CN101431010A - Gate valve apparatus, vacuum treatment apparatus and opening method of valve body in gate valve apparatus - Google Patents
Gate valve apparatus, vacuum treatment apparatus and opening method of valve body in gate valve apparatus Download PDFInfo
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- CN101431010A CN101431010A CNA200810176501XA CN200810176501A CN101431010A CN 101431010 A CN101431010 A CN 101431010A CN A200810176501X A CNA200810176501X A CN A200810176501XA CN 200810176501 A CN200810176501 A CN 200810176501A CN 101431010 A CN101431010 A CN 101431010A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/30—Details
- F16K3/32—Means for additional adjustment of the rate of flow
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
- F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B2211/00—Circuits for servomotor systems
- F15B2211/30—Directional control
- F15B2211/305—Directional control characterised by the type of valves
- F15B2211/30505—Non-return valves, i.e. check valves
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B2211/00—Circuits for servomotor systems
- F15B2211/40—Flow control
- F15B2211/405—Flow control characterised by the type of flow control means or valve
- F15B2211/40515—Flow control characterised by the type of flow control means or valve with variable throttles or orifices
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B2211/00—Circuits for servomotor systems
- F15B2211/40—Flow control
- F15B2211/405—Flow control characterised by the type of flow control means or valve
- F15B2211/40576—Assemblies of multiple valves
- F15B2211/40584—Assemblies of multiple valves the flow control means arranged in parallel with a check valve
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B2211/00—Circuits for servomotor systems
- F15B2211/40—Flow control
- F15B2211/405—Flow control characterised by the type of flow control means or valve
- F15B2211/40576—Assemblies of multiple valves
- F15B2211/40592—Assemblies of multiple valves with multiple valves in parallel flow paths
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B2211/00—Circuits for servomotor systems
- F15B2211/40—Flow control
- F15B2211/47—Flow control in one direction only
- F15B2211/473—Flow control in one direction only without restriction in the reverse direction
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B2211/00—Circuits for servomotor systems
- F15B2211/60—Circuit components or control therefor
- F15B2211/635—Circuits providing pilot pressure to pilot pressure-controlled fluid circuit elements
- F15B2211/6355—Circuits providing pilot pressure to pilot pressure-controlled fluid circuit elements having valve means
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B2211/00—Circuits for servomotor systems
- F15B2211/60—Circuit components or control therefor
- F15B2211/67—Methods for controlling pilot pressure
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
- F15B—SYSTEMS ACTING BY MEANS OF FLUIDS IN GENERAL; FLUID-PRESSURE ACTUATORS, e.g. SERVOMOTORS; DETAILS OF FLUID-PRESSURE SYSTEMS, NOT OTHERWISE PROVIDED FOR
- F15B2211/00—Circuits for servomotor systems
- F15B2211/80—Other types of control related to particular problems or conditions
- F15B2211/885—Control specific to the type of fluid, e.g. specific to magnetorheological fluid
- F15B2211/8855—Compressible fluids, e.g. specific to pneumatics
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Sliding Valves (AREA)
- Physical Vapour Deposition (AREA)
- Details Of Valves (AREA)
Abstract
The invention provides a gate valve apparatus capable of not generating particles and reducing a mechanism service lift and controlling an action time within an objective time. A gate valve apparatus (30) at moving in and moving out ports for moving an opening and closing a glass substrate G in and out comprises a valve body (33) for opening and closing the moving in and out ports (10a), an air cylinder (36) for driving the valve boy (33) and an air driving circuit (60) for controlling the valve body (33) drive using different moving speed modes of the valve body (33) according to the valve body (33) position.
Description
Technical field
The present invention relates to be arranged on the sidewall of chamber, be used to open and close moving into of processed substrate and take out of the substrate of usefulness and move into the gate-valve device of taking out of mouthful, and the vacuum treatment installation that comprises such gate-valve device, and the opening method of the valve body in the gate-valve device.
Background technology
In the manufacture process of flat-panel monitor (FPD) that with LCD (LCD) is representative, generally under vacuum state, on glass substrate, carry out etching, ashing, the processing of film forming equal vacuum.
In carrying out this vacuum treated vacuum treatment installation, be provided with the vacuum processing chamber that keeps vacuum and carry out above-mentioned processing and with the loadlock may with carrying mechanism of this vacuum processing chamber adjacency.As loadlock may, adopt between box body that is disposed at atmospheric side and vacuum processing chamber load locking room that the interface as atmospheric side and inlet side plays a role or the vacuum carrying chamber that keeps the normality vacuum.
And, between such vacuum processing chamber and loadlock may, be provided with gate valve, when carrying out vacuum treatment, by the valve body of gate valve, take out of and mouthful close being arranged on moving in the vacuum processing chamber, when the carrying glass substrate, the valve body of gate valve is descended, thus, make to move into and take out of mouth be opened (for example, patent documentation 1).
And, move into when taking out of mouthful closing by the valve body of gate valve, the bar that is attached at the cylinder on the valve body is risen, up to valve body is risen to move into take out of mouth till, and, the bar of cylinder is risen, and by joint institution valve body is urged to and moves into the peripheral part and the sealing of taking out of mouthful.In addition, move into when taking out of mouthful opening, the bar of cylinder is descended, remove at first the pushing force of the valve body that applies by joint institution, and, descending by making bar, and then valve body is descended, open moving into taken out of mouth.
In this on-off action kind of taking out of mouthful by moving into of carrying out of gate valve, as the cylinder of drive source, adopt speed control valve, when having realized the action beginning and the impact in when stopping to relax and execution in the object time.
In recent years, the requirement of the maximization of the glass substrate of using for FPD strengthens gradually, even has occurred surpassing the huge glass substrate of 2m on one side.And, to have to make the device of the huge like this substrate of processing also to maximize, thereby cause also becoming greatly by the size of taking out of mouth of moving into that gate valve opens and closes, the driving stroke of valve weight, cylinder also increases.In addition, pressure also increases to the load that the what is called of valve body effect is contrary when pressing from vacuum processing chamber, therefore, the only adjustment carried out of the speed control valve by in the past, if make operate time in the scope of object time, then move when beginning and the impact in when stopping increase, have the problem that produces particle (particle) and the reduction of portion of mechanism life-span.
Patent documentation 1: 5-No. 87258 communiques of Japanese kokai publication hei
Summary of the invention
The present invention is the invention of In view of the foregoing making, and its purpose is to provide a kind of and can produce particle and portion of the mechanism life-span is reduced, can be controlled at gate-valve device in the object time and the vacuum treatment installation with this gate-valve device operate time.In addition, its purpose of the present invention also is to provide a kind of opening method of the valve body in such gate-valve device.
In order to solve above-mentioned problem, in first viewpoint of the present invention, a kind of sidewall that is arranged on chamber is provided, be used to open and close moving into of processed substrate and take out of the substrate of usefulness and move into the gate-valve device of taking out of mouthful, it is characterized in that, comprising: be used for inaccessible aforesaid substrate and move into the valve body of taking out of mouth; Make above-mentioned valve body inaccessible aforesaid substrate move into the occlusion locations of taking out of mouthful and and aforesaid substrate move into and take out of the driving mechanism that moves between the retreating position that mouth separates; With according to the position of above-mentioned valve body so that the drive control part that the different mode of the translational speed of valve body is controlled the driving of above-mentioned valve body.
In first viewpoint of the present invention, above-mentioned drive control part can make above-mentioned valve body move with first relatively slow speed and comparatively faster second speed according to its position.In this case, above-mentioned drive control part preferably carries out following control, that is, above-mentioned valve body is moved with above-mentioned first speed, the second area that does not contact with miscellaneous part at above-mentioned valve body makes above-mentioned valve body move with above-mentioned second speed.
In addition, can constitute: above-mentioned driving mechanism is a cylinder, thereby above-mentioned drive control part has and carries out to the air supply of above-mentioned cylinder and the driven air drive circuit of discharge control cylinder, and above-mentioned air driven circuit has first speed control valve corresponding with above-mentioned first speed and the second speed control valve corresponding with second speed.In this case, thus above-mentioned air driven circuit can adopt and has the hydraulic control unidirectional valve that is connected on above-mentioned first speed control valve and be connected on this hydraulic control unidirectional valve, adjust to the regulate the speed structure of control valve of the moment that the feed speed of the air of this hydraulic control unidirectional valve is adjusted the switching instant of above-mentioned first speed and above-mentioned second speed.
Above-mentioned air driven circuit has first and second air that is connected on the above-mentioned cylinder and supplies with the discharge pipe arrangement and above-mentioned first air supply discharge pipe arrangement and above-mentioned second air are supplied with the supply of the air of discharging pipe arrangement and the electromagnetically operated valve that discharge is switched, above-mentioned first speed control valve is arranged on above-mentioned second air and supplies with on the discharge pipe arrangement, and above-mentioned second speed control valve and above-mentioned first speed control valve are set up in parallel.In this case, above-mentioned air driven circuit can constitute: have supplying with via above-mentioned first air and discharge pipe arrangement and/or above-mentioned second air and supply with and discharge pipe arrangement when carrying out discharge from the air of above-mentioned cylinder, the mechanism that does not carry out the high speed exhaust by above-mentioned electromagnetically operated valve.
In above-mentioned first viewpoint, preferably have a plurality of above-mentioned driving mechanisms.In this case, above-mentioned a plurality of driving mechanism preferably has the process auxiliary drive mechanism that makes the racking of above-mentioned valve body when aforesaid substrate is moved into the main driving machine structure that moves between the occlusion locations of taking out of mouthful and the retreating position and closing assisted above-mentioned valve body, this process auxiliary drive mechanism when above-mentioned valve body is positioned at above-mentioned retreating position and above-mentioned valve body leave.Above-mentioned process auxiliary drive mechanism preferably making above-mentioned valve body when retreating position moves to occlusion locations, moves than above-mentioned main driving machine structure later on.
Above-mentioned chamber is the vacuum chamber that is retained vacuum, via above-mentioned move into take out of mouthful with other the situation of vacuum chamber adjacency under effective.
In second viewpoint of the present invention, a kind of vacuum treatment installation is provided, comprising: have moving into of processed substrate at sidewall and take out of the substrate of usefulness and move into and take out of mouthful, on processed substrate, implement vacuum treated vacuum processing chamber; With above-mentioned vacuum processing chamber in abutting connection with the loadlock may of taking out of of moving into that is provided with, carries out with respect to the substrate of above-mentioned vacuum processing chamber; And between above-mentioned vacuum processing chamber and above-mentioned loadlock may, can open and close aforesaid substrate and move into the gate-valve device of taking out of mouthful and being provided with, it is characterized in that: above-mentioned gate-valve device comprises: inaccessible aforesaid substrate is moved into the valve body of taking out of mouthful; Make above-mentioned valve body inaccessible aforesaid substrate move into the occlusion locations of taking out of mouthful and and aforesaid substrate move into and take out of the driving mechanism that moves between the retreating position that mouth separates; With according to the position of above-mentioned valve body so that the drive control part that the different mode of the translational speed of valve body is controlled the driving of above-mentioned valve body.
In the 3rd viewpoint of the present invention, provide on a kind of sidewall that is arranged on chamber, be used for opening and closing moving into of processed substrate and take out of the opening method that the substrate of usefulness is moved into the valve body of the gate-valve device of taking out of mouth, move to aforesaid substrate and move into when taking out of the retreating position that mouth separates making above-mentioned valve body move into the occlusion locations of taking out of mouthful from inaccessible aforesaid substrate, exist on the above-mentioned valve body with other the first area of contact site of parts on make above-mentioned valve body with relatively slow first speed action, on the second area that does not have contact site on the above-mentioned valve body, above-mentioned valve body is moved with comparatively faster second speed.
(effect of invention)
According to the present invention, can be according to the position of valve body so that the different mode of the translational speed of valve body be controlled the driving of above-mentioned valve body, so, can make the translational speed of valve body slower in the zone that valve body contacts with miscellaneous part, with the discontiguous zone of miscellaneous part the translational speed of valve body is accelerated.Therefore, can not produce particle or portion of the mechanism life-span is reduced, can be controlled in the object time operate time of valve body.
In addition, use cylinder as driving mechanism and elevating mechanism, use the air driven circuit as drive control part, thereby the operating speed control valve is realized above-mentioned action on the speed control of valve body, thus, can access above-mentioned effect not making under the complicated situation of control and mechanism.
Description of drawings
Fig. 1 is the stereogram of outward appearance of the vacuum treatment installation of the valve gear of expression with an embodiment of the invention.
Fig. 2 is the load locking room (loadlock may) of the vacuum treatment installation of presentation graphs 1 and the horizontal cross of vacuum processing chamber.
Fig. 3 is the longitudinal section of the drive part of the gate-valve device between expression vacuum processing chamber and the load locking room.
Fig. 4 is the joint institution of valve body of expression gate-valve device shown in Figure 3 and the figure of action thereof.
Fig. 5 is the figure of driven air drive circuit of the cylinder of expression controlling and driving valve body.
Fig. 6 is that expression is provided with two schematic diagrames that drive the cylinder embodiments of valve body.
Fig. 7 is the figure that expression is provided with the air driven circuit under the situation of two cylinders.
Fig. 8 is the schematic diagram of initial stage state of the opening operation of explanation valve body.
Fig. 9 is used to illustrate the schematic diagram of two stages action of the present invention.
Figure 10 is the figure of other embodiment of driven air drive circuit of the cylinder of expression controlling and driving valve body.
Figure 11 is that expression is provided with master cylinder for the driving of valve body and the schematic diagram of the embodiment of assistant cylinder is set in its both sides.
Figure 12 is the figure of air driven circuit under the situation of expression Figure 11.
Symbol description
10 ... vacuum processing chamber
20 ... load locking room (loadlock may)
30 ... gate-valve device
31 ... opening
32 ... framework
33 ... valve body
34 ... joint institution's (linkage),
35 ... supporting mass
36 ... cylinder
37 ... bar
38a ... first air is supplied with and is discharged pipe arrangement
38b ... second air is supplied with and is discharged pipe arrangement
60,60 ', 160,260 ... the air driven circuit
71 ... first speed control valve
72 ... the second speed control valve
73,77 ... pipe arrangement
74 ... the third speed control valve
78 ... the 4th speed control valve
80 ... electromagnetically operated valve
100 ... vacuum treatment installation
G ... glass substrate
Embodiment
Below, specify embodiments of the present invention with reference to accompanying drawing.
Fig. 1 is the stereogram of outward appearance of the vacuum treatment installation of the gate-valve device of expression with an embodiment of the invention, Fig. 2 is the load locking room (loadlock may) of the vacuum treatment installation of presentation graphs 1 and the horizontal cross of vacuum processing chamber, and Fig. 3 is the longitudinal section of the drive part of the gate-valve device between expression vacuum processing chamber and the load locking room.
As shown in Figure 1, vacuum treatment installation 100 has under the vacuum environment and FPD to be carried out plasma etching process processes or film with glass substrate G forms desired vacuum treated vacuum processing chambers (chamber) 10 such as processings, and the load locking room 20 that plays a role as loadlock may that is connected with of this vacuum processing chamber 10, is arranged on the gate-valve device 30 between vacuum processing chamber 10 and the load locking room 20 and the gate-valve device 40 of separation load locking room 20 and atmosphere outside side carrying mechanism 50.Here, as FPD, illustration has LCD (LCD), electricity to luminous (Electro Luminescence:EL) display, plasma display device (PDP) etc.
Atmospheric side carrying mechanism 50 has the carrying arm 51 that can rotate and stretch, carry out following action, promptly from the frame substrate 55 of taking in many substrate G, take out a untreated substrate G, via gate-valve device 40 it is carried out the transition to action on the substrate transfer apparatus 27 in the load locking room 20, and the substrate G after will handling takes off and is fetched into atmospheric side via gate valve 40 from the substrate transfer apparatus 27 in the load locking room 20, and is received into the action on the frame substrate 55.
As shown in Figure 2, vacuum processing chamber 10 is provided with to move into and takes out of moving into of glass substrate G and take out of a mouthful 10a.In addition, via 11 bindings of gas supplying tubing the gas supply part 12 of processing is arranged on vacuum processing chamber 10, gas supplying tubing 11 is provided with valve 13 and flow controller (not shown).And, can be from the internal feed predetermined process gas of this gas supply part 12 to vacuum processing chamber 10.In addition, be connected with vacuum pump 15 via exhaust pipe arrangement 14 on vacuum processing chamber 10, exhaust pipe arrangement 14 is provided with pressure-control valve 16.Thus, can in vacuum processing chamber 10, form the processing gaseous environment of handling necessary authorized pressure.Be provided with treatment bench 17 in the inside of vacuum processing chamber 10, upload the glass substrate G that is equipped with as process object at treatment bench 17.
As shown in Figure 2, take out of first of glass substrate G and move into and take out of mouthful 20a and take out of second of glass substrate G and move into and take out of a mouthful 20b moving between itself and the atmospheric side having on the load locking room 20 moving between itself and the vacuum processing chamber 10.In addition, be connected with vacuum pump 22 via exhaust pipe arrangement 21 on load locking room 20, exhaust pipe arrangement 21 is provided with valve 23.In addition, be provided with purge gas supply unit 25 via purge gas supplying tubing 24 on load locking room 20, purge gas supplying tubing 24 is provided with valve 26 and flow controller (not shown).And, and vacuum processing chamber 10 between under the situation of carrying glass substrate G, carry out vacuum exhaust by 22 pairs of load locking rooms of vacuum pump 20 and have equal vacuum degree up to itself and vacuum processing chamber 10, under the situation of carrying glass substrate G between the frame substrate 55 of load locking room 20 and atmospheric environment, in load locking room 20, supply with N from purge gas supply unit 25
2Thereby return to atmospheric pressure in the purge gas load locking rooms 20 such as gas.In addition, be provided with substrate transfer apparatus 27, undertaken the moving into of glass substrate G of vacuum processing chamber 10 taken out of by this substrate transfer apparatus 27 in the inside of load locking room 20.
Gate-valve device 30, shown in Fig. 2,3, be arranged between vacuum processing chamber 10 and the load locking room 20, have to fit tightly and be communicated with that moving into of vacuum processing chamber 10 taken out of first the framework 32 of moving into the pair of openings 31 of taking out of mouthful 20a of mouthful 10a and load locking room 20 and mobile and carry out the valve body 33 of the on-off action of opening 31 this framework 32 in being formed with on the outer wall of vacuum processing chamber 10 and load locking room 20.
Upper end at the 33a of pushing portion of valve body 33 is provided with fastening roller 61, and the position corresponding with fastening roller 61 of the upper wall inboard of framework 32 is provided with the retainer 62 with pooling feature.In addition, in the rear side (load locking room 20 sides) of supporting mass 35, when the 33a of pushing portion was positioned on the position corresponding with opening 31, the pressure in the vacuum processing chamber 10 raise.For even the air-tight state that also can keep the opening 31 that obtains by the 33a of pushing portion under the state that produces " the contrary pressure " is equipped with a pair of roller dorsad right 63a, 63b.These stride across the opening 31 of load locking room 20 sides up and down when roller 63a, 63b are arranged in valve body 33 and are positioned on the position corresponding with opening 31 dorsad, the inwall of framework 32 be provided be used to accept these dorsad roller accept parts 64a, 64b.These accept parts 64a, and 64b has pooling feature.
As shown in Figure 4, above-mentioned joint institution 34 has: be attached at last associating portion 65 on 33a of pushing portion and the supporting mass 35 by axle 65a, 65b respectively; Be attached on 33a of pushing portion and the supporting mass 35 and be configured to parallel with last associating 65 following associating portion 66 by axle 66a, the 66b that is positioned at its lower position, by associating portion 65 these on, associating portion 66, the 33a of pushing portion and supporting mass 35 formation parallelogram associating portions down.And, when valve body 33 is not closed, shown in Fig. 4 (a), by as the spring 67 of force application mechanism so that the 33a of pushing portion of valve body 33 be positioned at than supporting mass 35 more the mode of the position of top to the 33a of the pushing portion application of force.And, begin valve body 33 to be risen from this state by cylinder 36, fastening roller 61 and retainer 62 butts of the 33a of pushing portion, shown in Fig. 4 (b), the rising of the 33a of pushing portion is hindered, and has only the active force of supporting mass 35 antagonistic springs 67 to rise.Like this, the last associating portion 65 that active force by spring 67 tilts and down associating portion 66 near level, parallelogram association becomes near rectangular shape, accompany therewith, the 33a of pushing portion is pushed into vacuum processing chamber 10 sides, be sealed by the 33a of pushing portion around the opening 31, the moving into of vacuum processing chamber 10 taken out of mouthful 10a and is closed by valve body 33.
Opening valve body 33 and opening and move under the situation of taking out of mouthful 10a, by cylinder 36 supporting mass 35 is descended, at first, make the 33a of pushing portion become state, begin the integral body of valve body 33 to be descended by cylinder 36 from this state to Fig. 4 of load locking room 20 side shiftings (a) from the state of Fig. 4 (b).
In this case, in gate-valve device 30, by valve body 33 from the state of inaccessible opening 31 when opening, must have sealing, fastening roller, contact site such as roller dorsad, and be positioned at outside the contact range thereafter.When contact site exists, if make valve body 33 rapid actions then be easy to generate particle, also reduce the life-span of portion of mechanism in addition easily, on the contrary, if suppress a dirt (generation dust) and make action slower, then in the object time, move and can not finish.
Therefore, in the present embodiment, carry out following control by 60 pairs of drivings of being undertaken by cylinder 36 of air driven circuit, when opening valve body 33, in the initial stage that contact site exists, make valve body 33 with low speed action (a action), in the non-existent stage of contact site, make valve body 33 with high speed motion (b action), thereby realize the inhibition of particle and the on-off action of the valve body in the object time 33.
The concrete structure of air driven circuit 60 as shown in Figure 5.
First air is supplied with and is discharged the top that pipe arrangement 38a is connected cylinder 36, (opening operation of valve body 33) air supply in cylinder 36 when the bar 37 that makes cylinder 36 descends, (the obturation action of valve body 33) air-out when the bar 37 that makes cylinder 36 rises.On the other hand, second air is supplied with and is discharged the bottom that pipe arrangement 38b is connected cylinder 36, (the obturation action of valve body 33) air supply in cylinder 36 when the bar 37 that makes cylinder 36 rises, (opening operation of valve body 33) air-out when it is descended.Supply with to discharge that pipe arrangement 38a and second air are supplied with the supply of the air of discharging pipe arrangement 38b and supply with to first air and discharge pipe arrangement 38a and second air and supply with the discharge of the air of discharging pipe arrangement 38b and control by electromagnetically operated valve 80 from first air.Electromagnetically operated valve 80 can switch cutting out between portion 81 and the open portion 82, when switching to the portion 81 of closing, carries out the obturation action of valve body 33, when switching to open portion 82, carries out the opening operation of valve body 33.
On first air supply discharge pipe arrangement 38a, first speed control valve 71 is installed.This first speed control valve 71 is controlled to the regulation flow by choke valve 71a when air-out, when air supply, can not hinder check-valves 71b ground to supply with big flow.
Supply with the second speed control valve 72 that the above-mentioned a action usefulness of carrying out low speed is installed on the discharge pipe arrangement 38b at second air.This second speed control valve 72 is controlled to low discharge by choke valve 72a so that the opening operation of valve body 33 becomes the mode of a action of the low speed that can suppress particle when air-out, when air supply, can supply with big flow on not overslaugh check-valves 72b ground.In addition, on second air supply discharge pipe arrangement 38b, be connected with pipe arrangement 73, the third speed control valve 74 that carries out above-mentioned b action usefulness at a high speed is installed on this pipe arrangement 73 so that second speed control valve 72 becomes the mode of bypass.Third speed control valve 74 is that assembling hydraulic control unidirectional valve (pilot checkvalve) 75 forms on the control part 76 with common speed control valve arrangement, is connected with on hydraulic control unidirectional valve 75 from first air and supplies with the pipe arrangement 77 of discharging pipe arrangement 38a branch.The 4th speed control valve 78 is installed on this pipe arrangement 77.And, when carrying out the opening operation of valve body 33, begin most, the hydraulic control unidirectional valve 75 by third speed control valve 74 does not make air flow to pipe arrangement 73, by second speed control valve 72 with the low discharge air-out.Thus, in the initial stage of open valve body 33, valve body 33 is with low speed action (a action).At this moment, choke valve 78a by the 4th speed control valve 78 supplies with the part of air of discharging pipe arrangement 38a supply supplies to third speed control valve 74 by pipe arrangement 77 hydraulic control unidirectional valve 75 with the regulation flow to first air, become the moment of the pressure (being 50%) of regulation here with respect to the pressure of cylinder 36 sides of hydraulic control unidirectional valve 75 at the pressure of pipe arrangement 77 sides, hydraulic control unidirectional valve 75 is opened, and air flows into pipe arrangement 73.At this moment, thereby can make the throttling unhurried current of choke valve 76a of the control part 76 of third speed control valve 74 become the big flow bigger, thus, the action of valve body 33 can be switched to high speed motion (b action) than controlled flow by second speed control valve 72.That is, the 4th speed control valve 78 has the function that is used to switch a action and b action.The switching instant of action of initial stage of such valve body 33 and high speed motion thereafter, the flow adjustment to the air that flows through pipe arrangement 77 that can be undertaken by the choke valve 78a by the 4th speed control valve 78 is controlled.
In addition, under gate-valve device 30 was large-scale situation, the power that the driving of valve body 33 must be bigger in this case, preferably was provided with two cylinders shown in Figure 6 36.In this case, two cylinders 36 can carry out identical action simultaneously by air driven circuit 60 '.
As shown in Figure 7, this air driven circuit 60 ' with respect to two cylinders 36, makes sharings such as electromagnetically operated valve 80, the 4th speed control valve 78, but identical under the situation of its basic structure and a cylinder 36.
As shown in Figure 2, gate-valve device 40 is arranged on the atmospheric side of load locking room 20, have fit tightly on the outer wall of load locking room 20, be formed with and be communicated with second and move into the framework 42 of the pair of openings 41 of taking out of mouthful 20b and atmospheric side and mobile and carry out the valve body 43 of the on-off action of opening 41 this framework 42 in.
As shown in Figure 2, each formation portion of vacuum treatment installation 100 becomes the structure of controlling by control part 90.For example, the supply of gas, exhaust, open and close valve, gate-valve device etc. are by control part 90 controls.Especially, in above-mentioned gate-valve device 30, the action of the electromagnetically operated valve 80 of air driven circuit 60 is by control part 90 controls.
This control part 90 has process controller 91, this process controller 91 has microcontroller, be connected with user interface 92 on this process controller 91, this user interface 92 is used to manage vacuum treatment installation 100 by the operator and the keyboard of the input operation of instructing etc. and visual vacuum treatment installation 100 operational situations and display of showing etc. constitute.In addition, be connected with storage part 93 on process controller 91, storing the control realization that is used for by process controller 91 in this storage part 93 is that method also has various databases etc. by the control program of the various processing of vacuum treatment installation 100 implementations and the control program that is used for carrying out predetermined process at vacuum treatment installation 100 according to treatment conditions.Storage part 93 has storage medium, and method etc. are stored in this storage medium.Storage medium can be the such mounting medium of hard disk, also can be movably medium such as CDROM, DVD, flash memory.And, as required,, thus, under the control of process controller 91, can carry out vacuum treatment installation 100 desirable processing process controller 91 by arbitrary method being read and carried out from storage part 93 from the indication of user interface 92 etc.
Next, the action of the vacuum treatment installation that constitutes like this is described.
At first, substrate transfer apparatus 27 is present in the load locking room 20, and the valve body 33 of gate-valve device 30 is closed, and the inside of vacuum processing chamber 10 is deflated into the vacuum necessary degree by vacuum pump 15.
Next, carrying arm 51 by atmospheric side carrying mechanism 50, untreated glass substrate G is taken out from frame substrate 55, open the valve body 42 of gate-valve device 40, make glass substrate G by peristome 41 and move into and take out of mouthful 20b and moved in the load locking room 20 of atmospheric environment, it is configured on the location division (not shown) subsequently.Then, carrying arm 51 is pulled out to atmospheric side and makes its outside of keeping out of the way load locking room 20, glass substrate G is positioned on the pick-up (pick) of Handling device 27.
Under this state, the valve body 42 of closing gate valve device 40 also makes load locking room 20 become air-tight state, open gas exhausting valve 23 and carry out exhaust, can carry out behind the pressure of the carrying of vacuum processing chamber 10, opening the valve body 33 of gate-valve device 30 up to becoming by vacuum pump 22.In this case, valve body 33 is from inaccessible opening 31 and begin open and decline thereupon to the state that pushes around the opening 31, but, initial stage at the opening operation of valve body 33, pressure ratio vacuum treatment in load locking room 20 is stopped up under high barotropic state of pressure in 10 or the isopiestic state that both equate, the sealing of valve body 33 contacts with peripheral part of the opening 31 of framework 32, under the low contrary pressure condition of pressure in the pressure ratio vacuum processing chamber 10 in load locking room 20, roller 63a dorsad, 63b with accept parts 64a, 64b, under any circumstance, because fastening roller 61 all contacts with retainer 62, therefore, must there be contact site at the action initial stage of valve body 33.In the past, because limited at the appointed time the operate time of valve body 33, therefore, in the stage that the contact site at action initial stage exists, have to make the responsiveness of valve body 33 to accelerate, as shown in Figure 8, because contact site is sent out dirt (generation dust) with high-speed slide etc., and there is the low worry of life-span of portion of mechanism.So as can be known problem even take to be provided with the countermeasure that the minimizing of roller 63,63b etc. is dorsad impacted, will produce as long as the initial stage that exists at contact site becomes at a high speed the action of valve body 33.
Therefore, in the present embodiment, in the opening operation of valve body 33, shown in Fig. 9 (a), during having contact site on the valve body 33, move (a action) with low speed so that the powerful mode of sending out dirt (generation dust) not to take place, shown in Fig. 9 (b), do not exist and moment of not sending out low worry of dirt or mechanism's life-span is moved (b action) with high speed at contact site.Thus, can not send out the life-span of dirt and reduction mechanism, can shorten the operate time of the integral body of valve body 33.
And, owing to carry out the action control in two stages of such a action and b action by air driven circuit 60, therefore, when valve body 33 actions, the switching controls that the control of being carried out in control part 90 is only moved for electromagnetically operated valve 80, and, owing to this air driven circuit 60 is that a plurality of speed control valves and pipe arrangement are made up the simple structure that constitutes, therefore, needn't use complicated structure or control, just can realize the action in such two stages.
Under the state of opening valve body 33 like this, take out of the pair of openings 31 of a mouthful 20a, gate-valve device 30 via moving into of load locking room 20 and move into by substrate transfer apparatus 27 and take out of mouthful 10a glass substrate G is moved into vacuum processing chamber 10.In this case, from the viewpoint of increasing the total yield, the preferably action of beginning substrate transfer apparatus 27 in the opening operation process of above-mentioned valve body 33.Thus, compare, can shorten total board carrying time with the situation that open moment that finishes at valve body 33 begins the action of substrate transfer apparatus 27.As the action moment of substrate transfer apparatus 27 at this moment, for example, can consider to be used to detect the transducer of valve body 33 when being arranged on valve body 33 on gate-valve device 30 carries out down maneuver, will make substrate transfer apparatus 27 actions as trigger from the signal of this transducer by the situation of assigned position.In addition, can with the action of substrate transfer apparatus correspondingly during valve body, base detects the positional information of substrate transfer apparatus by the encoder on the driving mechanism that is installed in substrate transfer apparatus etc., and is used to triggering signal that valve body 33 is risen based on this information output.
After moving into glass substrate G like this, switching solenoid valve 80, supply with the air of discharging in the pipe arrangement 38a discharge cylinder 36 via first air, and via second air supply discharge pipe arrangement 38b air supply in cylinder 36, thus, bar 37 is risen, valve body 33 is risen, and then valve body 33 is pressed on peripheral part of opening 31 of framework 32.Thus, valve body 33 becomes closed condition, in vacuum processing chamber 10 glass substrate G is carried out specified vacuum and handles.
After the vacuum treatment, with similarly above-mentioned, the valve body 33 of gate-valve device 30 is opened, and by substrate transfer apparatus 27 the glass substrate G in the vacuum processing chamber 10 is taken out to turn back in the load locking room 20, and then, the valve body 33 of gate-valve device 30 is closed.In load locking room 20, exist under the state of glass substrate G, in load locking room 20, supply with purge gas from purge gas supply unit 25, make its inside become atmospheric pressure state, next, the valve body 42 of open gate-valve device 40 is received into glass substrate G on the frame 55 that is present under the atmospheric environment by the atmospheric side carrying mechanism.
Next, other the air driven circuit of realizing above-mentioned two stages action is described.
Figure 10 is the figure that represents other air driven circuit 160.Here, because basic structure is identical with air driven circuit 60 shown in Figure 5, therefore, the symbol that identical part mark is identical also omits explanation.
This air driven circuit 160 replaces first speed control valve 71 to be provided with vent valve 171 rapidly on first air supply discharge pipe arrangement 38a, replaces instead flowing air and carrying out the height exhaust to electromagnetically operated valve 80.That is, vent valve 171 has the three-way valve structure rapidly, and exhaust lay out 172 is connected on the branching portion 171a rapidly.In addition, be connected in the stream 38a ' that first air of branching portion 171a supply with to discharge on the pipe arrangement 38a and be provided with check-valves 171b, when air-out, can not flow by check-valves 171b air to stream 38a ', can carry out the high speed exhaust through high speed exhaust lay out 172.Therefore, the vertical motion of the valve body 33 that is undertaken by cylinder 36 is carried out more to heavens.To the cylinder air supply time, can not supplied with discharge pipe arrangement 38a by first air and supply with by check-valves 171b overslaugh ground.
On the other hand, third speed control valve 74 from second air supply with to discharge that pipe arrangement 38b branch does not turn back to electromagnetically operated valve 80 but with previous status be connected can the pipe arrangement 173 of air-out on.Therefore, can carry out exhaust more at a high speed, can carry out moving with higher speed with the above-mentioned b that valve body 33 is descended.
Under the situation that device more maximizes, the preferred high speed motion circuit that uses Figure 10, but, under the situation of a cylinder, have the hypodynamic tendency of pushing when valve body 33, in addition, if use such high speed exhaust, then, therefore, can not fully prevent falling of valve body 33 because air does not turn back to electromagnetically operated valve 80.
As shown in figure 11, except the master cylinder 36 of the air driven circuit 160 that uses Figure 10, also use two cylinders 136 for auxiliary.Should be auxiliary with cylinder 136, bar 137 is not connected on the valve body 33, is the cylinder that is used for the pushing force of auxiliary valve body 33 when valve body 33.In addition, these two cylinders 136 have the function that falls that can prevent valve body 33.These two cylinders 136 pass through air driven circuit 260 and drive, and have first air and supply with discharge pipe arrangement 138a and second air supply discharge pipe arrangement 138b.
Figure 12 represents to make up the state of air driven circuit 160 and air driven circuit 260.On air driven circuit 260, as mentioned above, have first air and supply with discharge pipe arrangement 138a and second air supply discharge pipe arrangement 138b.First air is supplied with and is discharged the top that pipe arrangement 138a is connected cylinder 136, when the bar 137 that makes cylinder 136 descends, and air supply in cylinder 136, air-out when it is risen.On the other hand, second air supply with to be discharged the bottom that pipe arrangement 138b is connected cylinder 136, when the bar 137 that makes cylinder 136 rises to cylinder 136 in air supply, air-out when making its decline.First air is supplied with the supply of discharge pipe arrangement 138a process stream 138a ' arrival electromagnetically operated valve 80, the second air and is discharged pipe arrangement 138b process stream 138b ' arrival electromagnetically operated valve 80.To first air supply with to discharge pipe arrangement 138a and second air supply with the supply of discharging the air that pipe arrangement 138b carries out and from first air supply with discharge pipe arrangement 138a and second air supply with discharge the air that pipe arrangement 138b carries out discharge by electromagnetically operated valve 180 controls.Electromagnetically operated valve 180 can switch cutting out between portion 181 and the open portion 182, when switching to the portion 181 of closing, carries out the vertical motion of bar 137, when switching to open portion 182, carries out the down maneuver of bar 137.
On first air supply discharge pipe arrangement 138a, first speed control valve 181 is installed.This first speed control valve 181 is identical with the third speed control valve 74 of air driven circuit 60 shown in Figure 5, assembling hydraulic control unidirectional valve 182 obtains on the control part 183 with common speed control valve arrangement, is connected with on hydraulic control unidirectional valve 182 from second air and supplies with the pipe arrangement 185 of discharging pipe arrangement 138b branch.Therefore, when the supply of supply with discharging the air of pipe arrangement 138b to second air stopped owing to certain fault, owing to the supply to the air of pipe arrangement 185 stops, therefore, hydraulic control unidirectional valve 182 was closed.Like this, first air supply discharge pipe arrangement 138a that is connected cylinder 137 becomes enclosure space, and flowing of air can not taken place.That is to say the action that stops cylinder 137, when breaking down, keep present situation.
On the other hand, on second air supply discharge pipe arrangement 138b, second speed control valve 184 is installed.This second speed control valve 184 has the common structure of control flow when air-out.
And first air of two cylinders 136 is supplied with and is discharged pipe arrangement 138a, second air and supply with and discharge pipe arrangement 138b respectively by individualized (integrated) and be connected on the shared electromagnetically operated valve 180.Thus, two cylinders 136 can carry out identical action simultaneously.
In addition, the invention is not restricted to above-mentioned execution mode, in the scope of the technology of the present invention thought, can carry out various distortion.For example, in the above-described embodiment, the cylinder embodiments of use as elevating mechanism arranged as the driving mechanism illustration, but type of drive is not limited to up-down mode, for example rotates and waits other mode also passable, driving mechanism also is not limited to cylinder, and other driving mechanism such as motor also can.Under the situation of not using cylinder, replace the mode of using the air driven circuit as controlling organization, can use other control gimmick such as electric control.
And in the above-described embodiment, example illustrates the embodiment as loadlock may working load lock chamber, but also can be for being retained the vacuum carrying chamber of normality vacuum.
And, as the substrate illustration use the situation of FPD substrate, but be not limited to this, also can be applicable to other substrate.
(industrial utilize possibility)
The present invention be applicable to large-scale board carrying between the vacuum chamber time, be used for opening and closing this Gate-valve device between a little vacuum chambers.
Claims (13)
1. gate-valve device, the sidewall that it is set at chamber is used to open and close moving into of processed substrate and takes out of the substrate of usefulness and move into and take out of mouth, and this gate-valve device is characterised in that, comprising:
Be used for inaccessible described substrate and move into the valve body of taking out of mouth;
Make described valve body the described substrate of obturation move into the occlusion locations of taking out of mouthful and and described substrate move into and take out of the driving mechanism that moves between the retreating position that mouth separates; With
According to the position of described valve body so that the drive control part that the different mode of the translational speed of valve body is controlled the driving of described valve body.
2. gate-valve device as claimed in claim 1 is characterized in that:
Described drive control part makes described valve body move with first relatively slow speed and comparatively faster second speed according to its position.
3. gate-valve device as claimed in claim 2 is characterized in that:
Described drive control part is controlled, and makes in the first area that described valve body contacts with miscellaneous part described valve body to be moved with described first speed, and the second area that does not contact with miscellaneous part at described valve body makes described valve body move with described second speed.
4. as claim 2 or 3 described gate-valve devices, it is characterized in that:
Described driving mechanism is a cylinder, thereby described drive control part has and carries out to the air supply of described cylinder and the driven air drive circuit of discharge control cylinder, and described air driven circuit has first speed control valve corresponding with described first speed and the second speed control valve corresponding with second speed.
5. gate-valve device as claimed in claim 4 is characterized in that:
Thereby described air driven circuit has the hydraulic control unidirectional valve that is connected on described first speed control valve and is connected on this hydraulic control unidirectional valve, adjusts to the moment that the feed speed of the air of this hydraulic control unidirectional valve is adjusted the switching instant of described first speed and the described second speed control valve of regulating the speed.
6. as claim 4 or 5 described gate-valve devices, it is characterized in that:
Described air driven circuit has first and second air that is connected on the described cylinder and supplies with the discharge pipe arrangement and described first air supply discharge pipe arrangement and described second air are supplied with the supply of the air of discharging pipe arrangement and the electromagnetically operated valve that discharge is switched, described first speed control valve is arranged on described second air and supplies with on the discharge pipe arrangement, and described second speed control valve and described first speed control valve are set up in parallel.
7. gate-valve device as claimed in claim 6 is characterized in that:
Described air driven circuit has supplying with via described first air discharges pipe arrangement and/or described second air and supplies with and discharge pipe arrangement when carrying out discharge from the air of described cylinder, the mechanism that does not carry out the high speed exhaust by described electromagnetically operated valve.
8. as each the described gate-valve device in the claim 1～7, it is characterized in that:
Have a plurality of described driving mechanisms.
9. gate-valve device as claimed in claim 8 is characterized in that:
Described a plurality of driving mechanism has the process auxiliary drive mechanism that makes the racking of described valve body when described substrate is moved into the main driving machine structure that moves between the occlusion locations of taking out of mouthful and the retreating position and closing assisted described valve body, this process auxiliary drive mechanism when described valve body is positioned at described retreating position and described valve body leave.
10. gate-valve device as claimed in claim 9 is characterized in that:
Described process auxiliary drive mechanism moves than described main driving machine structure later on making described valve body when retreating position moves to occlusion locations.
11. each the described gate-valve device as in the claim 1～10 is characterized in that:
Described chamber is the vacuum chamber that is retained vacuum, via the described vacuum chamber adjacency of taking out of mouthful with other of moving into.
12. a vacuum treatment installation comprises:
Having moving into of processed substrate at sidewall takes out of the substrate of usefulness and moves into and take out of mouthful, implement vacuum treated vacuum processing chamber on to processed substrate;
With described vacuum processing chamber in abutting connection with the loadlock may of taking out of of moving into that is provided with, carries out with respect to the substrate of described vacuum processing chamber; With
Between described vacuum processing chamber and described loadlock may, can open and close described substrate and move into the gate-valve device of taking out of mouthful and being provided with, this vacuum treatment installation is characterised in that:
Described gate-valve device comprises:
Be used for inaccessible described substrate and move into the valve body of taking out of mouth;
Make described valve body the described substrate of obturation move into the occlusion locations of taking out of mouthful and and described substrate move into and take out of the driving mechanism that moves between the retreating position that mouth separates; With
According to the position of described valve body so that the drive control part that the different mode of the translational speed of valve body is controlled the driving of described valve body.
13. on the sidewall that is arranged on chamber, be used for opening and closing moving into of processed substrate and take out of the opening method that the substrate of usefulness is moved into the valve body of the gate-valve device of taking out of mouthful, it is characterized in that:
Move to described substrate and move into when taking out of the retreating position that mouth separates making described valve body move into the occlusion locations of taking out of mouthful from the described substrate of obturation, exist on the described valve body with other the first area of contact site of parts on make described valve body with relatively slow first speed action, on the second area that does not have contact site on the described valve body, described valve body is moved with comparatively faster second speed.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-289980 | 2007-11-07 | ||
| JP2007289980 | 2007-11-07 | ||
| JP2007289980A JP5005512B2 (en) | 2007-11-07 | 2007-11-07 | A gate valve device, a vacuum processing device, and a method for opening a valve body in the gate valve device. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101431010A true CN101431010A (en) | 2009-05-13 |
| CN101431010B CN101431010B (en) | 2011-02-09 |
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ID=40646309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200810176501XA Active CN101431010B (en) | 2007-11-07 | 2008-11-07 | Gate valve apparatus, vacuum treatment apparatus and opening method of valve body in gate valve apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5005512B2 (en) |
| KR (2) | KR101037846B1 (en) |
| CN (1) | CN101431010B (en) |
| TW (1) | TWI439623B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101988586A (en) * | 2009-08-04 | 2011-03-23 | 东京毅力科创株式会社 | Gate valve and substrate processing system using same |
| CN104048103A (en) * | 2013-03-13 | 2014-09-17 | 艾姆斯特工程有限公司 | Vacuum isolation valve |
| CN104343996A (en) * | 2013-07-23 | 2015-02-11 | Vat控股公司 | VALVE , especially vacuum valve |
| CN106340475A (en) * | 2016-08-24 | 2017-01-18 | 武汉华星光电技术有限公司 | Gate structure for etching devices and machining method thereof |
| CN111853264A (en) * | 2019-04-26 | 2020-10-30 | 株式会社爱发科 | Hydraulic drive system and gate valve |
| CN112530829A (en) * | 2019-09-18 | 2021-03-19 | 中微半导体设备(上海)股份有限公司 | Substrate processing system, valve plate assembly and working method of substrate processing system |
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| JP2011127190A (en) * | 2009-12-18 | 2011-06-30 | Showa Denko Kk | In-line film forming apparatus, method for producing magnetic recording medium, and gate valve |
| KR101099571B1 (en) | 2010-01-18 | 2011-12-28 | 프리시스 주식회사 | Vacuum gate valve |
| JP5806827B2 (en) | 2011-03-18 | 2015-11-10 | 東京エレクトロン株式会社 | Gate valve apparatus, substrate processing apparatus and substrate processing method thereof |
| KR102161685B1 (en) | 2013-09-26 | 2020-10-05 | 어플라이드 머티어리얼스, 인코포레이티드 | Mixed-platform apparatus, systems, and methods for substrate processing |
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| JP6160923B2 (en) * | 2014-04-30 | 2017-07-12 | Smc株式会社 | Gate valve |
| KR101597818B1 (en) * | 2015-06-19 | 2016-02-25 | 주식회사 퓨젠 | Rectangular gate vacuum valve |
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| KR102300216B1 (en) * | 2020-01-07 | 2021-09-10 | (주)고려기연 | Pneumatic Shutter for OLED Buffer |
| US11328943B2 (en) * | 2020-04-03 | 2022-05-10 | Applied Materials, Inc. | Dual gate and single actuator system |
| JP7458267B2 (en) | 2020-08-19 | 2024-03-29 | 東京エレクトロン株式会社 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD |
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| JPS59170503A (en) * | 1983-03-18 | 1984-09-26 | Toshiba Corp | Speed controller for hydraulic driven equipment |
| JPH0231002A (en) * | 1988-07-18 | 1990-02-01 | T & K Internatl Kenkyusho:Kk | Member transfer speed controller in member transfer machine |
| JP3589061B2 (en) * | 1999-01-25 | 2004-11-17 | 株式会社日立製作所 | Vacuum switchgear and method for opening and closing vacuum switchgear |
| JP4092028B2 (en) * | 1999-02-08 | 2008-05-28 | 新明和工業株式会社 | Vacuum gate valve |
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- 2008-11-06 TW TW097142863A patent/TWI439623B/en active
- 2008-11-07 CN CN200810176501XA patent/CN101431010B/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101988586A (en) * | 2009-08-04 | 2011-03-23 | 东京毅力科创株式会社 | Gate valve and substrate processing system using same |
| CN101988586B (en) * | 2009-08-04 | 2013-01-02 | 东京毅力科创株式会社 | Gate valve and substrate processing system using same |
| CN104048103A (en) * | 2013-03-13 | 2014-09-17 | 艾姆斯特工程有限公司 | Vacuum isolation valve |
| CN104048103B (en) * | 2013-03-13 | 2017-04-12 | 艾姆斯特工程有限公司 | Vacuum isolation valve |
| CN104343996A (en) * | 2013-07-23 | 2015-02-11 | Vat控股公司 | VALVE , especially vacuum valve |
| CN106340475A (en) * | 2016-08-24 | 2017-01-18 | 武汉华星光电技术有限公司 | Gate structure for etching devices and machining method thereof |
| CN111853264A (en) * | 2019-04-26 | 2020-10-30 | 株式会社爱发科 | Hydraulic drive system and gate valve |
| CN111853264B (en) * | 2019-04-26 | 2022-01-14 | 株式会社爱发科 | Hydraulic drive system and gate valve |
| CN112530829A (en) * | 2019-09-18 | 2021-03-19 | 中微半导体设备(上海)股份有限公司 | Substrate processing system, valve plate assembly and working method of substrate processing system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101431010B (en) | 2011-02-09 |
| JP2009115242A (en) | 2009-05-28 |
| KR101037846B1 (en) | 2011-05-31 |
| TW200934975A (en) | 2009-08-16 |
| KR20100120630A (en) | 2010-11-16 |
| TWI439623B (en) | 2014-06-01 |
| JP5005512B2 (en) | 2012-08-22 |
| KR20090047349A (en) | 2009-05-12 |
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