CN102169205A - Low-loss medium loaded surface plasmon excimer optical waveguide - Google Patents
Low-loss medium loaded surface plasmon excimer optical waveguide Download PDFInfo
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- CN102169205A CN102169205A CN 201010238680 CN201010238680A CN102169205A CN 102169205 A CN102169205 A CN 102169205A CN 201010238680 CN201010238680 CN 201010238680 CN 201010238680 A CN201010238680 A CN 201010238680A CN 102169205 A CN102169205 A CN 102169205A
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Abstract
The invention discloses a medium loaded surface plasmon excimer optical waveguide with low transmission loss and stronger light-field limiting ability. In the invention, the cross section of the waveguide structure comprises a metal basal layer (1), a high refractive index medium region (3) located on the metal basal layer, a low refractive index medium region (2) surrounded by the high refractive index medium region and the metal basal layer and a cladding (4), wherein the light-field distribution range of the waveguide structure can be obviously reduced by the high refractive index medium region on the metal basal layer so that the two-dimensional sub-wavelength constraint to a transmission light field is realized; and in the meantime, as the existence of the low refractive index medium region, the lower transmission loss of the waveguide can be maintained. By means of the optical waveguide structure, the contradiction of the light-field limiting ability and the transmission lost of a conventional medium loaded surface plasmon excimer optical waveguide is overcome and an ultrahigh integration level optical waveguide chip is possible to realize.
Description
Technical field
The present invention relates to the optical waveguide technique field, be specifically related to a kind of low loss dielectric loaded type surface plasmon optical waveguide.
Background technology
Surface plasmons is a kind of mode of electromagnetic wave that the interaction by light and metal surface free electron causes.This pattern is present near metal and the medium interface, and its field intensity is reaching maximum at the interface, and all is exponential decay along the direction perpendicular to the interface in the both sides, interface.Surface plasmons has stronger field limited characteristic, field energy can be constrained in the zone of bulk much smaller than its free space transmission wavelength, and its character can change with the metal surface structural change.In the surface plasmon optical waveguide structure that proper metal and medium are formed, the lateral light field distribution can be limited in can surpassing the restriction of diffraction limit in tens nanometers even the littler scope.Surface plasmons has demonstrated huge application potential in the nanophotonics field, and for realizing that high integration nano-photon chip provides possibility.
Mould field limitation capability and loss are two important parameters that characterize the surface plasmon optical waveguide mode characteristic.Traditional surface plasmon optical waveguide mainly comprises medium/metal/metal mold and medium/medium/metal type two class formations.Wherein, medium/medium/metal type transmission loss of optical waveguide is lower, but relatively poor mould field limitation capability has restricted its application in the high integration light path; On the other hand, medium/metal/metal mold optical waveguide has very strong mould field limitation capability, but its loss is too big, causes it can't realize long transmission apart from light signal.At the contradiction between conventional surface plasmon optical waveguide mould field limitation capability and the loss, the researchist has proposed the medium loaded type surface plasmon optical waveguide.The xsect of this waveguide is made up of the metallic substrates and the areas of dielectric of finite size that is positioned at its top.Compare with the surface plasmon optical waveguide of other types, this medium loaded type surface plasmon optical waveguide can provide the constraint of sub-wavelength dimensions in the horizontal, has simultaneously less relatively loss again, in addition, the easy of processing and fabricating also makes such waveguide that application potential is preferably arranged in integrated optics.At present, external a lot of research group has all carried out the theoretical research of system to the medium loaded type surface plasmon optical waveguide and has reported experiment progress based on the micro-nano device of relevant waveguide.
What traditional medium loaded type surface plasmon optical waveguide adopted usually is the low refractive index polymer material of refractive index about 1.535.This class waveguide can realize the low-loss optical signal transmission but its size is often relatively large.Be generally and guarantee single mode condition and keep long transmission range, often all about 600 nanometers, corresponding mould field size has also reached nearly micron dimension, is unfavorable for the integrated of waveguide and device for the length of polymer cross sections and width.And adopt the material (for example semiconductor material) of high index of refraction can dwindle the overall dimensions of waveguide as dielectric layer and improve mould field limitation capability, but the loss that thereupon causes can obviously increase.
For addressing this problem, the present invention improves it on the basis of above-mentioned high refractive index medium loaded type surface plasmon optical waveguide original structure.By introducing the composite structure that the high and low refractive index medium is formed, the novel surface plasmon optical waveguide that obtains possesses simultaneously than low transmission loss and stronger mould field limitation capability.Because the low refractive index dielectric zone can adopt air or other gas to fill, the loss of this waveguide can be significantly reduced, and an enhancement effect is further strengthened on the other hand.In addition because the high refractive index medium layer of the waveguide of carrying can adopt semiconductor material, therefore this two-dimensional structure can mate with semiconductor planar chip manufacture technology, easily be applied in the chip of light waveguide of high integration, for realizing that extensive integrated optical circuit has crucial meaning.
Summary of the invention
The objective of the invention is to overcome the big defective of medium loaded type surface plasmon optical waveguide field loss, propose a kind ofly possess the low transmission loss simultaneously and than the medium loaded type surface plasmon optical waveguide structure of high field limitation capability based on high-index material.
The invention provides and a kind ofly possess the low transmission loss simultaneously and, low refractive index dielectric zone and covering that its xsect comprises metallic substrate layer, be positioned at high refractive index medium zone on the metallic substrate layer, surrounded by high refractive index medium zone and metallic substrate layer than the medium loaded type surface plasmon optical waveguide structure of high field restriction ability; Wherein, the width range in high refractive index medium zone be institute's transmitting optical signal wavelength 0.06-0.4 doubly, altitude range be the light signal that transmitted wavelength 0.06-0.4 doubly, the low refractive index dielectric zone joins with metallic substrate layer, and the width range in low refractive index dielectric zone be institute's transmitting optical signal wavelength 0.01-0.39 doubly, altitude range be the light signal that transmitted wavelength 0.01-0.3 doubly; The material refractive index of high refractive index medium is higher than the material refractive index of low refractive index dielectric and covering, the material of low refractive index dielectric and covering can be same material or different materials, and the ratio of the maximal value of the material refractive index of low refractive index dielectric and covering and the material refractive index of high refractive index medium is less than 0.75.
The material of metal level is any or alloy separately or the compound material of different metal layer in the gold, silver, aluminium, copper, titanium, nickel, chromium that can produce surface plasmons in the described medium loaded type surface plasmon optical waveguide structure.
In the described medium loaded type surface plasmon optical waveguide structure outer contour shape in high refractive index medium zone and the cross section in the common zone that constitutes, low refractive index dielectric zone be square, rectangle or trapezoidal in any.
In the described medium loaded type surface plasmon optical waveguide structure cross section in low refractive index dielectric zone be shaped as square, rectangle, circle, ellipse or trapezoidal in any.
Medium loaded type surface plasmon optical waveguide of the present invention has the following advantages:
1. the material of recommending the low refractive index dielectric zone of matter loaded type surface plasmon optical waveguide can adopt low-index material or other low refractive index polymer materials such as silicon dioxide, also can adopt air and other gas to fill, its loss can be significantly reduced, an enhancement effect is further strengthened on the other hand, and traditional medium loaded type light wave guide rule can't be realized this goal.
2. recommend matter loaded type surface plasmon optical waveguide and compare with existing medium loaded type surface plasmon optical waveguide based on low-refraction, its size is obviously dwindled, and has improved integrated level, keeps lower loss simultaneously.Compare with the medium loaded type surface plasmon optical waveguide based on high index of refraction, its loss reduces greatly, has kept sub-wavelength mould field limitation capability simultaneously.
3. because the high refractive index medium layer of the matter loaded type surface plasmon optical waveguide of recommending can adopt semiconductor material, this two-dimensional structure can mate with semiconductor planar chip manufacture technology, easily is applied in the chip of light waveguide of high integration.
Description of drawings
Fig. 1 is the structural representation of medium loaded type surface plasmon optical waveguide.Zone 1 is a metallic substrate layer, and zone 2 is the low refractive index dielectric district, and its width is W
l, highly be h
lZone 3 is the high refractive index medium district, and its width is W
h, highly be h
hZone 4 is a covering.
Fig. 2 is the structural drawing of example 1,2 described medium loaded type surface plasmon optical waveguides.201 is metallic substrate layer, n
mBe its refractive index; 202 is the low refractive index dielectric district, n
1Be its refractive index, W
lBe its width, h
lBe its height; 203 is the high refractive index dielectric area, n
hBe its refractive index, W
hBe its width, h
hBe its height; 204 is covering, n
cBe its refractive index.
Fig. 3 is the electric-field intensity distribution curve of the wavelength of transmitting optical signal surface plasmon mode formula light field of example 1 described medium loaded type surface plasmon optical waveguide when being 1.55 μ m.Wherein, Fig. 3 (a) is the distribution curve of electric field intensity Y component along X-direction, and Fig. 3 (b) is the distribution curve of electric field intensity Y component along Y direction.
Fig. 4 be the wavelength of transmitting optical signal when being 1.55 μ m in the example 1 described medium loaded type surface plasmon optical waveguide effective refractive index of the stripped excimer patterns such as surface of transmission with width W
lChange curve.
Fig. 5 be the wavelength of transmitting optical signal when being 1.55 μ m in the example 1 described medium loaded type surface plasmon optical waveguide transmission range of the stripped excimer patterns such as surface of transmission with width W
lChange curve.
Fig. 6 be the wavelength of transmitting optical signal when being 1.55 μ m in the example 1 described medium loaded type surface plasmon optical waveguide the effective mode field area of normalization of the stripped excimer patterns such as surface of transmission with width W
lChange curve
Fig. 7 is the electric-field intensity distribution curve of the wavelength of transmitting optical signal surface plasmon mode formula light field of example 2 described medium loaded type surface plasmon optical waveguides when being 1.55 μ m.Wherein, Fig. 7 (a) is the distribution curve of electric field intensity Y component along X-direction, and Fig. 7 (b) is the distribution curve of electric field intensity Y component along Y direction.
Fig. 8 be the wavelength of transmitting optical signal when being 1.55 μ m in the example 2 described medium loaded type surface plasmon optical waveguides effective refractive index of the stripped excimer patterns such as surface of transmission with width W
lChange curve.
Fig. 9 be the wavelength of transmitting optical signal when being 1.55 μ m in the example 2 described medium loaded type surface plasmon optical waveguides transmission range of the stripped excimer patterns such as surface of transmission with width W
lChange curve.
Figure 10 be the wavelength of transmitting optical signal when being 1.55 μ m in the example 2 described medium loaded type surface plasmon optical waveguides the effective mode field area of normalization of the stripped excimer patterns such as surface of transmission with width W
lChange curve
Embodiment
The mode characteristic of surface plasma-wave is the important indicator that characterizes surface plasmon optical waveguide.Wherein the mode characteristic parameter mainly includes and imitates refractive index real part, transmission range and the effective mode field area of normalization.
Transmission range L is defined as the distance when electric field intensity decays to initial value 1/e on arbitrary interface, and its expression formula is:
L＝λ/[4π/Im(n
eff)] (1)
Im (n wherein
Eff) be the imaginary part of pattern effective refractive index, λ is the wavelength of transmitting optical signal.
Effectively the calculation expression of mode field area is as follows:
A
eff＝(∫∫E(x，y)|
2dxdy)
2/∫∫E(x，y)|
4dxdy(2)
Wherein, A
EffBe effective mode field area, (x y) is the electric field of surface plasma-wave to E.The effective mode field area that the effective mode field area of normalization calculates for (2) formula and the ratio of the little hole area of diffraction limit.The area of diffraction limit aperture is defined as follows:
A
0＝λ
2/4 (3)
Wherein, A
0Be the little hole area of diffraction limit, λ is the wavelength of transmitting optical signal.Therefore, the effective mode field area A of normalization is:
A＝A
eff/A
0 (4)
The size of the effective mode field area of normalization characterizes the mould field limitation capability of pattern, and this value is less than the dimension constraint of 1 the corresponding sub-wavelength of situation.
Example 1: the material refractive index of high and low refractive index areas of dielectric differs bigger optical waveguide structure
Fig. 2 is the structural drawing of example 1 described medium loaded type surface plasmon optical waveguide.201 is metallic substrate layer, n
mBe its refractive index; 202 is the low refractive index dielectric district, n
1Be its refractive index, W
lBe its width, h
lBe its height; 203 is the high refractive index dielectric area, n
hBe its refractive index, W
hBe its width, h
hBe its height; 204 is covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 201 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 202 material is made as air, and its refractive index is 1; 203 material is made as silicon, and its refractive index is 3.5; 204 material is made as silicon dioxide, and its refractive index is 1.5.
In this example, 202 height h
l=50nm; 203 width W
h=200nm, height h
h=200nm; 202 width W
lSpan be 30-150nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of 1.55 mum wavelength place surface plasmon mode formulas.
Fig. 3 is the electric-field intensity distribution curve of the wavelength of transmitting optical signal surface plasmon mode formula light field of the described medium loaded type surface plasmon optical waveguide of example when being 1.55 μ m, wherein 202 width W
l=100nm.Wherein, Fig. 3 (a) is the distribution curve of electric field intensity Y component along X-direction, and Fig. 3 (b) is the distribution curve of electric field intensity Y component along Y direction.As seen from Figure 3, the electric field intensity curve of described medium loaded type surface plasmon optical waveguide light field has tangible enhancement effect in the low refractive index dielectric zone.
Fig. 4 be the wavelength of transmitting optical signal when being 1.55 μ m in the described medium loaded type surface plasmon optical waveguide of example the effective refractive index of the stripped excimer patterns such as surface of transmission with width W
lChange curve.As seen from Figure 4, the effective refractive index of the surface plasmon mode formula of described medium loaded type optical waveguide is with width W
lIncrease and reduce.
Fig. 5 be the wavelength of transmitting optical signal when being 1.55 μ m in the described medium loaded type surface plasmon optical waveguide of example the transmission range of the stripped excimer patterns such as surface of transmission with width W
lChange curve.As seen from Figure 5, the transmission range of the surface plasmon mode formula of described medium loaded type optical waveguide is between 21～60 microns, and with width W
lIncrease and increase.Replace low refractive index dielectric (corresponding W with high refractive index medium under the same terms
h=200nm, h
h=200nm, W
l=h
l=0, other parameter remains unchanged), the transmission range of the traditional high refractive index medium loaded type surface plasmon optical waveguide pattern that obtains is 17 microns.As can be known, described medium loaded type optical waveguide has lower loss.
Fig. 6 be the wavelength of transmitting optical signal when being 1.55 μ m in the described medium loaded type surface plasmon optical waveguide of example the effective mode field area of normalization of the stripped excimer patterns such as surface of transmission with width W
lChange curve.As seen from Figure 6, the mode field area of the surface plasmon mode formula of described medium loaded type optical waveguide is with width W
lIncrease and increase, as can be known, the increase of the transmission range of surface plasmon mode formula is a cost with sacrificial mold field limitation capability.The effective mode field area of normalization is still very little as seen from the figure simultaneously, and much smaller than 1, illustrates that described medium loaded type optical waveguide has the mould field limitation capability of sub-wavelength.
Example 2: the material refractive index of high and low refractive index areas of dielectric differs less optical waveguide structure
The structural drawing of example 2 described medium loaded type surface plasmon optical waveguides is seen Fig. 2.201 is metallic substrate layer, n
mBe its refractive index; 202 is the low refractive index dielectric district, n
1Be its refractive index, W
lBe its width, h
lBe its height; 203 is the high refractive index dielectric area, n
hBe its refractive index, W
hBe its width, h
hBe its height; 204 is covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 201 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 202 material is made as silicon nitride, and its refractive index is 2; 203 material is made as silicon, and its refractive index is 3.5; 204 material is made as silicon dioxide, and its refractive index is 1.5.
In this example, 202 height h
l=50nm; 203 width W
h=200nm, height h
h=200nm; 202 width W
lSpan be 30-150nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of 1.55 mum wavelength place surface plasmon mode formulas.
Fig. 7 is the electric-field intensity distribution curve of the wavelength of transmitting optical signal surface plasmon mode formula light field of the described medium loaded type surface plasmon optical waveguide of example when being 1.55 μ m, wherein 202 width W
l=100nm.Wherein, Fig. 7 (a) is the distribution curve of electric field intensity Y component along X-direction, and Fig. 7 (b) is the distribution curve of electric field intensity Y component along Y direction.As seen from Figure 7, the electric field intensity curve of described medium loaded type surface plasmon optical waveguide light field has tangible enhancement effect in the low refractive index dielectric zone.
Fig. 8 be the wavelength of transmitting optical signal when being 1.55 μ m in the described medium loaded type surface plasmon optical waveguide of example the effective refractive index of the stripped excimer patterns such as surface of transmission with width W
lChange curve.As seen from Figure 8, the effective refractive index of the surface plasmon mode formula of described medium loaded type optical waveguide is with width W
lIncrease and reduce.
Fig. 9 be the wavelength of transmitting optical signal when being 1.55 μ m in the described medium loaded type surface plasmon optical waveguide of example the transmission range of the stripped excimer patterns such as surface of transmission with width W
lChange curve.As seen from Figure 9, the transmission range of the surface plasmon mode formula of described medium loaded type optical waveguide is between 20～37 microns, and with width W
lIncrease and reduce.Replace low refractive index dielectric (corresponding W with high refractive index medium under the same terms
h=200nm, h
h=200nm, W
l=h
l=0, other parameter remains unchanged), the transmission range of the traditional high refractive index medium loaded type surface plasmon optical waveguide pattern that obtains is 17 microns.As can be known, described medium loaded type optical waveguide has lower loss.
Figure 10 be the wavelength of transmitting optical signal when being 1.55 μ m in the described medium loaded type surface plasmon optical waveguide of example the effective mode field area of normalization of the stripped excimer patterns such as surface of transmission with width W
lChange curve.As seen from Figure 10, the mode field area of the surface plasmon mode formula of described medium loaded type optical waveguide is with width W
lIncrease and increase, as can be known, the increase of the transmission range of surface plasmon mode formula is a cost with sacrificial mold field limitation capability.The effective mode field area of normalization is still very little as seen from the figure simultaneously, and much smaller than 1, illustrates that described medium loaded type optical waveguide has the mould field limitation capability of sub-wavelength.
The simulation result of example 1 and example 2 shows that the material that the high and low refractive index areas of dielectric in the waveguiding structure involved in the present invention can adopt refractive index to differ bigger is realized, also can adopt refractive index to differ materials with smaller and realize.
It should be noted that embodiment in above each accompanying drawing at last only in order to surface plasmon optical waveguide structure of the present invention to be described, but unrestricted.Although the present invention is had been described in detail with reference to embodiment, those of ordinary skill in the art is to be understood that, technical scheme of the present invention is made amendment or is equal to replacement, do not break away from the spirit and scope of technical solution of the present invention, it all should be encompassed in the middle of the claim scope of the present invention.
Claims (4)
1. one kind possesses the low transmission loss and simultaneously than the medium loaded type surface plasmon optical waveguide structure of high field restriction ability, low refractive index dielectric zone and covering that its xsect comprises metallic substrate layer, be positioned at high refractive index medium zone on the metallic substrate layer, surrounded by high refractive index medium zone and metallic substrate layer; Wherein, the width range in high refractive index medium zone be institute's transmitting optical signal wavelength 0.06-0.4 doubly, altitude range be the light signal that transmitted wavelength 0.06-0.4 doubly, the low refractive index dielectric zone joins with metallic substrate layer, and the width range in low refractive index dielectric zone be institute's transmitting optical signal wavelength 0.01-0.39 doubly, altitude range be the light signal that transmitted wavelength 0.01-0.3 doubly; The material refractive index of high refractive index medium is higher than the material refractive index of low refractive index dielectric and covering, the material of low refractive index dielectric and covering can be same material or different materials, and the ratio of the maximal value of the material refractive index of low refractive index dielectric and covering and the material refractive index of high refractive index medium is less than 0.75.
2. optical waveguide structure according to claim 1, it is characterized in that the material of metal level is any or alloy separately or the compound material of different metal layer in the gold, silver, aluminium, copper, titanium, nickel, chromium that can produce surface plasmons in the described structure.
3. optical waveguide structure according to claim 1 is characterized in that, in the described structure outer contour shape in high refractive index medium zone and the cross section in the common zone that constitutes, low refractive index dielectric zone be square, rectangle or trapezoidal in any.
4. optical waveguide structure according to claim 1 is characterized in that, in the described structure cross section in low refractive index dielectric zone be shaped as square, rectangle, circle, ellipse or trapezoidal in any.
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| CN102540331A (en) * | 2012-02-22 | 2012-07-04 | 北京航空航天大学 | Surface plasma polarization optical waveguide |
| CN102565929A (en) * | 2012-01-16 | 2012-07-11 | 北京航空航天大学 | Surface plasmon polaritons optical waveguide of nanowire arrays |
| CN102565934A (en) * | 2012-01-16 | 2012-07-11 | 北京航空航天大学 | Trough type mixed surface plasma optical waveguide |
| CN102565933A (en) * | 2012-01-16 | 2012-07-11 | 北京航空航天大学 | Sub-wavelength mixed type surface plasma optical waveguide |
| CN102565928A (en) * | 2012-01-16 | 2012-07-11 | 北京航空航天大学 | Sub-wavelength dielectric-loaded surface plasma optical waveguide |
| CN102565938A (en) * | 2012-03-06 | 2012-07-11 | 北京航空航天大学 | Low-loss surface plasmon polariton optical waveguide based on double-layer metal |
| CN102590939A (en) * | 2012-03-05 | 2012-07-18 | 北京航空航天大学 | Surface plasmon polariton slit light waveguide |
| CN104407414A (en) * | 2014-11-21 | 2015-03-11 | 深圳大学 | Optical waveguide and sensor thereof |
| CN105552499A (en) * | 2015-12-10 | 2016-05-04 | 上海电机学院 | Plasmon active waveguide device and method of controlling propagation of plasmons |
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| US20030133682A1 (en) * | 2002-01-14 | 2003-07-17 | Henryk Temkin | Optical waveguide structures and methods of fabrication |
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Patent Citations (2)
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| CN1398356A (en) * | 2000-02-08 | 2003-02-19 | 康宁股份有限公司 | Planar waveguides with high refractive index |
| US20030133682A1 (en) * | 2002-01-14 | 2003-07-17 | Henryk Temkin | Optical waveguide structures and methods of fabrication |
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| CN102565934B (en) * | 2012-01-16 | 2013-06-19 | 北京航空航天大学 | Trough type mixed surface plasma optical waveguide |
| CN102565929B (en) * | 2012-01-16 | 2013-07-03 | 北京航空航天大学 | Surface plasmon polaritons optical waveguide of nanowire arrays |
| CN102565934A (en) * | 2012-01-16 | 2012-07-11 | 北京航空航天大学 | Trough type mixed surface plasma optical waveguide |
| CN102565933A (en) * | 2012-01-16 | 2012-07-11 | 北京航空航天大学 | Sub-wavelength mixed type surface plasma optical waveguide |
| CN102565929A (en) * | 2012-01-16 | 2012-07-11 | 北京航空航天大学 | Surface plasmon polaritons optical waveguide of nanowire arrays |
| CN102565928B (en) * | 2012-01-16 | 2013-06-19 | 北京航空航天大学 | Sub-wavelength dielectric-loaded surface plasma optical waveguide |
| CN102565928A (en) * | 2012-01-16 | 2012-07-11 | 北京航空航天大学 | Sub-wavelength dielectric-loaded surface plasma optical waveguide |
| CN102565933B (en) * | 2012-01-16 | 2013-06-19 | 北京航空航天大学 | Sub-wavelength mixed type surface plasma optical waveguide |
| CN102540331A (en) * | 2012-02-22 | 2012-07-04 | 北京航空航天大学 | Surface plasma polarization optical waveguide |
| CN102540331B (en) * | 2012-02-22 | 2014-03-26 | 北京航空航天大学 | Surface plasma polarization optical waveguide |
| CN102590939A (en) * | 2012-03-05 | 2012-07-18 | 北京航空航天大学 | Surface plasmon polariton slit light waveguide |
| CN102565938B (en) * | 2012-03-06 | 2013-07-03 | 北京航空航天大学 | Low-loss surface plasmon optical waveguide based on double-layer metal |
| CN102565938A (en) * | 2012-03-06 | 2012-07-11 | 北京航空航天大学 | Low-loss surface plasmon polariton optical waveguide based on double-layer metal |
| CN104407414A (en) * | 2014-11-21 | 2015-03-11 | 深圳大学 | Optical waveguide and sensor thereof |
| CN104407414B (en) * | 2014-11-21 | 2017-08-11 | 深圳大学 | A kind of fiber waveguide and its sensor |
| CN105552499A (en) * | 2015-12-10 | 2016-05-04 | 上海电机学院 | Plasmon active waveguide device and method of controlling propagation of plasmons |
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