CN102169206B - Low loss surface plasmon optical waveguide - Google Patents
Low loss surface plasmon optical waveguide Download PDFInfo
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- CN102169206B CN102169206B CN2011101083050A CN201110108305A CN102169206B CN 102169206 B CN102169206 B CN 102169206B CN 2011101083050 A CN2011101083050 A CN 2011101083050A CN 201110108305 A CN201110108305 A CN 201110108305A CN 102169206 B CN102169206 B CN 102169206B
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Abstract
The invention discloses a surface plasmon optical waveguide of low transmitting loss. A cross section of the waveguide structure comprises a medium substrate layer (4), a medium area with high refractive index (3) on the medium substrate layer, a metal layer (1) on the medium area with high refractive index, a medium area with low refractive index (2) surrounded by the medium area with high refractive index and a metal substrate layer, and a cladding (5). The medium area with high refractive index below the metal layer can substantially reduce the optical field distribution scope of the waveguide structure to realize constraint on two dimensional sub-wavelength of the transmitting optical field; and simultaneously the existence of the medium area with low refractive index can keep the waveguide still at low transmitting loss. The optical waveguide structure overcomes the contradiction of the conventional surface plasmon optical waveguide between the optical field restriction capability and the transmitting loss, to provide possibility for the realization of an optical waveguide chip at ultrahigh integrated level.
Description
Technical field
The present invention relates to the optical waveguide technique field, be specifically related to a kind of low-loss surface plasmon optical waveguide.
Background technology
Surface plasmons is a kind of mode of electromagnetic wave that the interaction by light and metal surface free electron causes.This pattern is present near metal and the medium interface, and its field intensity is reaching maximum at the interface, and all is exponential decay along the direction perpendicular to the interface in the both sides, interface.Surface plasmons has stronger field limited characteristic, can field energy be constrained in the zone of bulk much smaller than its free space transmission wavelength, and its character can change with the metal surface structural change.In the surface plasmon optical waveguide structure that proper metal and medium are formed, the lateral light field distribution can be limited in can surpassing the restriction of diffraction limit in tens nanometers even the littler scope.Surface plasmons has demonstrated huge application potential in the nanophotonics field, and for realizing that high integration nano-photon chip provides possibility.
Mould field limitation capability and loss are two important parameters that characterize the surface plasmon optical waveguide mode characteristic.The conventional surface plasmon optical waveguide mainly comprises medium/metal/metal mold and medium/medium/metal type two class formations.Wherein, medium/medium/metal type transmission loss of optical waveguide is lower, but relatively poor mould field limitation capability has restricted its application in the high integration light path; On the other hand, medium/metal/metal mold optical waveguide has very strong mould field limitation capability, but its loss is too big, causes it can't realize long transmission apart from light signal.
Solve the contradiction between conventional surface plasmon optical waveguide mould field limitation capability and the loss, the surface plasmon optical waveguide that exploitation has new features is the direction that the researchist makes great efforts always.The material (for example semiconductor material) of in waveguide, introducing high index of refraction can dwindle the overall dimensions of waveguide as dielectric layer and improve mould field limitation capability, but the loss that thereupon causes can obviously increase.
For addressing this problem, the present invention improves it on the basis of the above-mentioned surface plasmon optical waveguide original structure that contains high refractive index medium.Through introducing the composite structure that the high and low refractive index medium is formed, the novel surface plasmon optical waveguide that obtains possesses than low transmission loss and stronger mould field limitation capability simultaneously.Because the low refractive index dielectric zone can adopt air or other gas to fill, the loss of this waveguide can be significantly reduced, and an enhancement effect is further strengthened on the other hand.In addition because the high refractive index medium layer of the waveguide of carrying can adopt semiconductor material; Therefore this two-dimensional structure can mate with semiconductor planar chip manufacture technology; Be prone to be applied in the chip of light waveguide of high integration, for realizing that extensive integrated optical circuit has crucial meaning.
Summary of the invention
The objective of the invention is to overcome the big defective of surface plasmon optical waveguide loss that contains high refractive index medium, propose a kind ofly possess the low transmission loss simultaneously and than the surface plasmon optical waveguide structure of high field limitation capability.
The invention provides a kind of surface plasmon optical waveguide structure that possesses low transmission loss and high field restriction ability simultaneously, its xsect comprises the medium substrate layer, be positioned at high refractive index medium zone on the medium substrate layer, the metal level of the regional top of high refractive index medium, the low refractive index dielectric zone and the covering that are surrounded by high refractive index medium zone and metal level; Wherein, The width range in high refractive index medium zone be institute's transmitting optical signal wavelength 0.06-0.4 doubly; Altitude range be the light signal that transmitted wavelength 0.06-0.4 doubly; Top, low refractive index dielectric zone joins with the metal level below; And the width range in low refractive index dielectric zone be the high refractive index medium peak width 0.15-0.9 doubly, its altitude range be the high refractive index medium peak width 0.15-0.9 doubly, the width of metal level is greater than the width in low refractive index dielectric zone and be not more than the width in high refractive index medium zone; The material refractive index of high refractive index medium is higher than the material refractive index of medium substrate layer, low refractive index dielectric zone and covering; The material refractive index of medium substrate layer is greater than 1.4; The material of medium substrate layer, low refractive index dielectric zone and covering can be same material or different materials, and the ratio of the maximal value of the material refractive index of medium substrate layer, low refractive index dielectric zone and covering and the material refractive index of high refractive index medium is less than 0.75.
The compound substance that the material of metal level constitutes for any or alloy separately in the gold, silver, aluminium, copper, titanium, nickel, chromium that can produce surface plasmons or above-mentioned metal in the said structure.
In the said structure outer contour shape in high refractive index medium zone and the cross section in the common zone that constitutes, low refractive index dielectric zone be square, rectangle or trapezoidal in any.
In the said structure cross section in low refractive index dielectric zone be shaped as square, rectangle, circle, ellipse or trapezoidal in any.
Surface plasmon optical waveguide of the present invention has the following advantages:
1. the material in the low refractive index dielectric of the surface plasmon optical waveguide of carrying zone can adopt low-index material or other low refractive index polymer materials such as silicon dioxide; Also can adopt air and other gas to fill; Its loss can be significantly reduced; An enhancement effect is further strengthened on the other hand, and traditional surface plasmon optical waveguide based on high refractive index medium then can't be realized this goal.
The surface plasmon optical waveguide of carrying compare with existing surface plasmon optical waveguide based on low-refraction, its size is obviously dwindled, and has improved integrated level, keeps lower loss simultaneously.Compare with the surface plasmon optical waveguide based on high index of refraction, its loss reduces greatly, has kept sub-wavelength mould field limitation capability simultaneously.
3. because the high refractive index medium layer of the surface plasmon optical waveguide of carrying can adopt semiconductor material, this two-dimensional structure can mate with semiconductor planar chip manufacture technology, is prone to be applied in the chip of light waveguide of high integration.
Description of drawings
Fig. 1 is the structural representation of said surface plasmon optical waveguide.Zone 1 is a metal level, and its width is W
m, highly be h
mZone 2 is the low refractive index dielectric district, and its width is W
l, highly be h
lZone 3 is the high refractive index medium district, and its width is W, highly is h
hZone 4 is the medium substrate layer; Zone 5 is a covering.
Fig. 2 is the structural drawing of instance 1,2 said surface plasmon optical waveguides.201 is metallic substrate layer, n
mBe its refractive index, W
mBe its width, h
mBe its height; 202 is the low refractive index dielectric district, n
1Be its refractive index, W
lBe its width, h
lBe its height; 203 is the high refractive index dielectric area, n
hBe its refractive index, W is its width, h
hBe its height; 204 is the medium substrate layer, n
sBe its refractive index; 205 is covering, n
cBe its refractive index.
Fig. 3 is the electric-field intensity distribution curve of the wavelength of transmitting optical signal surface plasmon mode formula light field of instance 1 said surface plasmon optical waveguide when being 1.55 μ m.Wherein, Fig. 3 (a) is the distribution curve of electric field intensity Y component along X-direction, and Fig. 3 (b) is the distribution curve of electric field intensity Y component along Y direction.
Fig. 4 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 1 said surface plasmon optical waveguide effective refractive index of the stripped excimer patterns such as surface of transmission with width W
lChange curve.
Fig. 5 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 1 said surface plasmon optical waveguide transmission range of the stripped excimer patterns such as surface of transmission with width W
lChange curve.
Fig. 6 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 1 said surface plasmon optical waveguide the effective mode field area of normalization of the stripped excimer patterns such as surface of transmission with width W
lChange curve
Fig. 7 is the electric-field intensity distribution curve of the wavelength of transmitting optical signal surface plasmon mode formula light field of instance 2 said surface plasmon optical waveguides when being 1.55 μ m.Wherein, Fig. 7 (a) is the distribution curve of electric field intensity Y component along X-direction, and Fig. 7 (b) is the distribution curve of electric field intensity Y component along Y direction.
Fig. 8 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 2 said surface plasmon optical waveguides effective refractive index of the stripped excimer patterns such as surface of transmission with width W
lChange curve.
Fig. 9 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 2 said surface plasmon optical waveguides transmission range of the stripped excimer patterns such as surface of transmission with width W
lChange curve.
Figure 10 be the wavelength of transmitting optical signal when being 1.55 μ m in the instance 2 said surface plasmon optical waveguides the effective mode field area of normalization of the stripped excimer patterns such as surface of transmission with width W
lChange curve
Embodiment
The mode characteristic of surface plasma-wave is the important indicator that characterizes surface plasmon optical waveguide.Wherein the mode characteristic parameter mainly includes and imitates refractive index real part, transmission range and the effective mode field area of normalization.
Transmission range L is defined as the distance when electric field intensity decays to initial value 1/e on arbitrary interface, and its expression formula is:
L＝λ/[4π/Im(n
eff)] (1)
Im (n wherein
Eff) be the imaginary part of pattern effective refractive index, λ is the wavelength of transmitting optical signal.
Effectively the calculation expression of mode field area is following:
A
eff＝(∫∫|E(x，y)|
2dxdy)
2/∫∫|E(x，y)|
4dxdy (2)
Wherein, A
EffBe effective mode field area, (x y) is the electric field of surface plasma-wave to E.The effective mode field area that the effective mode field area of normalization calculates for (2) formula and the ratio of the little hole area of diffraction limit.The area of diffraction limit aperture defines as follows:
A
0＝λ
2/4 (3)
Wherein, A
0Be the little hole area of diffraction limit, λ is the wavelength of transmitting optical signal.Therefore, the effective mode field area A of normalization is:
A＝A
eff/A
0 (4)
The size of the effective mode field area of normalization characterizes the mould field limitation capability of pattern, and this value is less than the dimension constraint of 1 the corresponding sub-wavelength of situation.
Instance 1: the material refractive index of high and low refractive index areas of dielectric differs bigger optical waveguide structure
Fig. 2 is the structural drawing of instance 1 said surface plasmon optical waveguide.201 is metallic substrate layer, n
mBe its refractive index, W
mBe its width, h
mBe its height; 202 is the low refractive index dielectric district, n
1Be its refractive index, W
lBe its width, h
lBe its height; 203 is the high refractive index dielectric area, n
hBe its refractive index, W is its width, h
hBe its height; 204 is the medium substrate layer, n
sBe its refractive index; 205 is covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 201 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 202 and 205 material is made as air, and its refractive index is 1; 203 material is made as silicon, and its refractive index is 3.5; 204 material is made as silicon dioxide, and its refractive index is 1.5.
In this example, 201 width W
m=300nm, height h
m=100nm; 202 height h
l=50nm; Width W=300nm of 203, height h
h=300nm; 202 width W
lSpan be 50-250nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of 1.55 mum wavelength place surface plasmon mode formulas.
Fig. 3 is the electric-field intensity distribution curve of the wavelength of transmitting optical signal surface plasmon mode formula light field of instance 1 said surface plasmon optical waveguide when being 1.55 μ m, wherein 202 width W
l=100nm.Wherein, Fig. 3 (a) is the distribution curve of electric field intensity Y component along X-direction, and Fig. 3 (b) is the distribution curve of electric field intensity Y component along Y direction.Visible by Fig. 3, the electric field intensity curve of said surface plasmon optical waveguide light field has tangible enhancement effect in the low refractive index dielectric zone.
Fig. 4 be the wavelength of transmitting optical signal when being 1.55 μ m in the said surface plasmon optical waveguide of instance the effective refractive index of the stripped excimer patterns such as surface of transmission with width W
lChange curve.Visible by Fig. 4, the effective refractive index of the surface plasmon mode formula of said optical waveguide is with width W
lIncrease and reduce.
Fig. 5 be the wavelength of transmitting optical signal when being 1.55 μ m in the said surface plasmon optical waveguide of instance the transmission range of the stripped excimer patterns such as surface of transmission with width W
lChange curve.Visible by Fig. 5, the transmission range of the surface plasmon mode formula of said optical waveguide is between 21～65 microns, and with width W
lIncrease and increase.Replace low refractive index dielectric (corresponding W=300nm, h with high refractive index medium under the same terms
h=300nm, W
l=h
l=0, other parameter remains unchanged), the transmission range of the traditional high index of refraction surface plasmon optical waveguide pattern that obtains is 18 microns.Can know that said optical waveguide has lower loss.
Fig. 6 be the wavelength of transmitting optical signal when being 1.55 μ m in the said surface plasmon optical waveguide of instance the effective mode field area of normalization of the stripped excimer patterns such as surface of transmission with width W
lChange curve.Visible by Fig. 6, the mode field area of the surface plasmon mode formula of said optical waveguide is with width W
lIncrease and reduce, can know that by figure the effective mode field area of normalization is still very little simultaneously, and, explain that said optical waveguide has the mould field limitation capability of sub-wavelength much smaller than 1.
Instance 2: the material refractive index of high and low refractive index areas of dielectric differs less optical waveguide structure
The structural drawing of instance 2 said surface plasmon optical waveguides is seen Fig. 2.201 is metallic substrate layer, n
mBe its refractive index, W
mBe its width, h
mBe its height; 202 is the low refractive index dielectric district, n
1Be its refractive index, W
lBe its width, h
lBe its height; 203 is the high refractive index dielectric area, n
hBe its refractive index, W is its width, h
hBe its height; 204 is the medium substrate layer, n
sBe its refractive index; 205 is covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 201 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 202 material is made as silicon nitride, and its refractive index is 2; 203 material is made as silicon, and its refractive index is 3.5; 204 material is made as silicon dioxide, and its refractive index is 1.5; 205 material is made as air, and its refractive index is 1.
In this example, 201 width W
m=300nm, height h
m=100nm; 202 height h
l=50nm; Width W=300nm of 203, height h
h=300nm; 202 width W
lSpan be 50-250nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of 1.55 mum wavelength place surface plasmon mode formulas.
Fig. 7 is the electric-field intensity distribution curve of the wavelength of transmitting optical signal surface plasmon mode formula light field of the said surface plasmon optical waveguide of instance when being 1.55 μ m, wherein 202 width W
l=100nm.Wherein, Fig. 7 (a) is the distribution curve of electric field intensity Y component along X-direction, and Fig. 7 (b) is the distribution curve of electric field intensity Y component along Y direction.Visible by Fig. 7, the electric field intensity curve of said surface plasmon optical waveguide light field has tangible enhancement effect in the low refractive index dielectric zone.
Fig. 8 be the wavelength of transmitting optical signal when being 1.55 μ m in the said surface plasmon optical waveguide of instance the effective refractive index of the stripped excimer patterns such as surface of transmission with width W
lChange curve.Visible by Fig. 8, the effective refractive index of the surface plasmon mode formula of said optical waveguide is with width W
lIncrease and reduce.
Fig. 9 be the wavelength of transmitting optical signal when being 1.55 μ m in the said surface plasmon optical waveguide of instance the transmission range of the stripped excimer patterns such as surface of transmission with width W
lChange curve.Visible by Fig. 9, the transmission range of the surface plasmon mode formula of said optical waveguide is between 20～41 microns, and with width W
lIncrease and reduce.Replace low refractive index dielectric (corresponding W with high refractive index medium under the same terms
h=300nm, h
h=300nm, W
l=h
l=0, other parameter remains unchanged), the transmission range of the traditional high index of refraction surface plasmon optical waveguide pattern that obtains is 18 microns.Can know that said optical waveguide has lower loss.
Figure 10 be the wavelength of transmitting optical signal when being 1.55 μ m in the said surface plasmon optical waveguide of instance the effective mode field area of normalization of the stripped excimer patterns such as surface of transmission with width W
lChange curve.Visible by Figure 10, the mode field area of the surface plasmon mode formula of said optical waveguide is with width W
lIncrease and reduce.Can know that by figure the effective mode field area of normalization is still very little simultaneously, and, explain that said optical waveguide has the mould field limitation capability of sub-wavelength much smaller than 1.
The simulation result of instance 1 and instance 2 shows that the material that the high and low refractive index areas of dielectric in the waveguiding structure involved in the present invention can adopt refractive index to differ bigger is realized, also can adopt refractive index to differ materials with smaller and realize.
What should explain at last is, more than embodiment in each accompanying drawing only in order to surface plasmon optical waveguide structure of the present invention to be described, but unrestricted.Although the present invention is specified with reference to embodiment; Those of ordinary skill in the art is to be understood that; Technical scheme of the present invention is made amendment or is equal to replacement, do not break away from the spirit and the scope of technical scheme of the present invention, it all should be encompassed in the middle of the claim scope of the present invention.
Claims (4)
1. surface plasmon optical waveguide structure that possesses low transmission loss and high field restriction ability simultaneously, its xsect comprise the medium substrate layer, be positioned at high refractive index medium zone on the medium substrate layer, the metal level of the regional top of high refractive index medium, the low refractive index dielectric zone and the covering that are surrounded by high refractive index medium zone and metal level; Wherein, The width range in high refractive index medium zone be institute's transmitting optical signal wavelength 0.06-0.4 doubly; Altitude range be the light signal that transmitted wavelength 0.06-0.4 doubly; Top, low refractive index dielectric zone joins with the metal level below; And the width range in low refractive index dielectric zone be the high refractive index medium peak width 0.15-0.9 doubly, its altitude range be the high refractive index medium peak width 0.15-0.9 doubly, the width of metal level is greater than the width in low refractive index dielectric zone and be not more than the width in high refractive index medium zone; The material refractive index of high refractive index medium is higher than the material refractive index of medium substrate layer, low refractive index dielectric zone and covering; The material refractive index of medium substrate layer is greater than 1.4; The material of medium substrate layer, low refractive index dielectric zone and covering is same material or different materials, and the ratio of the maximal value of the material refractive index of medium substrate layer, low refractive index dielectric zone and covering and the material refractive index of high refractive index medium is less than 0.75.
2. optical waveguide structure according to claim 1; It is characterized in that the compound substance that the material of metal level constitutes for any or alloy separately in the gold, silver, aluminium, copper, titanium, nickel, chromium that can produce surface plasmons or above-mentioned metal in the said structure.
3. optical waveguide structure according to claim 1 is characterized in that, in the said structure outer contour shape in high refractive index medium zone and the cross section in the common zone that constitutes, low refractive index dielectric zone be rectangle or trapezoidal in any.
4. optical waveguide structure according to claim 1 is characterized in that, in the said structure cross section in low refractive index dielectric zone be shaped as rectangle, circle, ellipse or trapezoidal in any.
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| JP6456917B2 (en) | 2013-04-04 | 2019-01-23 | カリフォルニア インスティチュート オブ テクノロジー | Nanoscale plasmon field effect modulator |
| GB201313592D0 (en) * | 2013-07-30 | 2013-09-11 | Univ St Andrews | Optical modulator with plasmon based coupling |
| CN104407414B (en) * | 2014-11-21 | 2017-08-11 | 深圳大学 | A kind of fiber waveguide and its sensor |
| CN107422416B (en) * | 2017-06-22 | 2019-08-13 | 天津职业技术师范大学 | A kind of mixed type Bloch phasmon optical waveguide structure |
| CN110261957B (en) * | 2019-06-25 | 2020-03-06 | 南京航空航天大学 | High-backward stimulated Brillouin scattering gain micro-nano structure on-chip photoacoustic waveguide |
| CN112526674B (en) * | 2020-12-30 | 2022-10-14 | 南京邮电大学 | Low-loss arch column core micro-nano waveguide |
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