CN102590938A - Multilayer mixed surface plasmon polariton optical waveguide - Google Patents
Multilayer mixed surface plasmon polariton optical waveguide Download PDFInfo
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- CN102590938A CN102590938A CN2012100557482A CN201210055748A CN102590938A CN 102590938 A CN102590938 A CN 102590938A CN 2012100557482 A CN2012100557482 A CN 2012100557482A CN 201210055748 A CN201210055748 A CN 201210055748A CN 102590938 A CN102590938 A CN 102590938A
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Abstract
The invention discloses a multilayer mixed surface plasmon polariton optical waveguide that is low in loss. The cross section of the waveguide structure comprises a substrate layer (1), a high refractive index medium layer (2), a low refractive index medium layer (3) on the high refractive index medium layer (2), a metal region (4) embedded into the low refractive index medium layer (3), a high refractive index medium layer (5) on the low refractive index medium layer (3) and a cladding (6). By coupling the two adjacent high refractive index medium layers (2, 5), the light field can be limited in the low refractive index medium layer (3). Meanwhile, the mixing effect between the metal region and the upper and the lower high refractive index medium layers (5, 2) enhances the field intensity more remarkably. The optical waveguide structure maintains the limiting capacity of a sub-wavelength mode field and has lower transmission loss. The waveguide is easy to implement by plane machining process and can be used to construct various integrated photonic devices.
Description
Technical field
The present invention relates to the optical waveguide technique field, be specifically related to a kind of multilayer mixed type surface plasmon optical waveguide.
Background technology
Surface plasmons is the non-electromagnetic radiation pattern that metal surface free electron and incident photon intercouple and form, and it is a kind of mixed activation attitude of local in metal and dielectric surface propagation.This pattern is present near metal and the medium interface, and its field intensity is reaching maximum at the interface, and all is exponential decay along the direction perpendicular to the interface in the both sides, interface.Surface plasmons has stronger field limited characteristic, can field energy be constrained in the zone of bulk much smaller than its free space transmission wavelength, and its character can change with the metal surface structural change.Surface plasmon wave is led the restriction that can break through diffraction limit, light field is constrained in tens nanometers even the littler scope, and produce a significant enhancement effect.At present surface plasmon optical waveguide just with its unique mould field limitation capability and can transmit the photoelectricity signal simultaneously, special advantages such as adjustable demonstrates great potential in the nanophotonics field, and at aspects such as the super-resolution imaging of nano-photon chip, modulator, coupling mechanism and switch, nano laser, breakthrough diffraction limit and biology sensors important application prospects is arranged.
Medium/medium/metal type waveguide and medium/metal/metal mold waveguide is the surface plasmon optical waveguide structure of two quasi-traditions.Wherein, medium/medium/metal type transmission loss of optical waveguide is lower, but relatively poor mould field limitation capability has restricted its application in the high integration light path; On the other hand, medium/metal/metal mold optical waveguide has very strong mould field limitation capability, but its loss is too big, causes it can't realize long transmission apart from light signal.To the contradiction between conventional surface plasmon optical waveguide mould field limitation capability and the loss; The Xiang research group of opening of University of California Berkeley has proposed a kind of mixed type surface plasmon optical waveguide; They discover near high refractive index medium layer of interpolation low refractive index dielectric/metal surface; Can light field be tied in the low refractive index dielectric slit between high refractive index medium layer and the metal interface and transmit, keep lower loss simultaneously.
The present invention has then proposed a kind of multilayer mixed type surface plasmon optical waveguide that possesses the low transmission loss.Two high refractive index medium layers in the sandwich construction and wherein between coupling between the metallic region in the low refractive index dielectric layer make and can access the transmission light field preferably restriction has kept lower loss simultaneously.Institute's sandwich construction of carrying and plane processing technology are complementary, and can be used for making up types of functionality property integrated photonic device.
Summary of the invention
The invention provides a kind of multilayer mixed type surface plasmon optical waveguide that possesses sub-wavelength light field limitation capability and low transmission loss, its xsect comprises basalis, be arranged in high refractive index medium layer on the basalis, be positioned at low refractive index dielectric layer on the high refractive index medium layer, be embedded in the low refractive index dielectric layer metallic region, be positioned at high refractive index medium layer and covering on the low refractive index dielectric layer; Wherein, The width that is positioned at high refractive index medium layer, the low refractive index dielectric layer on the basalis and is positioned at the high refractive index medium layer on the low refractive index dielectric layer equate and be the light signal that transmitted wavelength 0.09-0.35 doubly, the height that is positioned at the high refractive index medium layer on the basalis and the height that is positioned at the high refractive index medium layer on the low refractive index dielectric layer be the light signal that transmitted wavelength 0.09-0.25 doubly; The height of low refractive index dielectric layer be the light signal that transmitted wavelength 0.009-0.2 doubly; The width that is embedded in the metallic region in the low refractive index dielectric layer be the light signal that transmitted wavelength 0.0129-0.35 doubly; And be not more than the width of low refractive index dielectric layer; The height of metallic region be the light signal that transmitted wavelength 0.006-0.19 doubly; And less than the height of low refractive index dielectric layer, metallic region does not contact with high refractive index medium layer and the high refractive index medium layer that is positioned on the low refractive index dielectric layer on being positioned at basalis; The high refractive index medium layer that is positioned on the basalis is identical or different material with the material that is positioned at the high refractive index medium layer on the low refractive index dielectric layer; And both material refractive indexes all are higher than the material refractive index of low refractive index dielectric layer and covering; The material of low refractive index dielectric layer and covering is same material or different materials, and the maximal value of the material refractive index of low refractive index dielectric layer and covering and the ratio of minimum value that is positioned at high refractive index medium layer on the basalis and the material refractive index that is positioned at the high refractive index medium layer on the low refractive index dielectric layer are less than 0.75; Be positioned at high refractive index medium layer, the low refractive index dielectric layer on the basalis in the said structure and be positioned at the high refractive index medium layer on the low refractive index dielectric layer the cross section be shaped as rectangle.
The compound substance that the material of metallic region constitutes for any or alloy separately in the gold, silver, aluminium, copper, titanium, nickel, chromium that can produce surface plasmons or above-mentioned metal in the said optical waveguide structure.
Be embedded in the said optical waveguide structure metallic region in the low refractive index dielectric layer the cross section be shaped as rectangle, circle, ellipse or trapezoidal in any.
Multilayer mixed type surface plasmon optical waveguide of the present invention has the following advantages:
The optical waveguide that the present invention designed has good mould field limitation capability and this two big advantage of low transmission loss concurrently, and near the field enhancement effect metallic region can be used in the fields such as nonlinear optics, light tweezer.
This mixed type waveguide based on multilayer planar structure can be complementary with the processing technology of existing planar waveguide, be prone to realize, can be used for making up all kinds of integrated optical devices and photon chip.
Description of drawings
Fig. 1 is the structural representation of multilayer mixed type surface plasmon optical waveguide.Zone 1 is a basalis, and zone 2 is the high refractive index medium layer, and it highly is h
2Zone 3 is the low refractive index dielectric layer, and it highly is h
3Zone 4 is for to be embedded in the metallic region in the low refractive index dielectric layer, and its width is w
4, highly be h
4Zone 5 is for to be positioned at the high refractive index medium layer on the low refractive index dielectric layer, and it highly is h
5The width in zone 2,3,5 is w; The lower surface in zone 4 is h to the minor increment of regional 2 upper surfaces
42, the upper surface in zone 4 is h to the distance of regional 5 lower surfaces
45Zone 6 is a covering.
Fig. 2 is the structural representation of instance 1 said multilayer mixed type surface plasmon optical waveguide.201 is basalis, n
sBe its refractive index; 202 is the high refractive index medium layer, n
hBe its refractive index, h
hBe its height; 203 is the low refractive index dielectric layer, n
1Be its refractive index, h
lBe its height; 204 for being embedded in the metallic region in the low refractive index dielectric layer, n
mBe its refractive index, w
mBe its width, h
mBe its height; 205 for being positioned at the high refractive index medium layer on the low refractive index dielectric layer, n
hBe its refractive index, h
hBe its height; 202,203 and 205 width is w; 204 lower surface is h to the minor increment of 202 upper surfaces
g, 204 upper surface is h to the distance of 205 lower surfaces
g206 is covering, n
cBe its refractive index.
Fig. 3 is the electric-field intensity distribution figure of the wavelength of transmitting optical signal surface plasmon mode formula light field of instance 1 said multilayer mixed type surface plasmon optical waveguide when being 1.55 μ m.
Fig. 4 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 1 said multilayer mixed type surface plasmon optical waveguide the effective mode field area of effective refractive index, transmission range, normalization of the surface plasmon mode formula of transmission and restriction factor with metal width w
mChange curve.
Fig. 5 is the structural representation of instance 2 said multilayer mixed type surface plasmon optical waveguides.501 is basalis, n
sBe its refractive index; 502 is the high refractive index medium layer, n
hBe its refractive index, h
hBe its height; 503 is the low refractive index dielectric layer, n
1Be its refractive index, h
lBe its height; 504 for being embedded in the metallic region in the low refractive index dielectric layer, n
mBe its refractive index, h
mBe its height; 505 for being positioned at the high refractive index medium layer on the low refractive index dielectric layer, n
hBe its refractive index, h
hBe its height; 502,503,504 and 505 width is w; 504 lower surface is h to the minor increment of 502 upper surfaces
g, 504 upper surface is h to the distance of 505 lower surfaces
g506 is covering, n
cBe its refractive index.
Fig. 6 is the electric-field intensity distribution figure of the wavelength of transmitting optical signal surface plasmon mode formula light field of instance 2 said multilayer mixed type surface plasmon optical waveguides when being 1.55 μ m.
Fig. 7 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 2 said multilayer mixed type surface plasmon optical waveguides the effective mode field area of effective refractive index, transmission range, normalization of the surface plasmon mode formula of transmission and restriction factor with height h
hChange curve.
Embodiment
The mode characteristic of surface plasma-wave is the important indicator that characterizes surface plasmon optical waveguide.Wherein the mode characteristic parameter mainly includes and imitates refractive index real part, transmission range and the effective mode field area of normalization.
Transmission range L is defined as the distance when electric field intensity decays to initial value l/e on arbitrary interface, and its expression formula is:
L＝λ/[4π/Im(n
eff] (1)
Im (n wherein
Eff) be the imaginary part of pattern effective refractive index, λ is the wavelength of transmitting optical signal.
Effectively the calculation expression of mode field area is following:
A
eff＝(∫∫|E(x，y)|
2dxdy)
2/∫∫|E(x，y)|
4dxdy (2)
Wherein, A
EffBe effective mode field area, (x y) is the electric field of surface plasma-wave to E.The effective mode field area that the effective mode field area of normalization calculates for (2) formula and the ratio of the little hole area of diffraction limit.The area of diffraction limit aperture defines as follows:
A
0＝λ
2/4 (3)
Wherein, A
0Be the little hole area of diffraction limit, λ is the wavelength of transmitting optical signal.Therefore, the effective mode field area A of normalization is:
A＝A
eff/A
0 (4)
The size of the effective mode field area of normalization characterizes the mould field limitation capability of pattern, and this value is less than the dimension constraint of 1 the corresponding sub-wavelength of situation.Restriction factor characterizes the field intensity limitation capability of surface plasmon optical waveguide, is defined herein as the ratio that contained power in the low refractive index dielectric layer accounts for the waveguide general power.
Instance 1: be embedded in metallic region width in the low refractive index dielectric layer less than the width of low refractive index dielectric layer
Fig. 2 is the structural representation of instance 1 said multilayer mixed type surface plasmon optical waveguide.201 is basalis, n
sBe its refractive index; 202 is the high refractive index medium layer, n
hBe its refractive index, h
hBe its height; 203 is the low refractive index dielectric layer, n
1Be its refractive index, h
lBe its height; 204 for being embedded in the metallic region in the low refractive index dielectric layer, n
mBe its refractive index, w
mBe its width, h
mBe its height; 205 for being positioned at the high refractive index medium layer on the low refractive index dielectric layer, n
hBe its refractive index, h
hBe its height; 202,203 and 205 width is w; 204 lower surface is h to the minor increment of 202 upper surfaces
g, 204 upper surface is h to the distance of 205 lower surfaces
g206 is covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 201 and 203 material is a silicon dioxide, and its refractive index is 1.5; 204 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 202 and 205 material is a silicon, and its refractive index is 3.5; 206 material is made as air, and its refractive index is 1.
In this example, 202,203 and 205 width w=200nm, 202 and 205 height h
h=200nm; 203 height h
l=50nm; 204 height h
m=30nm; Distance h
g=10nm; 204 width w
mSpan be 40-160nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of the accurate symmetrical surface plasmon pattern that 1.55 these waveguides of mum wavelength place are supported.
Fig. 3 is the electric-field intensity distribution figure of the wavelength of transmitting optical signal surface plasmon mode formula light field of instance 1 said multilayer mixed type surface plasmon optical waveguide when being 1.55 μ m.Visible by Fig. 3, this pattern has tangible enhancement effect near low refractive index dielectric layer especially metallic region.
Fig. 4 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 1 said multilayer mixed type surface plasmon optical waveguide the effective mode field area of effective refractive index, transmission range, normalization of the surface plasmon mode formula of transmission and restriction factor with metal width w
mChange curve.Visible by Fig. 4 (a)-(d), the effective refractive index of surface plasmon mode formula is with w
mIncrease and increase, and transmission range and restriction factor are all with w
mIncrease and reduce, mode field area then is to reduce earlier afterwards to increase.In gamut, the transmission range of pattern remains at the hundreds of micron, and keeps the mould field limitation capability of dark sub-wavelength.
Instance 2: the metallic region width that is embedded in the low refractive index dielectric layer equates with the width of low refractive index dielectric layer
Fig. 5 is the structural representation of instance 2 said multilayer mixed type surface plasmon optical waveguides.501 is basalis, n
sBe its refractive index; 502 is the high refractive index medium layer, n
hBe its refractive index, h
hBe its height; 503 is the low refractive index dielectric layer, n
1Be its refractive index, h
lBe its height; 504 for being embedded in the metallic region in the low refractive index dielectric layer, n
mBe its refractive index, h
mBe its height; 505 for being positioned at the high refractive index medium layer on the low refractive index dielectric layer, n
hBe its refractive index, h
hBe its height; 502,503,504 and 505 width is w; 504 lower surface is h to the minor increment of 502 upper surfaces
g, 504 upper surface is h to the distance of 505 lower surfaces
g506 is covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 501 and 503 material is a silicon dioxide, and its refractive index is 1.5; 504 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 502 and 505 material is a silicon, and its refractive index is 3.5; 506 material is made as air, and its refractive index is 1.
In this example, 502,503,504 and 505 width w=200nm; 503 height h
l=50nm; 504 height h
m=30nm; Distance h
g=10nm; 502 and 505 height h
hSpan be 150-300nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of the accurate symmetrical surface plasmon pattern that 1.55 these waveguides of mum wavelength place are supported.
Fig. 6 is the electric-field intensity distribution figure of the wavelength of transmitting optical signal surface plasmon mode formula light field of instance 2 said multilayer mixed type surface plasmon optical waveguides when being 1.55 μ m.Visible by Fig. 6, this pattern has tangible enhancement effect near metallic region low refractive index dielectric layer up and down.
Fig. 7 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 2 said multilayer mixed type surface plasmon optical waveguides the effective mode field area of effective refractive index, transmission range, normalization of the surface plasmon mode formula of transmission and restriction factor with height h
hChange curve.Visible by Fig. 7 (a)-(d), the effective refractive index of surface plasmon mode formula and transmission range are with height h
hIncrease and increase, mode field area then is to reduce earlier afterwards to increase, and restriction factor increases afterwards earlier and reduces.In gamut, the transmission range of pattern remains at the hundreds of micron, and keeps the mould field limitation capability of dark sub-wavelength.
The simulation result of instance 1 and instance 2 shows that the width that is embedded in the metallic region in the low refractive index dielectric layer in the waveguiding structure involved in the present invention can also can equate with it less than the width of low refractive index dielectric layer.
What should explain at last is, more than embodiment in each accompanying drawing only in order to surface plasmon optical waveguide structure of the present invention to be described, but unrestricted.Although the present invention is specified with reference to embodiment; Those of ordinary skill in the art is to be understood that; Technical scheme of the present invention is made amendment or is equal to replacement, do not break away from the spirit and the scope of technical scheme of the present invention, it all should be encompassed in the middle of the claim scope of the present invention.
Claims (3)
1. multilayer mixed type surface plasmon optical waveguide that possesses sub-wavelength light field limitation capability and low transmission loss, its xsect comprise basalis, be arranged in high refractive index medium layer on the basalis, be positioned at low refractive index dielectric layer on the high refractive index medium layer, be embedded in the low refractive index dielectric layer metallic region, be positioned at high refractive index medium layer and covering on the low refractive index dielectric layer; Wherein, The width that is positioned at high refractive index medium layer, the low refractive index dielectric layer on the basalis and is positioned at the high refractive index medium layer on the low refractive index dielectric layer equate and be the light signal that transmitted wavelength 0.09-0.35 doubly, the height that is positioned at the high refractive index medium layer on the basalis and the height that is positioned at the high refractive index medium layer on the low refractive index dielectric layer be the light signal that transmitted wavelength 0.09-0.25 doubly; The height of low refractive index dielectric layer be the light signal that transmitted wavelength 0.009-0.2 doubly; The width that is embedded in the metallic region in the low refractive index dielectric layer be the light signal that transmitted wavelength 0.0129-0.35 doubly; And be not more than the width of low refractive index dielectric layer; The height of metallic region be the light signal that transmitted wavelength 0.006-0.19 doubly; And less than the height of low refractive index dielectric layer, metallic region does not contact with high refractive index medium layer and the high refractive index medium layer that is positioned on the low refractive index dielectric layer on being positioned at basalis; The high refractive index medium layer that is positioned on the basalis is identical or different material with the material that is positioned at the high refractive index medium layer on the low refractive index dielectric layer; And both material refractive indexes all are higher than the material refractive index of low refractive index dielectric layer and covering; The material of low refractive index dielectric layer and covering is same material or different materials, and the maximal value of the material refractive index of low refractive index dielectric layer and covering and the ratio of minimum value that is positioned at high refractive index medium layer on the basalis and the material refractive index that is positioned at the high refractive index medium layer on the low refractive index dielectric layer are less than 0.75; Be positioned at high refractive index medium layer, the low refractive index dielectric layer on the basalis in the said structure and be positioned at the high refractive index medium layer on the low refractive index dielectric layer the cross section be shaped as rectangle.
2. optical waveguide structure according to claim 1; It is characterized in that the compound substance that the material that is embedded in the metallic region in the low refractive index dielectric layer in the said structure constitutes for any or alloy separately in the gold, silver that can produce surface plasmons, aluminium, copper, titanium, nickel, the chromium or above-mentioned metal.
3. optical waveguide structure according to claim 1 is characterized in that, be embedded in the said structure metallic region in the low refractive index dielectric layer the cross section be shaped as rectangle, circle, ellipse or trapezoidal in any.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103246016A (en) * | 2013-05-03 | 2013-08-14 | 中国科学院物理研究所 | Method for reducing loss generated by leakage in process of transmitting surface plasmons |
| CN104964762A (en) * | 2015-07-09 | 2015-10-07 | 广西师范大学 | Grating structure lithium niobate-gold-lithium niobate surface plasmon temperature sensing device |
| CN112068381A (en) * | 2020-08-11 | 2020-12-11 | 中山大学 | Broadband infrared composite optical waveguide for molecular detection and preparation method thereof |
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| US20080226222A1 (en) * | 2007-03-16 | 2008-09-18 | Jin Tae Kim | Opto-electric bus module and method of manufacturing the same |
| CN101630039A (en) * | 2009-03-19 | 2010-01-20 | 国家纳米科学中心 | Low loss mixed type surface plasmon optical waveguide |
| US20100014808A1 (en) * | 2008-06-05 | 2010-01-21 | Colorado School Of Mines | Hybrid dielectric/surface plasmon polariton waveguide with grating coupling |
-
2012
- 2012-03-05 CN CN2012100557482A patent/CN102590938A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080226222A1 (en) * | 2007-03-16 | 2008-09-18 | Jin Tae Kim | Opto-electric bus module and method of manufacturing the same |
| US20100014808A1 (en) * | 2008-06-05 | 2010-01-21 | Colorado School Of Mines | Hybrid dielectric/surface plasmon polariton waveguide with grating coupling |
| CN101630039A (en) * | 2009-03-19 | 2010-01-20 | 国家纳米科学中心 | Low loss mixed type surface plasmon optical waveguide |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103246016A (en) * | 2013-05-03 | 2013-08-14 | 中国科学院物理研究所 | Method for reducing loss generated by leakage in process of transmitting surface plasmons |
| CN104964762A (en) * | 2015-07-09 | 2015-10-07 | 广西师范大学 | Grating structure lithium niobate-gold-lithium niobate surface plasmon temperature sensing device |
| CN104964762B (en) * | 2015-07-09 | 2019-04-23 | 广西师范大学 | A kind of lithium niobate-gold of optical grating construction-lithium niobate surface plasmons temperature sensing device |
| CN112068381A (en) * | 2020-08-11 | 2020-12-11 | 中山大学 | Broadband infrared composite optical waveguide for molecular detection and preparation method thereof |
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