CN101178903B - 制造带切口的尾屏蔽件的改进方法 - Google Patents
制造带切口的尾屏蔽件的改进方法 Download PDFInfo
- Publication number
- CN101178903B CN101178903B CN2007101863304A CN200710186330A CN101178903B CN 101178903 B CN101178903 B CN 101178903B CN 2007101863304 A CN2007101863304 A CN 2007101863304A CN 200710186330 A CN200710186330 A CN 200710186330A CN 101178903 B CN101178903 B CN 101178903B
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- CN
- China
- Prior art keywords
- layer
- stop layer
- deposited
- dielectric layer
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 104
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 229920002120 photoresistant polymer Polymers 0.000 claims description 50
- 238000000151 deposition Methods 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 17
- 125000006850 spacer group Chemical group 0.000 claims description 16
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims 2
- 229910045601 alloy Inorganic materials 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 239000010410 layer Substances 0.000 description 195
- 230000036961 partial effect Effects 0.000 description 38
- 239000012528 membrane Substances 0.000 description 16
- 239000010948 rhodium Substances 0.000 description 15
- 230000005291 magnetic effect Effects 0.000 description 13
- 238000000992 sputter etching Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 230000008021 deposition Effects 0.000 description 8
- 238000001020 plasma etching Methods 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 6
- 239000003989 dielectric material Substances 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 230000000873 masking effect Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
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- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
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- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
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- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/10—Structure or manufacture of housings or shields for heads
- G11B5/11—Shielding of head against electric or magnetic fields
- G11B5/112—Manufacture of shielding device
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
- Y10T29/49043—Depositing magnetic layer or coating
- Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/4902—Electromagnet, transformer or inductor
- Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T29/49032—Fabricating head structure or component thereof
- Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
- Y10T29/49052—Machining magnetic material [e.g., grinding, etching, polishing] by etching
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/595,654 | 2006-11-10 | ||
| US11/595,654 US7757380B2 (en) | 2006-11-10 | 2006-11-10 | Methods for the manufacture of notched trailing shields |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101178903A CN101178903A (zh) | 2008-05-14 |
| CN101178903B true CN101178903B (zh) | 2011-12-14 |
Family
ID=39369704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101863304A Expired - Fee Related CN101178903B (zh) | 2006-11-10 | 2007-11-12 | 制造带切口的尾屏蔽件的改进方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7757380B2 (enExample) |
| JP (1) | JP2008123664A (enExample) |
| CN (1) | CN101178903B (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8276258B1 (en) | 2008-08-26 | 2012-10-02 | Western Digital (Fremont), Llc | Method for fabricating a magnetic recording transducer |
| US8166631B1 (en) | 2008-08-27 | 2012-05-01 | Western Digital (Fremont), Llc | Method for fabricating a magnetic recording transducer having side shields |
| US8720044B1 (en) | 2008-09-26 | 2014-05-13 | Western Digital (Fremont), Llc | Method for manufacturing a magnetic recording transducer having side shields |
| US8231796B1 (en) * | 2008-12-09 | 2012-07-31 | Western Digital (Fremont), Llc | Method and system for providing a magnetic recording transducer having side shields |
| US8196285B1 (en) | 2008-12-17 | 2012-06-12 | Western Digital (Fremont), Llc | Method and system for providing a pole for a perpendicular magnetic recording head using a multi-layer hard mask |
| US8254060B1 (en) | 2009-04-17 | 2012-08-28 | Western Digital (Fremont), Llc | Straight top main pole for PMR bevel writer |
| US8225488B1 (en) | 2009-05-22 | 2012-07-24 | Western Digital (Fremont), Llc | Method for providing a perpendicular magnetic recording (PMR) pole |
| US9346672B1 (en) | 2009-08-04 | 2016-05-24 | Western Digital (Fremont), Llc | Methods for fabricating damascene write poles using ruthenium hard masks |
| US8547661B2 (en) * | 2009-10-21 | 2013-10-01 | Headway Technologies, Inc. | MAMR head with self-aligned write element and microwave field generator |
| US8797686B1 (en) | 2010-12-23 | 2014-08-05 | Western Digital (Fremont), Llc | Magnetic recording transducer with short effective throat height and method of fabrication |
| US8790527B1 (en) | 2011-03-22 | 2014-07-29 | Western Digital (Fremont), Llc | Method and system for manufacturing tapered waveguide structures in an energy assisted magnetic recording head |
| US8468683B2 (en) * | 2011-10-31 | 2013-06-25 | HGST Netherlands B.V. | High bevel angle magnetic writer pole fabrication process |
| US8628672B1 (en) | 2012-06-27 | 2014-01-14 | Western Digital (Fremont), Llc | Process for manufacturing a perpendicular magnetic recording writer pole with nonmagnetic bevel |
| US9042051B2 (en) | 2013-08-15 | 2015-05-26 | Western Digital (Fremont), Llc | Gradient write gap for perpendicular magnetic recording writer |
| US9082423B1 (en) | 2013-12-18 | 2015-07-14 | Western Digital (Fremont), Llc | Magnetic recording write transducer having an improved trailing surface profile |
| US9053735B1 (en) | 2014-06-20 | 2015-06-09 | Western Digital (Fremont), Llc | Method for fabricating a magnetic writer using a full-film metal planarization |
| CN108292510B (zh) * | 2015-12-28 | 2019-11-01 | Hoya株式会社 | 圆环状的玻璃坯板及制造方法、圆环状的玻璃基板的制造方法和磁盘用玻璃基板的制造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6564445B1 (en) * | 1999-03-29 | 2003-05-20 | Kabushiki Kaisha Toshiba | Magnetic head manufacturing method |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000077777A1 (en) * | 1999-06-14 | 2000-12-21 | Fujitsu Limited | Thin-film magnetic write head and method of manufacture thereof |
| US6757141B2 (en) * | 2002-01-18 | 2004-06-29 | Hitachi Global Storage Technologies Netherlands B.V. | Perpendicular recording write head with a ferromagnetic shaping layer |
| US7082016B2 (en) * | 2002-07-22 | 2006-07-25 | Seagate Technology Llc | Multilayer magnetic shields with compensated thermal protrusion |
| US7120988B2 (en) * | 2003-09-26 | 2006-10-17 | Hitachi Global Storage Technologies Netherlands B.V. | Method for forming a write head having air bearing surface (ABS) |
| US7009812B2 (en) * | 2003-09-29 | 2006-03-07 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic transducer for perpendicular magnetic recording with single pole write head with trailing shield |
| US7134182B2 (en) * | 2003-11-17 | 2006-11-14 | Headway Technologies, Inc. | Method to form an embedded micro-pedestal in a conductive layer |
| US7265941B2 (en) * | 2004-02-27 | 2007-09-04 | Hitachi Global Storage Technologies Netherlands B.V. | Self-aligned, notched trailing shield for perpendicular recording |
| US7441325B2 (en) * | 2004-04-30 | 2008-10-28 | Hitachi Global Storage Technologies Netherlands B.V. | Perpendicular head with trailing shield and rhodium gap process |
| US7296337B2 (en) * | 2004-05-25 | 2007-11-20 | Hitachi Global Storage Technologies Netherlands B.V. | Notched trailing shield for perpendicular write head |
| US7296338B2 (en) * | 2004-07-30 | 2007-11-20 | Hitachi Global Storage Technologies Netherlands B.V. | Method and apparatus for providing a reverse air bearing surface head with trailing shield design for perpendicular recording |
| JP2006134507A (ja) * | 2004-11-08 | 2006-05-25 | Tdk Corp | 磁気ヘッドの製造方法、磁気ヘッド、ヘッドジンバルアセンブリ、ヘッドアームアセンブリ、ヘッドスタックアセンブリ |
| US7081041B1 (en) * | 2005-02-28 | 2006-07-25 | Hitachi Global Storage Technologies Netherlands B.V. | Manufacturing method for forming a write head top pole using chemical mechanical polishing with a DLC stop layer |
-
2006
- 2006-11-10 US US11/595,654 patent/US7757380B2/en not_active Expired - Fee Related
-
2007
- 2007-11-07 JP JP2007289673A patent/JP2008123664A/ja active Pending
- 2007-11-12 CN CN2007101863304A patent/CN101178903B/zh not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6564445B1 (en) * | 1999-03-29 | 2003-05-20 | Kabushiki Kaisha Toshiba | Magnetic head manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| US20080113514A1 (en) | 2008-05-15 |
| JP2008123664A (ja) | 2008-05-29 |
| CN101178903A (zh) | 2008-05-14 |
| US7757380B2 (en) | 2010-07-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: HGST NETHERLANDS BV Free format text: FORMER NAME: HITACHI GLOBAL STORAGE TECH |
|
| CP01 | Change in the name or title of a patent holder |
Address after: Amsterdam Patentee after: Hitachi Global Storage Technologies Netherlands B. V. Address before: Amsterdam Patentee before: Hitachi Global Storage Tech |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20111214 Termination date: 20151112 |
|
| EXPY | Termination of patent right or utility model |