KR20070114693A - Pump unit for feeding chemical liquid - Google Patents

Abstract

A pump unit for feeding a chemical liquid capable of reducing the stagnation of air bubbles and chemical liquid in the chemical liquid flow passage of the unit while reducing a size by unitizing a pump and open/close valves on the upstream and downstream sides of the pump. The pump unit (10) is formed by integrally mounting a suction side flow passage member (17) to which a suction side cut-off valve (13) is integrally fitted and a discharge side flow passage member (18) to which a discharge side cut-off valve (14) is integrally fitted on the pump (11) (pump housings (21), (22)). Suction passages (17a) and (21b) and discharge passages (18a) and (21c) communicating with a pump chamber (25) are positioned on a same straightline (L1).

Description

PUMP UNIT FOR FEEDING CHEMICAL LIQUID}

TECHNICAL FIELD This invention relates to the chemical liquid supply pump unit suitable for apply | coating chemical liquids, such as a photoresist liquid, to each semiconductor wafer by predetermined amount, for example in the chemical liquid use process of a semiconductor manufacturing apparatus.

In a chemical liquid supplying system, in order to spread chemical liquids such as photoresist liquids from a bottle and apply a predetermined amount to each semiconductor wafer, conventionally, each opening / closing valve necessary for a pump or a pump vicinity is arranged separately and connected by piping. I was letting go. However, in such a system configuration, a joint is required every time the pipes are connected, and the space in which these pipes and joints are arranged has caused an increase in the chemical liquid supply system.

In addition, in order to apply | coat a chemical | medical solution to several semiconductor wafers at the same time, generally, the process tank (inferior chamber which apply | coats a chemical | medical solution to a semiconductor wafer) is piled up several times in the up-down direction, and is provided. However, the space of the treatment tank is narrow, and it is impossible to arrange everything from the nozzle for discharging the chemical liquid in the treatment tank to the discharge side on / off valve, the pump, and even the suction side on / off valve. In the processing tank, a pump, an intake opening / closing valve, and the like are gathered in a receiving portion provided at the lower end of the processing tank to such an extent that the discharge-side on-off valve is arranged at the nozzle. For this reason, the pipe length and the elevation difference downstream of the pump are different for each treatment tank, and the pressure loss is different. Since this causes a difference in the discharge amount of the chemical liquid for each treatment tank, it is difficult to set the same discharge amount in any treatment tank.

Therefore, for example, in the chemical | medical solution supply system disclosed by patent document 1, each on-off valve (input valve and output valve) necessary for a pump and a pump vicinity is integrally provided, and is unitized. As a result, the piping between the pump and each of the on-off valves and the joints installed thereon are omitted to reduce the size of the pump unit, and the pump unit can be arranged in each treatment tank. As a result, the height difference (long-term difference) from the pipe length and the pump to the nozzle can be made the same in each treatment tank, so that it is easy to ensure the same discharge amount in any treatment tank.

By the way, air bubbles may be mixed in the chemical liquid flow path, for example, immediately after replacement with an empty bottle filled with a new chemical liquid. Since the bubble prevents the quantitative discharge of the chemical liquid, it is necessary to extract the bubble from the chemical liquid flow path, and in this case, bubble extraction is performed to discharge a predetermined amount of the chemical liquid from the nozzle.

However, chemical liquids such as photoresist liquids are expensive, and it is necessary to extract bubbles by making the amount of chemical liquid discharged as small as possible. Therefore, in the pump unit of patent document 1, the introduction direction of the chemical liquid of an input port and the discharge direction of the chemical liquid of an output port respectively face 90 degrees, and the chemical liquid flow path in a pump unit from an input port to an output port is complicated, respectively. Is flexing. As a result, since a bubble stays in the chemical liquid flow path, bubbles cannot be satisfactorily drawn with a small discharge amount, and there is a problem that the discharge amount increases. In addition, the part where the bubble stays in this way is also a part where the chemical liquid is collected, and there is also a problem in that the chemical liquid deteriorates due to long-term retention.

Patent Document 1: Japanese Patent Application Laid-Open No. 2003-49778

The main object of the present invention is to provide a chemical liquid supply pump unit capable of reducing air bubbles and chemical liquid retention in the chemical liquid flow path of the unit, while minimizing the unit by forming a pump and each open / close valve near the pump. Doing.

The pump unit for chemical liquid supply which concerns on this invention was comprised as follows. In other words,

A pump having a pump chamber for discharging suction of the chemical liquid, a suction side on / off valve for opening and closing a suction passage communicating with the pump chamber to suck the chemical liquid into the pump chamber, and communicating the pump chamber with the chemical chamber in the pump chamber. In the chemical liquid supply pump unit having a discharge side on-off valve for opening and closing the discharge passage to discharge,

The suction passage and the discharge passage were arranged almost in a straight line, and arranged on the same straight line, and the pump, the suction side on-off valve and the discharge side on-off valve were integrally provided.

In this chemical liquid supply pump, the suction passage and the discharge passage communicating with the pump chamber become almost straight together, and the suction side opening / closing valve and the discharge passage opening and closing the pump and the suction passage so that the suction passage and the discharge passage are in the same straight line form. The outlet side on-off valve for opening and closing the valve is integrally installed. Thus, by integrally providing the pump, the suction side on-off valve and the discharge side on-off valve, the pipe between the pump and the suction side on-off valve and the joint installed thereon, or between the pump and the discharge-side pump The pipe and the joint to install it can be omitted, and the pump unit can be miniaturized. As a result, the pump unit can be disposed in the treatment layer, and the pipe length and the elevation difference (sequence difference) downstream of the pump can be the same for each treatment tank, so that a difference in discharge amount and the like can be prevented. . Further, since the suction passage and the discharge passage communicating with the pump chamber are substantially straight together and arranged on the same straight line, it is possible to reduce as much as possible the portion where bubbles or chemical liquid stays in the chemical liquid flow path of the pump unit. For this reason, foaming can be performed favorably with a small discharge | release amount, and deterioration of a chemical liquid can be reduced.

Moreover, as a specific example of the said chemical liquid supply pump unit,

A pump having a pump chamber for discharging suction of the chemical liquid, a suction side on / off valve for opening and closing the suction passage communicating with the pump chamber to suck the chemical liquid into the pump chamber, and communicating the pump chamber with the chemical chamber in the pump chamber. In the chemical liquid supply pump unit having a discharge side on-off valve for opening and closing the discharge passage to discharge,

A suction side flow path member having an internal passage in a substantially straight state and integrally installing the suction side shutoff valve, and a discharge side flow passage member having an internal passage in a substantially straight state and integrally installing the discharge side shutoff valve. At the same time,

The pump includes, in the pump housing, an inner passage in a substantially straight state communicating with the inner passage and constituting the suction passage, and an inner passage in a substantially straight state communicating with the inner passage and forming the discharge passage. Will,

It is mentioned that the suction side passage member and the discharge side passage member are integrally provided with respect to the pump housing so that the suction passage and the discharge passage are in the same straight line.

In this chemical liquid supply pump unit, the suction passage (inner passage of the pump housing and the suction side flow path member) and the discharge passage (inner passage of the pump housing and the discharge side flow path member) communicating with the pump chamber are substantially straight together. The suction side flow path member and the discharge side flow path member are integrally provided with respect to the pump housing so that the passage and the discharge passage are in the same straight line shape. As a result, since the suction side opening / closing valve is integrally provided in the suction side flow path member, and the discharge side opening / closing valve is integrally provided in the discharge side flow passage member, the piping between the pump and the suction side opening / closing valve and hypothesis thereon are provided. The joint, the pipe between the pump and the discharge side on / off valve, and the joint installed thereon can be omitted, and the pump unit can be miniaturized. As a result, the pump unit can be arranged in the treatment tank, and the pipe length and the elevation difference (sequence difference) downstream from the pump can be the same for each treatment tank, so that a difference in discharge amount and the like can be prevented. In addition, since the suction passage and the discharge passage communicating with the pump chamber are substantially straight together and arranged in the same straight line, it is possible to reduce as much as possible the portion where the bubbles and the chemical liquid stay in the chemical liquid passage of the pump unit. For this reason, foaming can be performed favorably with a small discharge | emission amount, and the production | generation of deteriorated chemical liquid can be reduced.

The pump unit for chemical liquid supply shown as the specific example,

Between the pump housing and each of the flow path members, a seal ring is sealed to prevent the chemical liquid in the inner passage from leaking in the gap between both members.

The inner circumferential surface of the seal ring is preferably formed in a shape that is smoothly continuous with the inner circumferential surface of the inner passages upstream and downstream of the seal ring.

In this configuration, the inner circumferential surface of the seal ring smoothly continues with the inner circumferential surface of the inner passage provided in the pump housing and each flow path member. Here, the smoothly continuous shape is a shape in which an acute angle of concave portion does not occur between the upstream and downstream inner passages of the seal ring, for example, continuous with the inner circumferential surface of the inner passage, and in the thickness direction of the seal ring. The concave portion gradually deepens radially outward from the passage side toward the center portion. By doing in this way, the flow of the chemical liquid of the part of a seal ring becomes smooth and it can prevent that a chemical liquid and a bubble stay.

In addition, the pump housing has a thin flat shape having a diaphragm therein,

The suction side flow path member and the discharge side flow path member have a rod shape together, and are respectively disposed along the flat direction of the pump housing,

It is preferable that the said suction side opening / closing valve and the said discharge side opening / closing valve are respectively arrange | positioned so that it may follow the direction orthogonal to the said suction side flow path member and the said discharge side flow path member, and to follow the flat direction of the said pump housing.

In this configuration, the pump (pump housing) provided with the diaphragm has a thin flat shape along the direction in which the diaphragm is widened. When the rod-shaped suction side flow path member and the discharge side flow path member are disposed along the flat direction of the pump housing, the flow path member does not protrude in the direction orthogonal to the flat direction or does not protrude significantly. Further, when the suction side on-off valve and the discharge-side on-off valve are arranged in the direction orthogonal to the suction side flow path member and the discharge side flow path member and along the flat direction of the pump housing, the on-off valve is orthogonal to the flat direction. It does not protrude in a direction, or protrudes large, and it can be set as the structure which does not protrude large also in a flat direction. As a result, miniaturization including thinning of the pump unit can be achieved.

In any of the above configurations, it is preferable to integrally provide a suckback valve for introducing a predetermined amount of the chemical liquid in the discharge passage downstream of the discharge side on / off valve.

The seat back valve is a valve that needs to be provided on the downstream side of the discharge side on / off valve (for example, the most downstream part of the chemical liquid flow path), and is likely to be disposed in the treatment tank. By providing such a seat back valve integrally with the pump unit for chemical liquid supply, piping and a joint for connecting the seat back valve can be omitted. Therefore, compared with the case where the seat back valves are provided separately, omission of piping, joints, and the like, and the size of the pump unit for chemical liquid supply can be reduced. In connection with this, this seat back valve can also contribute to the miniaturization (thinning) of a pump unit if it arrange | positions along the flat direction of a pump like the opening-closing valve of the said structure.

Further, in any of the above configurations, at least one of the valves is operated by supplying and supplying working air, and integrally installing at least one of the electric regulators for controlling the working air. It is desirable to.

For example, when there is a space for arranging an electropneumatic regulator in the vicinity of the pump unit for chemical liquid supply, which controls the operating air for operating the respective valves, the electropneumatic regulator is integrally installed in the pump unit. The number of parts that can be installed can be reduced. In connection with this, if this electric regulator is also arrange | positioned along the flat direction of a pump, it can contribute to miniaturization (thinning) of a pump unit.

1 is a front sectional view showing a pump unit in a chemical liquid supply system.

2 is a side cross-sectional view of the pump unit, and b is an enlarged cross-sectional view of a.

3 is a circuit explanatory diagram showing an entire circuit of a chemical liquid supply system.

Explanation of the sign

11 pump

13 Suction side shut off valve (Suction side shut off valve)

14 Discharge-side shutoff valve

15 seats back valve

17 Suction side flow path member

17a suction passage

18 Outflow channel member

18a discharge passage

21, 22 pump housing

21b Suction Passage

21c discharge passage

25 pump rooms

33, 34 seal ring

33a, 34a inner circumference

L1 straight

R resist liquid

EMBODIMENT OF THE INVENTION Hereinafter, one Embodiment which actualized this invention with the pump unit of the chemical liquid supply system used in manufacturing lines, such as a semiconductor device, is demonstrated according to drawing. 1 and 2 also show the pump unit 10 which is the main part of the system, and FIG. 3 shows the whole chemical supply system.

As shown in FIGS. 1 and 2, the pump unit 10 includes a pump 11, an electromagnetic switching valve 12, a suction side shutoff valve 13, a discharge side shutoff valve 14, and a seat back valve ( 15) The regulator device 16, the suction side flow path member 17, and the discharge side flow path member 18 are integrally provided and unitized.

The pump 11 has a substantially square, thin, flat square shape in front, and has a pair of pump housings 21 and 22. In each of the pump housings 21 and 22, recesses 21a and 22a formed in a concave shape in a substantially circular dome shape are formed in the center of the opposing surfaces. The pump housings 21 and 22 sandwich the edges of the diaphragms 23 made of a flexible film such as a circular fluorine resin on the edges of the recesses 21a and 22a, and are fixed by eight screws 24 to each other. It is.

The diaphragm 23 divides the space formed in the both recessed parts 21a and 22a of the pump housings 21 and 22, and has the pump housing 21 side (left side of the diaphragm 23 in FIG. 2). The space is used as the pump chamber 25, and the space at the pump housing 22 side (the right side of the diaphragm 23 in FIG. 2) is used as the operation chamber 26. The pump chamber 25 is a space for supplying and supplying the resist liquid R (see FIG. 3) as a chemical liquid, and the operation chamber 26 is a space for supplying and supplying operating air for driving the diaphragm 23.

In the pump housing 21 on the side of the pump chamber 25, a suction passage 21b is formed which communicates with the pump chamber 25 and extends in a straight line in the downward direction. The suction passage 21b communicates with the suction passage 17a of the suction side passage member 17. In addition, the pump housing 21 is provided with a discharge passage 21c communicating with the pump chamber 25 and extending in a straight line in the upward direction. The discharge passage 21c communicates with the discharge passage 18a of the suction side flow passage member 18. The discharge passage 21c is provided on the same straight line L1 as the suction passage 21b. In addition, since the pump chamber 25 of this embodiment is formed in a thin space in the thickness direction of the diaphragm 23, the vicinity of the suction passage 21b and the discharge passage 21c which communicate with such a pump chamber 25 is shown. Only the portions necessary for this connection (about the width of the passage) are bent at right angles (see FIG. 2). The flow of the resist liquid R in this portion is smooth, and does not significantly affect (resist) the flow of the resist liquid R in the pump 11.

In the pump housing 22 on the operation chamber 26 side, a supply passage 22b for supplying and supplying the working air in the operation chamber 26 is formed. The supply and distribution path 22b is connected to the electromagnetic switching valve 12 fixed to the pump housing 22. Here, as shown in FIG. 3, the electromagnetic switching valve 12 is connected to the supply source 29 using the air supply pipe 28 which has the electro-pneumatic regulator 27 on the way. The electric regulator 27 is configured to be controlled by the controller 50 so that the exhaust port is opened to the atmosphere, and the pressure of the working air supplied from the supply source 29 to the pump 11 becomes a constant set pressure. Then, the electromagnetic switching valve 12 is switched by the controller 50 in which the operating chamber 26 is connected to the air supply pipe 28 or in the air opening. The switching operation is performed to the operating chamber 26 by the switching operation. The working air is rapidly discharged and the discharge and suction operation of the pump 11 is switched.

As a result, when operating air is supplied to the operating chamber 26 by the operation of the electromagnetic switching valve 12, the operating chamber 26 is pressurized to operate the diaphragm 23 toward the pump chamber 25, and the pump chamber 25 The filled resist liquid R is discharged downstream using the discharge passage 21c. On the other hand, when the operating air in the operating chamber 26 is discharged to the atmosphere by the operation of the electromagnetic switching valve 12, the diaphragm 26, which was operating toward the pump chamber 25, operates toward the operating chamber 26, Returning, the resist liquid R is introduced into the pump chamber 25 using the suction passage 21b on the upstream side.

In the lower center of the pump housing 21, 22, the suction side flow-path member 17 in a rod shape is fixed. The suction side flow path member 17 is provided along the flat direction of the pump 11. The suction passage 17a is formed in the suction side flow path member 17 extending in a substantially straight state in the downward direction. This suction passage 17a is provided on a substantially straight line L1 with the suction passage 21b of the pump 11. Moreover, on the opposing surface of the suction side flow path member 17 with the pump housing 21, an accommodation recess 17b is formed around the suction passage 17a, and the accommodation ring 17b has a seal ring. 33 is housed. The seal ring 33 is interposed between the suction side flow path member 17 and the pump housing 21 so that the resist liquid R in the suction paths 17a and 21b does not leak in the gap between both members. Seal it.

In addition, the seal ring 33 has a shape in which the inner circumferential surface 33a is smoothly continuous with the inner circumferential surface of each suction passage 17a, 21b, and specifically, the inner circumferential surface 33a is each suction passage 17a, 21b. It is continuous with the inner circumferential surface of the circumferential surface), and the concave portion is gradually deepened in the radial direction as it is directed toward the center portion from the passages 17a and 21b in the thickness direction of the seal ring 33. As a result, the flow of the resist liquid R in the portion of the seal ring 33 is smoothed, and the resist liquid R and bubbles are prevented from remaining. In this regard, in the case of using a generally used circular cross-shaped seal ring (O-ring), an acute angle is formed between the seal ring and each suction passage 17a, 21b, and thus the passages 17a, 21b. Since it becomes a shape which does not connect smoothly with the inner peripheral surface of), it becomes a part in which resist liquid R and a bubble remain, and are unpreferable. Then, the suction side flow path member 17 is continuous with one end of the suction pipe 31, as shown in Fig. 3, by using the joint 19 provided at the distal end, and the other end of the suction pipe 31. Silver is introduced into the resist liquid R filled in the resist bottle 30. In addition, the resist bottle 30 is pressurized by the pressurization apparatus which is not shown in figure.

Moreover, the suction side shut-off valve 13 which consists of an air operated valve is integrally provided in the suction side flow path member 17. As shown in FIG. The suction side shutoff valve 13 has a substantially rectangular columnar shape, and is in a direction orthogonal to the suction side flow path member 17 and along the flat direction of the pump 11 (pump housings 21 and 22). Is installed. Here, as shown in FIG. 3, the suction side shut-off valve 13 switches off and opens the suction passage 17a by a switching operation of the electric regulator 32 based on the control of the controller 50. Do it. That is, as shown in FIG. 1, when the inlet-side shutoff valve 13 is opened to the atmosphere by the switching operation of the electric regulator 32, the valve body 13b opens the spring 13c. When the suction passage 17a is interrupted by applying the force from, and the draft air is supplied from the supply source 29 to the supply / discharge chamber 13a, the valve body 13b is introduced against the force of the spring 13c. It is configured to open the suction passage 17a. In addition, the suction passage 17a in the vicinity of the valve main body 13b is bent at a right angle only for a portion (a passage width) necessary for reliably opening or closing the valve main body 13b. Also in this part, the flow of the resist liquid R is smooth and does not significantly affect (resist) the flow of the resist liquid R in the flow path member 17.

In the upper center of the pump housing 21, 22, the discharge side flow path member 18 which has a rod shape is fixed. The discharge side flow path member 18 is provided along the flat direction of the pump 11. In the discharge-side flow path member 18, a discharge passage 18a extending in a substantially straight state in the upward direction is formed. This discharge passage 18a is provided on a substantially straight line L1 with the discharge passage 21c of the pump 11. Moreover, on the opposite surface of the discharge side flow path member 18 with the pump housing 21, an accommodating recess 18b is formed around the discharge passage 18a, and the accommodating recess 18b has a seal ring. 34 is housed. The seal ring 34 is interposed between the discharge side flow path member 18 and the pump housing 21 and prevents the resist liquid R in the discharge paths 18a and 21c from leaking out between the members. Seal it.

In addition, the seal ring 34 has a shape in which the inner circumferential surface 34a is smoothly connected to the inner circumferential surfaces of the respective discharge passages 18a and 21c, similarly to the seal ring 33, and the resist liquid R or bubbles is formed. Has a structure to prevent the dwelling. And the discharge side flow path member 18 is connected with the other end of the discharge piping 35 which has the nozzle 35a at one end using the joint 20 provided in the front-end | tip as shown in FIG. The nozzle 35a is disposed at the position where the resist liquid R is dropped to the center position of the semiconductor wafer 37 which is directed downward and is mounted on the rotary plate 36 and rotates simultaneously with the rotary plate 36. have.

In addition, the discharge side flow path member 18 is integrally provided with a discharge side shutoff valve 14 that is an air operated valve. The discharge side shutoff valve 14 has a substantially rectangular columnar shape, and is in a direction orthogonal to the discharge side flow path member 18 and along the flat direction of the pump 11 (pump housings 21 and 22). Is installed. Here, the discharge side shut-off valve 14 is configured similarly to the suction side shut-off valve 13, and as shown in FIG. 3, based on the control of the controller 50 and by the switching operation of the electric regulator 38. Then, the discharge passage 18a is switched off and switched off. That is, as shown in FIG. 1, when the discharge-side shut-off valve 14 is opened to the atmosphere by the switching operation of the electric regulator 38, the valve main body 14b opens the spring 14c. When the discharge passage 18a is interrupted by the force of V, and the operating air is supplied from the supply source 29 to the supply / discharge chamber 14a, the valve body 14b is introduced against the force of the spring 14c. It is configured to open the discharge passage 18a. In addition, the discharge passage 18a in the vicinity of the valve body 14b is bent at right angles to only a portion (a passage width) necessary for reliably opening or closing the valve body 14b. Also in this part, the flow of the resist liquid R is smooth and does not significantly influence (resist) the flow of the resist liquid R in the flow path member 18.

Moreover, the discharge-side flow path member 18 is integrally provided so that the seat back valve 15 which is an air operated valve may be parallel with the said shut-off valve 14 downstream from the discharge-side shut-off valve 14. . Similarly, the seat back valve 15 has a substantially rectangular columnar shape, and is installed in a direction perpendicular to the discharge-side flow path member 18 and along the flat direction of the pump 11 (pump housings 21 and 22). do. Here, as shown in FIG. 3, the seat back valve 15 is based on the control of the controller 50, and by the switching operation of the electric regulator 39, the resist liquid which is in a downstream flow path from the said valve 15 downstream. A predetermined amount of (R) is introduced into the upstream side, and an unexpected drop of the resist liquid R is prevented from the nozzle 35a. That is, as shown in FIG. 1, when the air supply and discharge chamber 15a is opened to the atmosphere by the switching operation of the electric regulator 39, the valve main body 15b is released from the spring 15c. The volume of the volume escalation chamber 18c installed in communication with the discharge passage 18a is increased by receiving the force of V, and a predetermined amount of the resist liquid R is introduced into the volume expansion chamber 18c. On the other hand, when working air is supplied from the supply source 29 to the supply / discharge chamber 15a, the valve main body 15b protrudes against the force of the spring 15c and the volume expansion chamber 18c installed in the discharge passage 18a. It is configured to make small.

Moreover, the regulator device 16 which has a substantially rectangular parallelepiped shape is being fixed to the discharge side flow path member 18 on the opposite side to the discharge side shutoff valve 14 and the seat back valve 15. As shown in FIG. That is, the regulator apparatus 16 is provided with respect to the discharge side flow path member 18 so that it may follow the flat direction of the pump 11. In the regulator device 16, the base member 41 is fixed to the discharge side flow path member 18. A fixing table 42 is fixed to the base member 41, and respective electric regulators 38 and 39 for switching the discharge side shutoff valve 14 and the seat back valve 15 are fixed to the fixing table 42. . The fixing member 42 is provided with a cover member 43 for covering the electric regulators 38 and 39. In addition, the communication paths 45 and 46 which communicate with each electric power regulator 38 and 39 are formed in the fixing stand 42 and the base member 41, respectively, although each communication path 45 and 46 is not shown in figure. The discharge side shutoff valve 14 and the seat back valve 15 communicate with the supply and discharge chambers 14a and 15a, respectively. The electric regulators 38 and 39 supply and discharge the operation air to the supply / exhaust chambers 14a and 15a of the discharge side shutoff valve 14 and the seat back valve 15 based on the control of the controller 50. Shut off valve 14 and seat back valve 15.

In the pump unit 10 configured as described above, the suction passage 17a in the suction side flow path member 17 serving as the flow path of the resist liquid R, the suction passage 21b and the discharge passage in the pump 11 ( 21c and the discharge passage 18a of the discharge-side flow path member 18 are in a straight line and arranged on the same straight line L1. As a result, the pump unit 10 is configured to reduce as much as possible the portion where the resist liquid R or bubbles stay in the flow path of the resist liquid R while keeping the flow length of the resist liquid R as short as possible. It is. Moreover, also in the seal rings 33 and 34, it is set as the structure which reduces as much as possible the part where the resist liquid R and the bubble remain.

As shown in FIG. 3, the controller 50 controls the electro-pneumatic regulator 27 so that the operating air supplied to the pump 11 may become a set pressure, and the electromagnetic switching valve which performs switching operation of the pump 11 is carried out. (12) or the electric regulator (32, 39) for switching the suction side shut-off valve 13, the discharge-side shut-off valve (14) and the seat back valve (15) to be controlled. A series of operations of the supply system is controlled.

That is, when a command to start the operation of the chemical liquid supply system is generated, the controller 50 first controls the electro-pneumatic regulator 32 to switch the suction side shutoff valve 13 to shut off the suction passage 17a. Shall be. As a result, the pump 11 and the resist bottle 30 are blocked. In addition, the controller 50 switches the electromagnetic switching valve 12 and supplies the working air adjusted to the set pressure to the working chamber 26 in the pump 11. As a result, the diaphragm 23 tries to operate toward the pump chamber 25, and pressurizes the resist liquid R filled in the pump chamber 25. In addition, when the resist liquid R is not filled in the pump chamber 25 at the time of initial operation of a system, the inside of the pump chamber 25 is pressurized. At this time, the discharge passage 18a is blocked by the discharge side shutoff valve 14 downstream of the pump 11, and the resist liquid R is not discharged.

Next, the controller 50 controls the electric regulator 38 to switch the discharge side shutoff valve 14 and open the discharge passage 18a, and simultaneously controls the electric regulator 39 to control the seat back valve ( Release of the resist liquid R by 15) is cancelled. At this time, since the resist liquid R in the pump chamber 25 is pressurized by the diaphragm 23, the resist liquid R is discharged from the pump 11, and the resist liquid R is discharged to the discharge passage 18a. A predetermined amount is dropped onto the semiconductor wafer 37 from the nozzle 35a at the distal end of the discharge pipe 35 using.

Next, the controller 50 controls the electrostatic regulator 38 to switch the discharge side shutoff valve 14 to block the discharge passage 18a. As a result, the discharge of the resist liquid R from the nozzle 35a is stopped. In addition, the controller 50 controls the electro-pneumatic regulator 39 to introduce a predetermined amount of the resist liquid R by the seat back valve 15. Prevent dripping.

Next, the controller 50 controls the electropneumatic regulator 32 to switch the suction side shutoff valve 13 to open the suction passage 17a. As a result, the pump 11 and the resist bottle 30 are in communication with each other. In addition, the controller 50 switches the electromagnetic switching valve 12 and opens the operation chamber 26 to the atmosphere. Then, the working air in the operation chamber 26 is discharged to the atmosphere, and the diaphragm 23 returns. In this case, since the inside of the resist bottle 30 is pressurized, the resist liquid R is introduced into the pump chamber 25 and filled based on the return operation of the diaphragm 23. After this, the controller 50 repeats the above operation, and drops the resist liquid R by a fixed amount onto each of the semiconductor wafers 37 which are sequentially conveyed.

Next, the characteristic effect of this embodiment is described.

The pump unit 10 of the present embodiment includes the pump 11 (pump housings) so that the suction passages 17a and 21b and the discharge passages 18a and 21c communicating with the pump chamber 25 are on the same straight line L1. 21, 22), the suction side flow path member 17 and the discharge side flow path member 18 are integrally provided. As a result, the suction side shutoff valve 13 is integrally provided in the suction side flow path member 17, and the discharge side shutoff valve 14 is integrally provided in the discharge side flow path member 18. 11) the pipe between the inlet side shutoff valve 13 and the joint installed thereon, the pipe between the pump 11 and the outlet side shutoff valve 14 and the joint installed thereon can be omitted. 10 is downsized. Therefore, arrangement | positioning of the pump unit 10 in the processing tank is attained, piping length and height difference (long-term difference) downstream of the pump 11 can be made the same in every processing tank, and a difference arises in discharge | emission etc. Is prevented.

In addition, since the suction passages 17a and 21b and the discharge passages 18a and 21c which are in communication with the pump chamber 25 are substantially straight together and are disposed on the same straight line L1, the chemical liquid flow path of the pump unit 10 It is possible to reduce as much as possible the bubble or the part where the chemical liquid stays. Therefore, it is possible to satisfactorily bubble out with a small discharge amount, and the deterioration of the chemical liquid can be reduced.

Furthermore, when the pump unit 10 is installed so that the tip end of the suction side flow path member 17 faces downward, the discharge side flow path member 18 faces upward, and the chemical liquid flow path faces the vertical direction, bubbles in the chemical liquid flow path Since it naturally goes to the discharge side, it is possible to perform bubble extraction better. Therefore, it is preferable to provide such a pump unit 10 of this embodiment.

In the present embodiment, the inner circumferential surfaces 33a and 34a of the seal rings 33 and 34 are each smoothly connected to the inner circumferential surfaces of the passages 17a, 21b, 18a and 21c (each of the seal rings 33 and 34). In the thickness direction, the concave portion is formed to gradually deepen radially outwardly from the passages 17a, 21b, 18a, and 21c toward the center portion. As a result, no sharp-angled recesses are formed between the seal rings 33 and 34 and the passages 17a, 21b, 18a, and 21c, so that the resist liquid R in the portion of the seal rings 33 and 34 flows. This becomes smooth and can prevent the resist liquid R and the bubbles from remaining.

Moreover, in this embodiment, the rod-shaped suction side flow path member 17 and the discharge side flow path member 18 are arranged along the flat direction of the pump 11 (pump housings 21 and 22) having a thin flat shape. Further, the suction side shutoff valve 13 and the discharge side shutoff valve 14 are arranged in a direction orthogonal to the flow path members 17 and 18 and along the flat direction of the pump housing 21 and 22. . Thus, when the rod-shaped flow path members 17 and 18 are arranged along the flat direction of the pump housings 21 and 22, the flow path members 17 and 18 do not protrude in the direction orthogonal to the flat direction. In addition, when the shutoff valves 13 and 14 are arranged in the direction orthogonal to the flow path members 17 and 18 and in the flat direction of the pump housings 21 and 22, the opening / closing valves 13 and 14 are provided. Can not only protrude in the direction orthogonal to a flat direction, but can also be set as the structure which does not protrude large also in a flat direction. Thereby, miniaturization including the thinning of the pump unit 10 can be aimed at.

In addition, since the seat back valve 15 and the electro-pneumatic regulators 38 and 39 are also arranged along the flat direction of the pump 11, the pump unit 10 can be made smaller (thinner). have.

Moreover, the seat back valve 15 is a valve which needs to be provided in the downstream side (lowest part of the chemical liquid flow path) of the discharge side shut-off valve 14, and is likely to be arrange | positioned for every processing tank. In this embodiment, since the seat back valve 15 is integrally provided with the discharge side flow path member 18, the piping and the joint for connecting the seat back valve 15 can be omitted. For this reason, compared with the case where the seat back valve 15 is provided separately, abbreviated parts, such as piping and a joint, and the pump unit 10 can be miniaturized.

In addition, in this embodiment, when there is a space which arrange | positions the electric regulators 38 and 39 which control the working air for operating the discharge side shut-off valve 14 and the seat back valve 15 in the vicinity of the pump unit 10. The electrical regulators 38 and 39 are integrally installed in the pump unit 10, so that the number of parts installed in the chemical liquid supply system can be reduced.

In addition, this invention is not limited to the description content of the said embodiment, For example, you may carry out as follows.

In the said embodiment, although there existed in the pump 11 using the diaphragm 23, the pump using a tube or bellows other than this may be sufficient.

In the said embodiment, although the suction side flow path member 17 and the discharge side flow path member 18 were integrally provided in the pump 11, it corresponds to the suction special flow path member 17 and the discharge side flow path member 18. The portion to be formed may be integrally formed with respect to the pump 11.

In the said embodiment, although the electropneumatic regulators 38 and 39 were integrally provided in the discharge side flow path member 18, you may provide them separately. Alternatively, the electropneumatic regulator 32 for operating the suction side shutoff valve 13 may be integrally provided, for example, on the suction side flow path member 17.

In the above embodiment, the shutoff valves 13 and 14 and the seat back valve 15 are configured as error operated valves operated by the working air, but may be configured as electromagnetically operated valves, motor driven valves, or the like. good.

In the said embodiment, instead of the shutoff valve 14, you may use the opening / closing valve adjustable so that opening / closing speed may become slightly slow.

In the above embodiment, the seat back valve 15 is used, but the seat back valve 15 may be omitted.

In the above embodiment, the solenoid switching valve 12 is configured to connect the operation chamber 26 to the air supply pipe 28 or to switch the air to either of the air openings and the like. good. By using the negative pressure in this way, the suction force of the diaphragm 23 increases at the time of suction of the resist liquid R of the pump 11, so that the pressurization in the resist bottle 30 can be stopped by the above embodiment. Done.

In the above embodiment, the working air (air) has been described as an example, but other gases such as nitrogen may be used in addition to the air.

In the said embodiment, although the example which used the resist liquid R as a chemical liquid was given, this is because the object of dripping of the chemical liquid assumed the semiconductor wafer 37. Therefore, the chemical liquid and the dropping object of the chemical liquid may be other than that.

Claims (6)

A pump having a pump chamber for discharging suction of the chemical liquid, a suction side on / off valve for opening and closing a suction passage communicating with the pump chamber to suck the chemical liquid into the pump chamber, and communicating the pump chamber with the chemical chamber from the pump chamber. In the chemical liquid supply pump unit having a discharge side on-off valve for opening and closing the discharge passage to discharge, The suction passage and the discharge passage are arranged in a substantially straight state together, and are arranged on the same straight line, and the pump, the suction side open / close valve and the discharge side open / close valve are integrally installed. . A pump having a pump chamber for discharging suction of the chemical liquid, a suction side on / off valve for opening and closing a suction passage communicating with the pump chamber to suck the chemical liquid into the pump chamber, and communicating the pump chamber with the chemical chamber from the pump chamber. In the chemical liquid supply pump unit having a discharge side on-off valve for opening and closing the discharge passage to discharge, A suction side flow path member having an internal passage in a substantially straight state and integrally installing the suction side open / close valve, and a discharge side flow passage member having an internal passage in a substantially straight state and integrally installing the discharge side open / close valve. At the same time, The pump is configured to communicate with the inner passage of the substantially straight state constituting the suction passage through the inner passage of the suction side flow passage member and the discharge passage in the pump housing. Has an internal passage in a nearly straight state, And the suction side flow path member and the discharge side flow path member are integrally provided with respect to the pump housing so that the suction passage and the discharge passage are in the same straight line shape. The method of claim 2, Between the pump housing and each of the flow path members, a seal ring is sealed to prevent the chemical liquid in the inner passage from leaking in the gap between both members. The inner circumferential surface of the seal ring is formed in a shape that is smoothly continuous with the inner circumferential surfaces of the inner passages upstream and downstream of the seal ring. The method according to claim 2 or 3, The pump housing has a thin flat state with a diaphragm constituting a part of the pump chamber therein, The suction side flow path member and the discharge side flow path member are rod-shaped together, and are respectively disposed along the flat direction of the pump housing, The suction liquid on / off valve and the discharge side on / off valve are disposed in a direction orthogonal to the suction side flow path member and the discharge side flow path member and along the flat direction of the pump housing, respectively. Pump unit for supply. The method according to any one of claims 1 to 4, A pump unit for chemical liquid supply, characterized in that a downstream seat of said discharge side on / off valve is integrally provided with a seat back valve for introducing a predetermined amount of said chemical liquid in said discharge passage. The method according to any one of claims 1 to 5, At least one of the valves is operated to supply and supply the working air, and the chemical liquid supply pump unit, characterized in that to install at least one of the electrostatic regulator for controlling the working air.

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