CN101755014B - 具有高正表面电荷的高分散金属氧化物 - Google Patents

具有高正表面电荷的高分散金属氧化物 Download PDF

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Publication number
CN101755014B
CN101755014B CN200880025150.0A CN200880025150A CN101755014B CN 101755014 B CN101755014 B CN 101755014B CN 200880025150 A CN200880025150 A CN 200880025150A CN 101755014 B CN101755014 B CN 101755014B
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group
trib
silica
metal oxide
surface charge
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Chinese (zh)
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CN101755014A (zh
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T·戈特沙尔克高迪希
U·弗尔克尔
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Wacker Chemie AG
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Wacker Chemie AG
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3081—Treatment with organo-silicon compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/36—Compounds of titanium
    • C09C1/3607—Titanium dioxide
    • C09C1/3684—Treatment with organo-silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/40—Compounds of aluminium
    • C09C1/407—Aluminium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00—Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/12—Treatment with organosilicon compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/86—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/50—Agglomerated particles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y10T428/2995—Silane, siloxane or silicone coating

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Compounds (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
CN200880025150.0A 2007-07-18 2008-07-10 具有高正表面电荷的高分散金属氧化物 Active CN101755014B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007033448.8 2007-07-18
DE102007033448A DE102007033448A1 (de) 2007-07-18 2007-07-18 Hochdisperse Metalloxide mit einer hohen positiven Oberflächenladung
PCT/EP2008/059020 WO2009010447A1 (de) 2007-07-18 2008-07-10 Hochdisperse metalloxide mit einer hohen positiven oberflächenladung

Publications (2)

Publication Number Publication Date
CN101755014A CN101755014A (zh) 2010-06-23
CN101755014B true CN101755014B (zh) 2014-04-23

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Family Applications (1)

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CN200880025150.0A Active CN101755014B (zh) 2007-07-18 2008-07-10 具有高正表面电荷的高分散金属氧化物

Country Status (7)

Country Link
US (1) US8361622B2 (enExample)
EP (2) EP2824148B1 (enExample)
JP (1) JP5661461B2 (enExample)
KR (1) KR101172146B1 (enExample)
CN (1) CN101755014B (enExample)
DE (1) DE102007033448A1 (enExample)
WO (1) WO2009010447A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9228785B2 (en) 2010-05-04 2016-01-05 Alexander Poltorak Fractal heat transfer device
BE1020749A3 (fr) 2012-06-13 2014-04-01 Detandt Simon Ets Revetement superhydrophobe.
JP6008137B2 (ja) * 2013-09-18 2016-10-19 信越化学工業株式会社 表面有機樹脂被覆疎水性球状シリカ微粒子、その製造方法及びそれを用いた静電荷像現像用トナー外添剤
DE102013224206A1 (de) 2013-11-27 2015-05-28 Wacker Chemie Ag Oberflächenmodifizierte partikuläre Metalloxide
US10830545B2 (en) 2016-07-12 2020-11-10 Fractal Heatsink Technologies, LLC System and method for maintaining efficiency of a heat sink
US10745283B1 (en) * 2018-05-11 2020-08-18 Applied Material Solutions, Inc. Demulsification compound and method for oil separation from waste streams
CN112638490B (zh) 2018-06-15 2023-01-03 格雷斯公司 消泡剂活性物质、其制造方法和消泡制剂
US11054757B2 (en) * 2018-09-27 2021-07-06 Ricoh Company, Ltd. Toner, image forming apparatus, image forming method, and process cartridge
CN111355401B (zh) * 2020-02-28 2023-06-06 广西大学 一种富氧基团改性的纤维素纳米纤丝基摩擦纳米发电机
EP4547767A1 (de) 2022-06-29 2025-05-07 Wacker Chemie AG Verfahren zur modifizierung von kieselsäure in der flüssigphase
CN115540759B (zh) * 2022-11-16 2023-05-09 江西滕创洪科技有限公司 一种基于图像识别技术修饰金属的检测方法及检测系统
WO2025242315A1 (de) 2024-05-24 2025-11-27 Wacker Chemie Ag Verfahren zur modifizierung von kieselsäure in der flüssigphase

Citations (2)

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Publication number Priority date Publication date Assignee Title
US5665511A (en) * 1991-05-14 1997-09-09 Fuji Xerox Co., Ltd. Surface-treated inorganic fine particle and electrophotographic developer using the same
EP1138724A2 (en) * 2000-03-31 2001-10-04 Nippon Aerosil Co., Ltd. Surface-treated metallic-oxide fine powder and its production and use

Family Cites Families (20)

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GB2128764B (en) 1982-08-23 1986-02-19 Canon Kk Electrostatographic developer
JPS6023863A (ja) 1983-07-19 1985-02-06 Canon Inc 画像形成方法
DE3707226A1 (de) 1987-03-06 1988-09-15 Wacker Chemie Gmbh Verfahren zur herstellung von hochdispersem metalloxid mit ammoniumfunktionellem organopolysiloxan modifizierter oberflaeche als positiv steuerndes ladungsmittel fuer toner
US4973540A (en) 1988-08-31 1990-11-27 Minolta Camera Kabushiki Kaisha Developer for electrostatic latent image containing fine particle comprising positively and negatively chargeable polar group
US5102763A (en) * 1990-03-19 1992-04-07 Xerox Corporation Toner compositions containing colored silica particles
DE4202694C1 (en) 1992-01-31 1993-07-01 Degussa Ag, 6000 Frankfurt, De Silane surface-modified pyrogenic alumina, for use in toner - to increase charge stability, produced by spraying with silane mixt. free from solvent
JP3318997B2 (ja) * 1993-02-03 2002-08-26 三菱マテリアル株式会社 疎水性シリカ粉体、その製法および電子写真用現像剤
DE4419234A1 (de) 1994-06-01 1995-12-07 Wacker Chemie Gmbh Verfahren zur Silylierung von anorganischen Oxiden
EP0716350B1 (en) * 1994-12-05 2001-04-11 Canon Kabushiki Kaisha Toner for developing electrostatic image
JPH08319115A (ja) * 1995-05-22 1996-12-03 Mitsubishi Materials Corp 疎水性金属酸化物粉体およびこれを含有する電子写真用現像剤
US5763388A (en) * 1996-12-18 1998-06-09 Dsm Copolymer, Inc. Process for producing improved silica-reinforced masterbatch of polymers prepared in latex form
CA2224609A1 (en) * 1996-12-18 1998-06-18 David J. Kneiling Process for producing improved silica-reinforced masterbatch of polymers in latex form
US6342560B1 (en) * 1999-08-19 2002-01-29 Ppg Industries Ohio, Inc. Chemically modified fillers and polymeric compositions containing same
US7687107B2 (en) * 1999-08-19 2010-03-30 Ppg Industries Ohio, Inc. Process for producing chemically modified amorphous precipitated silica
US7704552B2 (en) * 1999-08-19 2010-04-27 Ppg Industries Ohio, Inc. Process for producing chemically treated amorphous precipitated silica
US6203960B1 (en) * 2000-08-22 2001-03-20 Xerox Corporation Toner compositions
DE10145162A1 (de) * 2001-09-13 2003-04-10 Wacker Chemie Gmbh Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen
JP4377215B2 (ja) * 2002-12-27 2009-12-02 株式会社トクヤマ シリカ微粒子
DE10319937A1 (de) 2003-05-02 2004-12-02 Wacker-Chemie Gmbh Organofunktionelle oberflächenmodifizierte Metalloxide
JP3983234B2 (ja) * 2004-08-16 2007-09-26 電気化学工業株式会社 トナー外添材の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5665511A (en) * 1991-05-14 1997-09-09 Fuji Xerox Co., Ltd. Surface-treated inorganic fine particle and electrophotographic developer using the same
EP1138724A2 (en) * 2000-03-31 2001-10-04 Nippon Aerosil Co., Ltd. Surface-treated metallic-oxide fine powder and its production and use

Also Published As

Publication number Publication date
JP5661461B2 (ja) 2015-01-28
CN101755014A (zh) 2010-06-23
US20100196811A1 (en) 2010-08-05
EP2167588A1 (de) 2010-03-31
JP2010533636A (ja) 2010-10-28
US8361622B2 (en) 2013-01-29
DE102007033448A1 (de) 2009-01-22
KR101172146B1 (ko) 2012-08-07
EP2824148A1 (de) 2015-01-14
WO2009010447A1 (de) 2009-01-22
EP2167588B1 (de) 2014-12-31
KR20100041842A (ko) 2010-04-22
EP2824148B1 (de) 2017-01-11

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