CN101655661A - 多调光掩模及其修正方法 - Google Patents

多调光掩模及其修正方法 Download PDF

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Publication number
CN101655661A
CN101655661A CN 200910149587 CN200910149587A CN101655661A CN 101655661 A CN101655661 A CN 101655661A CN 200910149587 CN200910149587 CN 200910149587 CN 200910149587 A CN200910149587 A CN 200910149587A CN 101655661 A CN101655661 A CN 101655661A
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CN
China
Prior art keywords
semi
permeable diaphragm
multilevel gradation
gradation photomask
zone
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Pending
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CN 200910149587
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English (en)
Chinese (zh)
Inventor
加藤和男
三宅充纮
美作昌宏
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SK Electronics Co Ltd
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SK Electronics Co Ltd
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Application filed by SK Electronics Co Ltd filed Critical SK Electronics Co Ltd
Publication of CN101655661A publication Critical patent/CN101655661A/zh
Pending legal-status Critical Current

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN 200910149587 2008-07-04 2009-07-06 多调光掩模及其修正方法 Pending CN101655661A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2008175280 2008-07-04
JP2008175281 2008-07-04
JP2008175279A JP5283440B2 (ja) 2008-07-04 2008-07-04 多階調フォトマスク及びその修正方法
JP2008175279 2008-07-04

Publications (1)

Publication Number Publication Date
CN101655661A true CN101655661A (zh) 2010-02-24

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ID=41701161

Family Applications (1)

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CN 200910149587 Pending CN101655661A (zh) 2008-07-04 2009-07-06 多调光掩模及其修正方法

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JP (1) JP5283440B2 (ja)
CN (1) CN101655661A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111880368A (zh) * 2020-03-04 2020-11-03 株式会社Sk电子 半色调掩模的缺陷修正方法、半色调掩模的制造方法以及半色调掩模

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3042155B2 (ja) * 1992-03-05 2000-05-15 日本電気株式会社 フォトマスク修正装置およびフォトマスク修正方法
JP2000347385A (ja) * 1999-06-03 2000-12-15 Nec Corp レーザリペア装置とフォトマスクの修正方法
JP4442962B2 (ja) * 1999-10-19 2010-03-31 株式会社ルネサステクノロジ フォトマスクの製造方法
JP4968464B2 (ja) * 2006-07-05 2012-07-04 大日本印刷株式会社 階調をもつフォトマスクの欠陥部修正方法および修正箇所の評価方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111880368A (zh) * 2020-03-04 2020-11-03 株式会社Sk电子 半色调掩模的缺陷修正方法、半色调掩模的制造方法以及半色调掩模
CN111880368B (zh) * 2020-03-04 2021-11-02 株式会社Sk电子 半色调掩模的缺陷修正方法、半色调掩模的制造方法以及半色调掩模

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Publication number Publication date
JP5283440B2 (ja) 2013-09-04
JP2010014998A (ja) 2010-01-21

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Application publication date: 20100224