CN101371196B - 抗反射涂料 - Google Patents

抗反射涂料 Download PDF

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Publication number
CN101371196B
CN101371196B CN2006800527193A CN200680052719A CN101371196B CN 101371196 B CN101371196 B CN 101371196B CN 2006800527193 A CN2006800527193 A CN 2006800527193A CN 200680052719 A CN200680052719 A CN 200680052719A CN 101371196 B CN101371196 B CN 101371196B
Authority
CN
China
Prior art keywords
value
electronic device
composition
solvent
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2006800527193A
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English (en)
Chinese (zh)
Other versions
CN101371196A (zh
Inventor
P-F·付
E·S·莫耶
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of CN101371196A publication Critical patent/CN101371196A/zh
Application granted granted Critical
Publication of CN101371196B publication Critical patent/CN101371196B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/02—Polysilicates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Formation Of Insulating Films (AREA)
CN2006800527193A 2006-02-13 2006-12-07 抗反射涂料 Expired - Fee Related CN101371196B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US77261906P 2006-02-13 2006-02-13
US60/772,619 2006-02-13
PCT/US2006/046810 WO2007094848A2 (en) 2006-02-13 2006-12-07 Antireflective coating material

Publications (2)

Publication Number Publication Date
CN101371196A CN101371196A (zh) 2009-02-18
CN101371196B true CN101371196B (zh) 2012-07-04

Family

ID=38371944

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800527193A Expired - Fee Related CN101371196B (zh) 2006-02-13 2006-12-07 抗反射涂料

Country Status (7)

Country Link
US (1) US8263312B2 (https=)
EP (1) EP1989593A2 (https=)
JP (1) JP4881396B2 (https=)
KR (1) KR101324052B1 (https=)
CN (1) CN101371196B (https=)
TW (1) TWI406099B (https=)
WO (1) WO2007094848A2 (https=)

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US7756384B2 (en) * 2004-11-08 2010-07-13 Dow Corning Corporation Method for forming anti-reflective coating
US20070212886A1 (en) * 2006-03-13 2007-09-13 Dong Seon Uh Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositions
JP4945460B2 (ja) * 2008-01-04 2012-06-06 株式会社東芝 反射防止構造の形成方法および反射防止構造
WO2009088600A1 (en) * 2008-01-08 2009-07-16 Dow Corning Toray Co., Ltd. Silsesquioxane resins
KR20100114075A (ko) * 2008-01-15 2010-10-22 다우 코닝 코포레이션 실세스퀴옥산 수지
CN101990551B (zh) * 2008-03-04 2012-10-03 陶氏康宁公司 倍半硅氧烷树脂
KR101541939B1 (ko) * 2008-03-05 2015-08-04 다우 코닝 코포레이션 실세스퀴옥산 수지
US8293354B2 (en) * 2008-04-09 2012-10-23 The Regents Of The University Of Michigan UV curable silsesquioxane resins for nanoprint lithography
KR101690159B1 (ko) * 2008-12-10 2016-12-27 다우 코닝 코포레이션 변환가능한 반사방지 코팅
EP2373722A4 (en) 2008-12-10 2013-01-23 Dow Corning SILSESQUIOXAN RESINS
US20110236835A1 (en) * 2008-12-10 2011-09-29 Peng-Fei Fu Silsesquioxane Resins
US9353268B2 (en) 2009-04-30 2016-05-31 Enki Technology, Inc. Anti-reflective and anti-soiling coatings for self-cleaning properties
US9376593B2 (en) * 2009-04-30 2016-06-28 Enki Technology, Inc. Multi-layer coatings
US20110305787A1 (en) * 2010-06-11 2011-12-15 Satoshi Ishii Stamper for transfer of microscopic structure and transfer apparatus of microscopic structure
EP2588287A4 (en) * 2010-07-01 2018-01-17 Inmold Biosystems A/S Method and apparatus for producing a nanostructured or smooth polymer article
US9598586B2 (en) 2014-07-14 2017-03-21 Enki Technology, Inc. Coating materials and methods for enhanced reliability
US9376589B2 (en) 2014-07-14 2016-06-28 Enki Technology, Inc. High gain durable anti-reflective coating with oblate voids
TWI592760B (zh) * 2014-12-30 2017-07-21 羅門哈斯電子材料韓國有限公司 與經外塗佈之光致抗蝕劑一起使用之塗層組合物
US10597495B2 (en) * 2016-02-19 2020-03-24 Dow Silicones Corporation Aged polymeric silsesquioxanes

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US20020065331A1 (en) * 2000-10-10 2002-05-30 Shipley Company, L.L.C. Antireflective porogens
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US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
US20020065331A1 (en) * 2000-10-10 2002-05-30 Shipley Company, L.L.C. Antireflective porogens
WO2004044025A2 (en) * 2002-11-12 2004-05-27 Honeywell International Inc Anti-reflective coatings for photolithography and methods of preparation thereof
WO2004046224A1 (en) * 2002-11-18 2004-06-03 Honeywell International Inc. Organohydridosiloxane resins with high organic content

Also Published As

Publication number Publication date
US20080318436A1 (en) 2008-12-25
TWI406099B (zh) 2013-08-21
KR20080094686A (ko) 2008-10-23
JP4881396B2 (ja) 2012-02-22
WO2007094848A3 (en) 2007-12-06
US8263312B2 (en) 2012-09-11
WO2007094848A2 (en) 2007-08-23
JP2009527021A (ja) 2009-07-23
TW200739270A (en) 2007-10-16
CN101371196A (zh) 2009-02-18
EP1989593A2 (en) 2008-11-12
KR101324052B1 (ko) 2013-11-01

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SE01 Entry into force of request for substantive examination
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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120704

Termination date: 20151207

EXPY Termination of patent right or utility model