CN101522822A - 超疏水涂层 - Google Patents
超疏水涂层 Download PDFInfo
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- CN101522822A CN101522822A CNA2007800378244A CN200780037824A CN101522822A CN 101522822 A CN101522822 A CN 101522822A CN A2007800378244 A CNA2007800378244 A CN A2007800378244A CN 200780037824 A CN200780037824 A CN 200780037824A CN 101522822 A CN101522822 A CN 101522822A
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- Prior art keywords
- coating system
- particle
- acrylate
- methyl
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- Prior art date
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- 239000002245 particle Substances 0.000 claims abstract description 46
- 239000000178 monomer Substances 0.000 claims abstract description 39
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 150000001336 alkenes Chemical class 0.000 claims abstract description 5
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000010526 radical polymerization reaction Methods 0.000 claims abstract description 4
- -1 2-EHA Chemical compound 0.000 claims description 46
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 41
- 239000000126 substance Substances 0.000 claims description 27
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 claims description 15
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical group COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 14
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 13
- 230000002209 hydrophobic effect Effects 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 11
- XEKOWRVHYACXOJ-UHFFFAOYSA-N ethyl acetate Substances CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 9
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 claims description 8
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 239000005977 Ethylene Substances 0.000 claims description 6
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 239000006185 dispersion Substances 0.000 claims description 6
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims description 6
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000005375 organosiloxane group Chemical group 0.000 claims description 5
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 claims description 5
- 229920006305 unsaturated polyester Polymers 0.000 claims description 5
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 238000009736 wetting Methods 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 229910004283 SiO 4 Inorganic materials 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 239000004411 aluminium Substances 0.000 claims description 3
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 claims description 3
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- LLVWLCAZSOLOTF-UHFFFAOYSA-N 1-methyl-4-[1,4,4-tris(4-methylphenyl)buta-1,3-dienyl]benzene Chemical compound C1=CC(C)=CC=C1C(C=1C=CC(C)=CC=1)=CC=C(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 LLVWLCAZSOLOTF-UHFFFAOYSA-N 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- 125000001072 heteroaryl group Chemical group 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 4
- 229920002554 vinyl polymer Polymers 0.000 abstract description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 2
- 229920001577 copolymer Polymers 0.000 abstract description 2
- 150000001993 dienes Chemical class 0.000 abstract description 2
- 229920001567 vinyl ester resin Polymers 0.000 abstract 1
- 229920001296 polysiloxane Polymers 0.000 description 24
- 239000003999 initiator Substances 0.000 description 20
- 239000000203 mixture Substances 0.000 description 19
- 239000003795 chemical substances by application Substances 0.000 description 18
- 238000002360 preparation method Methods 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 229960001866 silicon dioxide Drugs 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- 239000000377 silicon dioxide Substances 0.000 description 12
- 230000003075 superhydrophobic effect Effects 0.000 description 11
- 239000004205 dimethyl polysiloxane Substances 0.000 description 10
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 10
- 150000003254 radicals Chemical class 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 229910021485 fumed silica Inorganic materials 0.000 description 9
- 235000012239 silicon dioxide Nutrition 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 7
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 7
- 238000001816 cooling Methods 0.000 description 7
- JEIPFZHSYJVQDO-UHFFFAOYSA-N ferric oxide Chemical compound O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 230000005068 transpiration Effects 0.000 description 7
- ZMARGGQEAJXRFP-UHFFFAOYSA-N 1-hydroxypropan-2-yl 2-methylprop-2-enoate Chemical compound OCC(C)OC(=O)C(C)=C ZMARGGQEAJXRFP-UHFFFAOYSA-N 0.000 description 5
- 238000012644 addition polymerization Methods 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 229910002027 silica gel Inorganic materials 0.000 description 5
- 239000000741 silica gel Substances 0.000 description 5
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical class OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000009827 uniform distribution Methods 0.000 description 4
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 3
- CCJAYIGMMRQRAO-UHFFFAOYSA-N 2-[4-[(2-hydroxyphenyl)methylideneamino]butyliminomethyl]phenol Chemical compound OC1=CC=CC=C1C=NCCCCN=CC1=CC=CC=C1O CCJAYIGMMRQRAO-UHFFFAOYSA-N 0.000 description 3
- DRPJWBIHQOHLND-UHFFFAOYSA-N 4-[dimethoxy(methyl)silyl]oxybutyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)OCCCCOC(=O)C(C)=C DRPJWBIHQOHLND-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
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- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 3
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- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 3
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 3
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- 150000003377 silicon compounds Chemical class 0.000 description 1
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
- C08F283/124—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes on to polysiloxanes having carbon-to-carbon double bonds
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/10—Block or graft copolymers containing polysiloxane sequences
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- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
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Abstract
本发明涉及一种包含有机硅共聚物(O)的涂层体系,所述有机硅共聚物可由如下物质的自由基聚合获得:A)烯键式不饱和单体,其选自(甲基)丙烯酸酯、乙烯酯、芳乙烯、烯烃、1,3-二烯或乙烯醚,和B)烯键式单不饱和或多不饱和聚有机硅氧烷,和C)任选的烯键式不饱和辅助单体,和亲水性粒子(P)。
Description
本发明涉及聚合物-粒子混合物、其制备及其用途。
赋予表面以自清洁或防污性能的超疏水涂层是一个广泛研究的主题且具有高经济价值。水不可润湿的表面与降低的沾污和降低的清洁,降低的藻类、菌类或微生物的定植,更有吸引力的视觉外观以及可见的减少的维护成本相关。因此这种表面具有比常规的,至少部分可润湿的表面更好的功能和更长的使用寿命。
难以润湿的表面,即超疏水表面,是已知的。在自然界,超疏水表面常见于植物叶子,最著名的是荷花,但也公知卷心菜和旱金莲在其叶子上具有这种表面。这些表面的原理描述于EP 772514,其权利要求为一种表面结构包括突起和凹陷的自清洁表面,所述突起大小为5至100微米并相距5至200微米。所述突起由疏水材料构成。然而EP772514没有要求这些突起和凹陷的任何亚结构化。本领域技术人员现在已知超疏水作用要求突起和凹陷在微米区域中的结构化,也要求单个突起和凹陷的纳米结构化。
人工制备这种表面通常有两种方法:
第一种方法涉及在先光滑表面的随后的结构化。使用源自塑料加工的方法,特别是母结构的凹膜成型,例如通过挤出、注射成型或压花。比如,DE 10210673尤其描述了通过修改的注射成型法制备这种表面。同样地,在半导体领域已知的方法,即平板印刷法,已知用于制备超疏水表面。必需的表面结构化经由遮蔽、用高能光辐照耐光材料,以及通过蚀刻操作完成。一个例子为DE 10138036。DE 10138036描述了利用耐光材料和紫外区域的激光制备超疏水表面。
第二种方法涉及将粒子施用至光滑表面,使得这些粒子在施用后产生正确的赋予超疏水性的表面结构。通常使用的体系总是由物理或化学成膜粘合剂和粒子组成,所述粒子与粘合剂一起施用或随后施用。
WO 02/049980教导了例如一种由纳米区域内的至少部分疏水化的粒子和无机或有机粘合剂组成的体系。
EP 1043380描述了一种含有纳米区域内的氟化粒子以及作为粘合剂的氟化聚合物的体系。
EP 1153987描述了一种由疏水多孔粒子和选自可含有聚氧化烯烃基团的聚烯烃的疏水粘合剂组成的体系。
DE 102004062739描述了一种由疏水粒子和粘合剂组成的体系,其中所用的粘合剂为紫外固化的丙烯酸酯漆。所述粘合剂和粒子在分别的操作中施用。
WO 02/055446描述了一种由丙烯酸-乙烯共聚物和疏水化的热解法二氧化硅组成的体系。
DE 10118352描述了一种由作为粘合剂的丙烯酸酯共聚物和作为粒子的疏水化二氧化硅组成的体系。
WO 2004/014575描述了一种基于粉末涂料的体系,所述粉末涂料与粒子一起通过粉末喷雾施用。所用的粒子为由疏水材料组成的粒子,或特别疏水化的粒子。
EP 1475426最后描述了一种由作为粘合剂的硅酮蜡和疏水粒子组成的体系。
所有谈及的体系均依赖于疏水粒子以及常常另外的疏水粘合剂或后疏水化(posthydrophobicization)的使用。疏水粒子是所述体系最昂贵的组分之一。通常,疏水粒子首先必须在额外的操作中通过表面官能化反应由亲水粒子制得。这需要使用例如特定的有机官能硅烷的昂贵试剂,且还通常产生加工废料。在另一方面,已经是疏水材料的聚烯烃蜡为通常首先必须形成粒子(微粉化)形式的例子。
本发明提供了一种涂层体系,其包含可通过如下物质的自由基聚合获得的有机硅共聚物(O):
A)烯键式不饱和单体,其选自(甲基)丙烯酸酯、乙烯酯、芳乙烯、烯烃、1,3-二烯或乙烯醚,和
B)单-或多烯键式不饱和聚有机硅氧烷,和
C)任选的烯键式不饱和辅助单体,和亲水性粒子(P)。
发明人发现,令人惊讶地,当特定有机硅共聚物(O)同时用作粘合剂时,甚至仅仅亲水性粒子(P)足以制备非常显著的超疏水表面。
所述有机硅共聚物(O)可通过聚合物化学的标准结构单元(building block)(例如丙烯酸酯和苯乙烯以及烯键式不饱和聚有机硅氧烷B))的自由基共聚获得。所述聚有机硅氧烷B)可令人惊讶地仅构成整个有机硅共聚物(O)的极小比例。
由(O)和(P)组成的涂层体系可以粉末涂层、在有机溶液中或在水分散体中的形式存在。在以水分散体中的形式存在的由(O)和(P)组成的涂层体系的情况中,聚合物理想地自分散,且无需使用外部分散助剂。
优选的来自丙烯酸酯或甲基丙烯酸酯的单体A)为具有1至15个碳原子的非支化或支化的醇的酯。优选的甲基丙烯酸酯或丙烯酸酯为丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸丙酯、甲基丙烯酸丙酯、丙烯酸正丁酯、甲基丙烯酸正丁酯、丙烯酸异丁酯、甲基丙烯酸异丁酯、丙烯酸叔丁酯、甲基丙烯酸叔丁酯、丙烯酸2-乙基己酯和丙烯酸降冰片酯。特别优选丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸正丁酯、甲基丙烯酸正丁酯、丙烯酸异丁酯、丙烯酸叔丁酯、丙烯酸2-乙基己酯和丙烯酸降冰片酯。
优选的来自乙烯酯的烯键式不饱和单体A)为带有具有1至15个碳原子的羧酸基团的那些。特别优选乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、2-乙基己酸乙烯酯、月桂酸乙烯酯、乙酸1-甲基乙烯酯、三甲基乙酸乙烯酯和具有9至11个碳原子的α-支化的单羧酸的乙烯酯,例如或(来自Resolution)。特别优选乙酸乙烯酯。
优选作为芳乙烯A)的是苯乙烯、α-甲基苯乙烯、异构化的甲苯乙烯和二甲苯乙烯以及二乙烯苯。特别优选苯乙烯。
甲基乙烯醚为优选的乙烯醚A)的例子。
优选的烯烃A)为乙烯、丙烯、1-烷基乙烯以及多不饱和的链烯,且优选的二烯为1,3-丁二烯和异戊二烯。特别优选乙烯和1,3-丁二烯。
特别优选用作单体A)的是选自乙酸乙烯酯、具有9至11个碳原子的α-支化的单羧酸的乙烯酯、氯乙烯、乙烯、丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸丙酯、甲基丙烯酸丙酯、丙烯酸正丁酯、甲基丙烯酸正丁酯、丙烯酸2-乙基己酯、苯乙烯、1,3-丁二烯的一种或多种单体。也特别优选用作单体A)的是丙烯酸正丁酯和丙烯酸2-乙基己酯和/或甲基丙烯酸甲酯的混合物;苯乙烯和一种或多种选自丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸正丁酯或丙烯酸2-乙基己酯的单体的混合物;乙酸乙烯酯和一种或多种选自丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸正丁酯、丙烯酸2-乙基己酯的单体和任选的乙烯的混合物;1,3-丁二烯和苯乙烯和/或甲基丙烯酸甲酯的混合物。
优选的单-或多烯键式不饱和聚有机硅氧烷B)具有通式[1]:(SiO4/2)k(R1SiO3/2)m(R1 2SiO2/2)p(R1 3SiO1/2)q[O1/2SiR3 2-L-X]s[O1/2H]t [1]
其中
L表示二价的任选取代的芳族、杂芳族或脂族基团(CR4 2)b,
R1、R3、R4每一个表示氢原子或一价的任选由-CN-、-NCO-、-NR2 2-、-COOH-、-COOR2-、-PO(OR2)2-、-卤素-、-丙烯酰基-、-环氧基-、-SH-、-OH-或-CONR2 2-取代的C1-C20烃基或C1-C20烷氧基,其中在每种情况下一个或多个相互不相邻的亚甲基单元可由基团-O-、-CO-、-COO-、-OCO-或-OCOO-、-S-或-NR2-替代且在每种情况下一个或多个相互不相邻的次甲基单元可由基团-N=、-N=N-或-P=替代,
X表示烯键式不饱和基团,
R2表示氢或一价的任选取代的烃基,
b表示0或整数值,
s表示至少为1的整数值,
t表示0或整数值,
k+m+p+q表示至少为2的整数值。
优选的聚有机硅氧烷B)为C1-C20烃基和C1-C20烷氧基R1、R3、R4可为脂族饱和的或不饱和的、芳族、直链或支化的那些。R1、R3、R4优选具有1至12个原子,特别是1至6个原子,优选仅为碳原子,或一个烷氧基氧原子,否则仅为氢原子。优选地,R1、R3、R4为直链或支化的C1-C6烷基或苯基。特别优选甲基、乙基、苯基和乙烯基。
优选地,R3为甲基且R4为氢。
X优选为乙烯基(-C2H3)、丙烯酰氧基(-OCOC2H3)或甲基丙烯酰氧基(-OCOC2H2CH3)型的烯键式不饱和基团。
优选地,b不超过50,特别不超过10。在特别优选的具体实施方案中,b为0、1、2或3。
通式[1]的聚有机硅氧烷B)能为线性、环状、支化的或交联的。k、m、p、q、s和t的总和优选为3至20000,特别为8至1000。
通式[1]的聚有机硅氧烷B)的优选类型为仅由或接近仅由R2SiO2/2单元组成的线性聚有机硅氧烷;硅酮应几乎仅由双官能单元p组成。优选地,p相对于k、m、p、q的总和的比例为至少95%且更优选>95%。在此情况下,每分子的烯键式不饱和基团数优选为1或2。非常特别优选α,ω-二乙烯基聚二甲基硅氧烷以及α-甲基丙烯酰氧基甲基聚二甲基硅氧烷和α,ω-双(甲基丙烯酰氧基甲基)聚二甲基硅氧烷。更特别地,k和m每个表示0且q表示0或1。
通式[1]的聚有机硅氧烷B)的另一优选类型为有机硅树脂。其能由两个或两个以上如通式[1]所描述的单元组成,在此情况下存在的单元的摩尔百分率由指数k、m、p、q表示。k+m应>0。本文优选使用以k、m、p、q的总和计k+m>50%的聚硅氧烷树脂B)。特别优选k+m>90%的树脂。
通式[1]的聚有机硅氧烷B)的另一优选类型为仅由或接近仅由SiO4/2单元组成的有机硅树脂;k应大于m+p+q。k相对于k、m、p、q的总和的比例优选为至少51%且更优选>95%或为55%至65%。
如需要,以单体A)的总重量计0.1重量%至20重量%的烯键式不饱和辅助单体C)能另外被共聚。优选使用每个代表0.5重量%至2.5重量%的辅助单体C)。总共地,所有辅助单体C)的总和可构成A)、B)和C)的单体混合物的高至20重量%,优选总共具有10重量%以下的辅助单体C)。辅助单体C)的例子为烯键式不饱和单-和二羧酸,优选丙烯酸、甲基丙烯酸、富马酸和马来酸;烯键式不饱和羧酸酰胺和腈,优选丙烯酰胺和丙烯腈;富马酸和马来酸的单-和二酯,如二乙酯和二异丙酯以及马来酸酐;烯键式不饱和磺酸和它们的盐,优选乙烯基磺酸、2-丙烯酰胺-2-甲基丙磺酸。另外的例子为如聚烯键式不饱和共聚单体的预交联的共聚单体(例子为己二酸二乙烯酯、马来酸二烯丙酯、甲基丙烯酸烯丙酯或氰尿酸三烯丙酯),和后交联的共聚单体(例子为丙烯酰胺基羟基乙酸(AGA)、甲基丙烯酰胺基羟基乙酸甲酯(MAGME)、N-羟甲基丙烯酰胺(NMA)、N-羟甲基甲基丙烯酰胺、N-羟甲基烯丙基氨基甲酸酯、如异丁氧基醚的烷基醚或N-羟甲基丙烯酰胺、N-羟甲基甲基丙烯酰胺和N-羟甲基烯丙基氨基甲酸酯的酯)。如甲基丙烯酸缩水甘油酯和丙烯酸缩水甘油酯的环氧化物官能化的烯键式不饱和共聚单体也合适。也可提及具有羟基或CO基团的烯键式不饱和单体,例子为如羟乙基丙烯酸酯、羟丙基丙烯酸酯、羟丁基丙烯酸酯、羟乙基甲基丙烯酸酯、羟丙基甲基丙烯酸酯或羟丁基甲基丙烯酸酯的羟烷基甲基丙烯酸酯和羟烷基丙烯酸酯,以及如二丙酮丙烯酰胺和乙酰乙酸基丙烯酸乙酯或乙酰乙酸基甲基丙烯酸乙酯的化合物。另外可提及可共聚的烯键式不饱和硅烷,例如乙烯基硅烷(如乙烯基三甲氧基硅烷或乙烯基三乙氧基硅烷或(甲基)丙烯酰基硅烷),例如由Wacker-Chemie AG,Munich,Germany以GENIOSIL GF-31(甲基丙烯酰氧丙基三甲氧基硅烷)、XL-33(甲基丙烯酰氧甲基三甲氧基硅烷)、XL-32(甲基丙烯酰氧甲基二甲基甲氧基硅烷)、XL-34(甲基丙烯酰氧甲基甲基二甲氧基硅烷)和XL-36(甲基丙烯酰氧甲基三乙氧基硅烷)为名销售的硅烷。
优选选择单体A),或更精确地选择单体A)、B)和共聚单体C)的重量分数使得所得玻璃化转变温度Tg通常为≤60℃,优选为-50℃至+60℃。有机硅共聚物(O)的玻璃化转变温度Tg能以已知的方式利用差示扫描量热法(DSC)确定。Tg也能利用Fox公式近似预测。根据Fox T.G.,Bull.Am.Physics Soc.1,3,第123页(1956),如下公式表明:1/Tg=x1/Tg1+x2/Tg2+...+xn/Tgn,其中xn表示单体n的质量分数(重量%/100),且Tgn为单体n的均聚物的以开尔文计的玻璃化转变温度。均聚物的Tg值报告在Polymer Handbook第2版,J.Wiley & Sons,New York(1975)中。
所用的单体A)的量优选为每100重量份烯键式不饱和单体A)、B)和C)至少50重量份且更优选为至少65重量份。单体B)所用的量优选为1至50重量份,更优选高至30重量份且特别不超过25重量份。所用的单体C)的量优选高至20重量份且更优选不超过10重量份。
利用自由基聚合法制得有机硅共聚物(O),且所述制备可在无溶剂、在有机溶液中或在有机分散体中进行,如本领域技术人员所熟知。通过遵循本领域技术人员熟知的悬浮液、乳状液或细乳液聚合的异相技术(参阅例如Peter A.Lovell,M.S.El-Aasser,“Emulsion Polymerizationand Emulsion Polymers”1997,John Wiley and Sons,Chichester),合成在水介质中也是可能的。优选在有机溶液中的加聚且特别优选在至少部分水可混溶的溶剂或溶剂混合物(例子为异丙醇、异丙醇-乙酸乙酯混合物、乙酸甲氧基丙酯-异丙醇混合物)中的加聚。
所述聚合介质理想地同时为随后在其中制备或使用(O)和(P)的体系的介质。然而,溶剂的交换也有可能;更特别地,优选将无溶剂下得到的加聚物转化为有机溶液或用水介质代替有机溶剂。
反应温度为0℃至150℃,优选为20℃至130℃且更优选为30℃至120℃。加聚能分批或连续进行,通过初始进料所有或单个反应混合物成分、通过部分初始进料并随后计量加入单个反应混合物成分,或通过无初始进料的计量方法。所有计量加入优选以各个组分消耗的速率进行。特别优选其中初始进料硅酮结构单元并通过计量加入添加加聚的其他反应组分的加聚。
利用常规引发剂或氧化还原引发剂组合引发加聚。引发剂的例子为过氧双硫酸的钠盐、钾盐和铵盐、过氧化氢、叔丁基过氧化物、叔丁基氢过氧化物、过氧焦磷酸钾、过氧化新戊酸叔丁酯、异丙苯过氧化氢、过氧化苯甲酸叔丁酯、异丙苯单过氧化氢和偶氮二异丁腈。优选使用以共聚单体A)、B)和C)的总重量计0.01重量%至4.0重量%的量的所述引发剂。所用的氧化还原引发剂组合包含与还原剂结合的上述引发剂。合适的还原剂为一价阳离子的亚硫酸盐和亚硫酸氢盐(例如亚硫酸钠),如甲醛化次硫酸锌或甲醛化次硫酸碱金属盐的次硫酸的衍生物(例如甲醛次硫酸钠)和抗坏血酸。还原剂的量优选为所用的共聚单体A)、B)和C)的0.15重量%至3重量%。能另外引入少量可溶于聚合介质的金属化合物和在聚合条件下氧化还原活性的金属组分,这种金属化合物基于例如铁或钒。特别优选的引发剂为过氧化新戊酸叔丁酯和过氧化苯甲酸叔丁酯,以及过硫酸铵/甲醛次硫酸钠和过硫酸钾/甲醛次硫酸钠的过氧化物/还原剂组合。除了所述的代表之外的另外的合适引发剂的概述可见于“Handbook of Free Radical Initiators”,E.T.Denisov,T.G.Denisova,T.S.Pokidova,2003,Wiley Verlag。
优选的粒子(P)选自亲水性氧化硅和金属氧化物MO。粒子(P)在其表面具有M-OH或M-O-M官能团,所述粒子经由所述官能团能够与极性媒介和基团积极相互作用。更特别地,氧化物MO未经由表面官能化试剂(例如氯硅烷)疏水化。
在金属氧化物MO中,优选金属铝、钛、锆、钽、钨、铪、锌和锡的氧化物。在金属氧化物MO中,特别优选如刚玉的氧化铝、与其他金属和/或硅混合的氧化铝、氧化钛、氧化锆、氧化铁。
在氧化硅MO中,优选胶体二氧化硅、热解法二氧化硅、沉淀二氧化硅、天然二氧化硅,例如硅胶和硅藻土和硅溶胶。
也有可能使用具有氧化表面的金属M,和沸石(合适的沸石清单可见于Ch.Baerlocher,W.M.Meier,D.H.Olson,Atlas of ZeoliteFramework Types,第5版,2001,Elsevier,Amsterdam)、硅酸盐、铝酸盐、磷酸铝、钛酸盐和铝片-硅酸盐(例如膨润土、蒙脱土、蒙脱石、锂蒙脱石),在此情况下粒子(P)优选具有0.1至1000平方米/克的比表面积且更优选具有1至500平方米/克的比表面积(通过遵循DIN66131和66132的BET法测定)。
平均直径优选不超过50微米且更优选不超过25微米的粒子(P)能作为聚集体(根据DIN 53206定义)和附聚物(根据DIN 53206定义)存在,所述聚集体和附聚物取决于外部剪切载荷(例如由于测量条件)能具有1至1000微米的大小。
特别优选用作粒子(P)的是热解法二氧化硅,其在焰色反应中由挥发性硅化合物制得,例如由单独的或与烃混合的四氯化硅或甲基二氯硅烷、或氢三氯硅烷或氢甲基二氯硅烷、或其他甲基氯硅烷或烷基氯硅烷,或所述有机硅化合物和烃的任何所需的可挥发或可喷雾混合物,在例如氢氧火焰中或一氧化碳-氧火焰中制备。二氧化硅的制备能选择性地添加水或不添加水进行,例如在纯化步骤中;优选不加入水。
未改性的热解法二氧化硅具有10平方米/克至600平方米/克,优选50平方米/克至400平方米/克的BET比表面积(根据DIN EN ISO9277/DIN 66132测定)。
在填塞(tamping)之后的未改性的热解法二氧化硅的根据DIN ENISO 787-11的视密度优选为10克/升至500克/升,更优选为20克/升至200克/升且甚至更优选为30克/升至100克/升。
热解法二氧化硅优选具有不超过2.3,更优选不超过2.1且特别为1.95至2.05的分形表面维数,本文所述分形表面维数Ds定义如下:
粒子表面积A正比于粒子半径R的Ds次方。
所述二氧化硅优选具有不超过2.8,更优选不超过2.3且甚至更优选为1.7至2.1的分形质量维数Dm,例如F.Saint-Michel,F.Pignon,A.Magnin,J.Colloid Interface Sci.2003,267,314所报道。本文分形质量维数Dm定义如下:
粒子质量M正比于粒子半径R的Dm次方。
未改性的二氧化硅优选具有小于2.5SiOH/平方纳米,优选小于2.1SiOH/平方纳米,更优选小于2SiOH/平方纳米且甚至更优选为1.7至1.9SiOH/平方纳米的SiOH硅醇表面密度,其根据G.W.Sears,Anal.Chem.28(1956)1981中给出的方法测定。
能使用湿化学法或在高温下(>1000℃)制得的二氧化硅。特别优选焦化制备的二氧化硅(热解法二氧化硅)。也有可能使用直接由燃烧器制得的被暂时储存或已为商业包装形式的亲水性二氧化硅。
能使用各种金属氧化物或二氧化硅的混合物,例如BET表面积不同的金属氧化物或二氧化硅的混合物,或金属氧化物的混合物。
聚合物(O)/粒子(P)的质量比优选为不超过10/1,特别不超过10/2且优选至少为10/8,特别至少为10/6。
如需要,一种或多种混合物可另外加入(O)和(P)的体系。混合物的例子为溶剂或膜形成助剂;至少两种有机溶剂的混合物;颜料润湿剂和分散剂;表面作用添加剂,例如用于获得如锤纹漆或桔皮结构的结构的那些添加剂;消泡剂;基材润湿剂;表面流平剂;增粘剂;脱模剂;不同于本发明的有机聚合物的另外的有机聚合物;表面活性剂;疏水性辅助材料;非自由基可聚合的聚有机硅氧烷。
优选通过将粒子(P)掺入聚合物(O)的溶液或分散体制得粒子(P)和聚合物(O)的体系。这能借助于本领域技术人员熟知的方法完成,例如借助溶解器、借助转子-定子设备(例如)或借助速度混合器。特别优选经由溶解器的掺合。
所述涂层体系优选用于疏水性涂层的制造。由此制得的体系能以各种方式施用至待处理的表面。可能通过刮刀涂布机、通过软刷、通过辊或通过喷雾设备施用。浸渍涂布或旋涂法也是可能的。一旦施用涂层,其理想地通过热老化稳定。
通过涂层体系的施用制得的涂层赋予与玻璃、木头、纺织纤维、纸纤维、石头、塑料和金属截然不同的基材以防污和超疏水性能。示例性的施用领域为房屋墙壁、屋顶、风力发电厂、卫星天线、帆布、伞、敞篷车覆盖、遮阳篷或桌布的涂层。
在上式中所有的标记的每一个具有相互独立的含义。在所有式中硅原子为四价。
在如下实施例中,除非另外提及,所有含量和百分率以重量计,所有压力等于0.10兆帕(绝对)且所有温度等于20℃。
实施例
实施例1(聚合物(O)的制备):
反应组分:
组分 份数
乙酸甲氧基丙酯 444
甲基丙烯酸丁酯 42
苯乙烯 29
α-甲基丙烯酰氧甲基聚二甲基硅氧烷 10
(Mw约1300)
甲基丙烯酸羟丙酯 26
甲基丙烯酸 2
N-(羟甲基)丙烯酰胺 2
将溶剂与硅酮结构单元一起初始进料至装有蒸发冷却、锚式搅拌器和氮气入口管的夹套反应器。将剩余的单体与1.6份过氧化苯甲酸叔丁酯自由基引发剂在120℃下在4小时内加入所述初始进料。添加结束时,将另外0.3份自由基引发剂在每半小时一次性加入。在总共5.5小时的聚合时间之后获得固体含量为20%的透明溶液。聚合物的重均摩尔质量为25 000,如GPC所确定。所得膜的TEM显微照片显示硅酮结构单元的完全均匀分布。
实施例2(聚合物(O)的制备):
反应组分:
组分 份数
乙酸甲氧基丙酯 324.4
甲基丙烯酸丁酯 42
苯乙烯 29
α-甲基丙烯酰氧甲基聚二甲基硅氧烷 8.1
(Mw约3200)
甲基丙烯酸羟丙酯 26
甲基丙烯酰氧丙基三甲氧基硅烷 4.3
N-(羟甲基)丙烯酰胺 2
将溶剂与硅酮结构单元一起初始进料至装有蒸发冷却、锚式搅拌器和氮气入口管的夹套反应器。将剩余的单体与1.6份过氧化苯甲酸叔丁酯自由基引发剂在120℃下在4小时内加入所述初始进料。添加结束时,将另外0.3份自由基引发剂在每半小时一次性加入。在总共5.5小时的聚合时间之后获得固体含量为20%的透明溶液。聚合物的重均摩尔质量为40 000,如GPC所确定。所得膜的TEM显微照片显示硅酮结构单元的完全均匀分布。
实施例3(聚合物(O)的制备):
反应组分:
组分 份数
乙酸甲氧基丙酯 444
甲基丙烯酸丁酯 42
苯乙烯 29
α,ω-二乙烯基聚二甲基硅氧烷 10
(Mw约10 000)
甲基丙烯酸羟丙酯 26
甲基丙烯酸 2
N-(羟甲基)丙烯酰胺 2
将溶剂与硅酮结构单元一起初始进料至装有蒸发冷却、锚式搅拌器和氮气入口管的夹套反应器。将剩余的单体与1.6份过氧化苯甲酸叔丁酯自由基引发剂在120℃下在4小时内加入所述初始进料。添加结束时,将另外0.3份自由基引发剂在每半小时一次性加入。在总共5.5小时的聚合时间之后获得固体含量为20%的透明溶液。聚合物的重均摩尔质量为25 000,如GPC所确定。所得膜的TEM显微照片显示部分相分离的共聚物,然而,该共聚物不再含有任何未聚合的硅酮成分。
实施例4(本发明的聚合物(O)的制备):
反应组分:
组分 份数
乙酸甲氧基丙酯 442.8
甲基丙烯酸丁酯 42
苯乙烯 29
α-甲基丙烯酰氧甲基聚二甲基硅氧烷 11.7
(Mw约3200)
α,ω-双(甲基丙烯酰氧甲基)-聚二甲基硅氧烷 6
(Mw约3300)
二乙烯苯 0.6
甲基丙烯酰氧甲基二甲基甲氧基硅烷 2.4
甲基丙烯酸羟丙酯 26
N-(羟甲基)丙烯酰胺 2
将溶剂与硅酮结构单元一起初始进料至装有蒸发冷却、锚式搅拌器和氮气入口管的夹套反应器。将剩余的单体与1.6份过氧化苯甲酸叔丁酯自由基引发剂在120℃下在4小时内加入所述初始进料。添加结束时,将另外0.3份自由基引发剂在每半小时一次性加入。在总共5.5小时的聚合时间之后获得固体含量为20%的透明溶液。聚合物的重均摩尔质量为51 000,如GPC所确定。所得膜的TEM显微照片显示硅酮结构单元的完全均匀分布。
实施例5(本发明的聚合物(O)的制备):
反应组分:
组分 份数
乙酸甲氧基丙酯 400.8
丙烯酸丁酯 44
甲基丙烯酸甲酯 44
α-甲基丙烯酰氧甲基聚二甲基硅氧烷 10.2
(Mw约3200)
甲基丙烯酰氧丙基三甲氧基硅烷 1
N-(羟甲基)丙烯酰胺 2
将溶剂与硅酮结构单元一起初始进料至装有蒸发冷却、锚式搅拌器和氮气入口管的夹套反应器。将剩余的单体与1.6份过氧化苯甲酸叔丁酯自由基引发剂在120℃下在4小时内加入所述初始进料。添加结束时,将另外0.3份自由基引发剂在每半小时一次性加入。在总共5.5小时的聚合时间之后获得固体含量为20%的透明溶液。聚合物的重均摩尔质量为33 000,如GPC所确定。所得膜的TEM显微照片显示硅酮结构单元的完全均匀分布。
实施例6(本发明的聚合物(O)的制备):
反应组分:
组分 份数
异丙醇/乙酸乙酯9/1 400
乙酸乙烯酯 70
衣康酸 5
α,ω-二乙烯基聚二甲基硅氧烷 10
(Mw约10 000)
乙烯基三甲氧基硅烷 2
N-(羟甲基)丙烯酰胺 2
将溶剂与硅酮结构单元一起初始进料至装有蒸发冷却、锚式搅拌器和氮气入口管的夹套反应器。将乙酸乙烯酯与1.6份过氧化新戊酸叔丁酯自由基引发剂在120℃下在4小时内加入所述初始进料。添加结束时,将另外0.3份自由基引发剂在每半小时一次性加入。在总共5.5小时的聚合时间之后获得固体含量为17%的杀菌(tyndallizing)溶液。聚合物的重均摩尔质量为35 000,如GPC所确定。所得膜的TEM显微照片显示微区内的微相分离。
实施例V1(非本发明的聚合物的制备):
反应组分:
组分 份数
乙酸甲氧基丙酯 444
甲基丙烯酸丁酯 45
苯乙烯 32
甲基丙烯酸羟丙酯 28
甲基丙烯酸 2
N-(羟甲基)丙烯酰胺 2
将溶剂初始进料至装有蒸发冷却、锚式搅拌器和氮气入口管的夹套反应器。将单体与1.6份过氧化苯甲酸叔丁酯自由基引发剂在120℃下在4小时内加入所述初始进料。添加结束时,将另外0.3份自由基引发剂在每半小时一次性加入。在总共5.5小时的聚合时间之后获得固体含量为20%的透明溶液。聚合物的重均摩尔质量为33 000,如GPC所确定。该聚合物用作对比实施例。
实施例7(聚合物(O)和粒子(P)的超疏水性赋予体系的制备):在来自Getzmann GmbH,Reichshof,Germany的CA40-M1型溶解器中,将2克 V15型亲水性热解法二氧化硅(获自Wacker Chemie AG,Munich,Germany)和2克Kieselgel 60硅胶[0.015-0.040毫米](获自Merck KgaA,Darmstadt,Germany)分散至100毫升实施例1的聚合物在乙酸甲氧基丙酯中的10重量%的溶液。利用90微米刮刀将所得的体系刮刀涂布至玻璃片上并在140℃下储存1小时,从而获得静态接触角为147°的超疏水表面。
实施例8-20(聚合物(O)和粒子(P)的超疏水性赋予体系的制备):
重复实施例7以实现如下体系:
实施例号 | 来自实施例的聚合物(O) | 粒子(P)*比例 | (O)/(P)比例 | 接触角 |
8 | 1 | 1+2(2/1) | 10/3 | 147° |
9 | 1 | 1+2(3/1) | 10/4 | 139° |
10 | 1 | 1+2(2/2) | 10/4 | 147° |
11 | 1 | 1+2(2/3) | 10/5 | 144° |
12 | 2 | 1+2(2/1) | 10/3 | 155° |
13 | 2 | 1+4(2/1) | 10/3 | 160° |
14 | 3 | 1+2(2/1) | 10/3 | 155° |
15 | 3 | 1+3(2/1) | 10/3 | 152° |
16 | 3 | 1+4(2/2) | 10/4 | 157° |
17 | 4 | 1+2(2/2) | 10/4 | 158° |
18 | 4 | 1+3(2/1) | 10/3 | 145° |
19 | 5 | 1+2(2/2) | 10/4 | 154° |
20 | 6 | 1+2(2/2) | 10/4 | 138° |
VS1 | V1 | 1+2(2/2) | 10/4 | 97° |
VS2 | V1 | 1+3(2/2) | 10/4 | 111° |
2:Kieselgel 60硅胶[0.015-0.040毫米],Merck KgaA,Darmstadt,Germany
3:Kieselgel 60硅胶[0.040-0.063毫米],Merck KgaA,Darmstadt,Germany
图1和2为显示来自实施例8的体系的表面的扫描电子显微照片,并说明了微结构和纳米结构。所有实施例的前进角和后退角相差10°以下。
由实施例明显可知本发明的有机硅共聚物(O)和亲水粒子(P)的体系产生超疏水表面。与现有技术相反,这里无需粒子的至少部分疏水化。对比试验VS1和VS2显示无硅酮的聚合物不产生所需的效果。
Claims (10)
1、一种涂层体系,其包含可通过如下物质的自由基聚合获得的有机硅共聚物(O):
A)烯键式不饱和单体,其选自(甲基)丙烯酸酯、乙烯酯、芳乙烯、烯烃、1,3-二烯或乙烯醚,和
B)单-或多烯键式不饱和聚有机硅氧烷,和
C)任选的烯键式不饱和辅助单体,和
亲水性粒子(P)。
2、根据权利要求1所述的涂层体系,其中所述单体选自乙酸乙烯酯、具有9至11个碳原子的α-支化的单羧酸的乙烯酯、氯乙烯、乙烯、丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸丙酯、甲基丙烯酸丙酯、丙烯酸正丁酯、甲基丙烯酸正丁酯、丙烯酸2-乙基己酯、苯乙烯或1,3-丁二烯。
3、根据权利要求1或2所述的涂层体系,其中所述单-或多烯键式不饱和聚有机硅氧烷B)具有通式[1]:
(SiO4/2)k(R1SiO3/2)m(R1 2SiO2/2)p(R1 3SiO1/2)q[O1/2SiR3 2-L-X]s[O1/2H]t [1]
其中
L表示二价的任选取代的芳族、杂芳族或脂族基团(CR4 2)b,
R1、R3、R4每一个表示氢原子或一价的任选由-CN-、-NCO-、-NR2 2-、-COOH-、-COOR2-、-PO(OR2)2-、-卤素-、-丙烯酰基-、-环氧基-、-SH-、-OH-或-CONR2 2-取代的C1-C20烃基或C1-C20烷氧基,其中在每种情况下一个或多个相互不相邻的亚甲基单元可由基团-O-、-CO-、-COO-、-OCO-或-OCOO-、-S-或-NR2-替代且在每种情况下一个或多个相互不相邻的次甲基单元可由基团-N=、-N=N-或-P=替代,
X表示烯键式不饱和基团,
R2表示氢或一价的任选取代的烃基,
b表示0或整数值,
s表示至少为1的整数值,
t表示0或整数值,
k+m+p+q表示至少为2的整数值。
4、根据权利要求3所述的涂层体系,其中k和m每一个表示0且q表示0或1。
5、根据权利要求1至4所述的涂层体系,其中每100重量份烯键式不饱和单体A)、B)和C)使用至少50重量份的单体A)。
6、根据权利要求1至5所述的涂层体系,其中每100重量份烯键式不饱和单体A)、B)和C)使用1至50重量份的单体B)。
7、根据权利要求1至6所述的涂层体系,其中所述粒子(P)选自亲水性氧化硅或金属铝、钛、锆、钽、钨、铪、锌或锡的金属氧化物MO。
8、根据权利要求1至7所述的涂层体系,其中聚合物(O)/粒子(P)的质量比为10/1至10/8。
9、一种制备权利要求1至8所述的涂层体系的方法,该方法包含将粒子(P)掺入聚合物(O)的溶液或分散体。
10、根据权利要求1至8所述的涂层体系在疏水涂层的制造中的用途。
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- 2006-11-16 DE DE102006054158A patent/DE102006054158A1/de not_active Withdrawn
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2007
- 2007-11-08 WO PCT/EP2007/062068 patent/WO2008058895A1/de active Application Filing
- 2007-11-08 JP JP2009536707A patent/JP2010510338A/ja active Pending
- 2007-11-08 KR KR1020097010168A patent/KR101159550B1/ko not_active IP Right Cessation
- 2007-11-08 CN CNA2007800378244A patent/CN101522822A/zh active Pending
- 2007-11-08 AT AT07822372T patent/ATE547486T1/de active
- 2007-11-08 EP EP07822372A patent/EP2092026B1/de not_active Not-in-force
- 2007-11-08 US US12/513,618 patent/US20100069551A1/en not_active Abandoned
Cited By (6)
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CN102712005A (zh) * | 2009-12-08 | 2012-10-03 | 杜尔系统有限责任公司 | 具有表面涂层的涂装系统部件 |
US9731311B2 (en) | 2009-12-08 | 2017-08-15 | Durr Systems Gmbh | Painting system component having a surface coating |
CN109665721A (zh) * | 2019-01-11 | 2019-04-23 | 宁波大学 | 一种疏水自清洁玻璃及其制备方法 |
CN109665721B (zh) * | 2019-01-11 | 2022-01-11 | 宁波大学 | 一种疏水自清洁玻璃及其制备方法 |
CN115445582A (zh) * | 2022-09-22 | 2022-12-09 | 国网河北能源技术服务有限公司 | 一种疏水改性分子筛及其制备方法和应用 |
CN115445582B (zh) * | 2022-09-22 | 2024-03-29 | 国网河北能源技术服务有限公司 | 一种疏水改性分子筛及其制备方法和应用 |
Also Published As
Publication number | Publication date |
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WO2008058895A1 (de) | 2008-05-22 |
KR20090074241A (ko) | 2009-07-06 |
US20100069551A1 (en) | 2010-03-18 |
ATE547486T1 (de) | 2012-03-15 |
EP2092026B1 (de) | 2012-02-29 |
EP2092026A1 (de) | 2009-08-26 |
JP2010510338A (ja) | 2010-04-02 |
DE102006054158A1 (de) | 2008-05-21 |
KR101159550B1 (ko) | 2012-07-10 |
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