CN101341578B - 加工多光子可固化光活性组合物的方法及装置 - Google Patents

加工多光子可固化光活性组合物的方法及装置 Download PDF

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Publication number
CN101341578B
CN101341578B CN2006800482953A CN200680048295A CN101341578B CN 101341578 B CN101341578 B CN 101341578B CN 2006800482953 A CN2006800482953 A CN 2006800482953A CN 200680048295 A CN200680048295 A CN 200680048295A CN 101341578 B CN101341578 B CN 101341578B
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China
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layer
substrate
optical system
interface
light beam
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Expired - Fee Related
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CN2006800482953A
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English (en)
Chinese (zh)
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CN101341578A (zh
Inventor
克雷格·R·斯克拉
史蒂文·C·理德
瑟奇·韦策尔斯
凯瑟琳·A·莱瑟达勒
马修·R·C·阿特金森
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
CN2006800482953A 2005-12-21 2006-12-20 加工多光子可固化光活性组合物的方法及装置 Expired - Fee Related CN101341578B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US75252905P 2005-12-21 2005-12-21
US60/752,529 2005-12-21
PCT/US2006/048498 WO2007073482A2 (en) 2005-12-21 2006-12-20 Method and apparatus for processing multiphoton curable photoreactive compositions

Publications (2)

Publication Number Publication Date
CN101341578A CN101341578A (zh) 2009-01-07
CN101341578B true CN101341578B (zh) 2010-12-08

Family

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CN2006800482953A Expired - Fee Related CN101341578B (zh) 2005-12-21 2006-12-20 加工多光子可固化光活性组合物的方法及装置

Country Status (5)

Country Link
US (1) US7893410B2 (enExample)
JP (1) JP4880701B2 (enExample)
CN (1) CN101341578B (enExample)
DE (1) DE112006003494T5 (enExample)
WO (1) WO2007073482A2 (enExample)

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JP2010537843A (ja) * 2007-09-06 2010-12-09 スリーエム イノベイティブ プロパティズ カンパニー 微細構造物品を作製するための工具
US9102083B2 (en) 2007-09-06 2015-08-11 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
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WO2009048808A1 (en) * 2007-10-11 2009-04-16 3M Innovative Properties Company Chromatic confocal sensor
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JP5801558B2 (ja) * 2008-02-26 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム
GB2489722B (en) 2011-04-06 2017-01-18 Precitec Optronik Gmbh Apparatus and method for determining a depth of a region having a high aspect ratio that protrudes into a surface of a semiconductor wafer
DE102011051146B3 (de) * 2011-06-17 2012-10-04 Precitec Optronik Gmbh Prüfverfahren zum Prüfen einer Verbindungsschicht zwischen waferförmigen Proben
WO2013130297A1 (en) * 2012-02-28 2013-09-06 3M Innovative Properties Company Multiphoton curing methods using negative contrast compositions
US9040921B2 (en) * 2012-07-28 2015-05-26 Harvard Apparatus Regenerative Technology, Inc. Analytical methods
DE102012111008B4 (de) 2012-11-15 2014-05-22 Precitec Optronik Gmbh Optisches Messverfahren und optische Messvorrichtung zum Erfassen einer Oberflächentopographie
US9005878B2 (en) 2013-03-19 2015-04-14 Eastman Kodak Company Forming patterns using thiosulfate polymer compositions
US9499650B2 (en) 2013-03-19 2016-11-22 Eastman Kodak Company Thiosulfate polymers
US8916336B2 (en) 2013-03-19 2014-12-23 Eastman Kodak Company Patterning method using thiosulfate polymer and metal nanoparticles
US8986924B2 (en) 2013-03-19 2015-03-24 Eastman Kodak Company Method of sequestering metals using thiosulfate polymers
US9772552B2 (en) * 2013-03-19 2017-09-26 Eastman Kodak Company Thiosulfate polymer compositions and articles
CN105324629B (zh) 2013-06-17 2018-08-24 普雷茨特激光技术有限公司 用于获取距离差的光学测量装置以及光学测量方法
EP3077421B1 (en) 2013-12-06 2018-01-31 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
TWI583916B (zh) * 2015-10-08 2017-05-21 財團法人工業技術研究院 雷射共焦量測方法及應用此方法之雷射共焦量測裝置
US10234265B2 (en) 2016-12-12 2019-03-19 Precitec Optronik Gmbh Distance measuring device and method for measuring distances
DE102017126310A1 (de) 2017-11-09 2019-05-09 Precitec Optronik Gmbh Abstandsmessvorrichtung
US11150484B2 (en) 2018-05-18 2021-10-19 Lawrence Livermore National Security, Llc System and method for curved light sheet projection during two-photon polymerization
DE102018130901A1 (de) 2018-12-04 2020-06-04 Precitec Optronik Gmbh Optische Messeinrichtung
EP4168734B1 (de) 2020-06-19 2025-09-24 Precitec Optronik GmbH Chromatisch konfokale messvorrichtung
DE102021113189A1 (de) 2021-05-20 2022-11-24 Nanoscribe Holding Gmbh Verfahren zum Erzeugen einer dreidimensionalen Zielstruktur in einem Lithographiematerial mittels einer Laserlithographie-Vorrichtung

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Also Published As

Publication number Publication date
US7893410B2 (en) 2011-02-22
JP2009521315A (ja) 2009-06-04
DE112006003494T5 (de) 2008-10-30
CN101341578A (zh) 2009-01-07
US20090250635A1 (en) 2009-10-08
WO2007073482A3 (en) 2007-09-27
WO2007073482A2 (en) 2007-06-28
JP4880701B2 (ja) 2012-02-22

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