KR101099571B1 - Vacuum gate valve - Google Patents
Vacuum gate valve Download PDFInfo
- Publication number
- KR101099571B1 KR101099571B1 KR20100004442A KR20100004442A KR101099571B1 KR 101099571 B1 KR101099571 B1 KR 101099571B1 KR 20100004442 A KR20100004442 A KR 20100004442A KR 20100004442 A KR20100004442 A KR 20100004442A KR 101099571 B1 KR101099571 B1 KR 101099571B1
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- KR
- South Korea
- Prior art keywords
- flange
- main fluid
- fluid passage
- hole
- decompression
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Abstract
The present invention relates to a vacuum gate valve, the vacuum gate valve according to a preferred embodiment of the present invention, the main fluid passage 110 connected to the process chamber and the vacuum pump is formed with both sides open, the inner sidewall The guide rail 120 is provided up and down along the length direction, the body 100 is formed therein the slide space 130; And, coupled to the lower end of the body 100, the cylinder 201, and A first having a piston 202 installed inside the cylinder 201 and an actuating rod 203 connected to the piston 202 to be operated up and down by compressed air flowing into the cylinder 201. An actuator 200; and a first flange 300 installed at one opening of the main fluid passage 100 and connected to the vacuum pump; and a process chamber installed at the other opening of the main fluid passage 100. A second flange 400 connected to the second flange 400 and installed on the first flange 300. A second actuator 310 which is advanced back and forth according to the inflow of compressed air; and a link member 500 connected to one side of the operation rod 203; and connected to the other side of the link member 500, A roller 610 is provided to operate in the slide space 130 along the guide rail 120, and enters between the first flange 300 and the second flange 400 so that the second actuator 310 of the second actuator 310 can be operated. Blade 600 for the main fluid passage 110 is sealed or open in accordance with the forward and backward movement; and the decompression formed on the second flange 400, the main fluid passage 110 is in communication with the interior of the body 100 A through-hole 700; and a check valve 810 installed in the reduced-pressure through-hole 700 to allow passage of fluid only from the inside of the body 100 to the main fluid passage 110; And a decompression room 800 in which the check valve is accommodated and in communication with the decompression hole.
According to the vacuum gate valve according to the present invention as described above, when the blade for sealing the process chamber in the standby state and the vacuum pump in the vacuum state, by controlling the pressure generated in the main fluid passage to reduce the amount of impact applied to the body. This can improve durability and reduce the amount of waste gas flowing into the body. Therefore, replacement or malfunction by the powder contained in the waste gas can be reduced compared to the conventional vacuum gate valve, which can significantly reduce the cost of maintenance. There are advantages to it.
Description
The present invention relates to a vacuum gate valve, and when the blade for sealing the process chamber in the standby state and the vacuum pump in the vacuum state, by controlling the pressure generated in the main fluid passage can reduce the amount of impact applied to the body durability Not only can this be improved, but the amount of waste gas introduced into the body can be reduced, so that replacement or malfunction by powder contained in the waste gas can be reduced compared to the conventional vacuum gate valve, which can dramatically reduce the cost of maintenance. It relates to a gate valve.
In general, since semiconductors require high precision, high cleanliness and special manufacturing techniques are required. For this reason, the semiconductor device is manufactured in a vacuum state that can completely block the contact of foreign matter contained in the air.
Therefore, the vacuum working area of the semiconductor manufacturing apparatus and the airtight technology also have a great influence on the quality of semiconductor products.
The semiconductor device manufacturing apparatus includes an exhaust pump and a gas processor for neutralizing the fluid gas in order to exhaust the fluid gas in the process chamber.
1 is a partial schematic view of such a semiconductor device manufacturing apparatus.
Between the
The
One example conventionally used as such a gate valve is described.
Figure 2 is a plan view of a conventional gate valve, Figure 3 is a side cross-sectional view of the gate valve shown in FIG.
The
The blocking
However, in the conventional gate valve as described above, the powder contained in the air, which was in the vacuum state, is introduced into the main body by the difference in the pressure generated when the barrier plate is opened to switch from the vacuum state to the standby state. When stacked inside the main body, the opening and closing of the blocking plate is not made accurately, and eventually there was a fatal problem that impossible to maintain the vacuum state.
The present invention has been made to solve the above-described problems, an object of the present invention is to adjust the pressure generated in the main fluid passage during the opening of the blade to seal the process chamber and the vacuum pump in a vacuum state of the interior of the body Since the amount of waste gas introduced into the gas can be reduced, replacement or malfunction by the powder contained in the waste gas is reduced than that of the conventional vacuum gate valve, thereby significantly reducing the cost of maintenance and increasing the durability of the vacuum gate. To provide a valve.
In order to solve the above problems, the vacuum gate valve according to the present invention includes a
In addition, the decompression through-hole (700) is provided between the pressure reducing through-hole (700) and the decompression room (800) so that air flowing from the inside of the body (100) is smoothly discharged into the main fluid passage (110).
In addition, the
According to the present invention as described above, the durability of the impact on the body can be reduced by adjusting the pressure generated in the main fluid passage during opening of the blade sealing the process chamber in the standby state and the vacuum pump in the vacuum state Not only can this be improved, but the amount of waste gas introduced into the body can be reduced, so that replacement or malfunction by powder contained in the waste gas can be reduced than that of the conventional vacuum gate valve, thereby significantly reducing the cost of maintenance. There is this.
1 is a reference diagram illustrating a semiconductor device manufacturing apparatus;
2 is a plan view of a conventional vacuum gate valve,
3 is a side cross-sectional view of a conventional vacuum gate valve,
4 is an exploded perspective view of a vacuum gate valve according to a preferred embodiment of the present invention;
5 is a plan view of a vacuum gate valve according to a preferred embodiment of the present invention;
6 is a cross-sectional view taken along line AA of FIG.
7 is a detailed cross-sectional view of the check valve of the vacuum gate valve according to the preferred embodiment of the present invention;
8 is an exploded perspective view of a valve body of the check valve of the vacuum gate valve according to a preferred embodiment of the present invention in a partially cut state.
Hereinafter, with reference to the accompanying drawings, it will be described embodiments of the present invention. Like reference numerals in the drawings denote like elements. In describing the present invention, detailed descriptions of related well-known functions or configurations are omitted in order not to obscure the subject matter of the present invention.
Figure 4 is an exploded perspective view of a vacuum gate valve according to a preferred embodiment of the present invention, Figure 5 is a plan view of a vacuum gate valve according to a preferred embodiment of the present invention, Figure 6 is a cross-sectional view of Figure 5, Figure 7 of the present invention Detailed cross-sectional view of the check valve of the vacuum gate valve according to a preferred embodiment, Figure 8 is an exploded perspective view of the valve body of the check valve of the vacuum gate valve according to a preferred embodiment of the present invention partially cut.
Vacuum gate valve according to a preferred embodiment of the present invention, the
Where the components of the present invention to be described later are installed in the
In addition, the inner sidewall of the
As shown in FIG. 4, the
The
The
The
The
The
The
As described above, the
Referring to the
When the vacuum pump is operated in the standby state as described above, the
Thereafter, the
When the
8, an exploded perspective view of a state in which the
The
That is, the
In addition, a
The
In addition, a
In more detail, the
Meanwhile, the clearance o-
In addition, it may be good that the
The
The
Meanwhile, the
In addition, when the pressurization by the
The best embodiments have been disclosed in the drawings and the specification. Herein, specific terms have been used, but they are used only for the purpose of illustrating the present invention and are not intended to limit the scope of the present invention as defined in the claims or the claims. Therefore, those skilled in the art will understand that various modifications and equivalent other embodiments are possible from this. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.
100-body 110-main fluid passage
120-Guide rail 130-slide space
200-first actuator 201-cylinder
202-piston 203-operating rod
300-first flange 310-second actuator
311 Compressed Air
313-guide unit
400-second flange
500-link member
600-blade 610-roller
700-Decompression through hole
800-decompression room 810-check valve
811
813-Pin 814-Gap O-Ring
815-check cover
900-Express Exhaust Air
Claims (3)
Is coupled to the lower end of the body 100, the cylinder 201, the piston 202 is installed in the cylinder 201, and is connected to the piston 202 is introduced into the cylinder 201 A first actuator 200 having an operating rod 203 operated up and down by compressed air; and
A first flange 300 installed at one opening of the main fluid passage 100 and connected to the vacuum pump; and
A second flange 400 installed at the other opening of the main fluid passage 100 and connected to the process chamber; and
A second actuator 310 installed in the first flange 300 and advanced back and forth according to the inflow of compressed air; and
A link member 500 having one side connected to the operation rod 203; and
Is connected to the other side of the link member 500, the roller 610 is provided to operate in the slide space 130 along the guide rail 120, the first flange 300 and the second flange 400 A blade 600 which enters between the main fluid passages 110 and is sealed or opened as the second actuator 310 moves forward and backward.
A decompression through hole 700 formed in the second flange 400 and provided to communicate with the inside of the body 100; and
A check valve 810 installed in the pressure reducing hole 700 to allow passage of fluid only from the inside of the body 100 to the main fluid passage 110; And
The check valve is accommodated, vacuum decompression valve comprising a; decompression room (800) in communication with the pressure reducing through-hole.
The decompression through-hole 700 is provided between the decompression through-hole 700 and the decompression room 800 so that air flowing from the inside of the body 100 is smoothly discharged into the main fluid passage 110. 900, further comprising a vacuum gate valve.
A cylindrical valve body 811 installed inside the decompression room 800 and having a vent hole 812 to communicate with the decompression through-hole 700 and the body 100; and
Spacing adjustment projection 813 is formed in the outer peripheral surface of the valve body 811 protruding to the edge of the surface adjacent to the pressure-sensitive through-hole 700; And
A pin 814 installed on the same surface as the clearance adjusting protrusion 813; And clearance o-ring 815; and
And a check cover (816) installed on the pin (814) to be selectively spaced apart from the valve body (811) by air flowing from the inside of the body (100).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20100004442A KR101099571B1 (en) | 2010-01-18 | 2010-01-18 | Vacuum gate valve |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20100004442A KR101099571B1 (en) | 2010-01-18 | 2010-01-18 | Vacuum gate valve |
Publications (2)
Publication Number | Publication Date |
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KR20110084729A KR20110084729A (en) | 2011-07-26 |
KR101099571B1 true KR101099571B1 (en) | 2011-12-28 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR20100004442A KR101099571B1 (en) | 2010-01-18 | 2010-01-18 | Vacuum gate valve |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101322826B1 (en) | 2012-06-21 | 2013-10-28 | 오종우 | Safety valve for cleaning |
WO2014112795A1 (en) * | 2013-01-18 | 2014-07-24 | 주식회사 유앤아이솔루션 | Back pressure blocking sliding valve |
KR101528458B1 (en) * | 2013-01-18 | 2015-06-18 | (주) 유앤아이솔루션 | Sliding Pressure Shut-off Valve |
KR20160132155A (en) * | 2015-05-06 | 2016-11-17 | 주식회사 에스알티 | Gate valves |
KR20200106348A (en) | 2019-03-04 | 2020-09-14 | 주식회사 마이크로텍 | Slow pump of gate valve |
KR102325469B1 (en) | 2021-05-18 | 2021-11-15 | (주)사이언스프로버 | Vacuum gate valve |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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KR200464828Y1 (en) * | 2012-04-13 | 2013-01-22 | 윤명한 | Sliding valve of water interception |
KR101356579B1 (en) * | 2013-02-04 | 2014-02-03 | 주식회사 비에스에이 | Compact type decompression apparatus |
KR102230465B1 (en) * | 2019-09-20 | 2021-03-22 | (주)엔투텍 | Vacuum gate valve |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1078145A (en) | 1996-09-04 | 1998-03-24 | Kokusai Electric Co Ltd | Gate valve mechanism |
KR100717865B1 (en) | 2006-02-01 | 2007-05-14 | 주식회사 에스티에스 | Improved protection vacuum gate valve |
JP2009115242A (en) | 2007-11-07 | 2009-05-28 | Tokyo Electron Ltd | Gate valve device, vacuum processing device and opening method of valve element in gate valve device |
-
2010
- 2010-01-18 KR KR20100004442A patent/KR101099571B1/en active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1078145A (en) | 1996-09-04 | 1998-03-24 | Kokusai Electric Co Ltd | Gate valve mechanism |
KR100717865B1 (en) | 2006-02-01 | 2007-05-14 | 주식회사 에스티에스 | Improved protection vacuum gate valve |
JP2009115242A (en) | 2007-11-07 | 2009-05-28 | Tokyo Electron Ltd | Gate valve device, vacuum processing device and opening method of valve element in gate valve device |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101322826B1 (en) | 2012-06-21 | 2013-10-28 | 오종우 | Safety valve for cleaning |
WO2014112795A1 (en) * | 2013-01-18 | 2014-07-24 | 주식회사 유앤아이솔루션 | Back pressure blocking sliding valve |
KR101528458B1 (en) * | 2013-01-18 | 2015-06-18 | (주) 유앤아이솔루션 | Sliding Pressure Shut-off Valve |
KR20160132155A (en) * | 2015-05-06 | 2016-11-17 | 주식회사 에스알티 | Gate valves |
KR101684881B1 (en) * | 2015-05-06 | 2016-12-12 | 주식회사 에스알티 | Gate valves |
KR20200106348A (en) | 2019-03-04 | 2020-09-14 | 주식회사 마이크로텍 | Slow pump of gate valve |
KR102325469B1 (en) | 2021-05-18 | 2021-11-15 | (주)사이언스프로버 | Vacuum gate valve |
Also Published As
Publication number | Publication date |
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KR20110084729A (en) | 2011-07-26 |
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