CN101263592A - 用于分离电子元件的装置和方法 - Google Patents
用于分离电子元件的装置和方法 Download PDFInfo
- Publication number
- CN101263592A CN101263592A CNA2006800330679A CN200680033067A CN101263592A CN 101263592 A CN101263592 A CN 101263592A CN A2006800330679 A CNA2006800330679 A CN A2006800330679A CN 200680033067 A CN200680033067 A CN 200680033067A CN 101263592 A CN101263592 A CN 101263592A
- Authority
- CN
- China
- Prior art keywords
- cutting tool
- cut
- assembly
- control device
- cutting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 45
- 238000005520 cutting process Methods 0.000 claims abstract description 95
- 238000000926 separation method Methods 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 6
- 238000005259 measurement Methods 0.000 claims description 2
- 230000008520 organization Effects 0.000 claims description 2
- 230000008901 benefit Effects 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 239000002313 adhesive film Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 208000036829 Device dislocation Diseases 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0093—Working by laser beam, e.g. welding, cutting or boring combined with mechanical machining or metal-working covered by other subclasses than B23K
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0626—Energy control of the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/024—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with the stock carried by a movable support for feeding stock into engagement with the cutting blade, e.g. stock carried by a pivoted arm or a carriage
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/027—Scoring tool holders; Driving mechanisms therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/07—Cutting armoured, multi-layered, coated or laminated, glass products
- C03B33/074—Glass products comprising an outer layer or surface coating of non-glass material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/52—Ceramics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T225/00—Severing by tearing or breaking
- Y10T225/10—Methods
- Y10T225/12—With preliminary weakening
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49789—Obtaining plural product pieces from unitary workpiece
- Y10T29/4979—Breaking through weakened portion
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49815—Disassembling
- Y10T29/49821—Disassembling by altering or destroying work part or connector
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/53274—Means to disassemble electrical device
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Thermal Sciences (AREA)
- Laser Beam Processing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Supply And Installment Of Electrical Components (AREA)
- Manipulator (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1029992 | 2005-09-21 | ||
NL1029992 | 2005-09-21 | ||
NL1030004 | 2005-09-22 | ||
NL1030004A NL1030004C2 (nl) | 2005-09-21 | 2005-09-22 | Inrichting en werkwijze voor het separeren van elektronische componenten. |
PCT/NL2006/050228 WO2007035097A2 (en) | 2005-09-21 | 2006-09-19 | Device and method for separating electronic components |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101263592A true CN101263592A (zh) | 2008-09-10 |
CN101263592B CN101263592B (zh) | 2013-09-11 |
Family
ID=37622469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006800330679A Expired - Fee Related CN101263592B (zh) | 2005-09-21 | 2006-09-19 | 用于分离电子元件的装置和方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8677592B2 (zh) |
KR (1) | KR20080047614A (zh) |
CN (1) | CN101263592B (zh) |
MY (1) | MY164455A (zh) |
NL (1) | NL1030004C2 (zh) |
TW (1) | TWI477374B (zh) |
WO (1) | WO2007035097A2 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107538137A (zh) * | 2016-06-29 | 2018-01-05 | 东捷科技股份有限公司 | 脆性基板的切割方法 |
CN108465943A (zh) * | 2018-03-13 | 2018-08-31 | 武汉翔明激光科技有限公司 | 一种外包金属壳体的激光解体设备及其使用方法 |
CN109863006A (zh) * | 2016-10-06 | 2019-06-07 | 泰恩河畔纽卡斯尔大学 | 加工脆性材料的方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI498990B (zh) * | 2012-12-19 | 2015-09-01 | Genesis Photonics Inc | 劈裂裝置 |
JP5917677B1 (ja) * | 2014-12-26 | 2016-05-18 | エルシード株式会社 | SiC材料の加工方法 |
DE102018117364A1 (de) * | 2018-07-18 | 2020-01-23 | Infineon Technologies Ag | Verfahren und Vorrichtung zum Trimmen einer auf einem Träger aufgebrachten Antenne, Verfahren zum Herstellen einer Trägerstruktur, Trägerstruktur und Chipkarte |
KR102306315B1 (ko) | 2019-06-13 | 2021-09-29 | 주식회사 제이스텍 | 플랫탑 uv레이저를 이용한 부품칩 분리장치 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4217689A (en) * | 1976-09-14 | 1980-08-19 | Mitsubishi Denki Kabushiki Kaisha | Process for preparing semiconductor devices |
US4355457A (en) * | 1980-10-29 | 1982-10-26 | Rca Corporation | Method of forming a mesa in a semiconductor device with subsequent separation into individual devices |
EP1255280A2 (en) * | 2001-04-30 | 2002-11-06 | Kulicke & Soffa Investments, Inc | Apparatus and method for dicing semiconductor wafers |
US20030127428A1 (en) * | 2000-09-14 | 2003-07-10 | Satoshi Fujii | Method for separating chips from diamond wafer |
EP1502695A1 (en) * | 2002-05-07 | 2005-02-02 | Disco Corporation | Finishing machine using laser beam |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6195544A (ja) * | 1984-10-17 | 1986-05-14 | Hitachi Ltd | ペレタイズ方法 |
JP3028660B2 (ja) * | 1991-10-21 | 2000-04-04 | 住友電気工業株式会社 | ダイヤモンドヒートシンクの製造方法 |
US5362681A (en) * | 1992-07-22 | 1994-11-08 | Anaglog Devices, Inc. | Method for separating circuit dies from a wafer |
CA2115947A1 (en) * | 1993-03-03 | 1994-09-04 | Gregory C. Smith | Wafer-like processing after sawing dmds |
EP0678904A1 (en) * | 1994-04-12 | 1995-10-25 | Lsi Logic Corporation | Multicut wafer saw process |
US5597767A (en) * | 1995-01-06 | 1997-01-28 | Texas Instruments Incorporated | Separation of wafer into die with wafer-level processing |
US5832585A (en) * | 1996-08-13 | 1998-11-10 | National Semiconductor Corporation | Method of separating micro-devices formed on a substrate |
JPH11316928A (ja) * | 1998-05-06 | 1999-11-16 | Tdk Corp | スライダの製造方法および装置 |
JP3319507B2 (ja) * | 1998-06-29 | 2002-09-03 | 住友電気工業株式会社 | ダイヤモンドウェハのチップ化方法 |
KR100338983B1 (ko) * | 1998-11-30 | 2002-07-18 | 윤종용 | 웨이퍼분리도구및이를이용하는웨이퍼분리방법 |
CN1178564C (zh) * | 1999-05-07 | 2004-12-01 | 古河电气工业株式会社 | 布线方法和装置以及ic卡制造方法 |
US6562698B2 (en) * | 1999-06-08 | 2003-05-13 | Kulicke & Soffa Investments, Inc. | Dual laser cutting of wafers |
JP2001189288A (ja) * | 1999-12-20 | 2001-07-10 | Ind Technol Res Inst | イオン注入利用の基板ダイシング法 |
TW439107B (en) * | 2000-02-04 | 2001-06-07 | Advanced Systems Automation | Apparatus for singulating a molded panel with a plurality of IC devices and method for cutting a panel of IC devices connected by a multilayer substrate |
TWI228780B (en) * | 2000-05-11 | 2005-03-01 | Disco Corp | Semiconductor wafer dividing method |
US6719188B2 (en) * | 2001-07-24 | 2004-04-13 | International Business Machines Corporation | Rework methods for lead BGA/CGA |
US6745449B2 (en) * | 2001-11-06 | 2004-06-08 | Raytheon Company | Method and apparatus for making a lid with an optically transmissive window |
US6838299B2 (en) * | 2001-11-28 | 2005-01-04 | Intel Corporation | Forming defect prevention trenches in dicing streets |
US20040088855A1 (en) * | 2002-11-11 | 2004-05-13 | Salman Akram | Interposers for chip-scale packages, chip-scale packages including the interposers, test apparatus for effecting wafer-level testing of the chip-scale packages, and methods |
JP4796271B2 (ja) * | 2003-07-10 | 2011-10-19 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP4493662B2 (ja) * | 2004-01-15 | 2010-06-30 | インターナショナル・ビジネス・マシーンズ・コーポレーション | マイクロ電気機械システム(mems)を製造するための装置 |
JP2006147623A (ja) * | 2004-11-16 | 2006-06-08 | Tdk Corp | ウエハの切断方法 |
DE602005013084D1 (de) * | 2005-09-15 | 2009-04-16 | Infineon Technologies Ag | Elektromagnetische Abschirmung von Gehäusen mit einem Laminatsubstrat |
-
2005
- 2005-09-22 NL NL1030004A patent/NL1030004C2/nl not_active IP Right Cessation
-
2006
- 2006-09-19 WO PCT/NL2006/050228 patent/WO2007035097A2/en active Application Filing
- 2006-09-19 MY MYPI20080360A patent/MY164455A/en unknown
- 2006-09-19 KR KR1020087009115A patent/KR20080047614A/ko active Search and Examination
- 2006-09-19 US US12/065,136 patent/US8677592B2/en active Active
- 2006-09-19 CN CN2006800330679A patent/CN101263592B/zh not_active Expired - Fee Related
- 2006-09-20 TW TW095134771A patent/TWI477374B/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4217689A (en) * | 1976-09-14 | 1980-08-19 | Mitsubishi Denki Kabushiki Kaisha | Process for preparing semiconductor devices |
US4355457A (en) * | 1980-10-29 | 1982-10-26 | Rca Corporation | Method of forming a mesa in a semiconductor device with subsequent separation into individual devices |
US20030127428A1 (en) * | 2000-09-14 | 2003-07-10 | Satoshi Fujii | Method for separating chips from diamond wafer |
EP1255280A2 (en) * | 2001-04-30 | 2002-11-06 | Kulicke & Soffa Investments, Inc | Apparatus and method for dicing semiconductor wafers |
EP1502695A1 (en) * | 2002-05-07 | 2005-02-02 | Disco Corporation | Finishing machine using laser beam |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107538137A (zh) * | 2016-06-29 | 2018-01-05 | 东捷科技股份有限公司 | 脆性基板的切割方法 |
CN109863006A (zh) * | 2016-10-06 | 2019-06-07 | 泰恩河畔纽卡斯尔大学 | 加工脆性材料的方法 |
CN108465943A (zh) * | 2018-03-13 | 2018-08-31 | 武汉翔明激光科技有限公司 | 一种外包金属壳体的激光解体设备及其使用方法 |
Also Published As
Publication number | Publication date |
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WO2007035097A3 (en) | 2007-05-10 |
MY164455A (en) | 2017-12-15 |
US8677592B2 (en) | 2014-03-25 |
NL1030004C2 (nl) | 2007-03-22 |
WO2007035097A2 (en) | 2007-03-29 |
TWI477374B (zh) | 2015-03-21 |
TW200726612A (en) | 2007-07-16 |
CN101263592B (zh) | 2013-09-11 |
US20080289165A1 (en) | 2008-11-27 |
KR20080047614A (ko) | 2008-05-29 |
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