CN101645276B - 基板处理设备以及磁记录介质制造方法 - Google Patents
基板处理设备以及磁记录介质制造方法 Download PDFInfo
- Publication number
- CN101645276B CN101645276B CN2009101617101A CN200910161710A CN101645276B CN 101645276 B CN101645276 B CN 101645276B CN 2009101617101 A CN2009101617101 A CN 2009101617101A CN 200910161710 A CN200910161710 A CN 200910161710A CN 101645276 B CN101645276 B CN 101645276B
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- CN
- China
- Prior art keywords
- ion beam
- beam generator
- substrate
- grid
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
Landscapes
- Drying Of Semiconductors (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008-197736 | 2008-07-31 | ||
JP2008197736 | 2008-07-31 | ||
JP2008197736 | 2008-07-31 | ||
JP2008249585 | 2008-09-29 | ||
JP2008249585 | 2008-09-29 | ||
JP2008-249585 | 2008-09-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101645276A CN101645276A (zh) | 2010-02-10 |
CN101645276B true CN101645276B (zh) | 2011-06-15 |
Family
ID=41610464
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009101617101A Active CN101645276B (zh) | 2008-07-31 | 2009-07-31 | 基板处理设备以及磁记录介质制造方法 |
CN200910161707XA Active CN101645275B (zh) | 2008-07-31 | 2009-07-31 | 基板处理设备以及磁记录介质制造方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200910161707XA Active CN101645275B (zh) | 2008-07-31 | 2009-07-31 | 基板处理设备以及磁记录介质制造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5174170B2 (fr) |
CN (2) | CN101645276B (fr) |
WO (1) | WO2010013765A1 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5518449B2 (ja) * | 2009-12-02 | 2014-06-11 | エイチジーエスティーネザーランドビーブイ | 磁気記録媒体及びその製造方法 |
US20130004736A1 (en) * | 2011-06-30 | 2013-01-03 | Seagate Technology, Llc | Method of protecting patterned magnetic materials of a stack |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62162219A (ja) * | 1986-01-10 | 1987-07-18 | Hitachi Maxell Ltd | 両面記録型磁気記録媒体およびその製造方法 |
JP3732250B2 (ja) * | 1995-03-30 | 2006-01-05 | キヤノンアネルバ株式会社 | インライン式成膜装置 |
CN1240635C (zh) * | 1996-02-26 | 2006-02-08 | 日本碍子株式会社 | 结晶玻璃及其制法、磁盘用基片和磁盘 |
JP2005056535A (ja) * | 2003-08-07 | 2005-03-03 | Tdk Corp | 磁気記録媒体の製造方法及び製造装置 |
JP2006318648A (ja) * | 2003-12-25 | 2006-11-24 | Tdk Corp | 凹凸パターンの凹部充填方法及び磁気記録媒体の製造方法 |
JP3916636B2 (ja) * | 2005-02-15 | 2007-05-16 | Tdk株式会社 | 磁気記録媒体、磁気記録再生装置 |
US20070137063A1 (en) * | 2005-12-21 | 2007-06-21 | Hitachi Global Storage Technologies Netherlands, B.V. | Carbon beam deposition chamber for reduced defects |
JP4676897B2 (ja) * | 2006-02-16 | 2011-04-27 | 昭和電工株式会社 | 磁気記録媒体およびその製造方法 |
-
2009
- 2009-07-30 WO PCT/JP2009/063543 patent/WO2010013765A1/fr active Application Filing
- 2009-07-30 JP JP2010522746A patent/JP5174170B2/ja active Active
- 2009-07-31 CN CN2009101617101A patent/CN101645276B/zh active Active
- 2009-07-31 CN CN200910161707XA patent/CN101645275B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN101645275A (zh) | 2010-02-10 |
JPWO2010013765A1 (ja) | 2012-01-12 |
CN101645276A (zh) | 2010-02-10 |
JP5174170B2 (ja) | 2013-04-03 |
CN101645275B (zh) | 2011-06-15 |
WO2010013765A1 (fr) | 2010-02-04 |
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SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |