CN101630038A - Low-loss surface plasmon optical waveguide structure - Google Patents
Low-loss surface plasmon optical waveguide structure Download PDFInfo
- Publication number
- CN101630038A CN101630038A CN 200810226263 CN200810226263A CN101630038A CN 101630038 A CN101630038 A CN 101630038A CN 200810226263 CN200810226263 CN 200810226263 CN 200810226263 A CN200810226263 A CN 200810226263A CN 101630038 A CN101630038 A CN 101630038A
- Authority
- CN
- China
- Prior art keywords
- refractive index
- metal
- layer
- low
- loss
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Optical Integrated Circuits (AREA)
Abstract
The invention relates to the technical fields of surface plasmon optical waveguide structures and provides an antisymmetric-high energy mode surface plasmon optical waveguide structure capable of low-loss transmission for overcoming a large loss drawback of the conventional metal/media/metal waveguide transmission. The optical waveguide structure realizes a waveguide structure for supporting transmission in an antisymmetric-high energy mode by combining the refractive index difference between a plurality of high refractive index layers and a low refractive index substrate and a low refractive index covering layer and a surface plasmon effect of a metal layer and uses the low refractive index medium layers on two sides of the metal layer to reduce transmission loss, thereby realizing low-loss surface plasmon optical waveguide. Meanwhile, the optical waveguide structure has the advantages of small effective mode filed area and low loss can be used for manufacturing optical devices of a subwavelength size and ultra high integration level optical circuits.
Description
Technical field
The present invention relates to the optical waveguide structure field, be specifically related to have low-loss surface plasmon optical waveguide structure.
Background technology
Surface plasmons is a kind of mode of electromagnetic wave that the interaction by light and metal surface free electron causes.This pattern is present near metal and the medium interface, and its field intensity is reaching maximum at the interface, and all is exponential decay along the direction perpendicular to the interface in the both sides, interface.Surface plasmons has stronger field limited characteristic, field energy can be constrained in the zone of bulk much smaller than its free space wavelength, and its character can change with the metal surface structural change.In the waveguiding structure of proper metal and medium composition, surface plasmons can be limited in tens nanometers even the littler scope, and light signal is transmitted in the minimum surface plasmon optical waveguide of size with the form of surface plasma-wave by the influence of diffraction limit.Surface plasmon wave is led and demonstrate huge application potential in the nanophotonics field, and for the manufacturing of high integration nano-photon chip provides may.
In the integrated practical application of nano-photon, mainly contain two kinds of heterojunction structures, medium/medium/metal structure and medium/metal/metal construction based on surface plasmons.
(1) medium/medium/metal structure
The layer of metal layer that this structure is surrounded by two layer medium forms.Usually metal layer thickness is tens nanometers, and thickness of dielectric layers is in the hundreds of nanometer even more than the micron dimension.
In this structure, when metal level was extremely thin, two interfaces up and down of metal and medium were very approaching, and the surface plasmons on two interfaces is coupled, and forms two kinds of patterns.Along the symmetry that interfacial upwards distributes, it is divided into symmetry and antisymmetric mode according to the component of its magnetic field on metal and medium interface direction.The loss of the symmetric pattern that this structure is supported is less, is called the long-distance surface plasmon again.When center metal layer thickness during less than 20 nanometers, the field energy overwhelming majority is distributed in the dielectric layer of both sides, makes that the loss of this pattern is less relatively, and its transmission length can reach a millimeter magnitude, and increases along with reducing of metal layer thickness.People such as the Alexandria of Denmark University of Science and Technology studies show that, the loss of this structure is minimum to reach several dB/cm.But the La Shiteqiya of Stanford University discovers that the field limitation capability of this structure is very poor, and the mode sizes minimum greater than 3 times of its free space wavelength, and reduces and increases with metal layer thickness still about 5 microns.
(2) medium/metal/metal construction
One deck dielectric layer that this structure is surrounded by double layer of metal forms.Usually the thickness of medium is sub-micrometer scale.
When last lower metal layer can think that semiinfinite is thick with respect to dielectric layer, there were two kinds of patterns in the light field in this structure, also can be divided into symmetry and antisymmetric mode along the symmetry that interfacial upwards distributes according to the component of its magnetic field on metal and medium interface direction.Symmetric pattern wherein can be used in the photonic integrated device because its field distribution characteristic is easily excited by free space beam or other waveguide.Simultaneously, because surface plasma-wave is for the penetration depth of metal very short (being about 20 nanometers in optical band), the luminous energy overwhelming majority is limited in thickness and can reaches in the central medium layer of sub-wavelength dimensions, thereby can realize the sub-wavelength dimensions of light is retrained based on the waveguide of this structure.People such as La Shiteqiya studies show that, the light field constraint factor of this structure improves 4 orders of magnitude than medium/medium/metal structure, and the I of mode sizes is reduced to below 100 nanometers.
But the loss ratio of traditional medium/metal/metal construction medium/medium/metal structure is much bigger, and its transmission range is limited in micron dimension usually.Therefore, the researchist is a purpose to reduce the wastage under the prerequisite that guarantees the sub-wavelength constraint, and traditional medium/metal/metal construction has been carried out various improvement.Wherein the scheme of the people such as Feng Ningning of Boston University zone adding low refractive index dielectric layer of close both sides metal level in dielectric layer can be reduced to 10 with loss
3The dB/cm magnitude.
Have semiinfinite thick on the base metal/medium/metal construction basis of lower metal layer, medium/medium/metal/medium/metal structure of being made of thin metal level has also appearred, promptly the metal level of central medium layer both sides is thinner, its outer medium that coats again.People such as the Ma Luoyi of University of New Mexico discover, when metal layer thickness is very little up and down in medium/medium/metal/medium/metal structure, support 4 kinds of surface plasmon mode formulas in this waveguide.According to the symmetry of this several modes and under certain transmission the height of needed excitation photon energy, it can be divided into: symmetry-high-energy pattern, antisymmetry-high-energy pattern, symmetry-low energy model and antisymmetry-low energy model (as shown in Figure 1).But the antisymmetry in the mentioned structure of this article-high-energy pattern shows as the leakage mould, and loss is very high and be cut off at the longer wavelength wave band.
Be to carry out with less mode sizes, low-loss ground transmitting optical signal from the difficult point of the existing as can be seen medium/metal of top introduction/structure and medium/metal/metallic surface plasma excimer optical waveguide structure.
Summary of the invention
The objective of the invention is to overcome the defective that conventional metals/medium/the metallic surface plasma excimer transmission loss of optical waveguide is big, thus provide a kind of can be with the surface plasmon optical waveguide structure of low-loss transmission antisymmetry-high-energy pattern.
The invention provides a kind of can be with the surface plasmon optical waveguide structure of low-loss transmission antisymmetry-high-energy pattern.Comprise multiple layer metal/dielectric structure (as shown in Figure 2).
Described multiple layer metal/dielectric structure comprises: covering 111/ high refractive index medium layer 101/ low refractive index dielectric layer 102/ metal level 103/ low refractive index dielectric layer 104/ high refractive index medium layer 105/ low refractive index dielectric layer 106/ metal level 107/ low refractive index dielectric layer 108/ high refractive index medium layer 109/ basalis 110.
Described metal level 103 is identical with 107 material, but must be simple metal, alloy or the metallic compound of support surface plasma wave, and described simple metal comprises gold, silver, chromium, copper and aluminium etc.
Described metal level 103 and 107 thickness d
M3And d
M7Scope be 10-100nm.Its thickness is big more, and the loss of optical waveguide is big more; Its thickness is too small, pattern and propagation thereof that then can't the support surface plasmon.The scope of its width is 250nm-800nm, to avoid producing the higher order mode of broad ways.
Described low refractive index dielectric layer 102,104,106 is identical with 108 material, and it act as the field strength distribution that reduces in the metal level, thereby reduces the loss of waveguide, so its thickness is big more or refractive index is low more, and the loss of optical waveguide is more little; But simultaneously the effective refractive index of antisymmetry-high-energy pattern will reduce, and excessive or refractive index is crossed when hanging down when its thickness, and pattern will be leaked, and can't transmit.So thickness d of described low refractive index dielectric layer
L2, d
L4, d
L6And d
L8Scope be 10-100nm, the refractive indices of the refractive index of described low refractive index dielectric layer and high refractive index medium layer is greater than 0.45.
The described effect that is positioned at the high refractive index medium layer 105 at waveguiding structure center is to constitute the waveguiding structure with high index of refraction with the high refractive index medium layer 101 that is positioned at both sides and 109, by the basalis 110 of itself and low-refraction and the big refringence between the covering 111, constitute waveguiding structure with metal-layer structure 103 and 107, support the transmission of antisymmetry-high-energy pattern.Its thickness is big more or refractive index is high more, and the effective refractive index of antisymmetry-high-energy pattern is big more, and the binding effect of field intensity is also strong more, but the loss of the waveguide that is caused by the loss in the metal level simultaneously is also big more.Otherwise then the binding effect of field intensity also reduces, but the loss of the waveguide that is caused by the loss in the metal level simultaneously also reduces.So thickness d of described height of center index medium layer 105
H5Scope is 270-500nm, the thickness d of the high refractive index medium layer of both sides
H1And d
H9Scope is 30-200nm.Described center is identical with the material of the high refractive index medium layer of both sides, and the ratio of the material refractive index of covering and the refractive index of high refractive index medium layer is less than 0.45, and the refractive indices of the material refractive index of described basalis and high refractive index medium layer is less than 0.45.
Low-loss surface plasmon optical waveguide of the present invention has the following advantages:
1. the designed surface plasmon optical waveguide of the present invention has in the low advantage of optical communicating waveband loss with respect to traditional medium/metal/Metallic Optical Waveguide, can be used for making optical device such as photoswitch, modulator, beam splitter according to the fiber waveguide device of designed structure fabrication.
2. the designed surface plasmon optical waveguide long-distance surface plasmon optical waveguide less with respect to loss of the present invention has better effect of contraction to light field, its useful area is less, optical intensity density is bigger, therefore can be applicable to device for non-linear optical, realize integrated full optical device.
3. antisymmetry-high-energy pattern the effective refractive index that is transmitted in the designed surface plasmon optical waveguide of the present invention is low, be slightly larger than clad material, therefore can realize coupling with the waveguide of silicon insulating material, convenient realization is integrated with other optical waveguide device, thereby is applied to the super-high density integrated optical circuit.
4. the designed surface plasmon optical waveguide of the present invention has smooth dispersion characteristics in optical communicating waveband.
Description of drawings
Fig. 1 is the magnetic field distribution curve of four patterns supporting of medium/metal/Metallic Optical Waveguide.
Fig. 2 is surface plasmon optical waveguide structure figure.101 and 109 is the high refractive index medium layer of both sides, and 102,104,106 and 108 is the low refractive index dielectric layer, and 103 and 107 is metal level, and 105 is middle high refractive index layer, and 110 is basalis, and 111 is covering.
Fig. 3 is that antisymmetry-high-energy pattern is along the normalization magnetic field distribution curve perpendicular to the ducting layer direction.
Fig. 4 is that the effective refractive index of four patterns being transmitted in wavelength is 1.4-1.6 mu m range inner waveguide is with the wavelength change curve.
Fig. 5 is that the loss of four patterns being transmitted in wavelength is 1.4-1.6 mu m range inner waveguide is with the wavelength change curve.
Embodiment
Two important indicators that surface plasmon wave is led are its limitation capability and loss.The field limitation capability can be by effective mode field area A
EffCharacterize, expression formula is as follows:
A
eff＝(∫∫|E(x，y)|
2dxdy)
2/∫∫|E(x，y)|
4dxdy (1)
A wherein
EffBe effective mode field area, (x y) is the electric field of surface plasma-wave to E.
The expression formula of loss Loss is as follows:
Loss＝20log(e)k
0?Im(N
eff)≈8.686k
0?Im(N
eff)(dB/m) (2)
Im (N wherein
Eff) be the imaginary part of pattern effective refractive index, k
0Expression light wave number in a vacuum.The size of loss has determined the transmission range of light in medium.Transmission range L
pBe defined as the distance when electric field intensity decays to initial value l/e on arbitrary interface, the relational expression of the two is:
Loss＝8.686/L
p (3)
The designed surface plasmon optical waveguide structure of the present invention adopts the basic structure of medium/metal/metal waveguide, increase the effective refractive index of antisymmetry-high-energy pattern by between double layer of metal, reaching outside filling high refractive index medium, thereby make it to become the pattern that to transmit; By increasing the loss that the low refractive index dielectric layer reduces optical waveguide every layer of metal both sides.
Fig. 2 is surface plasmon optical waveguide structure figure.101 and 109 is the high refractive index medium layer of both sides, and 102,104,106 and 108 is the low refractive index dielectric layer, and 103 and 107 is metal level, and 105 is middle high refractive index layer, and 110 is basalis, and 111 is covering.
In the present embodiment, the material of high refractive index medium layer is a silicon, and the refractive index at 1.55 μ m places is 3.48; The material of low refractive index dielectric layer, covering and basalis is a silicon dioxide, and the refractive index at 1.55 mum wavelength places is 1.444; The material of metal level is a gold, and the complex index of refraction at 1.55 mum wavelength places is 0.18+i*10.18.
In the present embodiment, 101 and 109 thickness d
H1=d
H9=80nm, 102,104,106 and 108 thickness d
L2=d
L4=d
L6=d
L8=40nm, 103 and 107 thickness d
M3=d
M7=20nm, 105 thickness d
H5=300nm, the width of above-mentioned each layer are 300nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, can calculate the mould field distribution and the effective refractive index of symmetry-high-energy pattern, symmetry-low energy model, antisymmetry-high-energy pattern and four patterns of antisymmetry-low energy model at 1.55 mum wavelengths.
Fig. 3 is that antisymmetry-high-energy pattern is along the magnetic field distribution curve perpendicular to the ducting layer direction.
Fig. 4 is that the effective refractive index of above-mentioned four patterns in wavelength is the 1.4-1.6 mu m range is with the wavelength change curve.
Fig. 5 is that the loss of above-mentioned four patterns in wavelength is the 1.4-1.6 mu m range is with the wavelength change curve.Wherein in the 1.4-1.6 mu m range in the described optical waveguide structure refractive index of silicon and silicon dioxide use Sai Er G Equation for Calculating to obtain, the complex index of refraction of gold uses Lorentz lorentz-De Lude Model Calculation to obtain.
Can calculate the loss of antisymmetry-high-energy pattern at 1.55 mum wavelength places is 0.01dB/ μ m, has reduced an order of magnitude than traditional medium/metal/metal waveguide; Its effective mode field area is 0.3 μ m
2, than little two orders of magnitude of traditional medium/medium/metal waveguide.
It should be noted that embodiment in above each accompanying drawing at last only in order to surface plasmon optical waveguide structure of the present invention to be described, but unrestricted.Although the present invention is had been described in detail with reference to embodiment, those of ordinary skill in the art is to be understood that, technical scheme of the present invention is made amendment or is equal to replacement, do not break away from the spirit and scope of technical solution of the present invention, it all should be encompassed in the middle of the claim scope of the present invention.
Claims (9)
1. an energy comprises multiple layer metal/dielectric structure with the surface plasmon optical waveguide structure of low-loss transmission antisymmetry-high-energy pattern.Described multiple layer metal/dielectric structure comprises the basalis of bottom, plays high refractive index medium layer/low refractive index dielectric layer/metal level/low refractive index dielectric layer/high refractive index medium layer/medium/low refractive index dielectric layer/metal level/low refractive index dielectric layer/high refractive index medium layer and the peripheral covering that from bottom to top stacks successively at basalis.
2. multiple layer metal/dielectric structure according to claim 1 is characterized in that, the material of described metal level must be simple metal, alloy or the metallic compound of support surface plasma wave, and described simple metal comprises gold, silver, chromium, copper and aluminium etc.
3. multiple layer metal/dielectric structure according to claim 1 is characterized in that, described metal layer thickness scope is 10-100nm, and width range is 250-800nm.
4. multiple layer metal/dielectric structure according to claim 1 is characterized in that the thickness range of described low refractive index dielectric layer is 10-100nm.
5. multiple layer metal/dielectric structure according to claim 1 is characterized in that, the described thickness range that is positioned at the high refractive index medium layer at waveguiding structure center is 270-500nm.
6. multiple layer metal/dielectric structure according to claim 1 is characterized in that, the described thickness range that is positioned at the high refractive index medium layer of both sides is 30-200nm.
7. multiple layer metal/dielectric structure according to claim 1 is characterized in that, the refractive indices of described low refractive index dielectric layer and high refractive index medium layer is greater than 0.45.
8. multiple layer metal/dielectric structure according to claim 1 is characterized in that, the refractive indices of described cladding index and high refractive index medium layer is less than 0.45.
9. multiple layer metal/dielectric structure according to claim 1 is characterized in that, the refractive indices of described basalis refractive index and high refractive index medium layer is greater than 0.45.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200810226263 CN101630038A (en) | 2008-11-11 | 2008-11-11 | Low-loss surface plasmon optical waveguide structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200810226263 CN101630038A (en) | 2008-11-11 | 2008-11-11 | Low-loss surface plasmon optical waveguide structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101630038A true CN101630038A (en) | 2010-01-20 |
Family
ID=41575206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200810226263 Pending CN101630038A (en) | 2008-11-11 | 2008-11-11 | Low-loss surface plasmon optical waveguide structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101630038A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101975880A (en) * | 2010-09-08 | 2011-02-16 | 中国科学院电工研究所 | Optical current transformer sensing head and sensing method |
| CN102023334A (en) * | 2010-12-15 | 2011-04-20 | 江苏大学 | Large-mode field fiber |
| CN102109637A (en) * | 2011-01-28 | 2011-06-29 | 北京航空航天大学 | Hybrid surface plasmon polariton (SPP) optical waveguide |
| CN102478389A (en) * | 2010-11-26 | 2012-05-30 | 上海光刻电子科技有限公司 | Method for measuring thickness of metal film of lithographic mask |
| CN102545050A (en) * | 2012-02-22 | 2012-07-04 | 北京航空航天大学 | Low-threshold-value surface plasma laser device |
| CN104111565A (en) * | 2014-06-13 | 2014-10-22 | 苏州大学 | Micro-nano optical switch based on surface plasmon Fano resonance and cascade optical switch using same |
| CN106772817A (en) * | 2017-01-04 | 2017-05-31 | 桂林电子科技大学 | A kind of long-range surface plasmon excimer waveguide coupler |
| CN108152885A (en) * | 2018-01-17 | 2018-06-12 | 清华大学 | A kind of waveguide coupled structure |
| CN111880260A (en) * | 2020-07-03 | 2020-11-03 | 南京邮电大学 | Long transmission distance Tamm plasmon ridge waveguide |
| CN112526674A (en) * | 2020-12-30 | 2021-03-19 | 南京邮电大学 | Low-loss arch column core micro-nano waveguide |
| CN114063321A (en) * | 2022-01-06 | 2022-02-18 | 成都明夷电子科技有限公司 | Silicon photon push-pull microphone Jeda modulator with double differential electrodes |
-
2008
- 2008-11-11 CN CN 200810226263 patent/CN101630038A/en active Pending
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101975880A (en) * | 2010-09-08 | 2011-02-16 | 中国科学院电工研究所 | Optical current transformer sensing head and sensing method |
| CN101975880B (en) * | 2010-09-08 | 2013-08-07 | 中国科学院电工研究所 | Optical current transformer sensing head and sensing method |
| CN102478389A (en) * | 2010-11-26 | 2012-05-30 | 上海光刻电子科技有限公司 | Method for measuring thickness of metal film of lithographic mask |
| CN102023334A (en) * | 2010-12-15 | 2011-04-20 | 江苏大学 | Large-mode field fiber |
| CN102023334B (en) * | 2010-12-15 | 2012-05-23 | 江苏大学 | Large-mode field fiber |
| CN102109637A (en) * | 2011-01-28 | 2011-06-29 | 北京航空航天大学 | Hybrid surface plasmon polariton (SPP) optical waveguide |
| CN102109637B (en) * | 2011-01-28 | 2012-08-29 | 北京航空航天大学 | Hybrid surface plasmon polariton (SPP) optical waveguide |
| CN102545050A (en) * | 2012-02-22 | 2012-07-04 | 北京航空航天大学 | Low-threshold-value surface plasma laser device |
| CN102545050B (en) * | 2012-02-22 | 2013-03-20 | 北京航空航天大学 | Low-threshold-value surface plasma laser device |
| CN104111565A (en) * | 2014-06-13 | 2014-10-22 | 苏州大学 | Micro-nano optical switch based on surface plasmon Fano resonance and cascade optical switch using same |
| CN106772817A (en) * | 2017-01-04 | 2017-05-31 | 桂林电子科技大学 | A kind of long-range surface plasmon excimer waveguide coupler |
| CN106772817B (en) * | 2017-01-04 | 2023-03-07 | 桂林电子科技大学 | Long-range surface plasmon polariton waveguide coupler |
| CN108152885A (en) * | 2018-01-17 | 2018-06-12 | 清华大学 | A kind of waveguide coupled structure |
| CN108152885B (en) * | 2018-01-17 | 2019-06-21 | 清华大学 | A kind of waveguide coupled structure |
| CN111880260A (en) * | 2020-07-03 | 2020-11-03 | 南京邮电大学 | Long transmission distance Tamm plasmon ridge waveguide |
| CN111880260B (en) * | 2020-07-03 | 2022-08-30 | 南京邮电大学 | Long transmission distance Tamm plasmon ridge waveguide |
| CN112526674A (en) * | 2020-12-30 | 2021-03-19 | 南京邮电大学 | Low-loss arch column core micro-nano waveguide |
| CN112526674B (en) * | 2020-12-30 | 2022-10-14 | 南京邮电大学 | Low-loss arch column core micro-nano waveguide |
| CN114063321A (en) * | 2022-01-06 | 2022-02-18 | 成都明夷电子科技有限公司 | Silicon photon push-pull microphone Jeda modulator with double differential electrodes |
| CN114063321B (en) * | 2022-01-06 | 2022-04-22 | 成都明夷电子科技有限公司 | Silicon photon push-pull microphone Jeda modulator with double differential electrodes |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101630038A (en) | Low-loss surface plasmon optical waveguide structure | |
| CN101630039B (en) | Low loss mixed type surface plasmon optical waveguide | |
| Bian et al. | Metallic-nanowire-loaded silicon-on-insulator structures: a route to low-loss plasmon waveguiding on the nanoscale | |
| Bian et al. | Deep‐subwavelength light confinement and transport in hybrid dielectric‐loaded metal wedges | |
| CN102169205A (en) | Low-loss medium loaded surface plasmon excimer optical waveguide | |
| CN102540331B (en) | Surface plasma polarization optical waveguide | |
| CN107422416B (en) | A kind of mixed type Bloch phasmon optical waveguide structure | |
| Bian et al. | Dielectrics covered metal nanowires and nanotubes for low-loss guiding of subwavelength plasmonic modes | |
| CN107219575A (en) | A kind of low-loss cylinder mixing phasmon waveguide of compact | |
| CN102169206B (en) | Low loss surface plasmon optical waveguide | |
| Yuan et al. | Design optimization of a low-loss and wide-band sharp 120 waveguide bend in 2D photonic crystals | |
| CN102590940B (en) | Open type surface plasmon polariton slit optical waveguide | |
| CN207992483U (en) | A kind of mixing phasmon waveguide of radial polarisation optical waveguide mode | |
| CN102545050B (en) | Low-threshold-value surface plasma laser device | |
| CN102608700A (en) | Hybrid slit optical waveguide | |
| CN102565938B (en) | Low-loss surface plasmon optical waveguide based on double-layer metal | |
| CN105511014A (en) | Porous core photonic crystal optical fiber for transmitting light through nanometer air holes | |
| Takahara et al. | Mutual mode control of short-and long-range surface plasmons | |
| CN102565933B (en) | Sub-wavelength mixed type surface plasma optical waveguide | |
| CN102565928B (en) | Sub-wavelength dielectric-loaded surface plasma optical waveguide | |
| Park et al. | Long range surface plasmon polariton waveguides at 1.31 and 1.55 μm wavelengths | |
| CN112526674B (en) | Low-loss arch column core micro-nano waveguide | |
| CN102565934A (en) | Trough type mixed surface plasma optical waveguide | |
| Bian et al. | Silicon-slot-mediated guiding of plasmonic modes: The realization of subwavelength optical confinement with low propagation loss | |
| CN102590938A (en) | Multilayer mixed surface plasmon polariton optical waveguide |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20100120 |