CN101176039B - 使用可去除膜制备浮雕图像 - Google Patents

使用可去除膜制备浮雕图像 Download PDF

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Publication number
CN101176039B
CN101176039B CN2006800168063A CN200680016806A CN101176039B CN 101176039 B CN101176039 B CN 101176039B CN 2006800168063 A CN2006800168063 A CN 2006800168063A CN 200680016806 A CN200680016806 A CN 200680016806A CN 101176039 B CN101176039 B CN 101176039B
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CN
China
Prior art keywords
imaging
imageable
film
radiation
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2006800168063A
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English (en)
Chinese (zh)
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CN101176039A (zh
Inventor
G·L·茨沃德洛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mirco
Original Assignee
Eastman Kodak Co
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Filing date
Publication date
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Publication of CN101176039A publication Critical patent/CN101176039A/zh
Application granted granted Critical
Publication of CN101176039B publication Critical patent/CN101176039B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CN2006800168063A 2005-05-16 2006-05-02 使用可去除膜制备浮雕图像 Expired - Fee Related CN101176039B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/130,065 US7279254B2 (en) 2005-05-16 2005-05-16 Method of making an article bearing a relief image using a removable film
US11/130,065 2005-05-16
PCT/US2006/016865 WO2006124279A2 (en) 2005-05-16 2006-05-02 Making relief image using removable film

Publications (2)

Publication Number Publication Date
CN101176039A CN101176039A (zh) 2008-05-07
CN101176039B true CN101176039B (zh) 2011-03-09

Family

ID=37232950

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800168063A Expired - Fee Related CN101176039B (zh) 2005-05-16 2006-05-02 使用可去除膜制备浮雕图像

Country Status (5)

Country Link
US (1) US7279254B2 (enExample)
EP (1) EP1883858B1 (enExample)
JP (1) JP4971311B2 (enExample)
CN (1) CN101176039B (enExample)
WO (1) WO2006124279A2 (enExample)

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US8153347B2 (en) * 2008-12-04 2012-04-10 Eastman Kodak Company Flexographic element and method of imaging
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WO2010098175A1 (ja) * 2009-02-26 2010-09-02 日立化成工業株式会社 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
US9173336B2 (en) 2009-05-19 2015-10-27 Apple Inc. Techniques for marking product housings
US9884342B2 (en) 2009-05-19 2018-02-06 Apple Inc. Techniques for marking product housings
US8663806B2 (en) 2009-08-25 2014-03-04 Apple Inc. Techniques for marking a substrate using a physical vapor deposition material
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US10071583B2 (en) 2009-10-16 2018-09-11 Apple Inc. Marking of product housings
US9845546B2 (en) 2009-10-16 2017-12-19 Apple Inc. Sub-surface marking of product housings
US8809733B2 (en) 2009-10-16 2014-08-19 Apple Inc. Sub-surface marking of product housings
US8628836B2 (en) 2010-03-02 2014-01-14 Apple Inc. Method and apparatus for bonding metals and composites
US8489158B2 (en) 2010-04-19 2013-07-16 Apple Inc. Techniques for marking translucent product housings
US8724285B2 (en) 2010-09-30 2014-05-13 Apple Inc. Cosmetic conductive laser etching
US8530142B2 (en) * 2011-03-15 2013-09-10 Eastman Kodak Company Flexographic printing plate precursor, imaging assembly, and use
US20120248001A1 (en) 2011-03-29 2012-10-04 Nashner Michael S Marking of Fabric Carrying Case for Portable Electronic Device
US9280183B2 (en) 2011-04-01 2016-03-08 Apple Inc. Advanced techniques for bonding metal to plastic
JP6111521B2 (ja) * 2012-02-29 2017-04-12 東洋紡株式会社 感光性凸版用シール印刷原版
US8879266B2 (en) 2012-05-24 2014-11-04 Apple Inc. Thin multi-layered structures providing rigidity and conductivity
US10071584B2 (en) 2012-07-09 2018-09-11 Apple Inc. Process for creating sub-surface marking on plastic parts
JP2015532323A (ja) * 2012-09-28 2015-11-09 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ イメージャブルな架橋性フルオロポリマーフィルムを配置された基材を含むイメージャブル物品、並びにそれらから作製されたイメージ化物品
US9372407B2 (en) 2013-04-18 2016-06-21 E I Du Pont De Nemours And Company Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
US8945813B2 (en) 2013-04-18 2015-02-03 Eastman Kodak Company Mask forming imageable material and use
US9434197B2 (en) 2013-06-18 2016-09-06 Apple Inc. Laser engraved reflective surface structures
US9314871B2 (en) 2013-06-18 2016-04-19 Apple Inc. Method for laser engraved reflective surface structures
CN105531628B (zh) 2013-07-15 2018-04-20 富林特集团德国有限公司 制造柔性版印刷印版的方法
CN106814542B (zh) * 2015-11-30 2020-10-27 乐凯华光印刷科技有限公司 一种烧蚀胶片及其应用
CN108020991A (zh) * 2016-10-31 2018-05-11 无锡中微掩模电子有限公司 集成电路用掩模版背曝方法
CN110221731B (zh) * 2018-03-02 2023-03-28 宸鸿光电科技股份有限公司 触控面板的直接图案化方法及其触控面板
US10999917B2 (en) 2018-09-20 2021-05-04 Apple Inc. Sparse laser etch anodized surface for cosmetic grounding
EP3865308A1 (en) * 2020-02-12 2021-08-18 Jesús Francisco Barberan Latorre Method and machine for producing reliefs, as well as panels containing said reliefs
CN111736435A (zh) * 2020-07-23 2020-10-02 上海华力微电子有限公司 光刻装置及其曝光方法
US12324114B2 (en) 2021-09-24 2025-06-03 Apple Inc. Laser-marked electronic device housings
EP4495691A1 (en) 2023-07-18 2025-01-22 Eco3 Bv Relief forming plate precursors
WO2025017000A1 (en) * 2023-07-18 2025-01-23 Eco3 Bv Relief forming plate precursors
WO2025177651A1 (ja) 2024-02-22 2025-08-28 東洋紡エムシー株式会社 水現像可能なフレキソ印刷原版製造用積層体
JP7670254B1 (ja) 2024-02-22 2025-04-30 東洋紡エムシー株式会社 水現像可能なフレキソ印刷原版製造用積層体

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WO1993003928A1 (en) * 1991-08-16 1993-03-04 E.I. Du Pont De Nemours And Company Infra-red direct write imaging media
US5998088A (en) * 1998-08-03 1999-12-07 Eastman Kodak Company Heterogeneous image layer for laser ablative imaging

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WO1993003928A1 (en) * 1991-08-16 1993-03-04 E.I. Du Pont De Nemours And Company Infra-red direct write imaging media
US5998088A (en) * 1998-08-03 1999-12-07 Eastman Kodak Company Heterogeneous image layer for laser ablative imaging

Also Published As

Publication number Publication date
US20060257780A1 (en) 2006-11-16
JP2008541192A (ja) 2008-11-20
EP1883858B1 (en) 2015-09-09
EP1883858A2 (en) 2008-02-06
CN101176039A (zh) 2008-05-07
US7279254B2 (en) 2007-10-09
WO2006124279A2 (en) 2006-11-23
JP4971311B2 (ja) 2012-07-11
WO2006124279A3 (en) 2007-04-19

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Legal Events

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20190522

Address after: Delaware, USA

Patentee after: Mirco

Address before: American New York

Patentee before: Eastman Kodak Co.

TR01 Transfer of patent right
CP02 Change in the address of a patent holder

Address after: Minnesota, USA

Patentee after: Mirco

Address before: Delaware, USA

Patentee before: Mirco

CP02 Change in the address of a patent holder
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20110309

CF01 Termination of patent right due to non-payment of annual fee