CN101344717A - 光罩修补液 - Google Patents
光罩修补液 Download PDFInfo
- Publication number
- CN101344717A CN101344717A CNA200810141920XA CN200810141920A CN101344717A CN 101344717 A CN101344717 A CN 101344717A CN A200810141920X A CNA200810141920X A CN A200810141920XA CN 200810141920 A CN200810141920 A CN 200810141920A CN 101344717 A CN101344717 A CN 101344717A
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- Prior art keywords
- light shield
- quality
- repair glue
- gold solution
- repair
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Abstract
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Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200810141920XA CN101344717B (zh) | 2008-08-15 | 2008-08-15 | 光罩修补液 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200810141920XA CN101344717B (zh) | 2008-08-15 | 2008-08-15 | 光罩修补液 |
Publications (2)
Publication Number | Publication Date |
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CN101344717A true CN101344717A (zh) | 2009-01-14 |
CN101344717B CN101344717B (zh) | 2011-05-18 |
Family
ID=40246738
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200810141920XA Expired - Fee Related CN101344717B (zh) | 2008-08-15 | 2008-08-15 | 光罩修补液 |
Country Status (1)
Country | Link |
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CN (1) | CN101344717B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103676466A (zh) * | 2012-09-14 | 2014-03-26 | 世禾科技股份有限公司 | 金属塑料复层式光罩及其制造方法 |
CN103969945A (zh) * | 2013-01-25 | 2014-08-06 | 上海微电子装备有限公司 | 刮伤掩模修补装置及方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2718893B2 (ja) * | 1993-06-04 | 1998-02-25 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 移相マスクの移相欠陥を修復する方法 |
JP2005529362A (ja) * | 2002-06-10 | 2005-09-29 | トッパン、フォウタマスクス、インク | フォトマスクおよび欠陥の修復方法 |
JP2006504136A (ja) * | 2002-10-21 | 2006-02-02 | ナノインク インコーポレーティッド | ナノメートル・スケール設計構造、その製造方法および装置、マスク修復、強化、および製造への適用 |
CN1320407C (zh) * | 2003-12-30 | 2007-06-06 | 中芯国际集成电路制造(上海)有限公司 | 一种修复掩膜上的铬污染点的方法及其所采用的定位版 |
-
2008
- 2008-08-15 CN CN200810141920XA patent/CN101344717B/zh not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103676466A (zh) * | 2012-09-14 | 2014-03-26 | 世禾科技股份有限公司 | 金属塑料复层式光罩及其制造方法 |
CN103676466B (zh) * | 2012-09-14 | 2016-06-29 | 世禾科技股份有限公司 | 金属塑料复层式光罩的制造方法 |
CN103969945A (zh) * | 2013-01-25 | 2014-08-06 | 上海微电子装备有限公司 | 刮伤掩模修补装置及方法 |
CN103969945B (zh) * | 2013-01-25 | 2018-08-24 | 上海微电子装备(集团)股份有限公司 | 刮伤掩模修补装置及方法 |
Also Published As
Publication number | Publication date |
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CN101344717B (zh) | 2011-05-18 |
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C06 | Publication | ||
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C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SHENZHEN NEWWAY PHOTOMASK MAKING CO., LTD. Free format text: FORMER OWNER: SHENZHEN NEWWAY ELECTRONIC CO., LTD. Effective date: 20130423 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 518000 SHENZHEN, GUANGDONG PROVINCE TO: 518057 SHENZHEN, GUANGDONG PROVINCE |
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TR01 | Transfer of patent right |
Effective date of registration: 20130423 Address after: 518057 Guangdong, Nanshan District, China, No., Long Hill Road, innovation park, No. D, first floor, block Patentee after: SHENZHEN NEWWAY PHOTOMASK MAKING CO., LTD. Address before: 518000 Guangdong province Shenzhen city Nanshan District high tech Zone North Keyuan Avenue Xihua Han Innovation Park D Building 1 floor Patentee before: Shenzhen Newway Electronic Co., Ltd. |
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C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110518 Termination date: 20120815 |