KR101462528B1 - Manufacturing device for nano particle attached to supporting material - Google Patents

Abstract

The present invention relates to a novel device for manufacturing nano particles attached to a supporting material, whereby nano particle manufacturing processes from a pretreatment process to a packaging process are separated according to process stages, and a vacuum degree is changed according to process works in the separated nano particle manufacturing processes, thereby continuously performing the nano particle manufacturing processes. A device for manufacturing nano particles attached to a supporting material according to the present invention is characterized by including: a pretreatment chamber for pretreating a supplied supporting material at a predetermined vacuum degree; a process chamber for treating the supporting material pretreated at the pretreatment chamber, through a process at a predetermined vacuum degree; a recovery chamber for recovering the supporting material treated at the process chamber, at a predetermined vacuum degree and discharging the supporting material; first and second transfer pipe arrangements connected between the pretreatment chamber and the process chamber, and between the process chamber and the recovery chamber to transfer the supporting material; and inter-chamber valves installed on the first and second transfer pipe arrangements to control opening and closing of the first and second transfer pipe arrangements.

Description

TECHNICAL FIELD [0001] The present invention relates to a nanoparticle-

The present invention relates to a nanoparticle production apparatus, and more particularly, to a nanoparticle production apparatus that separates a nanoparticle production process from a preprocessing process to a packaging process by a process step, To a new type of nanoparticle production apparatus in which a particle production process is carried out.

Nanoparticles are formed by chemical processes in the initial process in which metal ions are converted into metal solid particles by adding a reducing agent and a dispersant to the metal ions present in the aqueous solution state.

Also, unlike chemical methods, there is a method of physically making nanoparticles using the condensation of metal atom vapor. This method makes metal or metal compound gas at high temperature and expands it to low temperature, To form nanoparticles.

The above method is a method in which a high temperature is applied to a metal or a metal compound to form a vapor or an electron or an energy is generated by using DC sputtering, DC-RF sputtering, ECR or laser beam sputtering. Is sprayed onto a low temperature gas or passed through a low temperature region so that the atomic vapors are rapidly condensed to form nano-sized particles.

Unlike the chemical method, the physical methods are simple because the metal itself is made into steam and the metal nanoparticles are again made into the metal nanoparticles.

Another physical method is a mechanical grinding method of grinding a material into fine particles by applying a mechanical force to the material. In order to process the material into nanoparticles having a size of 10 nm, a long grinding process is required.

In the physical methods, 80 to 90% of the particles are formed in a micrometer size significantly larger than the nanoparticles. When the nanoparticles are formed by the physical method using the vacuum equipment, the particle size is uneven and the productivity is low. There is a falling problem.

Recently, attempts have been made to vaporize a metal or a metal oxide by a physical method in a vacuum state, and to deposit a metal or an oxide vapor on the carrier to be stirred to form nanoparticles.

FIG. 1 is a schematic cross-sectional side view of an apparatus for manufacturing nanoparticles attached to a carrier according to the prior art. As shown in FIG. 1, the process of manufacturing a nano powder in a vacuum state is carried out, To obtain nanoparticles attached to the carrier.

However, the conventional method has a problem in that it is impossible to carry out a continuous process since the nano powder is obtained in a vacuum process in a vacuum state and then the process is started after the vacuum is released and the product is recovered from the beginning .

Each of the prior art techniques described below is a device for carrying out a process of manufacturing a nano powder in a vacuum state. In this case, the nano powder is obtained in a vacuum process in a vacuum state and then the vacuum state is released. It is impossible to carry out a continuous process.

[Prior Art]

1. Application No. 10-2009-43663 (2009.5.19), a nano powder manufacturing apparatus

2. Application No. 10-2005-101112 (Oct. 26, 2005), a method of forming a powder in which metal, alloy and ceramic nanoparticles are uniformly vacuum-deposited, and a manufacturing apparatus therefor

As a batch-type equipment of the same type as the conventional technique described above, since the vacuum degree (low vacuum work, high vacuum work, and standby work) must be changed depending on the work from the time of pre-processing to packaging in the nanoparticle manufacturing process, It is impossible to do so, and it is necessary to perform the steps separately.

Further, when a plurality of chambers of the same arrangement type as the above-mentioned prior art are connected to each other, separate power is required to move the carriers between the chambers. In such cases, there is a problem in maintaining and repairing the equipment, so additional power is not used. In addition, since there is a difference in vacuum degree between the connected chambers, there is an inconvenience that it is firstly required to prevent this from happening and to prevent inflow and outflow of the carrier.

In addition, moisture and out gassing contained in the carrier delays the time for reaching the vacuum degree (basic vacuum degree: working pressure) for carrying out the NPP process, and therefore there is a problem that it must be removed before the NPP process. Here, the NPP process refers to a process of forming nanoparticles on the surface of a carrier while agitating the carrier powder or carrier chip.

KR 2010-0124581 A KR 2007-0044879 A

It is an object of the present invention to provide a method of manufacturing nanoparticles having different degrees of vacuum, which can collectively perform a process including a pre-treatment process, a manufacturing process, and a recovery process, And to provide a nanoparticle production apparatus adhered to the carrier.

To achieve these and other advantages and in accordance with the purpose of the present invention, as embodied and broadly described herein, there is provided a nanoparticle-

A pretreatment chamber for pretreating the supplied carrier at a predetermined degree of vacuum;

A process chamber for processing the carrier pretreated from the pretreatment chamber at a predetermined degree of vacuum;

A recovery chamber for recovering and discharging the carrier processed from the process chamber at a predetermined degree of vacuum;

First and second transfer piping connected to the pre-treatment chamber and the process chamber, and between the process chamber and the recovery chamber to transfer the carrier; And

And an inter-chamber valve installed in the first and second transfer pipes for controlling opening and closing of the first and second transfer pipes.

Further, the pre-treatment chamber, the process chamber, and the recovery chamber have different degrees of vacuum.

In addition, the pretreatment chamber and the process chamber are formed in a structure that is inclined upward, not horizontally, to prevent the carrier from escaping, and a chamber connection pipe is provided to prevent the carrier from flowing.

The chamber connecting pipe is provided with a carrier conveying screw for opening or closing the chamber connecting pipe by forward rotation or reverse rotation by a rotational force of a motor driven by a motor driving signal.

As described above, according to the apparatus for producing nanoparticles according to the present invention, it is possible to separate nanoparticle production steps from pre-treatment to packaging, and to achieve a continuous nanoparticle production process Thus, it is possible to solve the problems of low vacuum work, high vacuum work, high vacuum work, vacuum work, and discontinuity of process due to the different degree of vacuum in the conventional nanoparticle production apparatus.

FIG. 1 schematically shows an apparatus for producing nanoparticles according to the prior art.
2 schematically shows an apparatus for producing nanoparticles which can be used in the present invention.
3 schematically shows an example of a chamber connection tube of the pretreatment chamber and the process chamber.
Figure 4 schematically shows an example of a carrier transport screw mounted in a chamber connector.
Figure 5 schematically shows an example of an inter-chamber valve coupled with a transfer line.
Figure 6 schematically shows the structure of the recovery chamber.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention, and the manner of achieving them, will be apparent from and elucidated with reference to the embodiments described hereinafter in conjunction with the accompanying drawings. It should be understood, however, that the invention is not limited to the disclosed embodiments, but is capable of many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, To fully disclose the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. Like reference numerals refer to like elements throughout the specification.

Hereinafter, an apparatus for producing nanoparticles according to the present invention will be described in detail with reference to the accompanying drawings.

2 schematically shows an apparatus for producing nanoparticles which can be used in the present invention.

Referring to FIG. 2, the apparatus for manufacturing nanoparticles according to the present invention collectively performs a pretreatment process, a manufacturing process, and a recovery process, which are NPP (Nano Particle Production) processes.

The initial carrier is charged into the carrier storage device 10 and the loaded carrier is moved upward along the carrier transferring rail 12 to the pre-treatment chamber 20. After the pretreatment process in the pre-treatment chamber 20, Such as the process chamber 30, through the transfer lines 22, 32, transfer piping 24, 34, 44 and the chamber-to-chamber valve 50. At this time, the piping connected to the chamber, that is, the chamber connecting pipes 22 and 32, is formed in an upwardly inclined structure not horizontal in order to prevent the carrier from escaping, thereby preventing the carrier from flowing.

In the pretreatment chamber 20, water and out gassing are removed through a pretreatment process before reaching the base pressure for the NPP process, thereby shortening the time required for the NPP process. If the NPP process time is shorter than the pre-process time, an alternative is to use multiple pretreatment chambers. The basic degree of vacuum is preferably in the range of 1 x 10 ^-5 torr to 1 x 10 ^-3 torr.

In the process chamber 30, the NPP process is performed while the working pressure is reached.

The working vacuum degree is preferably in the range of ¹ x 10 ^-4 torr to 1 x 10 ^-2 torr.

In the recovery chamber 40, the vacuum is eliminated and the product is recovered without affecting the degree of vacuum of the process chamber 30. [

During each process, each of the chambers has a low vacuum, a high vacuum, and a standby state, and the chamber-to-chamber valve 50 is provided so as not to affect the vacuum degree of each chamber.

The pretreatment chamber 20, the process chamber 30, and the recovery chamber 40 are supported by equipment supports 72, 74, and 76 having different heights, respectively. The carrier ascends through the carrier transporting rail 12 by a predetermined height in the initial carrier storage device 10 and is supplied downwardly in a free fall form under the vertical through the transporting piping 24. The supply of the carrier is controlled through the inter-chamber valve (50). That is, the process chamber 30 and the recovery chamber 40 are installed in a shape that the height of the process chamber 30 is reduced from the pre-treatment chamber 20.

In another embodiment of the present invention, the pretreatment chamber 20 and the process chamber 30 are constructed of two or more multiple chambers to prevent bottlenecks due to differences in respective process completion times and enable continuous processes .

Fig. 3 schematically shows an example of a chamber connecting tube of a pretreatment chamber and a processing chamber, and Fig. 4 schematically shows an example of a carrier transporting screw mounted in a chamber connecting tube.

Referring to FIGS. 3 and 4, there is a carrier transporting screw 82 as shown in FIG. 3 in a pipe connected to the chamber, that is, the chamber connecting pipe 22 (or 32). The carrier transporting screw 82 rotates in the forward direction when the carrier moves to the next chamber, and reversely rotates when the carrier does not move to determine whether or not the carrier is transported. At this time, in order to prevent the carrier from escaping into the gap between the chamber connection pipe 22 and the carrier delivery screw 82, the chamber connection pipe 22 has an upward angle rather than a horizontal or diagonal structure.

The carrier conveyance screw 82 is connected to a carrier conveyance screw drive motor 92 and the carrier conveyance screw drive motor 92 is driven in accordance with a drive motor control signal from a control unit (Or reverse rotation).

The carrier transporting screw 82 comprises an edge portion 82-1 and a recess 84-1 and the edge portion 82-1 has a top edge portion 82-1a and a bottom edge portion 82-1a, -1b are rotated in contact with the inner diameter 22a of the chamber connecting pipe 22 (the inner diameter 32a of the chamber connecting pipe 32 is the same). The width or spacing p between the edge portion 82-1 and the following edge portion 82-1 can of course be adjusted.

The apparatus for manufacturing nanoparticles attached to the carrier of the present invention controls the width (p) of the carrier transporting screw 82 according to the type of carrier and the size of the carrier particles, thereby allowing the carrier to move smoothly.

Figure 5 schematically shows an example of an inter-chamber valve coupled with a transfer line.

Referring to Figure 5,

There are inter-chamber valves 52 and 54 in the transfer pipe 34 (or the same in FIG. 44), and one auxiliary pipe 25 exists in the transfer pipe 34. The chamber-to-chamber valves 52 and 54 and the O-rings 56 may be configured such that, for example, when the pre-treatment chamber 20 and the process chamber 30 are in the process of being vacuumed, And also serves to advance or stop the transport of the carrier together with the carrier moving screw 82. An auxiliary piping 25 is provided to prevent contamination of the transfer pipe 24 and the O-ring 56 due to the carrier movement when the existing valve is used, so that even when the carrier is moved, the O-ring 56 and the carrier of the transfer pipe 24 Thereby preventing contamination.

The inter-chamber valves 52 and 54 are respectively installed by a pair of O-rings 56 at valve mounting portions of the transfer pipe 34 (or 44), and the inter-chamber valves 52, The transfer piping 34 (or 44 is the same) is opened or closed by driving of the transfer piping 34 (which can be driven automatically or manually and can be sequentially driven).

The auxiliary piping 25 can prevent the working efficiency from being lowered by the replacement operation of the O-ring by contacting the carrier to which the O-ring positioned between the valve and the transfer pipe is transported when the transfer valve is in the open state.

The state in which the transfer pipe 34 is blocked by the chamber-to-chamber valve, that is, the first chamber-to-chamber valve 52 and the second chamber-to-chamber valve 54 is a closed state.

The transfer piping 34 is opened by the chamber-to-chamber valve or first chamber-to-chamber valve 52 and the second chamber-to-chamber valve 54 so that the auxiliary piping 25 is connected to the first and second chambers of the transfer piping 24, Passing through the intermediate valves 52 and 54 is in an open state.

Figure 6 schematically shows the structure of the recovery chamber.

The existing batch type chamber recovers the product when it is at atmospheric pressure by injecting air to remove the vacuum state when recovering the product. In this process, oxidation and other alteration could not be prevented when the product was in contact with oxygen. In the recovery chamber of the present invention illustrated in FIG. 6, when a product is recovered, a gas tank (such as argon or nitrogen) is attached to the apparatus and argon or nitrogen gas is injected to recover the product. The recovery can prevent the product from being oxidized with oxygen and can be recovered without affecting the degree of vacuum in the process chamber and recovery chamber by using valves.

This process is described in more detail. When the valve 1 is opened, the product inside the chamber is moved to the transfer cylinder. After moving to the transfer cylinder, change the valve 1 to the closed state and inject the inert gas into the transfer cylinder in the gas tank. When the injection is completed, valve 2 is opened, and the product is recovered with the product in contact with air. In this process, the inside of the chamber can be held in a vacuum state and oxidation and deterioration of the product can be prevented.

The nanoparticle manufacturing apparatus attached to the carrier of the present invention enables the individual use of the special condition pre-treatment equipment or the process equipment by separately operating the sensor on / off and open / close states of the detailed device.

According to the apparatus for producing nanoparticles according to the present invention, the nanoparticle production process from the pretreatment to the packaging is separated from each other and the degree of vacuum according to the process operation is changed for each of the separate processes, It is possible to solve the problem of changing the degree of vacuum for each of the low vacuum operation, the high vacuum operation and the standby operation due to the different degree of vacuum in the manufacturing apparatus, and the problem of the discontinuity of the process due to this.

Example

Hereinafter, the configuration and operation of the present invention will be described in more detail with reference to preferred embodiments of the present invention. It is to be understood, however, that the same is by way of illustration and example only and is not to be construed in a limiting sense.

The contents not described here are sufficiently technically inferior to those skilled in the art, and a description thereof will be omitted.

First, the carrier is put into the carrier storage device 10 and then transported along the carrier transporting rail 12. (In this process, a pumping operation for transporting the carrier to the upper part may be required. Because it is contents, detailed explanation is omitted).

Thereafter, while the inter-chamber valve 50 of the pretreatment chamber 20 is switched to the open state, the transported carrier is introduced into the pretreatment chamber 20 through the transfer valve 24. Then, the inter-chamber valve 50 is closed.

Thereafter, the carrier pretreated in the pretreatment chamber 20 starts to be transported toward the process chamber 30 by the operation of the carrier transporting screw 82. Meanwhile, the chamber-to-chamber valve 50, which closes the transfer valve 34 between the pretreatment chamber 20 and the process chamber 30, is in an open state.

When the carrier is transferred from the pretreatment chamber 20 to the process chamber 30, the carrier transporting screw 82 of the pretreatment chamber 20 is stopped and the inter-chamber valve 50 is also closed. Thereafter, in the process chamber 30, a necessary process is performed on the carrier with a degree of vacuum different from that in the pretreatment chamber 20.

Thereafter, the carrier processed in the process chamber 30 starts to be conveyed toward the collection chamber 40 by the operation of the carrier conveyance screw 82. Meanwhile, the chamber-to-chamber valve 50, which closes the transfer valve 44 between the process chamber 30 and the recovery chamber 40, is in an open state.

When the carrier is transferred from the process chamber 30 to the recovery chamber 40, the carrier delivery screw 82 of the process chamber 30 is stopped and the inter-chamber valve 50 is also closed. Thereafter, in the recovery chamber 40, the carrier is opened with the degree of vacuum different from that of the process chamber 30, and the discharge valve 60 is opened and discharged through the discharge pipe.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments.

Such changes and modifications are intended to fall within the scope of the present invention unless they depart from the scope of the present invention. Accordingly, the scope of the present invention should be determined by the following claims.

10: carrier storage device
20: Pretreatment chamber
30: Process chamber
40: Recovery chamber
50: chamber-to-chamber valve
60: discharge valve

Claims (8)

A pretreatment chamber for pretreating the supplied carrier at a predetermined degree of vacuum;
A process chamber for processing the carrier pretreated from the pretreatment chamber at a predetermined degree of vacuum;
A recovery chamber for recovering and discharging the carrier processed from the process chamber at a predetermined degree of vacuum;
First and second transfer piping connected to the pre-treatment chamber and the process chamber, and between the process chamber and the recovery chamber to transfer the carrier; And
And an inter-chamber valve disposed in the first and second transport pipes for controlling opening and closing of the first and second transport pipes. The method according to claim 1,
Wherein the pre-treatment chamber, the process chamber, and the collection chamber have different degrees of vacuum. The method according to claim 1,
Wherein the pretreatment chamber and the process chamber are provided with a chamber connection pipe formed in a structure inclined upwardly and not horizontally to prevent the carrier from escaping and preventing the carrier from flowing therethrough. . The method according to claim 1,
Wherein the chamber connecting pipe is provided with a carrier conveying screw for opening or closing the chamber connecting pipe by forward or reverse rotation by a rotational force of a motor driven by a motor driving signal. The method according to claim 1,
Wherein the recovery chamber is equipped with an argon or nitrogen gas tank, and when the product is recovered, argon or nitrogen gas is injected to prevent oxidation of the product. The method according to claim 1,
Wherein the pretreatment chamber and the process chamber are comprised of two or more chambers in order to prevent bottlenecks due to the difference in the completion time of each process and to enable a continuous process. The method according to claim 1,
The interior of the chamber-to-chamber valve is provided with an auxiliary pipe to prevent the operation efficiency of the O-ring from dropping due to the contact of the O-ring located between the valve and the transfer pipe when the transfer valve is open, Wherein the nanoparticle-producing device is a nanoparticle-producing device. A nanoparticle produced by the nanoparticle production apparatus according to any one of claims 1 to 7.

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