CN101266414A - 液体处理装置 - Google Patents

液体处理装置 Download PDF

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Publication number
CN101266414A
CN101266414A CNA2008100853757A CN200810085375A CN101266414A CN 101266414 A CN101266414 A CN 101266414A CN A2008100853757 A CNA2008100853757 A CN A2008100853757A CN 200810085375 A CN200810085375 A CN 200810085375A CN 101266414 A CN101266414 A CN 101266414A
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CN
China
Prior art keywords
liquid
substrate
treating fluid
handling device
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2008100853757A
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English (en)
Chinese (zh)
Inventor
福田浩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of CN101266414A publication Critical patent/CN101266414A/zh
Pending legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Liquid Crystal (AREA)
CNA2008100853757A 2007-03-14 2008-03-14 液体处理装置 Pending CN101266414A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007064317A JP2008227195A (ja) 2007-03-14 2007-03-14 液処理装置
JP2007-064317 2007-03-14

Publications (1)

Publication Number Publication Date
CN101266414A true CN101266414A (zh) 2008-09-17

Family

ID=39845453

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2008100853757A Pending CN101266414A (zh) 2007-03-14 2008-03-14 液体处理装置

Country Status (3)

Country Link
JP (1) JP2008227195A (enExample)
CN (1) CN101266414A (enExample)
TW (1) TW200843868A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101727009B (zh) * 2008-10-21 2012-07-18 东京毅力科创株式会社 液处理装置和液处理方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017164126A1 (ja) * 2016-03-25 2017-09-28 東レ株式会社 現像装置及び回路基板の製造方法
JP7042051B2 (ja) * 2017-09-21 2022-03-25 旭化成株式会社 現像装置及び現像方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3437702B2 (ja) * 1996-02-01 2003-08-18 大日本スクリーン製造株式会社 基板処理装置
JP2000114221A (ja) * 1998-10-02 2000-04-21 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2001255668A (ja) * 2000-03-10 2001-09-21 Matsushita Electric Ind Co Ltd 湿式処理方法及び装置
JP2002252200A (ja) * 2001-02-22 2002-09-06 Hitachi Electronics Eng Co Ltd 基板処理装置及び処理方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101727009B (zh) * 2008-10-21 2012-07-18 东京毅力科创株式会社 液处理装置和液处理方法

Also Published As

Publication number Publication date
TWI343842B (enExample) 2011-06-21
JP2008227195A (ja) 2008-09-25
TW200843868A (en) 2008-11-16

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Application publication date: 20080917