CN101592751B - 滤光器 - Google Patents
滤光器 Download PDFInfo
- Publication number
- CN101592751B CN101592751B CN2009101456595A CN200910145659A CN101592751B CN 101592751 B CN101592751 B CN 101592751B CN 2009101456595 A CN2009101456595 A CN 2009101456595A CN 200910145659 A CN200910145659 A CN 200910145659A CN 101592751 B CN101592751 B CN 101592751B
- Authority
- CN
- China
- Prior art keywords
- equal
- light filter
- opening
- wavelength
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title abstract description 45
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 238000001228 spectrum Methods 0.000 claims description 49
- 230000005540 biological transmission Effects 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 235000012239 silicon dioxide Nutrition 0.000 claims description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 238000004611 spectroscopical analysis Methods 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 description 130
- 239000002184 metal Substances 0.000 description 130
- 239000010408 film Substances 0.000 description 103
- 239000010410 layer Substances 0.000 description 97
- 238000010586 diagram Methods 0.000 description 27
- 230000010287 polarization Effects 0.000 description 19
- 230000014509 gene expression Effects 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000004411 aluminium Substances 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 238000010894 electron beam technology Methods 0.000 description 12
- 238000013461 design Methods 0.000 description 11
- 238000009826 distribution Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 238000012545 processing Methods 0.000 description 9
- 239000010453 quartz Substances 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 230000005672 electromagnetic field Effects 0.000 description 7
- 239000003574 free electron Substances 0.000 description 7
- 230000004807 localization Effects 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 7
- 239000003086 colorant Substances 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 230000001939 inductive effect Effects 0.000 description 6
- 239000002086 nanomaterial Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 230000000737 periodic effect Effects 0.000 description 5
- 238000000985 reflectance spectrum Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 208000004350 Strabismus Diseases 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000008246 gaseous mixture Substances 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000000255 optical extinction spectrum Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 239000002023 wood Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000009365 direct transmission Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000009331 sowing Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004577 thatch Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/204—Filters in which spectral selection is performed by means of a conductive grid or array, e.g. frequency selective surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/008—Surface plasmon devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Optical Elements Other Than Lenses (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008-142939 | 2008-05-30 | ||
| JP2008142939 | 2008-05-30 | ||
| JP2008142939 | 2008-05-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101592751A CN101592751A (zh) | 2009-12-02 |
| CN101592751B true CN101592751B (zh) | 2012-10-17 |
Family
ID=41057486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009101456595A Expired - Fee Related CN101592751B (zh) | 2008-05-30 | 2009-05-27 | 滤光器 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8067723B2 (enExample) |
| EP (1) | EP2128665B1 (enExample) |
| JP (1) | JP4995231B2 (enExample) |
| KR (2) | KR101175395B1 (enExample) |
| CN (1) | CN101592751B (enExample) |
Families Citing this family (60)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101058861B1 (ko) * | 2009-05-11 | 2011-08-23 | (주)실리콘화일 | 포토 리소그래피 공정이 가능한 금속 광학 필터 및 이를 포함하는 이미지 센서 |
| JP2011043681A (ja) * | 2009-08-21 | 2011-03-03 | Canon Inc | 光学素子、光検出素子、光変調素子、撮像素子及びカメラ |
| KR101274591B1 (ko) * | 2009-12-18 | 2013-06-13 | 엘지디스플레이 주식회사 | 표면 플라즈몬을 이용한 컬러필터와 액정표시장치 및 그 제조방법 |
| KR101313654B1 (ko) * | 2009-12-18 | 2013-10-02 | 엘지디스플레이 주식회사 | 표면 플라즈몬을 이용한 컬러필터와 액정표시장치 및 그 제조방법 |
| JP5741888B2 (ja) * | 2010-03-16 | 2015-07-01 | 株式会社豊田中央研究所 | 光学フィルタ及び表示装置 |
| KR20110107603A (ko) | 2010-03-25 | 2011-10-04 | 삼성전자주식회사 | 표면 플라즈몬과 high-k 물질을 이용한 반사 방지구조 및 그 제조방법 |
| US8879152B2 (en) | 2010-07-15 | 2014-11-04 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Optical bandpass filter system, in particular for multichannel spectral-selective measurements |
| JP5549495B2 (ja) * | 2010-09-13 | 2014-07-16 | 大日本印刷株式会社 | 光学素子、その製造方法及びその使用方法 |
| JP2012064703A (ja) * | 2010-09-15 | 2012-03-29 | Sony Corp | 撮像素子および撮像装置 |
| DE102011101635A1 (de) * | 2011-05-16 | 2012-11-22 | Giesecke & Devrient Gmbh | Zweidimensional periodisches, farbfilterndes Gitter |
| JP5713856B2 (ja) * | 2011-09-26 | 2015-05-07 | 株式会社東芝 | 光透過型金属電極、電子装置及び光学素子 |
| FR2982038B1 (fr) | 2011-10-28 | 2013-11-15 | Hologram Ind | Composant optique de securite a effet reflectif, fabrication d'un tel composant et document securise equipe d'un tel composant |
| EP2847557B1 (de) * | 2012-05-07 | 2017-08-23 | Elmos Semiconductor Aktiengesellschaft | Mikrooptisches filter und dessen verwendung in einem spektrometer |
| US9063072B1 (en) * | 2012-06-12 | 2015-06-23 | Maven Technologies, Llc | Birefringence correction for imaging ellipsometric bioassay system and method |
| US9274005B2 (en) * | 2012-08-23 | 2016-03-01 | Robert Bosch Gmbh | Device and method for increasing infrared absorption in MEMS bolometers |
| JPWO2014087927A1 (ja) * | 2012-12-06 | 2017-01-05 | シャープ株式会社 | 光学フィルター |
| US10197716B2 (en) | 2012-12-19 | 2019-02-05 | Viavi Solutions Inc. | Metal-dielectric optical filter, sensor device, and fabrication method |
| US9568362B2 (en) * | 2012-12-19 | 2017-02-14 | Viavi Solutions Inc. | Spectroscopic assembly and method |
| KR101467988B1 (ko) * | 2013-03-07 | 2014-12-10 | 광운대학교 산학협력단 | 대역폭 가변 광 필터 |
| JP6292766B2 (ja) * | 2013-05-08 | 2018-03-14 | 株式会社豊田中央研究所 | 光学フィルタ |
| JP2015022109A (ja) * | 2013-07-18 | 2015-02-02 | 旭化成株式会社 | 光学フィルタ及び光学フィルタ積層体 |
| JP6126490B2 (ja) * | 2013-08-05 | 2017-05-10 | シャープ株式会社 | 光学フィルター |
| JPWO2015033611A1 (ja) * | 2013-09-04 | 2017-03-02 | シャープ株式会社 | 光学フィルター及び撮像素子 |
| JP6214285B2 (ja) * | 2013-09-04 | 2017-10-18 | シャープ株式会社 | カラーセンサ |
| JP2015087526A (ja) * | 2013-10-30 | 2015-05-07 | 旭化成株式会社 | 赤外線用バンドパスフィルタ |
| JP6390090B2 (ja) * | 2013-11-19 | 2018-09-19 | セイコーエプソン株式会社 | 光学フィルターデバイス、光学モジュール、及び電子機器 |
| TWI509632B (zh) * | 2014-12-05 | 2015-11-21 | Nat Univ Tsing Hua | 採用超材料高通濾波器之透明導電電極 |
| TWI541493B (zh) * | 2015-09-01 | 2016-07-11 | 國立交通大學 | 一種分光器及其光譜儀 |
| US11187576B2 (en) | 2016-06-03 | 2021-11-30 | 3M Innovative Properties Company | Optical filters having spatially variant microreplicated layers |
| JP6926706B2 (ja) * | 2016-06-17 | 2021-08-25 | 株式会社リコー | 固体撮像素子の製造方法 |
| KR102294845B1 (ko) * | 2016-08-02 | 2021-08-30 | 삼성전자주식회사 | 광학필터, 광학 디바이스, 및 광학필터의 제조방법 |
| KR102020956B1 (ko) * | 2016-08-30 | 2019-10-18 | 삼성전자주식회사 | 광학필터 및 이를 이용한 광학 디바이스 |
| JP6789792B2 (ja) * | 2016-12-13 | 2020-11-25 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子、電子機器 |
| CN111051964B (zh) * | 2017-05-22 | 2022-03-11 | 乐卓博大学 | 光学显微镜检查的图像对比度增强 |
| CN109407189B (zh) * | 2017-08-18 | 2021-05-04 | 台湾积体电路制造股份有限公司 | 紫外光复合光栅及等离子装置 |
| US10381397B2 (en) * | 2017-11-14 | 2019-08-13 | Black Sesame International Holding Limited | Nano metallic planar apex optical detector |
| KR102536821B1 (ko) | 2018-04-16 | 2023-05-26 | 어플라이드 머티어리얼스, 인코포레이티드 | 임시 및 영구 접합을 사용하는 다중 적층 광학 요소들 |
| EP3617757B1 (en) * | 2018-08-27 | 2021-02-24 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Optical filter, optical filter system, spectrometer and method of fabrication thereof |
| SG11202105293SA (en) | 2018-11-29 | 2021-06-29 | Univ La Trobe | Microscopy method and system |
| EP3966554A4 (en) | 2018-11-29 | 2022-09-07 | La Trobe University | METHOD OF IDENTIFYING A STRUCTURE |
| EP3887799B1 (en) | 2018-11-29 | 2024-04-24 | La Trobe University | Automated method of identifying a structure |
| JP7652693B2 (ja) | 2018-12-20 | 2025-03-27 | キョーセラ・エイブイエックス・コンポーネンツ・コーポレーション | 高周波数多層フィルタ |
| DE112019006353T5 (de) | 2018-12-20 | 2021-09-09 | Avx Corporation | Mehrschichtfilter mit einem kondensator; der mit mindestens zwei durchkontaktierungen verbunden ist |
| US11563414B2 (en) | 2018-12-20 | 2023-01-24 | KYOCERA AVX Components Corporation | Multilayer electronic device including a capacitor having a precisely controlled capacitive area |
| JP7268161B2 (ja) | 2018-12-20 | 2023-05-02 | キョーセラ・エイブイエックス・コンポーネンツ・コーポレーション | 低インダクタンスビアアセンブリを備える多層フィルタ |
| CN113196561B (zh) | 2018-12-20 | 2022-08-23 | 京瓷Avx元器件公司 | 包括减少回波信号的突出部的多层滤波器 |
| US11595013B2 (en) | 2018-12-20 | 2023-02-28 | KYOCERA AVX Components Corporation | Multilayer electronic device including a high precision inductor |
| GB201902046D0 (en) * | 2019-02-14 | 2019-04-03 | Teledyne E2V Uk Ltd | Biased idf photodetector |
| CN109901253B (zh) * | 2019-03-22 | 2020-06-09 | 江南大学 | 一种表面等离子体滤波器 |
| CN110112156B (zh) * | 2019-04-23 | 2021-06-01 | Oppo广东移动通信有限公司 | 一种像素结构、cmos图像传感器和终端 |
| CN109951660B (zh) * | 2019-04-23 | 2021-09-03 | Oppo广东移动通信有限公司 | 一种像素结构、cmos图像传感器、图像信号处理器和终端 |
| CN110049261B (zh) * | 2019-04-23 | 2022-04-12 | Oppo广东移动通信有限公司 | 一种像素结构、图像传感器及终端 |
| CN110324545B (zh) * | 2019-06-11 | 2022-01-28 | Oppo广东移动通信有限公司 | 一种像素结构、图像传感器及终端 |
| CN110310969B (zh) * | 2019-07-08 | 2022-11-08 | Oppo广东移动通信有限公司 | 一种像素结构、cis和终端 |
| CN110346313A (zh) * | 2019-07-31 | 2019-10-18 | 清华大学 | 一种光调制微纳结构、微集成光谱仪及光谱调制方法 |
| JP2021107786A (ja) * | 2019-12-27 | 2021-07-29 | 富士通株式会社 | 光センサ |
| CN111505820A (zh) * | 2020-03-17 | 2020-08-07 | 清华大学 | 单片集成的图像传感芯片及光谱识别设备 |
| CN111811651B (zh) * | 2020-07-23 | 2024-06-18 | 清华大学 | 光谱芯片、光谱仪及光谱芯片制备方法 |
| KR102814266B1 (ko) * | 2021-11-11 | 2025-05-29 | 경북대학교 산학협력단 | 패브릿 패럿 플라즈모닉 컬러 필터 |
| KR102876052B1 (ko) * | 2021-12-03 | 2025-10-24 | 이화여자대학교 산학협력단 | 메타표면 흡수체 및 그 제조방법 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5973316A (en) | 1997-07-08 | 1999-10-26 | Nec Research Institute, Inc. | Sub-wavelength aperture arrays with enhanced light transmission |
| US6236033B1 (en) * | 1998-12-09 | 2001-05-22 | Nec Research Institute, Inc. | Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography |
| US6818907B2 (en) * | 2000-10-17 | 2004-11-16 | The President And Fellows Of Harvard College | Surface plasmon enhanced illumination system |
| US7154820B2 (en) * | 2003-01-06 | 2006-12-26 | Nec Corporation | Optical element for enhanced transmission of light and suppressed increase in temperature |
| US7456383B2 (en) * | 2003-08-06 | 2008-11-25 | University Of Pittsburgh | Surface plasmon-enhanced nano-optic devices and methods of making same |
| EP1721194A4 (en) * | 2003-12-05 | 2010-01-13 | Univ Pittsburgh | METALLIC NANOOPTIC LENSES AND JET FORMING EQUIPMENT |
| US7110154B2 (en) * | 2004-06-10 | 2006-09-19 | Clemson University | Plasmon-photon coupled optical devices |
| WO2006102275A2 (en) * | 2005-03-21 | 2006-09-28 | University Of Florida Research Foundation, Inc. | Multi-layer subwavelength structures for imparting controllable phase delay |
| EP1991891A1 (en) * | 2006-02-28 | 2008-11-19 | Canon Kabushiki Kaisha | Method for designing light transmission device, optical element and sensor |
| FR2900279B1 (fr) * | 2006-04-19 | 2008-06-06 | Commissariat Energie Atomique | Filtre spectral micro-structure et capteur d'images |
| JP5300344B2 (ja) * | 2007-07-06 | 2013-09-25 | キヤノン株式会社 | 光検出素子及び撮像素子、光検出方法及び撮像方法 |
| JP4621270B2 (ja) * | 2007-07-13 | 2011-01-26 | キヤノン株式会社 | 光学フィルタ |
-
2009
- 2009-05-15 JP JP2009118978A patent/JP4995231B2/ja active Active
- 2009-05-26 EP EP09007003.8A patent/EP2128665B1/en not_active Not-in-force
- 2009-05-27 CN CN2009101456595A patent/CN101592751B/zh not_active Expired - Fee Related
- 2009-05-28 US US12/474,086 patent/US8067723B2/en active Active
- 2009-05-29 KR KR1020090047734A patent/KR101175395B1/ko not_active Expired - Fee Related
-
2011
- 2011-10-21 US US13/279,119 patent/US8384013B2/en not_active Expired - Fee Related
-
2012
- 2012-04-02 KR KR1020120033955A patent/KR101253006B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN101592751A (zh) | 2009-12-02 |
| EP2128665A1 (en) | 2009-12-02 |
| KR20090125012A (ko) | 2009-12-03 |
| US8067723B2 (en) | 2011-11-29 |
| KR20120041184A (ko) | 2012-04-30 |
| US20090296246A1 (en) | 2009-12-03 |
| US8384013B2 (en) | 2013-02-26 |
| KR101253006B1 (ko) | 2013-04-15 |
| US20120038995A1 (en) | 2012-02-16 |
| JP2010009025A (ja) | 2010-01-14 |
| EP2128665B1 (en) | 2016-06-15 |
| KR101175395B1 (ko) | 2012-08-20 |
| JP4995231B2 (ja) | 2012-08-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101592751B (zh) | 滤光器 | |
| US20230375400A1 (en) | Color filter array having color filters, and image sensor and display device including the color filter array | |
| Chen et al. | Nanophotonic image sensors | |
| KR101175455B1 (ko) | 광학 필터, 수광 소자, 및 적층형 광학 필터 | |
| US10403665B2 (en) | Two-dimensional solid-state image capture device with polarization member, color filter and light shielding layer for sub-pixel regions and polarization-light data processing method to obtain polarization direction and polarization component intensity | |
| JP5538813B2 (ja) | 光学素子、及びこれを用いたイメージセンサ、撮像装置 | |
| Yu et al. | Transmissive/reflective structural color filters: theory and applications | |
| CN101894849B (zh) | 二维固体摄像器件 | |
| US20110176044A1 (en) | Solid-state imaging device and method thereof | |
| JP2010225944A (ja) | 固体撮像装置 | |
| Wen et al. | Multifunctional silicon optoelectronics integrated with plasmonic scattering color | |
| CN114843298B (zh) | 偏振成像传感器及电子设备 | |
| JP5037044B2 (ja) | カラー・イメージ・センサ | |
| WO2010099261A1 (en) | Optical device with array of apertures and methods of making and using the optical device | |
| CN113950632B (zh) | 波长选择滤光器、显示体、光学设备以及波长选择滤光器的制造方法 | |
| CN223584630U (zh) | 图像传感器及其电子设备 | |
| WO2025022878A1 (ja) | 光検出装置 | |
| CN120224817A (zh) | 成像感测器件及其制备方法、成像感测装置及其感测方法 | |
| Afshinmanesh | Controlling Light Transmission with Nanostructured Metallic Surfaces: Applications in Polarimetry, Transparent Electrodes, and Anti-Reflective Coatings |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121017 Termination date: 20190527 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |