CN101752433B - 光电转换装置及光电转换装置的制造方法 - Google Patents

光电转换装置及光电转换装置的制造方法 Download PDF

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Publication number
CN101752433B
CN101752433B CN2009101783807A CN200910178380A CN101752433B CN 101752433 B CN101752433 B CN 101752433B CN 2009101783807 A CN2009101783807 A CN 2009101783807A CN 200910178380 A CN200910178380 A CN 200910178380A CN 101752433 B CN101752433 B CN 101752433B
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semiconductor
semiconductor layer
impurity
electrode
amorphous
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Chinese (zh)
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CN101752433A (zh
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鸟海聪志
远藤俊弥
大森绘梨子
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • H10F77/164Polycrystalline semiconductors
    • H10F77/1642Polycrystalline semiconductors including only Group IV materials
    • H10F77/1645Polycrystalline semiconductors including only Group IV materials including microcrystalline silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/164Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
    • H10F10/165Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells
    • H10F10/166Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/545Microcrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/548Amorphous silicon PV cells

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  • Photovoltaic Devices (AREA)
CN2009101783807A 2008-11-28 2009-11-25 光电转换装置及光电转换装置的制造方法 Expired - Fee Related CN101752433B (zh)

Applications Claiming Priority (2)

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JP2008-303441 2008-11-28
JP2008303441 2008-11-28

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CN101752433A CN101752433A (zh) 2010-06-23
CN101752433B true CN101752433B (zh) 2013-11-20

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US (1) US20100139766A1 (enExample)
JP (1) JP5503946B2 (enExample)
CN (1) CN101752433B (enExample)
TW (1) TWI488317B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8704083B2 (en) * 2010-02-11 2014-04-22 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and fabrication method thereof
US9076909B2 (en) * 2010-06-18 2015-07-07 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and method for manufacturing the same
US9159939B2 (en) * 2011-07-21 2015-10-13 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device
JP5933495B2 (ja) * 2012-09-28 2016-06-08 富士フイルム株式会社 有機電界発光素子及び有機電界発光素子の製造方法
US9905837B2 (en) * 2014-08-21 2018-02-27 Sony Corporation Imaging element, solid-state imaging device, and electronic device
JP6139731B2 (ja) * 2016-03-23 2017-05-31 株式会社半導体エネルギー研究所 光電変換装置の作製方法
CN108987522A (zh) * 2018-07-25 2018-12-11 京东方科技集团股份有限公司 一种光电传感器、光电传感组件及其制作方法
CN113860410B (zh) * 2021-09-30 2022-06-10 海南大学 一种全角度太阳能高效驱动水蒸发仿生材料及其制备方法

Citations (3)

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US5677236A (en) * 1995-02-24 1997-10-14 Mitsui Toatsu Chemicals, Inc. Process for forming a thin microcrystalline silicon semiconductor film
CN101043026A (zh) * 2006-03-20 2007-09-26 株式会社半导体能源研究所 晶体半导体薄膜,半导体器件及其制造方法
CN101043058A (zh) * 2006-03-20 2007-09-26 上海太阳能科技有限公司 非晶硅-晶体硅异质结太阳电池

Family Cites Families (13)

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US4878097A (en) * 1984-05-15 1989-10-31 Eastman Kodak Company Semiconductor photoelectric conversion device and method for making same
US6413805B1 (en) * 1993-03-12 2002-07-02 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device forming method
US6472248B2 (en) * 1999-07-04 2002-10-29 Canon Kabushiki Kaisha Microcrystalline series photovoltaic element and process for fabrication of same
US6204156B1 (en) * 1999-09-02 2001-03-20 Micron Technology, Inc. Method to fabricate an intrinsic polycrystalline silicon film
US6858308B2 (en) * 2001-03-12 2005-02-22 Canon Kabushiki Kaisha Semiconductor element, and method of forming silicon-based film
KR100627203B1 (ko) * 2001-08-14 2006-09-22 제이에스알 가부시끼가이샤 실란 조성물, 실리콘막의 형성법 및 태양 전지의 제조법
JP4240984B2 (ja) * 2002-10-08 2009-03-18 三洋電機株式会社 光電変換装置
US20050236030A1 (en) * 2003-11-27 2005-10-27 Kyocera Corporation Photoelectric conversion device and method for manufacturing the same
TWI273719B (en) * 2005-12-30 2007-02-11 Ind Tech Res Inst Nanocrystal and photovoltaics applying the same
US8049103B2 (en) * 2006-01-18 2011-11-01 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
TWM323112U (en) * 2006-12-28 2007-12-01 Advance Design Technology Inc Thin film solar-cell with multi level microcrystalline silicon
TW200832714A (en) * 2007-01-29 2008-08-01 Innolux Display Corp Fabricating method for low temperatyue polysilicon thin film
KR100861548B1 (ko) * 2007-04-27 2008-10-02 엘지전자 주식회사 박막형 태양전지와 그의 제조방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5677236A (en) * 1995-02-24 1997-10-14 Mitsui Toatsu Chemicals, Inc. Process for forming a thin microcrystalline silicon semiconductor film
CN101043026A (zh) * 2006-03-20 2007-09-26 株式会社半导体能源研究所 晶体半导体薄膜,半导体器件及其制造方法
CN101043058A (zh) * 2006-03-20 2007-09-26 上海太阳能科技有限公司 非晶硅-晶体硅异质结太阳电池

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Publication number Publication date
US20100139766A1 (en) 2010-06-10
JP5503946B2 (ja) 2014-05-28
CN101752433A (zh) 2010-06-23
TW201036181A (en) 2010-10-01
JP2010153827A (ja) 2010-07-08
TWI488317B (zh) 2015-06-11

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