CN101135863A - 绘制装置 - Google Patents

绘制装置 Download PDF

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Publication number
CN101135863A
CN101135863A CNA2007101419830A CN200710141983A CN101135863A CN 101135863 A CN101135863 A CN 101135863A CN A2007101419830 A CNA2007101419830 A CN A2007101419830A CN 200710141983 A CN200710141983 A CN 200710141983A CN 101135863 A CN101135863 A CN 101135863A
Authority
CN
China
Prior art keywords
mentioned
light
camera
optical system
illumination light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007101419830A
Other languages
English (en)
Chinese (zh)
Inventor
猪俣俊德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Publication of CN101135863A publication Critical patent/CN101135863A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
CNA2007101419830A 2006-08-30 2007-08-17 绘制装置 Pending CN101135863A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006233675 2006-08-30
JP2006233675A JP2008058477A (ja) 2006-08-30 2006-08-30 描画装置

Publications (1)

Publication Number Publication Date
CN101135863A true CN101135863A (zh) 2008-03-05

Family

ID=39160002

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007101419830A Pending CN101135863A (zh) 2006-08-30 2007-08-17 绘制装置

Country Status (4)

Country Link
JP (1) JP2008058477A (ja)
KR (1) KR20080021497A (ja)
CN (1) CN101135863A (ja)
TW (1) TW200811619A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104062859A (zh) * 2013-03-21 2014-09-24 上海微电子装备有限公司 一种光刻设备对准系统

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5305967B2 (ja) * 2009-02-17 2013-10-02 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
JP5355245B2 (ja) * 2009-06-25 2013-11-27 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
CN108121177B (zh) * 2016-11-29 2019-11-22 上海微电子装备（集团）股份有限公司 一种对准测量系统及对准方法
KR102362864B1 (ko) * 2019-12-26 2022-02-14 서울대학교산학협력단 동적 마스크를 이용하여 포토리소그래피를 수행하기 위한 광학시스템 및 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104062859A (zh) * 2013-03-21 2014-09-24 上海微电子装备有限公司 一种光刻设备对准系统
CN104062859B (zh) * 2013-03-21 2016-08-10 上海微电子装备有限公司 一种光刻设备对准系统

Also Published As

Publication number Publication date
TW200811619A (en) 2008-03-01
JP2008058477A (ja) 2008-03-13
KR20080021497A (ko) 2008-03-07

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