on-off valve for opening and closing a suction passage for inhaling the chemical into the pump chamber, and in communication with the pump chamber A chemical liquid supply pump unit having a discharge side on-off valve for opening and closing a discharge passage for discharging the chemical liquid from the pump chamber,
A pump unit for supplying a chemical solution, wherein the suction passage and the discharge passage are both substantially straight and arranged on the same straight line, and the pump, the suction side on-off valve and the discharge side on-off valve are assembled together. . 薬液の吐出吸入を行うポンプ室を有するポンプと、前記ポンプ室と連通して該ポンプ室に前記薬液を吸入する吸入通路の開閉を行うための吸入側開閉弁と、前記ポンプ室と連通して該ポンプ室から前記薬液を吐出する吐出通路の開閉を行うための吐出側開閉弁とを有する薬液供給用ポンプユニットであって、
略直線状の内部通路を有し前記吸入側開閉弁を一体的に組み付けてなる吸入側流路部材と、略直線状の内部通路を有し前記吐出側開閉弁を一体的に組み付けてなる吐出側流路部材とを備えると共に、
前記ポンプは、そのポンプハウジング内に、前記吸入側流路部材の内部通路と連通して前記吸入通路を構成する略直線状の内部通路と、前記吐出側流路部材の内部通路と連通して前記吐出通路を構成する略直線状の内部通路とを備えるものであり、
前記吸入通路及び前記吐出通路が同一直線上となるように、前記ポンプハウジングに対して前記吸入側流路部材と前記吐出側流路部材とを一体的に組み付けたことを特徴とする薬液供給用ポンプユニット。 A pump having a pump chamber for discharging and inhaling a chemical, a suction-side on-off valve for opening and closing a suction passage for inhaling the chemical into the pump chamber, and in communication with the pump chamber A chemical liquid supply pump unit having a discharge side on-off valve for opening and closing a discharge passage for discharging the chemical liquid from the pump chamber,
A suction-side flow path member that has a substantially linear internal passage and the suction-side on-off valve is integrally assembled, and a discharge that has a substantially linear internal passage and is integrally assembled with the discharge-side on-off valve. A side flow path member,
In the pump housing, the pump communicates with the internal passage of the suction side flow path member and the substantially straight internal passage constituting the suction passage and the internal passage of the discharge side flow path member. A substantially linear internal passage constituting the discharge passage,
The chemical supply unit, wherein the suction side flow path member and the discharge side flow path member are integrally assembled with the pump housing so that the suction passage and the discharge path are on the same straight line. Pumping unit. 前記ポンプハウジングと前記各流路部材との間には、両部材間の隙間から前記通路内の薬液が漏れ出さないようにシールするシールリングが介在されるものであって、
前記シールリングの内周面は、該シールリング前後の前記通路の内周面と滑らかに連続する形状に形成されていることを特徴とする請求項２に記載の薬液供給用ポンプユニット。 Between the pump housing and each flow path member, a seal ring is interposed for sealing so that the chemical in the passage does not leak from the gap between the two members,
3. The chemical liquid supply pump unit according to claim 2, wherein an inner peripheral surface of the seal ring is formed in a shape that is smoothly continuous with an inner peripheral surface of the passage before and after the seal ring. 前記ポンプハウジングは、内部に前記ポンプ室の一部を構成するダイアフラムを備えた薄型な扁平形状をなしており、
前記吸入側流路部材及び前記吐出側流路部材は、共に棒状をなしており、前記ポンプハウジングの扁平方向に沿ってそれぞれ配置され、
前記吸入側開閉弁及び前記吐出側開閉弁は、前記吸入側流路部材及び前記吐出側流路部材に対して直交する方向で、かつ前記ポンプハウジングの扁平方向に沿うようにそれぞれ配置されていることを特徴とする請求項２又は３に記載の薬液供給用ポンプユニット。 The pump housing has a thin flat shape with a diaphragm that forms a part of the pump chamber inside,
Both the suction side flow path member and the discharge side flow path member have a rod shape, and are respectively disposed along the flat direction of the pump housing,
The suction-side on-off valve and the discharge-side on-off valve are respectively arranged in a direction orthogonal to the suction-side flow path member and the discharge-side flow path member and along the flat direction of the pump housing. The chemical solution supply pump unit according to claim 2 or 3, 前記吐出側開閉弁の下流側に、前記吐出通路内の前記薬液を所定量引き込むサックバック弁を一体的に組み付けたことを特徴とする請求項１〜４のいずれかに記載の薬液供給用ポンプユニット。   The pump for supplying chemical liquid according to any one of claims 1 to 4, wherein a suck back valve for drawing a predetermined amount of the chemical liquid in the discharge passage is integrally assembled downstream of the discharge side on-off valve. unit. 前記各弁の少なくとも１個は作動エアを給排させることにより動作するものであり、その作動エアを制御する電空レギュレータの少なくとも１個を一体的に組み付けたことを特徴とする請求項１〜５のいずれかに記載の薬液供給用ポンプユニット。   2. At least one of the valves operates by supplying and discharging operating air, and at least one electropneumatic regulator for controlling the operating air is integrally assembled. 6. The chemical solution supply pump unit according to any one of 5 above.
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CNB2005800289947A CN100562664C (en) 2004-09-10 2005-07-29 The pump unit that is used for supply of chemical
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