CN101272643B - 用于制造显示装置的方法 - Google Patents

用于制造显示装置的方法 Download PDF

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Publication number
CN101272643B
CN101272643B CN2008100875012A CN200810087501A CN101272643B CN 101272643 B CN101272643 B CN 101272643B CN 2008100875012 A CN2008100875012 A CN 2008100875012A CN 200810087501 A CN200810087501 A CN 200810087501A CN 101272643 B CN101272643 B CN 101272643B
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CN
China
Prior art keywords
transfer printing
layer
substrate
printing layer
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN2008100875012A
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English (en)
Chinese (zh)
Other versions
CN101272643A (zh
Inventor
镜庆一
松尾圭介
小日向好吉
松田英介
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Sony Corp
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Sony Corp
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Publication date
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Publication of CN101272643A publication Critical patent/CN101272643A/zh
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Publication of CN101272643B publication Critical patent/CN101272643B/zh
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CN2008100875012A 2007-03-20 2008-03-19 用于制造显示装置的方法 Expired - Fee Related CN101272643B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-072965 2007-03-20
JP2007072965A JP2008235010A (ja) 2007-03-20 2007-03-20 表示装置の製造方法

Publications (2)

Publication Number Publication Date
CN101272643A CN101272643A (zh) 2008-09-24
CN101272643B true CN101272643B (zh) 2010-10-13

Family

ID=39775224

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008100875012A Expired - Fee Related CN101272643B (zh) 2007-03-20 2008-03-19 用于制造显示装置的方法

Country Status (5)

Country Link
US (1) US20080233827A1 (enExample)
JP (1) JP2008235010A (enExample)
KR (1) KR20080085705A (enExample)
CN (1) CN101272643B (enExample)
TW (1) TW200904240A (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8951816B2 (en) 2010-03-18 2015-02-10 Semiconductor Energy Laboratory Co., Ltd. Film forming method
WO2011114873A1 (ja) * 2010-03-18 2011-09-22 株式会社半導体エネルギー研究所 成膜方法及び成膜用基板の作製方法
JP2011195870A (ja) * 2010-03-18 2011-10-06 Semiconductor Energy Lab Co Ltd 成膜方法
US8900675B2 (en) 2010-03-18 2014-12-02 Semiconductor Energy Laboratory Co., Ltd. Deposition method and method for manufacturing deposition substrate
CN103189211B (zh) * 2010-12-27 2017-02-15 第一毛织株式会社 热转印膜
JP5695535B2 (ja) 2011-09-27 2015-04-08 株式会社東芝 表示装置の製造方法
TW201321871A (zh) * 2011-11-29 2013-06-01 Au Optronics Corp 顯示面板及其製作方法
KR20150012530A (ko) * 2013-07-25 2015-02-04 삼성디스플레이 주식회사 전사용 도너 기판 및 유기 발광 표시 장치의 제조 방법
US10468279B2 (en) * 2013-12-26 2019-11-05 Kateeva, Inc. Apparatus and techniques for thermal treatment of electronic devices
KR102303994B1 (ko) * 2014-10-20 2021-09-23 삼성디스플레이 주식회사 유기발광 표시기판의 제조방법
CN107221548A (zh) * 2016-03-22 2017-09-29 上海和辉光电有限公司 Oled显示面板、智能显示玻璃装置及制备方法
US10615345B2 (en) * 2016-06-03 2020-04-07 The Trustees Of Princeton University Method and device for using an organic underlayer to enable crystallization of disordered organic thin films
US11587981B2 (en) * 2018-05-11 2023-02-21 Semiconductor Energy Laboratory Co., Ltd. Display device including a semi-transmissive layer

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CN1744783A (zh) * 2004-08-30 2006-03-08 三星Sdi株式会社 有机发光显示器的制造方法
CN1744781A (zh) * 2004-08-30 2006-03-08 三星Sdi株式会社 用于激光诱致热成像方法的供体基板及其制造方法
CN1769066A (zh) * 2004-10-19 2006-05-10 三星Sdi株式会社 供体基板及利用其制造有机发光显示器的方法
CN1902771A (zh) * 2003-12-09 2007-01-24 3M创新有限公司 发光型树枝状大分子的热转印

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JP2002216957A (ja) * 2001-01-19 2002-08-02 Sharp Corp 転写法を用いた有機ｌｅｄ表示パネルの製造方法およびそれにより製造された有機ｌｅｄ表示パネル
EP1595712B1 (en) * 2001-06-19 2007-11-07 Dai Nippon Printing Co., Ltd. Method for fluorescent image formation, print produced thereby and thermal transfer sheet thereof
US6699597B2 (en) * 2001-08-16 2004-03-02 3M Innovative Properties Company Method and materials for patterning of an amorphous, non-polymeric, organic matrix with electrically active material disposed therein
JP4004255B2 (ja) * 2001-09-05 2007-11-07 シャープ株式会社 有機ｌｅｄ表示パネルの製造方法
JP2003187972A (ja) * 2001-12-20 2003-07-04 Dainippon Printing Co Ltd 有機ｅｌ素子の製造方法および有機ｅｌ転写体と被転写体
JP2003347054A (ja) * 2002-05-29 2003-12-05 Sharp Corp 薄膜転写用フィルムとその製造方法およびそれを用いた有機ｅｌ素子
KR100490539B1 (ko) * 2002-09-19 2005-05-17 삼성에스디아이 주식회사 유기 전계 발광소자 및 그 제조방법
JP4187149B2 (ja) * 2002-12-12 2008-11-26 富士フイルム株式会社 有機電界発光素子の製造方法及び有機電界発光素子
JP2005116238A (ja) * 2003-10-03 2005-04-28 Tdk Corp 有機ｅｌ素子及び有機ｅｌディスプレイ
US7052355B2 (en) * 2003-10-30 2006-05-30 General Electric Company Organic electro-optic device and method for making the same
GB0329364D0 (en) * 2003-12-19 2004-01-21 Cambridge Display Tech Ltd Optical device
KR100731728B1 (ko) * 2004-08-27 2007-06-22 삼성에스디아이 주식회사 레이저 전사용 도너 기판 및 이를 이용한 유기 전계 발광소자의 제조 방법
JP2006086069A (ja) * 2004-09-17 2006-03-30 Three M Innovative Properties Co 有機エレクトロルミネッセンス素子及びその製造方法
KR100793355B1 (ko) * 2004-10-05 2008-01-11 삼성에스디아이 주식회사 도너 기판의 제조방법 및 유기전계발광표시장치의 제조방법
KR100700654B1 (ko) * 2005-02-22 2007-03-27 삼성에스디아이 주식회사 레이저 조사 장치 및 레이저 열 전사법

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* Cited by examiner, † Cited by third party
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CN1902771A (zh) * 2003-12-09 2007-01-24 3M创新有限公司 发光型树枝状大分子的热转印
CN1744783A (zh) * 2004-08-30 2006-03-08 三星Sdi株式会社 有机发光显示器的制造方法
CN1744781A (zh) * 2004-08-30 2006-03-08 三星Sdi株式会社 用于激光诱致热成像方法的供体基板及其制造方法
CN1769066A (zh) * 2004-10-19 2006-05-10 三星Sdi株式会社 供体基板及利用其制造有机发光显示器的方法

Non-Patent Citations (1)

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Title
全文.

Also Published As

Publication number Publication date
KR20080085705A (ko) 2008-09-24
TW200904240A (en) 2009-01-16
JP2008235010A (ja) 2008-10-02
US20080233827A1 (en) 2008-09-25
CN101272643A (zh) 2008-09-24

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Granted publication date: 20101013

Termination date: 20120319