CN101814380A - 包含非金属表面处理的固体电解电容的阳极 - Google Patents
包含非金属表面处理的固体电解电容的阳极 Download PDFInfo
- Publication number
- CN101814380A CN101814380A CN200910215415A CN200910215415A CN101814380A CN 101814380 A CN101814380 A CN 101814380A CN 200910215415 A CN200910215415 A CN 200910215415A CN 200910215415 A CN200910215415 A CN 200910215415A CN 101814380 A CN101814380 A CN 101814380A
- Authority
- CN
- China
- Prior art keywords
- pelletizing
- sintering
- anode
- electrolytic capacitor
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003990 capacitor Substances 0.000 title claims abstract description 26
- 239000007787 solid Substances 0.000 title claims abstract description 23
- 238000004381 surface treatment Methods 0.000 title description 3
- 239000007784 solid electrolyte Substances 0.000 claims abstract description 21
- 230000005283 ground state Effects 0.000 claims abstract description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 44
- 238000005245 sintering Methods 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 37
- 238000005453 pelletization Methods 0.000 claims description 37
- 239000002245 particle Substances 0.000 claims description 28
- 238000002048 anodisation reaction Methods 0.000 claims description 23
- 235000011007 phosphoric acid Nutrition 0.000 claims description 22
- 238000000576 coating method Methods 0.000 claims description 20
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 20
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 18
- 229910052758 niobium Inorganic materials 0.000 claims description 18
- 239000000843 powder Substances 0.000 claims description 18
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 17
- 239000010955 niobium Substances 0.000 claims description 16
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 8
- 229910019142 PO4 Inorganic materials 0.000 claims description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 7
- 229920001940 conductive polymer Polymers 0.000 claims description 7
- 238000002156 mixing Methods 0.000 claims description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 7
- 239000010452 phosphate Substances 0.000 claims description 7
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims description 6
- 239000011574 phosphorus Substances 0.000 claims description 6
- 229910052787 antimony Inorganic materials 0.000 claims description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 5
- 239000002322 conducting polymer Substances 0.000 claims description 5
- 229910052785 arsenic Inorganic materials 0.000 claims description 4
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 4
- 230000006835 compression Effects 0.000 claims description 4
- 238000007906 compression Methods 0.000 claims description 4
- 229940037003 alum Drugs 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 abstract 1
- 239000000523 sample Substances 0.000 description 41
- 238000012360 testing method Methods 0.000 description 36
- 239000010410 layer Substances 0.000 description 34
- 239000000243 solution Substances 0.000 description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 22
- 229910000484 niobium oxide Inorganic materials 0.000 description 21
- 239000000463 material Substances 0.000 description 15
- 229910052739 hydrogen Inorganic materials 0.000 description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 11
- 230000001070 adhesive effect Effects 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 11
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 239000012298 atmosphere Substances 0.000 description 10
- 229910002804 graphite Inorganic materials 0.000 description 10
- 239000010439 graphite Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 9
- 239000003792 electrolyte Substances 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 9
- 239000000178 monomer Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- -1 vacuum for example Substances 0.000 description 8
- ROSDCCJGGBNDNL-UHFFFAOYSA-N [Ta].[Pb] Chemical compound [Ta].[Pb] ROSDCCJGGBNDNL-UHFFFAOYSA-N 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 7
- 239000008367 deionised water Substances 0.000 description 7
- 238000007598 dipping method Methods 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000008188 pellet Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000000314 lubricant Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 235000019198 oils Nutrition 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 241001076960 Argon Species 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 235000013876 argon Nutrition 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 150000008040 ionic compounds Chemical class 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 229940005657 pyrophosphoric acid Drugs 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- 101100518972 Caenorhabditis elegans pat-6 gene Proteins 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical class CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N glycerol Substances OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- BFRGSJVXBIWTCF-UHFFFAOYSA-N niobium monoxide Inorganic materials [Nb]=O BFRGSJVXBIWTCF-UHFFFAOYSA-N 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 229920000128 polypyrrole Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004513 sizing Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 239000012178 vegetable wax Substances 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical compound C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- JSYPRLVDJYQMAI-ODZAUARKSA-N (z)-but-2-enedioic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)\C=C/C(O)=O JSYPRLVDJYQMAI-ODZAUARKSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- XXXFZKQPYACQLD-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl acetate Chemical compound CC(=O)OCCOCCO XXXFZKQPYACQLD-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- WXHLLJAMBQLULT-UHFFFAOYSA-N 2-[[6-[4-(2-hydroxyethyl)piperazin-1-yl]-2-methylpyrimidin-4-yl]amino]-n-(2-methyl-6-sulfanylphenyl)-1,3-thiazole-5-carboxamide;hydrate Chemical compound O.C=1C(N2CCN(CCO)CC2)=NC(C)=NC=1NC(S1)=NC=C1C(=O)NC1=C(C)C=CC=C1S WXHLLJAMBQLULT-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- OYHQOLUKZRVURQ-HZJYTTRNSA-M 9-cis,12-cis-Octadecadienoate Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC([O-])=O OYHQOLUKZRVURQ-HZJYTTRNSA-M 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- BYHTWCCOYRWZIB-UHFFFAOYSA-N B(O)O.BO Chemical compound B(O)O.BO BYHTWCCOYRWZIB-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 101100232929 Caenorhabditis elegans pat-4 gene Proteins 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 241000723346 Cinnamomum camphora Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N Decanoic acid Natural products CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- 241000790917 Dioxys <bee> Species 0.000 description 1
- MEHUJCGAYMDLEL-UHFFFAOYSA-N Ethyl-triacetylaleuritat Natural products OCCCCCCC(O)C(O)CCCCCCCC(O)=O MEHUJCGAYMDLEL-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- 244000068988 Glycine max Species 0.000 description 1
- 235000010469 Glycine max Nutrition 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000000783 alginic acid Substances 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 229960001126 alginic acid Drugs 0.000 description 1
- 150000004781 alginic acids Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000005600 alkyl phosphonate group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229960004050 aminobenzoic acid Drugs 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 235000003704 aspartic acid Nutrition 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229940125717 barbiturate Drugs 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- MVIOINXPSFUJEN-UHFFFAOYSA-N benzenesulfonic acid;hydrate Chemical compound O.OS(=O)(=O)C1=CC=CC=C1 MVIOINXPSFUJEN-UHFFFAOYSA-N 0.000 description 1
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 1
- 229960000846 camphor Drugs 0.000 description 1
- 229930008380 camphor Natural products 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- POULHZVOKOAJMA-UHFFFAOYSA-M dodecanoate Chemical compound CCCCCCCCCCCC([O-])=O POULHZVOKOAJMA-UHFFFAOYSA-M 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 150000002190 fatty acyls Chemical group 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 125000005456 glyceride group Chemical group 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- IPCSVZSSVZVIGE-UHFFFAOYSA-M hexadecanoate Chemical compound CCCCCCCCCCCCCCCC([O-])=O IPCSVZSSVZVIGE-UHFFFAOYSA-M 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- WFKAJVHLWXSISD-UHFFFAOYSA-N isobutyramide Chemical compound CC(C)C(N)=O WFKAJVHLWXSISD-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229940070765 laurate Drugs 0.000 description 1
- 229940049918 linoleate Drugs 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-M linolenate Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC([O-])=O DTOSIQBPPRVQHS-PDBXOOCHSA-M 0.000 description 1
- 229940040452 linolenate Drugs 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000004200 microcrystalline wax Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229940105132 myristate Drugs 0.000 description 1
- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002821 niobium Chemical class 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 239000004006 olive oil Substances 0.000 description 1
- 235000008390 olive oil Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N phthalic anhydride Chemical compound C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 235000020777 polyunsaturated fatty acids Nutrition 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- YARNEMCKJLFQHG-UHFFFAOYSA-N prop-1-ene;styrene Chemical compound CC=C.C=CC1=CC=CC=C1 YARNEMCKJLFQHG-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000003340 retarding agent Substances 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- DAJSVUQLFFJUSX-UHFFFAOYSA-M sodium;dodecane-1-sulfonate Chemical compound [Na+].CCCCCCCCCCCCS([O-])(=O)=O DAJSVUQLFFJUSX-UHFFFAOYSA-M 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 229960005137 succinic acid Drugs 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- TUNFSRHWOTWDNC-UHFFFAOYSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- UFTFJSFQGQCHQW-UHFFFAOYSA-N triformin Chemical compound O=COCC(OC=O)COC=O UFTFJSFQGQCHQW-UHFFFAOYSA-N 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- 229940048102 triphosphoric acid Drugs 0.000 description 1
- 239000002383 tung oil Substances 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/0029—Processes of manufacture
- H01G9/0032—Processes of manufacture formation of the dielectric layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/008—Terminals
- H01G9/012—Terminals specially adapted for solid capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/07—Dielectric layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/15—Solid electrolytic capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
样本 | DCL[μA] | 在85℃/16V下进行寿命测试后的DCL拒绝的数目 | 105℃/10.56V下进行寿命测试后的DCL拒绝的数目 | 125℃/10.56V下进行寿命测试后的DCL拒绝的数目 |
对照 | 0.13 | 20rej.,5SC | 18rej.,7SC | 25SC |
1 | 0.09 | 17rej.,8SC | 5rej. | 7rej.,17SC |
2 | 0.11 | 15rej.,10SC | 11rej. | 4rej.,21SC |
样本 | DCL[μA] | 在85℃/16V下进行寿命测试后的DCL拒绝的数目 | 105℃/10.56V下进行寿命测试后的DCL拒绝的数目 | 在125℃/10.56V下进行寿命测试后的DCL拒绝的数目 |
对照 | 7.34 | 2rej.,23SC | 25SC | 5rej.,18SC |
3 | 5.41 | 1rej.,24SC | 3rej.,13SC | 25SC |
4 | 3.93 | 1rej.,2SC | 25SC | 8rej.,16SC |
样本 | DCL[μA] | 在85℃/16V下进行寿命测试后的DCL拒绝的数目 | 105℃/10.56V下进行寿命测试后的DCL拒绝的数目 | 在125℃/10.56V下进行寿命测试后的DCL拒绝的数目 |
对照 | 0.10 | 25SC | 25SC | 25SC |
6 | 0.14 | 25SC | 25SC | 23SC |
样本 | DCL[μA] | 在85℃/16v下进行寿命测试后的DCL拒绝的数目 | 105℃/10.56V下进行寿命测试后的DCL拒绝的数目 | 在125℃/10.56V下进行寿命测试后的DCL拒绝的数目 |
对照 | 0.10 | 25SC | 21SC,4LI | 21SC,1LI |
7 | 0.09 | N/A | N/A | N/A |
样本 | DCL[μA] | 在85℃/16V下进行寿命测试后的DCL拒绝的数目 | 105℃/10.56V下进行寿命测试后的DCL拒绝的数目 | 在125℃/10.56V下进行寿命测试后的DCL拒绝的数目 |
对照 | 12.38 | Burnt | 4rej.,21SC | 3rej.,21SC |
8 | 7.61 | 0rej,1SC | 16rej,8SC | 2rej,23SC |
样本 | DCL[μA] | 在85℃/16V下进行寿命测试后的DCL拒绝的数目 | 105℃/10.56V下进行寿命测试后的DCL拒绝的数目 | 在125℃/10.56V下进行寿命测试后的DCL拒绝的数目 |
9 | 3.45 | 4rej,0SC | 25SC | 19rej,5SC |
10 | 1.63 | 13rej,7SC | 23LI | 13rej,7SC |
11 | 2.33 | Burnt | 23rej.,1SC | 3rej.,8SC |
样本 | DCL[μA] | 在40℃/4V下进行寿命测试后的DCL拒绝的数目 | 在85℃/2V下进行寿命测试后的DCL拒绝的数目 | 在125℃/2V下进行寿命测试后的DCL拒绝的数目 |
对照 | 3.27 | 0rejects | 0rejects | 0rejects |
12 | 5.02 | 0rejects | 1LI | 0rejects |
Claims (35)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/389,783 US8203827B2 (en) | 2009-02-20 | 2009-02-20 | Anode for a solid electrolytic capacitor containing a non-metallic surface treatment |
US12/389,783 | 2009-02-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101814380A true CN101814380A (zh) | 2010-08-25 |
CN101814380B CN101814380B (zh) | 2014-04-02 |
Family
ID=41502102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200910215415.XA Expired - Fee Related CN101814380B (zh) | 2009-02-20 | 2009-12-25 | 包含非金属表面处理的固体电解电容的阳极 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8203827B2 (zh) |
JP (1) | JP2010199572A (zh) |
KR (1) | KR20100095358A (zh) |
CN (1) | CN101814380B (zh) |
DE (1) | DE102010008506A1 (zh) |
GB (1) | GB2467996A (zh) |
HK (1) | HK1144852A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102842432A (zh) * | 2012-08-31 | 2012-12-26 | 深圳顺络电子股份有限公司 | 电解电容的阳极体的制作方法 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007020458A1 (en) * | 2005-08-19 | 2007-02-22 | Avx Limited | Polymer based solid state capacitors and a method of manufacturing them |
US8213158B2 (en) * | 2007-09-28 | 2012-07-03 | Sanyo Electric Co., Ltd. | Solid electrolytic capacitor and its production method |
US8947857B2 (en) * | 2011-04-07 | 2015-02-03 | Avx Corporation | Manganese oxide capacitor for use in extreme environments |
US8741214B2 (en) | 2011-10-17 | 2014-06-03 | Evans Capacitor Company | Sintering method, particularly for forming low ESR capacitor anodes |
US9941055B2 (en) * | 2012-02-27 | 2018-04-10 | Kemet Electronics Corporation | Solid electrolytic capacitor with interlayer crosslinking |
US10204737B2 (en) | 2014-06-11 | 2019-02-12 | Avx Corporation | Low noise capacitors |
CN104377039B (zh) * | 2014-11-06 | 2017-08-25 | 中国振华(集团)新云电子元器件有限责任公司 | 一种避免钽电容器损耗角正切值超差的方法 |
US10381165B2 (en) | 2016-05-20 | 2019-08-13 | Avx Corporation | Solid electrolytic capacitor for use at high temperatures |
US10431389B2 (en) | 2016-11-14 | 2019-10-01 | Avx Corporation | Solid electrolytic capacitor for high voltage environments |
US10832871B2 (en) | 2016-11-14 | 2020-11-10 | Avx Corporation | Wet electrolytic capacitor for an implantable medical device |
US10643797B2 (en) | 2016-11-15 | 2020-05-05 | Avx Corporation | Casing material for a solid electrolytic capacitor |
US10475591B2 (en) * | 2016-11-15 | 2019-11-12 | Avx Corporation | Solid electrolytic capacitor for use in a humid atmosphere |
US10504657B2 (en) | 2016-11-15 | 2019-12-10 | Avx Corporation | Lead wire configuration for a solid electrolytic capacitor |
US11004615B2 (en) | 2017-12-05 | 2021-05-11 | Avx Corporation | Solid electrolytic capacitor for use at high temperatures |
US10957493B2 (en) | 2017-12-05 | 2021-03-23 | Avx Corporation | Wet electrolytic capacitor for an implantable medical device |
EP3811390A4 (en) | 2018-06-21 | 2022-05-04 | KYOCERA AVX Components Corporation | SOLID ELECTROLYTE CAPACITOR WITH STABLE ELECTRICAL PROPERTIES AT HIGH TEMPERATURES |
CN113678217B (zh) | 2019-05-17 | 2023-06-23 | 京瓷Avx元器件公司 | 抗分层固体电解电容器 |
JP7417714B2 (ja) | 2019-09-18 | 2024-01-18 | キョーセラ・エイブイエックス・コンポーネンツ・コーポレーション | バリヤ被覆を含む固体電解キャパシタ |
WO2022066722A1 (en) * | 2020-09-23 | 2022-03-31 | Avx Corporation | Solid electrolytic capacitor containing a deoxidized anode |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6751086B2 (en) * | 2001-08-30 | 2004-06-15 | Ikuo Matsumoto | Structure of surface-mounting solid electrolytic capacitor and method of making the same |
CN1610027A (zh) * | 2003-10-17 | 2005-04-27 | H.C.施塔克股份有限公司 | 带有聚合外层的电解电容器 |
US20050225927A1 (en) * | 2004-04-06 | 2005-10-13 | Tagusagawa Solon Y | Processes for the production of niobium oxides with controlled tantalum content and capacitors made therefrom |
WO2005096332A1 (ja) * | 2004-03-30 | 2005-10-13 | Rohm Co., Ltd. | 固体電解コンデンサ |
CN101419866A (zh) * | 2007-10-22 | 2009-04-29 | Avx公司 | 用于形成电容器阳极的掺杂陶瓷粉末 |
Family Cites Families (91)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3345545A (en) * | 1964-11-27 | 1967-10-03 | Johnson Matthey & Mallory Ltd | Solid electrolytic capacitor having minimum anode impedance |
US4085435A (en) * | 1976-06-14 | 1978-04-18 | Avx Corporation | Tantalum chip capacitor |
US4009007A (en) | 1975-07-14 | 1977-02-22 | Fansteel Inc. | Tantalum powder and method of making the same |
JPS52139993A (en) * | 1976-05-18 | 1977-11-22 | Toshiba Corp | Preparation of dielectric layer |
JPS52139947A (en) * | 1976-05-18 | 1977-11-22 | Tokyo Shibaura Electric Co | Method of manufacturing solid state electrolytic capacitor |
US4084965A (en) * | 1977-01-05 | 1978-04-18 | Fansteel Inc. | Columbium powder and method of making the same |
US4118727A (en) * | 1977-09-09 | 1978-10-03 | The United States Of America As Represented By The Secretary Of The Army | MOX multi-layer switching device comprising niobium oxide |
US4155017A (en) * | 1977-11-09 | 1979-05-15 | The United States Of America As Represented By The Secretary Of The Army | Sharpening high power pulses |
US4131520A (en) * | 1977-11-10 | 1978-12-26 | Sprague Electric Company | Two-stage anodization of capacitor electrodes |
US4149876A (en) * | 1978-06-06 | 1979-04-17 | Fansteel Inc. | Process for producing tantalum and columbium powder |
US4278513A (en) * | 1980-06-30 | 1981-07-14 | Sprague Electric Company | Two-stage differential anodization process |
CA1168762A (en) * | 1981-06-22 | 1984-06-05 | Osamu Michikami | Method of fabrication for josephson tunnel junction |
SU1057995A1 (ru) | 1981-12-05 | 1983-11-30 | Предприятие П/Я А-3529 | Способ изготовлени объемно-пористого анода электролитического конденсатора |
US4712857A (en) * | 1985-03-28 | 1987-12-15 | Honeywell Inc. | NO2 thin film electro-optic switch |
US4672267A (en) * | 1986-04-04 | 1987-06-09 | Gte Laboratories Incorporated | High intensity discharge device containing oxytrihalides |
JPS62268121A (ja) | 1986-05-16 | 1987-11-20 | 日立エーアイシー株式会社 | 電解コンデンサ用電解液 |
US4722756A (en) * | 1987-02-27 | 1988-02-02 | Cabot Corp | Method for deoxidizing tantalum material |
EP0287325B1 (en) * | 1987-04-13 | 1994-07-27 | Hitachi, Ltd. | Superconducting material and process for producing the same |
US4957541A (en) | 1988-11-01 | 1990-09-18 | Nrc, Inc. | Capacitor grade tantalum powder |
US4960471A (en) | 1989-09-26 | 1990-10-02 | Cabot Corporation | Controlling the oxygen content in tantalum material |
US4945452A (en) * | 1989-11-30 | 1990-07-31 | Avx Corporation | Tantalum capacitor and method of making same |
US5098485A (en) * | 1990-09-19 | 1992-03-24 | Evans Findings Company | Method of making electrically insulating metallic oxides electrically conductive |
JPH06104206B2 (ja) | 1990-11-27 | 1994-12-21 | 株式会社栗本鐵工所 | 連続式エアスエプト型遊星ボールミル |
US5198187A (en) * | 1991-11-20 | 1993-03-30 | University Of Florida | Methods for production of surface coated niobium reinforcements for intermetallic matrix composites |
US5198968A (en) * | 1992-07-23 | 1993-03-30 | Avx Corporation | Compact surface mount solid state capacitor and method of making same |
US5357399A (en) * | 1992-09-25 | 1994-10-18 | Avx Corporation | Mass production method for the manufacture of surface mount solid state capacitor and resulting capacitor |
US5306479A (en) * | 1992-11-20 | 1994-04-26 | Teledyne Industries, Inc. (California Corp.) | Process for synthesizing niobium dioxide and mixed metal oxides containing niobium |
US5394295A (en) * | 1993-05-28 | 1995-02-28 | Avx Corporation | Manufacturing method for solid state capacitor and resulting capacitor |
JP2765462B2 (ja) * | 1993-07-27 | 1998-06-18 | 日本電気株式会社 | 固体電解コンデンサおよびその製造方法 |
US5495386A (en) * | 1993-08-03 | 1996-02-27 | Avx Corporation | Electrical components, such as capacitors, and methods for their manufacture |
JPH07135126A (ja) * | 1993-11-10 | 1995-05-23 | Nec Corp | 固体電解コンデンサ及びその製造方法 |
JP2904392B2 (ja) | 1993-12-17 | 1999-06-14 | 株式会社栗本鐵工所 | 竪型連続遊星ボールミル |
JP3068430B2 (ja) * | 1995-04-25 | 2000-07-24 | 富山日本電気株式会社 | 固体電解コンデンサ及びその製造方法 |
DE69704110T2 (de) | 1996-03-08 | 2001-07-19 | Du Pont | Verbesserte fluidenergie-mühle |
US5812367A (en) * | 1996-04-04 | 1998-09-22 | Matsushita Electric Industrial Co., Ltd. | Solid electrolytic capacitors comprising a conductive layer made of a polymer of pyrrole or its derivative |
US5993513A (en) | 1996-04-05 | 1999-11-30 | Cabot Corporation | Method for controlling the oxygen content in valve metal materials |
JPH09306792A (ja) | 1996-05-13 | 1997-11-28 | Matsushita Electric Ind Co Ltd | 固体電解コンデンサの製造方法 |
JP3863232B2 (ja) * | 1996-09-27 | 2006-12-27 | ローム株式会社 | 固体電解コンデンサに使用するコンデンサ素子の構造及びコンデンサ素子におけるチップ体の固め成形方法 |
US6165623A (en) * | 1996-11-07 | 2000-12-26 | Cabot Corporation | Niobium powders and niobium electrolytic capacitors |
GB9700566D0 (en) * | 1997-01-13 | 1997-03-05 | Avx Ltd | Binder removal |
DE59801634D1 (de) * | 1997-02-19 | 2001-11-08 | Starck H C Gmbh Co Kg | Tantal-pulver, verfahren zu seiner herstellung, sowie daraus erhältliche sinteranoden |
JP3254163B2 (ja) * | 1997-02-28 | 2002-02-04 | 昭和電工株式会社 | コンデンサ |
US6051326A (en) * | 1997-04-26 | 2000-04-18 | Cabot Corporation | Valve metal compositions and method |
US6051044A (en) * | 1998-05-04 | 2000-04-18 | Cabot Corporation | Nitrided niobium powders and niobium electrolytic capacitors |
US6416730B1 (en) * | 1998-09-16 | 2002-07-09 | Cabot Corporation | Methods to partially reduce a niobium metal oxide oxygen reduced niobium oxides |
US6391275B1 (en) * | 1998-09-16 | 2002-05-21 | Cabot Corporation | Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides |
US6322912B1 (en) * | 1998-09-16 | 2001-11-27 | Cabot Corporation | Electrolytic capacitor anode of valve metal oxide |
US6462934B2 (en) * | 1998-09-16 | 2002-10-08 | Cabot Corporation | Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides |
US6072694A (en) * | 1998-09-30 | 2000-06-06 | Kemet Electronics Corporation | Electrolytic capacitor with improved leakage and dissipation factor |
BR0009107A (pt) * | 1999-03-19 | 2002-12-31 | Cabot Corp | Método para produzir pó de nióbio e outros pós metálicos através de moagem |
US6191936B1 (en) * | 1999-04-12 | 2001-02-20 | Vishay Sprague, Inc. | Capacitor having textured pellet and method for making same |
US6375704B1 (en) * | 1999-05-12 | 2002-04-23 | Cabot Corporation | High capacitance niobium powders and electrolytic capacitor anodes |
US6483694B1 (en) * | 1999-06-22 | 2002-11-19 | Showa Denko Kabushiki Kaisha | Electrode for electrolytic capacitor, electrolytic capacitor, and manufacturing method therefor |
US6126097A (en) | 1999-08-21 | 2000-10-03 | Nanotek Instruments, Inc. | High-energy planetary ball milling apparatus and method for the preparation of nanometer-sized powders |
DE19953946A1 (de) * | 1999-11-09 | 2001-05-10 | Starck H C Gmbh Co Kg | Kondensatorpulver |
US6563695B1 (en) * | 1999-11-16 | 2003-05-13 | Cabot Supermetals K.K. | Powdered tantalum, niobium, production process thereof, and porous sintered body and solid electrolytic capacitor using the powdered tantalum or niobium |
US6576099B2 (en) * | 2000-03-23 | 2003-06-10 | Cabot Corporation | Oxygen reduced niobium oxides |
CN100339917C (zh) * | 2000-04-21 | 2007-09-26 | 昭和电工株式会社 | 铌烧结体及其生产方法以及使用这种铌烧结体的电容器 |
US6643120B2 (en) * | 2000-04-28 | 2003-11-04 | Showa Denko Kabushiki Kaisha | Niobium powder for capacitor, sintered body using the powder and capacitor using the same |
JP2004513514A (ja) * | 2000-11-06 | 2004-04-30 | キャボット コーポレイション | 酸素を低減した改質バルブ金属酸化物 |
US6455443B1 (en) * | 2001-02-21 | 2002-09-24 | International Business Machines Corporation | Method of fabricating low-dielectric constant interlevel dielectric films for BEOL interconnects with enhanced adhesion and low-defect density |
US7149074B2 (en) * | 2001-04-19 | 2006-12-12 | Cabot Corporation | Methods of making a niobium metal oxide |
JP4010868B2 (ja) * | 2001-05-15 | 2007-11-21 | 昭和電工株式会社 | ニオブ粉、ニオブ焼結体及びニオブ焼結体を用いたコンデンサ |
JP2002367867A (ja) * | 2001-06-06 | 2002-12-20 | Matsushita Electric Ind Co Ltd | 固体電解コンデンサ用電極部材とその製造方法及びこれを用いた固体電解コンデンサ |
US6674635B1 (en) * | 2001-06-11 | 2004-01-06 | Avx Corporation | Protective coating for electrolytic capacitors |
DE10307716B4 (de) * | 2002-03-12 | 2021-11-18 | Taniobis Gmbh | Ventilmetall-Pulver und Verfahren zu deren Herstellung |
JP4727160B2 (ja) * | 2003-04-28 | 2011-07-20 | 昭和電工株式会社 | 弁作用金属焼結体、その製造方法及び固体電解コンデンサ |
US7157073B2 (en) * | 2003-05-02 | 2007-01-02 | Reading Alloys, Inc. | Production of high-purity niobium monoxide and capacitor production therefrom |
CN1549286A (zh) | 2003-05-08 | 2004-11-24 | 中南大学 | 一氧化铌电解电容器阳极及其制造方法 |
DE502004011120D1 (de) * | 2003-07-15 | 2010-06-17 | Starck H C Gmbh | Niobsuboxidpulver |
DE10333156A1 (de) * | 2003-07-22 | 2005-02-24 | H.C. Starck Gmbh | Verfahren zur Herstellung von Niobsuboxid |
DE10347702B4 (de) * | 2003-10-14 | 2007-03-29 | H.C. Starck Gmbh | Sinterkörper auf Basis Niobsuboxid |
JP3731596B2 (ja) * | 2003-10-20 | 2006-01-05 | 松下電器産業株式会社 | 固体電解コンデンサの製造方法 |
CN1879181B (zh) | 2003-11-10 | 2012-11-14 | 昭和电工株式会社 | 用于电容器的铌粉、铌烧结体和电容器 |
TWI239542B (en) * | 2003-12-26 | 2005-09-11 | Ind Tech Res Inst | Solid-state, electrolytic capacitor, fabrication method thereof, and coupling agent used therefor |
US7803235B2 (en) * | 2004-01-08 | 2010-09-28 | Cabot Corporation | Passivation of tantalum and other metal powders using oxygen |
JP4275044B2 (ja) | 2004-02-04 | 2009-06-10 | 三洋電機株式会社 | 固体電解コンデンサおよびその製造方法 |
JP2005251808A (ja) * | 2004-03-01 | 2005-09-15 | Japan Science & Technology Agency | ニオブを用いた固体電解コンデンサ |
DE102004011214A1 (de) * | 2004-03-04 | 2005-10-06 | W.C. Heraeus Gmbh | Hochtemperaturbeständiger Niob-Draht |
JP2005303062A (ja) * | 2004-04-13 | 2005-10-27 | Rubycon Corp | 電解コンデンサ駆動用電解液及び電解コンデンサ |
US7116548B2 (en) * | 2004-04-23 | 2006-10-03 | Kemet Electronics Corporation | Fluted anode with minimal density gradients and capacitor comprising same |
CN1737072B (zh) * | 2004-08-18 | 2011-06-08 | 播磨化成株式会社 | 导电粘合剂及使用该导电粘合剂制造物件的方法 |
JP4743507B2 (ja) | 2004-11-29 | 2011-08-10 | 昭和電工株式会社 | 固体電解コンデンサ用多孔質陽極体、その製造方法、及び固体電解コンデンサ |
JP2006186190A (ja) * | 2004-12-28 | 2006-07-13 | Mitsubishi Paper Mills Ltd | 固体電解コンデンサ |
WO2007020458A1 (en) | 2005-08-19 | 2007-02-22 | Avx Limited | Polymer based solid state capacitors and a method of manufacturing them |
GB0517952D0 (en) | 2005-09-02 | 2005-10-12 | Avx Ltd | Method of forming anode bodies for solid state capacitors |
EP1928620B1 (en) * | 2005-09-29 | 2020-03-18 | Ningxia Orient Tantalum Industry Co., Ltd. | Method for spherically granulating and agglomerating metal particles |
JP2009536266A (ja) | 2006-05-05 | 2009-10-08 | キャボット コーポレイション | タンタル粉末およびその製造方法 |
JP4884108B2 (ja) * | 2006-06-30 | 2012-02-29 | 三洋電機株式会社 | 電解コンデンサ |
US7483259B2 (en) * | 2007-03-21 | 2009-01-27 | Avx Corporation | Solid electrolytic capacitor containing a barrier layer |
WO2009001772A1 (ja) * | 2007-06-26 | 2008-12-31 | Shin-Etsu Polymer Co., Ltd. | コンデンサ及びその製造方法 |
-
2009
- 2009-02-20 US US12/389,783 patent/US8203827B2/en not_active Expired - Fee Related
- 2009-11-09 GB GB0919599A patent/GB2467996A/en not_active Withdrawn
- 2009-12-14 KR KR1020090123781A patent/KR20100095358A/ko not_active Application Discontinuation
- 2009-12-25 CN CN200910215415.XA patent/CN101814380B/zh not_active Expired - Fee Related
-
2010
- 2010-01-28 JP JP2010016944A patent/JP2010199572A/ja active Pending
- 2010-02-18 DE DE102010008506A patent/DE102010008506A1/de not_active Withdrawn
- 2010-12-03 HK HK10111287.7A patent/HK1144852A1/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6751086B2 (en) * | 2001-08-30 | 2004-06-15 | Ikuo Matsumoto | Structure of surface-mounting solid electrolytic capacitor and method of making the same |
CN1610027A (zh) * | 2003-10-17 | 2005-04-27 | H.C.施塔克股份有限公司 | 带有聚合外层的电解电容器 |
WO2005096332A1 (ja) * | 2004-03-30 | 2005-10-13 | Rohm Co., Ltd. | 固体電解コンデンサ |
US20050225927A1 (en) * | 2004-04-06 | 2005-10-13 | Tagusagawa Solon Y | Processes for the production of niobium oxides with controlled tantalum content and capacitors made therefrom |
CN101419866A (zh) * | 2007-10-22 | 2009-04-29 | Avx公司 | 用于形成电容器阳极的掺杂陶瓷粉末 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102842432A (zh) * | 2012-08-31 | 2012-12-26 | 深圳顺络电子股份有限公司 | 电解电容的阳极体的制作方法 |
CN102842432B (zh) * | 2012-08-31 | 2016-07-06 | 深圳顺络电子股份有限公司 | 电解电容的阳极体的制作方法 |
Also Published As
Publication number | Publication date |
---|---|
US20100214723A1 (en) | 2010-08-26 |
CN101814380B (zh) | 2014-04-02 |
DE102010008506A1 (de) | 2010-08-26 |
US8203827B2 (en) | 2012-06-19 |
KR20100095358A (ko) | 2010-08-30 |
HK1144852A1 (zh) | 2011-03-11 |
GB2467996A (en) | 2010-08-25 |
JP2010199572A (ja) | 2010-09-09 |
GB0919599D0 (en) | 2009-12-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101814380B (zh) | 包含非金属表面处理的固体电解电容的阳极 | |
CN101494118B (zh) | 用于电解电容器的经表面活性剂处理的烧结的阳极颗粒 | |
CN101419866B (zh) | 用于形成电容器阳极的掺杂陶瓷粉末 | |
CN101494121B (zh) | 用于电解电容器的经有机酸蚀刻的烧结阳极件 | |
CN101494119B (zh) | 用有机金属化合物处理的电解电容器阳极 | |
CN101673622B (zh) | 用于嵌入电路板的固体电解电容 | |
CN101714461A (zh) | 由包含粗团聚物和细团聚物的粉末形成的电容阳极 | |
CN102024576B (zh) | 具有凹槽式引线框沟道的电解电容器组件及其制作方法 | |
JP5933200B2 (ja) | 高電圧用途で使用するための固体電解コンデンサ | |
JP2009505412A (ja) | ポリマーベースの固体コンデンサおよびその製造方法 | |
CN105990026B (zh) | 钽嵌入式微芯片 | |
CN102496486A (zh) | 包含改良的锰氧化物电解质的固态电解电容器 | |
KR102262077B1 (ko) | 다층 접착 코팅을 포함하는 고체 전해 커패시터 | |
KR102241640B1 (ko) | 프리 코팅층을 포함하는 고체 전해 커패시터 | |
KR20150141075A (ko) | 다층 접착 코팅을 포함하는 고체 전해 커패시터 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
REG | Reference to a national code |
Ref country code: HK Ref legal event code: DE Ref document number: 1144852 Country of ref document: HK |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C53 | Correction of patent of invention or patent application | ||
CB02 | Change of applicant information |
Address after: south carolina Applicant after: AVX Corp. Address before: south carolina Applicant before: Avx Corp. |
|
COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: AVX CORP. TO: AVX CORP. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
REG | Reference to a national code |
Ref country code: HK Ref legal event code: GR Ref document number: 1144852 Country of ref document: HK |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140402 Termination date: 20151225 |
|
EXPY | Termination of patent right or utility model |