CN101137683B - 用于制备精密光学器件的模制组合物 - Google Patents

用于制备精密光学器件的模制组合物 Download PDF

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Publication number
CN101137683B
CN101137683B CN2006800076254A CN200680007625A CN101137683B CN 101137683 B CN101137683 B CN 101137683B CN 2006800076254 A CN2006800076254 A CN 2006800076254A CN 200680007625 A CN200680007625 A CN 200680007625A CN 101137683 B CN101137683 B CN 101137683B
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substrate
molded part
weight
composition according
acrylate
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Expired - Fee Related
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CN2006800076254A
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English (en)
Chinese (zh)
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CN101137683A (zh
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M·克伦克
T·本廷
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Nanogate Advanced Materials GmbH
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Nanogate Advanced Materials GmbH
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Polymerisation Methods In General (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Dental Preparations (AREA)
CN2006800076254A 2005-03-10 2006-03-08 用于制备精密光学器件的模制组合物 Expired - Fee Related CN101137683B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP05101887.7 2005-03-10
EP20050101887 EP1700871B1 (de) 2005-03-10 2005-03-10 Abformzusammensetzung zur Herstellung von Präzisionsoptik
PCT/EP2006/060563 WO2006094997A1 (de) 2005-03-10 2006-03-08 Abformzusammensetzung zur herstellung von präszisionsoptik

Publications (2)

Publication Number Publication Date
CN101137683A CN101137683A (zh) 2008-03-05
CN101137683B true CN101137683B (zh) 2012-06-27

Family

ID=34938945

Family Applications (1)

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CN2006800076254A Expired - Fee Related CN101137683B (zh) 2005-03-10 2006-03-08 用于制备精密光学器件的模制组合物

Country Status (11)

Country Link
US (1) US8246896B2 (enExample)
EP (2) EP1700871B1 (enExample)
JP (1) JP5406522B2 (enExample)
KR (1) KR20070110438A (enExample)
CN (1) CN101137683B (enExample)
AT (2) ATE373026T1 (enExample)
DE (1) DE502005001479D1 (enExample)
DK (1) DK1700871T3 (enExample)
ES (1) ES2290848T3 (enExample)
PL (1) PL1700871T3 (enExample)
WO (1) WO2006094997A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE512172T1 (de) * 2009-04-07 2011-06-15 Nanogate Ind Solutions Gmbh Abformzusammensetzung
TWI510507B (zh) * 2009-05-29 2015-12-01 Nissan Chemical Ind Ltd 含氟高分支化聚合物及含有該聚合物之樹脂組成物
EP2647673A4 (en) * 2010-12-01 2016-02-10 Nissan Chemical Ind Ltd CURABLE COMPOSITION FOR A COATING CONTAINING A HYPER-RAMIFIED POLYMER CONTAINING FLUORINE
CN102174143B (zh) * 2011-01-29 2013-01-09 锦州惠发天合化学有限公司 一种含氟丙烯酸酯乳液的制备方法
BR102014031426B1 (pt) 2014-12-15 2018-07-24 Jjgc Ind E Comercio De Materiais Dentarios S/A implante
CL2015001657S1 (es) 2014-12-15 2016-09-02 Jjgc Indústria E Comércio De Materiais Dentários S A Configuracion aplicada a implante oseo.
CN109627378B (zh) * 2017-10-09 2021-03-16 中国石油化工股份有限公司 疏水缔合物及其制备方法、非均质碳酸盐岩储层酸压用清洁转向酸及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511209A (en) * 1982-02-24 1985-04-16 Ensign-Bickford Industries, Inc. Composition having improved optical qualities
US5343544A (en) * 1993-07-02 1994-08-30 Minnesota Mining And Manufacturing Company Integrated optical fiber coupler and method of making same
CN1131177A (zh) * 1994-12-28 1996-09-18 夏普公司 可光聚树脂材料组合物
CN1156164A (zh) * 1995-08-03 1997-08-06 松下电器产业株式会社 紫外线固化性涂料组合物、使用该涂料组合物的光磁盘及其制造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE63324T1 (de) * 1985-03-25 1991-05-15 Raychem Corp Klebemittelzusammensetzung fuer optische fasern.
JPS6296508A (ja) * 1985-10-23 1987-05-06 Sumitomo Chem Co Ltd 硬化性樹脂組成物
JPS63248807A (ja) * 1987-04-03 1988-10-17 Mitsubishi Rayon Co Ltd 光硬化性組成物
AU608420B2 (en) * 1988-03-15 1991-03-28 Minnesota Mining And Manufacturing Company Polymer claddings for optical fibre waveguides
EP0478261A3 (en) * 1990-09-27 1992-05-06 Ciba-Geigy Ag Process for producing oxygen-permeable polymer
JP3326796B2 (ja) * 1991-01-31 2002-09-24 大日本インキ化学工業株式会社 硬化性組成物及びその硬化方法
AU1927092A (en) * 1991-05-31 1993-01-08 Advanced Glass Treatment Systems Moisture resistant glass article
JP3167443B2 (ja) * 1991-08-23 2001-05-21 大日本インキ化学工業株式会社 光ファイバクラッド用硬化性組成物及びそれを用いた光ファイバ
EP0536743A1 (en) * 1991-10-08 1993-04-14 Sumitomo Electric Industries, Ltd Resin composition and plastic clad optical fiber comprising the same
JP3051241B2 (ja) * 1991-12-04 2000-06-12 日本化薬株式会社 紫外線硬化性透過型スクリーン用樹脂組成物及びその硬化物
JPH06136062A (ja) * 1992-10-21 1994-05-17 Nippon Oil & Fats Co Ltd 含フッ素硬化性組成物及び含フッ素硬化被膜
JP3372073B2 (ja) * 1992-12-01 2003-01-27 日本化薬株式会社 紫外線硬化性透過型スクリーン用樹脂組成物並びにその硬化物
US5411209A (en) * 1993-10-18 1995-05-02 Ollivier; Gerald Anti-hail shock wave generator
JP4029531B2 (ja) * 1999-10-19 2008-01-09 大日本インキ化学工業株式会社 微小立体成形用活性エネルギー線硬化性組成物
EP1635201A1 (de) 2004-09-09 2006-03-15 Nanogate Advanced Materials GmbH Beleuchtungseinrichtung zur gleichmässigen Hinterleuchtung von Flachbildschirmen, umfassend einen Lichtleiter mit diffraktiven Oberflächenelementen
PL1701203T3 (pl) * 2005-03-10 2007-10-31 Nanogate Advanced Mat Gmbh Płaski ekran

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511209A (en) * 1982-02-24 1985-04-16 Ensign-Bickford Industries, Inc. Composition having improved optical qualities
US5343544A (en) * 1993-07-02 1994-08-30 Minnesota Mining And Manufacturing Company Integrated optical fiber coupler and method of making same
CN1131177A (zh) * 1994-12-28 1996-09-18 夏普公司 可光聚树脂材料组合物
CN1156164A (zh) * 1995-08-03 1997-08-06 松下电器产业株式会社 紫外线固化性涂料组合物、使用该涂料组合物的光磁盘及其制造方法

Also Published As

Publication number Publication date
KR20070110438A (ko) 2007-11-16
EP1856169B1 (de) 2011-05-11
DE502005001479D1 (de) 2007-10-25
EP1856169A1 (de) 2007-11-21
EP1700871A1 (de) 2006-09-13
PL1700871T3 (pl) 2007-12-31
ATE373026T1 (de) 2007-09-15
WO2006094997A1 (de) 2006-09-14
JP5406522B2 (ja) 2014-02-05
US20080176064A1 (en) 2008-07-24
ES2290848T3 (es) 2008-02-16
DK1700871T3 (da) 2008-01-21
US8246896B2 (en) 2012-08-21
EP1700871B1 (de) 2007-09-12
JP2008533228A (ja) 2008-08-21
CN101137683A (zh) 2008-03-05
ATE509047T1 (de) 2011-05-15

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Granted publication date: 20120627

Termination date: 20140308