CN101135863A - Drawing apparatus - Google Patents
Drawing apparatus Download PDFInfo
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- CN101135863A CN101135863A CNA2007101419830A CN200710141983A CN101135863A CN 101135863 A CN101135863 A CN 101135863A CN A2007101419830 A CNA2007101419830 A CN A2007101419830A CN 200710141983 A CN200710141983 A CN 200710141983A CN 101135863 A CN101135863 A CN 101135863A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Abstract
A drawing device can accurately measure the position of the reference mark of the drawn object such as substrate in short time. In the drawing device for drawing the circuit mode, a camera which can move along the (Y) direction (the main scanning direction) is arranged, and a drawing desk which can carry the substrate moving along the (X) direction (the subscanning direction) is also disposed. Furthermore, a reference graduated scale (16) is arranged along the (Y) direction and fixed relative to a reference station. The camera (11) is arranged with a light source unit which can selectively radiate the red light and the green light, and is arranged with a dichroic reflector (15) at the lower side.
Description
Technical field
The invention relates to that (photo-mask reticle) or directly forms the drawing apparatus of the pattern of circuit pattern (pattern) etc. towards the drawn body of printed base plate or Silicon Wafer etc. towards the light shield that becomes master.
Background technology
In the manufacturing engineering of substrate etc., the drafting that the drawn body of the photosensitive material that waits for coating photoresistance (photo-resist), pattern form usefulness is handled and is implemented, and engineering such as peels off through video picture processing, etching or coating processing, photoresistance (resist), at drawn body, pattern is formed.At substrate, the pointer that becomes the benchmark in mark (mark), hole etc. is formed regularly towards deciding place, and substrate is carried when drawing table (table) (drawing platform [stage]), draws table and camera movement by making, and the position of datum mark is detected.Based on the position that is detected, will draw pattern and form towards decide zone again.
When the measuring basis mark, owing to must know the tram of camera, for example, drawing table, reference graduation chi (scale) is mounted, and makes the drafting table move to institute's allocation, with the scale of reference graduation chi as benchmark, the position coordinates of measuring basis mark (patent documentation 1).Again, based on the position coordinates of the datum mark that is measured, calculate substrate deformation amount, aligning (alignment) error, the position is drawn in revisal.
[patent documentation 1] TOHKEMY 2004-348045 communique
Draw table because the reference graduation chi is installed in, the mark of measuring basis rule, the drafting table of scale are moved to till institute's allocation (origin position) of camera.Therefore, result from the driving mechanism of drawing table, when the determining positions of moving direction had error, at the position coordinates that is measured, a table error can produce.Again, use the reference graduation chi at every turn, must make draw table get back to till the fixed origin position, aspect the datum mark position probing of substrate, need spended time.
Summary of the invention
Drawing apparatus of the present invention can be correctly and with the mark of the measurement usefulness that measures the drawn body that is arranged at substrate etc. in short time, the position in hole, comprising: the position measure the drawn body that the datum mark of usefulness is set up carried, for base station relatively movably draw along first direction of scanning table and for base station be mounted movably along second direction of scanning with the first direction of scanning quadrature, the camera of measuring basis mark position.Datum mark at this comprises seal, hole etc., for example, is formed on four jiaos of drawn body of substrate etc.Make and draw table, camera, for example, constitute as being moved along sub scanning direction, main scanning direction (or it is opposite) respectively and get final product.
Drawing apparatus of the present invention comprises the reference graduation chi that is installed in base station, extends along second direction of scanning, again, comprising: irradiation measures the secondary light source of second illumination light with wavelength field different with first illumination light that first light source, the irradiating illumination reference graduation chi of first illumination light of using the datum mark position use and guides that first illumination light is directed to flare-aircraft to drawn body and with its reflected light and second illuminated light guide caused the reference graduation chi and its reflected light is directed to the measurement optical system of camera.
Measurement is selected first illumination light, second illumination light with optical system, is directed to datum mark, drawn body respectively.Based on the position coordinates of the drafting data that is contained in design data, camera is moved along second direction of scanning, in that camera is stopped under the state in this place, by second illumination light of being radiated from secondary light source, the reference graduation chi becomes and can measure.Again, by first illumination light, the direct position of measuring basis mark.The shape of reference graduation chi, constitute arbitrarily, for example, uses fine hole with uniformly-spaced regularly the rule of arrangement get final product.The spacing of mark, scale gets final product according to the formation of drawing apparatus, but must consider the driving error of the driving mechanism of mobile cameras, and the mode that is no more than the spacing (pitch) of scale with the driving error determines spacing to get final product.Again, drawing apparatus comprises: the measuring equipment of measuring basis mark position and based on being drawn the compensating device of position by the position of the datum mark that measured, revisal.
In order selectively to distinguish first illumination light, second illumination light, use optical system measuring, preferably be provided with make first illumination light with and reflected light see through, make second illumination light with and the beam-splitting optical system that reflects of reflected light.For example, use optical system measuring, be provided with make first and second illumination light towards drawn body reflect, make first optical system that its reflected light directly sees through and with first illumination light with and reflected light second optical system that sees through, make second illumination light reflect and its reflected light is reflected towards camera towards the reference graduation chi.Perhaps, be provided with make first illumination light towards drawn body reflect, make the 3rd optical system that its reflected light directly sees through and with first illumination light with and reflected light see through, make via second illumination light of reference graduation chi incident the 4th optical system towards the camera reflection.As the first, the 3rd optical system, for example, prism is set up.As beam-splitting optical system, second, the 4th optical system, for example, dichronic mirror (dichroic mirror) is set up.
As the formation of beam-splitting optical system, for example, can install integratedly with camera, measure with optical system and camera and relatively move for the reference graduation chi.Perhaps, as extending along the reference graduation chi, be installed in the reference graduation chi also can, camera relatively moves for measuring with optical system and reference graduation chi.
The measurement mechanism of drawing apparatus of the present invention comprises: camera, along being mounted, measuring the position that is arranged at the datum mark that is equipped on the drawn body of drawing table movably with second direction of scanning of drawing the first direction of scanning quadrature that table relatively moves for base station; The reference graduation chi is installed in base station, extends along second direction of scanning; First light source, irradiation measures first illumination light that the datum mark position is used; Secondary light source, second illumination light that irradiating illumination reference graduation chi is used with wavelength field different with first illumination light; And measure and to use optical system, first illuminated light guide is caused drawn body and its reflected light is directed to camera, and second illuminated light guide is caused the reference graduation chi and its reflected light is directed to camera.
According to the present invention, can correctly measure the position of datum mark of the drawn body of substrate etc. in the short time.
Description of drawings
Fig. 1 is with the stereographic map of modal representation as the drawing system of present embodiment;
Fig. 2 contains the stereographic map of the some of the measurement mechanism of camera for expression roughly;
Fig. 3 is the planimetric map of measurement mechanism;
Fig. 4 is the calcspar of drawing apparatus and drafting control part;
Fig. 5 is the planimetric map of expression substrate;
Fig. 6 is the icon of the position of the mating holes of expression reference graduation chi;
Fig. 7 is the icon of the photographic picture of expression mating holes;
Fig. 8 is the planimetric map of measurement mechanism in a second embodiment;
Fig. 9 is for roughly being illustrated in the stereographic map of the some of the measurement mechanism among the 3rd embodiment.
Symbol description
10: drawing apparatus; 11: camera;
11B: prism; 13A: first light source portion;
13B: secondary light source portion; 15: dichronic mirror;
16: the reference graduation chi; 18: draw table;
20: exposing unit; 20A: light source;
20B:DMD; 21: light source cell;
30A: draw control part; 32: system, control circuit;
The 34:DMD control part; 38: the platform control part;
40: the platform position detection part; SW: substrate (drawn body);
X: sub scanning direction; Y: main scanning direction.
Embodiment
Below with reference to the illustration embodiments of the invention.
Fig. 1 is with the stereographic map of modal representation as the drawing system of present embodiment.
The drawing apparatus 10 of drawing system be by towards at the substrate SW irradiates light of the photosensitive material of surface coated photoresistance etc. to form the device of circuit pattern, drawing unit 30 is connected.Drawing unit 30 comprises drawing unit 30A, keyboard 30B, screen 30C, based on CAM data (vector [vector] data) corresponding to the circuit pattern, and in the time of generating mesh (raster) data, the action of control drawing apparatus 10.
Be fixed in the fence gate columnar structure body 12 of base station 14, forming the circuit pattern and be set up at the exposing unit 20 of substrate SW surface usefulness.Exposing unit 20 is carried on pair of guide rails 17, can move along guide rail 17.Substrate SW for example, is Silicon Wafer (silicon wafer), film (film), glass substrate or copper-surfaced laminated board, under the state of the master slice (blanks) that processing such as pre-roasting (prebake) processing, photoresistance coating are applied in, is carried at drafting table 18.At this, the photoresistance of minus is formed at substrate surface.
At four jiaos of substrate SW, adjust the mating holes AM1～AM4 that uses the drafting position and be formed, at fence gate columnar structure body 12, the camera 11 that detects the mating holes position is mounted.In the bottom surface of fence gate columnar structure body 12, the guide rail (not icon) parallel with guide rail 17 is set up, and camera 11 can move along guide rail.For drawing table 18, the X-Y coordinate of mutually orthogonal is prescribed, and based on the X-Y coordinate system, substrate SW is scanned.At this, the main scanning direction of the moving direction of exposing unit 20 as the Y direction, will be drawn the sub scanning direction of moving direction of table as directions X.
Exposing unit 20 comprises light source, DMD (digital minitype reflector assembly, digitalmicro-mirror device), again, comprises lamp optical system, imaging optical system (any all not icon).Light source radiates the light of other semiconductor lasers etc. continuously with certain intensity.The light that is radiated is led to DMD by by lamp optical system the light that all light beams that throws light on of DMD constitute being formed.
DMD be small minitype reflector with the rectangular spatial light modulation device that is arranged, each minitype reflector is by electrostatic field revolution change.Each minitype reflector is determined the position in arbitrary posture of the second of prime that will be reflected towards the direction of the plane of exposure of substrate SW from the light beam of light source and the reflection of the direction outside plane of exposure, and according to control signal, posture is switched.At DMD, minitype reflector is independent respectively and controlled by ON/OFF, and shining in all light of DMD becomes the light that constitutes from the light beam of the light that selectively reflected each minitype reflector.Its result, on plane of exposure, illuminated corresponding to the light of the circuit pattern that should be formed on this place.
By drawing moving of table 18, substrate SW is determined the position towards drawing the starting position, and exposing unit 20 moves along the Y direction.During exposing unit 20 moved, as being formed corresponding to the pattern of the position of the point of irradiation (spot) (exposure area) of DMD, each minitype reflector of DMD was controlled by ON/OFF.The mobile of exposure area 20 of (scanning strip [band]) finished along a scanning field, and the drafting table 18 that carries out handling along the drafting of next scanning strip usefulness moves institute's set a distance.Again, in order to scan next scanning strip, exposing unit 20 moves with certain speed in the opposite direction, and between this, DMD is corresponding to drawing the pattern Be Controlled.
Scanning by this type of is repeated, and it is all that the circuit pattern is formed on substrate.For the substrate SW that drafting is finished dealing with, video picture processing, etching or coating, photoresistance lift-off processing etc. is applied in, and the substrate that the circuit pattern is formed is manufactured.
Fig. 2 contains the stereographic map of the some of the measurement mechanism of camera for expression roughly, and Fig. 3 is the planimetric map of measurement mechanism.
At the inner space 12A of fence gate columnar structure body 12, the reference graduation chi 16 that extends along the Y direction is set up, and by support member (not icon), is mounted at fence gate columnar structure body 12.At reference graduation chi 16, fine hole (scale) (is the interval of several centimetres of degree at this) at certain intervals and is formed.At the leading section of camera 11, camera lenses (camera lens) 11A is set up, and below camera lenses 11A, that is on drawn side, dichronic mirror 15 is set up.Dichronic mirror 15 is installed on camera 11 integratedly via support member (not icon), and according to moving of camera 11, dichronic mirror 15 is along the Y direction, that is, move along reference graduation chi 16.
As shown in Figure 3, at the leading section of camera lenses 11A, optical fiber (fiber, not icon) light source cell 13 (at Fig. 2, not icon) is mounted along horizontal direction, and optical fiber is conveyed to camera lenses 11A inside with the light of light source cell 13.Light source cell 13 comprises the first light source portion 13A and the 13B of secondary light source portion, and it is luminous that the first light source portion 13A will have the red light L1 of general 660nm wavelength, and it is luminous that secondary light source portion will have the green light L2 of general 525nm wavelength.
Be partial to by the prism 11B that is arranged in the camera lenses 11A from the red light that the first light source portion 13A is radiated, be led to the direction of dichronic mirror 15 along the optical axis E of camera lenses 11A.Again, the green light of being radiated from the 13A of secondary light source portion also is led to dichronic mirror 15 by prism 11B.
Arrive the red reflective of substrate SW, reflected light is towards dichronic mirror 15 incidents.Dichronic mirror 15 directly sees through the red light of reflection, and prism 11B also directly makes reflected light see through.By this, the reflected light of red light L1 is incident to camera 11.On the other hand, arrive the green light reflection of reference graduation chi 16, reflected light is towards dichronic mirror 15 incidents.Dichronic mirror 15 is with the green light reflection of reflection, and the reflected light of green light L2 is by prism 11B, towards camera 11 incidents.
Fig. 4 is the calcspar of drawing apparatus 10 and drafting control part 30A.
The drafting control part 30A that is connected with keyboard 30B comprises system, control circuit 32, DMD control part 34, platform control part 38, platform position detection part 40, light source control portion 44.The system, control circuit 32 that contains CPU, RAM, ROM etc. is that the action of control drawing apparatus 10 is all, for DMD control part 34, will control the control signal output of time shutter (timing) usefulness.DMD control part 34 is handled with program control DMD 20B according to the drafting that is stored in ROM in advance.
Circuit pattern data as vectorial data (CAM data) is input to the mesh transformations portion 42 of drawing control part 30A from workstation (work station, not icon).The vector data that is transfused to is transformed to the grid data corresponding to network scanning, is sent to DMD control part 34.
At DMD control part 34, the grid data cooperates the relative position of exposure area, with the fixed time be read out in regular turn.That is, relative position information based on the exposure area of sending from the Quadratic Finite Element point data that is read out and platform position detection part 40, the control signal of minitype reflector ON/OFF control is read out from bitmap internal memory (bitmap memory) 43, is output towards DMD 20B.
The X platform 37A of mechanism possesses motor (not icon), makes to draw table 18 and move towards directions X.The Y platform 37B of mechanism also possesses motor (not icon), make possess light source 20A, the exposing unit 20 of DMD 20B moves along the Y direction.Motor (not icon), control exposing unit 20 and the determining positions of drawing platform 18 of the platform control part 38 control X platform 37A of mechanism, the Y platform 37B of mechanism.
Platform position detection part 40 based on the signal of video signal that sends from the CCD (not icon) that is arranged at camera 11 (that is, light detecting signal) and the position detection signal of the motor rotary position of the X platform 37A of mechanism that sends from platform control part 38 of expression, the position coordinates with mating holes AM1～AM4 of substrate SW detects.Along moving of the Y direction of camera 11 by camera driving mechanism 39 Be Controlled that possess motor (not icon), platform control part 38 control camera driving mechanisms 39.
System, control circuit 32 is calculated expression by the alignment error of the difference between the position coordinates of the position coordinates of predefined drafting data and the actual substrate SW that measures from the position coordinates of mating holes AM1～AM4 of sending from platform position detection part 40.Draw the control signal of position towards the 34 output revisals of DMD control part again.At DMD control part 34, the reception position of the grid data in bitmap internal memory 43 is moved (shift) institute quantitatively corresponding to alignment error.
The light source 20A that light source control portion 44 drives in the exposing unit 20 makes the laser light radiation from light source 20A.Again, system, control circuit 32 drive installations make the first light source portion 13A shown in Figure 3, the 13B of secondary light source portion by selectively bright lamp in the light source cell 21 of camera 11.System, control circuit 32 as the image of screen 30C demonstration mating holes, is carried out signal Processing based on the light detecting signal that is transmitted from camera 11, exports signal of video signal to screen 30C.
Fig. 5 is the planimetric map of expression substrate SW.Fig. 6 is the icon of the position of the mating holes of expression reference graduation chi 16.Fig. 7 is the icon of the photographic picture of expression mating holes.Utilize Fig. 5～Fig. 7, the measurement order of relevant mating holes is described.
There is the situation that is offset in X, Y direction by the distortion of substrate SW the position that is arranged at mating holes AM1～AM4 of four jiaos of substrate SW, again, has the arbitrary hole that makes mating holes AM1～AM4 to be formed on the position of proofreading and correct in advance.In Fig. 5, the position of mating holes AM1 is offset in the Y direction for mating holes AM2.
When measuring the position of mating holes AM1～AM4, measured respectively in X, Y direction.In the circuit pattern data as vectorial data, the position coordinates data of mating holes AM1～AM4 is involved, is determined based on the position coordinates data of mating holes AM1～AM4 along the amount of movement of the Y direction of camera 11, the amount of movement of drawing table 18.Again, about the Y coordinate, as shown below as, utilize reference graduation chi 16, the position of mating holes AM1～AM4 is measured.
Substrate SW is configured in primary position (origin position), and in order to move it, based on the Y coordinate data of the mating holes that measures, camera 11 moves along institute's set a distance Y direction.Just, in the state, the position is in the position of Y=0 in the early stage for camera 11.For example, when measuring mating holes AM1,11 displacement Y1 of camera.
At the driving mechanism of camera 11, produce to transmit error, in fact, the position coordinates of camera movement and between the position coordinates of the involved mating holes of drafting data produces deviation.At this, error produces in the scope of the spacing (several centimetres) in the hole that is arranged in reference graduation chi 16.After camera 11 moved, the 13B of secondary light source portion of light source cell 21 was by bright lamp, and green light L2 is irradiated onto on the reference graduation chi 16.When produce transmitting error, depart from from the center in the visual field of camera the position in the hole of the mating holes that measures corresponding to the quilt of reference graduation chi 16.In Fig. 6, will not transmit the hole of the reference graduation chi 16 in the state of error and represent with T1, the hole that produces the reality that transmits error is represented with T2.
At the CCD that is arranged at camera 11, the reflected light of green light L2 is transfused to, and represents that the signal of video signal (that is, light detecting signal) of catoptrical input position is output from CCD.Again, based on detection signal, the position deviation amount in the hole of reference graduation chi 16 is detected.Afterwards, draw 18 on table and move institute quantitatively along directions X, the position of camera 11 is determined on the top of mating holes.Draw table 18 and stop, the bright lamp of the first light source portion 13A of light source cell 21, red light L1 exposes to substrate SW, and the 13B of secondary light source portion turns off the light.Again, about directions X, based on the position detection signal that the code translator (encoder) from the motor that is installed on X platform driving mechanism 37A is output, the amount of movement of drawing table 18 is detected.Substrate SW is driven the origin position of X=0 as primary position.
When the position of mating holes produced deviation by distortion waits, mating holes departed from from the center, the visual field of camera 11.At this moment, by operator's keyboard operation, as coming towards the center, the visual field of camera 11, the center of mating holes make camera 11 move (with reference to figure 7).When camera 11 was moved, the first light source portion 13A turned off the light, and from the 13B of secondary light source portion, green light L2 exposes to reference graduation chi 16 once more.Again, the departure corresponding to the position in the hole of the mating holes of reference graduation chi 16 is measured.
At system, control circuit 32, based on the position deviation amount that produces by the transmission error of camera 11, again, by the position deviation amount that the position adjustment of mating holes produces, the revisal amount of drawing position coordinates is detected.Again, based on the revisal amount, the grid data is corrected, and towards the correct drafting position of substrate SW, light is illuminated.
As above-mentioned, according to present embodiment, can move along Y direction (main scanning direction) at camera 11, the drafting table 18 of mounting substrate SW can be in the mobile drawing apparatus of directions X (sub scanning direction), substrate rule 16 is configured along the Y direction, is fixed for base station 12.Again, at camera 11, the light source cell 21 that red light L1, green light L2 are selectively radiated is mounted, and below camera 11, dichronic mirror 15 is set up.
Because reference graduation chi 16 discord are drawn table 18 action integratedly, need not drive and draw table, and under the state of keeping for the position of the camera of substrate, but the scale of measuring basis rule, can be not drawn the error of drive amount of table 18 and influenced and can correctly measure the position information of mating holes.
Secondly, utilize Fig. 8, relevant drawing system as second embodiment is described.In a second embodiment, the light source used of reference graduation chi and the mating holes light source that measures usefulness is set up independently.Formation beyond this is identical with first embodiment.
Fig. 8 is the planimetric map of measurement mechanism in a second embodiment.
At light source cell 21 ', first light source portion, 13 ' A only is set, at the rear of reference graduation chi 16, the 13 ' B of secondary light source portion is set up.Radiated from secondary light source portion 13 ' B green light, the green light in the hole by reference graduation chi 16 is incident to dichronic mirror 15, and by dichronic mirror 15, green light is reflected towards the direction of camera 11.
Secondly, utilize Fig. 9, relevant drawing system as the 3rd embodiment is described.In the 3rd embodiment, dichronic mirror can not move together with camera.Formation beyond this is identical with first embodiment.
Fig. 9 is for roughly being illustrated in the stereographic map of the some of the measurement mechanism among the 3rd embodiment.Dichronic mirror 15 ' and reference graduation chi extend abreast, are fixed by indicating member (not icon) for fence gate columnar structure body 12.Camera 11 moves along dichronic mirror 15 '.
The spacing of reference graduation chi 16, be shaped as arbitrarily, use and also can according to the reference graduation chi of other formation.Just, the spacing in the hole of reference graduation chi 16 should be considered the transmission error of the driving mechanism of camera, the position deviation amount of mating holes etc. and determine, because the Kong Bucong camera view of specific reference graduation chi is fallen through, the deviation in the hole during measurement become half of spacing following as the decision spacing get final product.The reference graduation chi also can in the formation that sub scanning direction is provided with again.
By the optical system beyond the dichronic mirror, prism, red light, green light selectively be directed to constitute as substrate, the reference graduation chi also can.Again, replace red light, green light, use light to get final product, as long as be suitable for the mutual different light in wavelength field for the nonreactive wavelength of the photosensitive material of substrate field.
The spatial light modulation device that replaces DMD etc. is applicable to that the drawing apparatus of the laser beam flying that utilizes polygonal mirror (polygon mirror) etc. also can.
Claims (7)
1. drawing apparatus, this drawing apparatus comprises:
Draw table, the drawn body that the datum mark of position measurement usefulness is set up is carried, and can relatively move along first direction of scanning for base station;
Camera can be mounted along second direction of scanning with the above-mentioned first direction of scanning quadrature movably for above-mentioned base station, measures said reference mark position;
The reference graduation chi is installed in above-mentioned base station, extends along above-mentioned second direction of scanning;
First light source, irradiation measure first illumination light that said reference mark position is used;
Secondary light source, second illumination light that irradiating illumination said reference rule is used with wavelength field different with above-mentioned first illumination light;
Measure and use optical system, above-mentioned first illuminated light guide is caused above-mentioned drawn body and its reflected light is directed to above-mentioned camera, and above-mentioned second illuminated light guide is caused the said reference rule and its reflected light is directed to above-mentioned camera;
Measuring equipment, the position of measurement said reference mark; And
Compensating device, based on the position of the said reference mark that is measured, the position is drawn in revisal.
2. drawing apparatus as claimed in claim 1, wherein above-mentioned measurement comprises with optical system:
First optical system makes above-mentioned first and second illumination light towards above-mentioned drawn body reflection, and its reflected light is directly seen through; And
Second optical system, with above-mentioned first illumination light with and reflected light see through, make above-mentioned second illumination light towards the reflection of above-mentioned reference graduation chi and its reflected light is reflected towards above-mentioned camera.
3. drawing apparatus as claimed in claim 1, wherein above-mentioned measurement comprises with optical system:
The 3rd optical system makes above-mentioned first illumination light towards above-mentioned drawn body reflection, and its reflected light is directly seen through; And
The 4th optical system, make above-mentioned first illumination light with and reflected light see through, above-mentioned second illumination light via the incident of said reference rule is reflected towards above-mentioned camera.
4. drawing apparatus as claimed in claim 1, wherein above-mentioned measurement with optical system comprise with above-mentioned first illumination light with and reflected light sees through, will above-mentioned second illumination light with and the beam-splitting optical system that reflects of reflected light.
5. drawing apparatus as claimed in claim 4, wherein above-mentioned beam-splitting optical system is mounted integratedly towards above-mentioned camera, and above-mentioned measurement can relatively be moved for the said reference rule with optical system and above-mentioned camera.
6. drawing apparatus as claimed in claim 4, wherein above-mentioned beam-splitting optical system are installed in the said reference rule as extending along the said reference rule, and above-mentioned camera can relatively move with optical system and said reference rule for above-mentioned measurement.
7. the measurement mechanism of a drawing apparatus, this measurement mechanism comprises:
Camera can measure the position of the datum mark that is arranged at the drawn body that is equipped on above-mentioned drafting table along for base station, be mounted movably with second direction of scanning of drawing the first direction of scanning quadrature that table relatively moves;
The reference graduation chi is installed in above-mentioned base station, extends along above-mentioned second direction of scanning;
First light source, irradiation measure first illumination light that said reference mark position is used;
Secondary light source, second illumination light that irradiating illumination said reference rule is used with wavelength field different with above-mentioned first illumination light; And
Measure and use optical system, above-mentioned first illuminated light guide is caused above-mentioned drawn body and its reflected light is directed to above-mentioned camera, and above-mentioned second illuminated light guide is caused the said reference rule and its reflected light is directed to above-mentioned camera.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006233675 | 2006-08-30 | ||
| JP2006233675A JP2008058477A (en) | 2006-08-30 | 2006-08-30 | Drawing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101135863A true CN101135863A (en) | 2008-03-05 |
Family
ID=39160002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007101419830A Pending CN101135863A (en) | 2006-08-30 | 2007-08-17 | Drawing apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2008058477A (en) |
| KR (1) | KR20080021497A (en) |
| CN (1) | CN101135863A (en) |
| TW (1) | TW200811619A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104062859A (en) * | 2013-03-21 | 2014-09-24 | 上海微电子装备有限公司 | Lithography equipment aligning system |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5305967B2 (en) * | 2009-02-17 | 2013-10-02 | 株式会社日立ハイテクノロジーズ | Exposure apparatus, exposure method, and manufacturing method of display panel substrate |
| JP5355245B2 (en) * | 2009-06-25 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | Exposure apparatus, exposure method, and manufacturing method of display panel substrate |
| CN108121177B (en) * | 2016-11-29 | 2019-11-22 | 上海微电子装备（集团）股份有限公司 | A kind of alignment measurement systems and alignment methods |
| KR102362864B1 (en) * | 2019-12-26 | 2022-02-14 | 서울대학교산학협력단 | Optical system and method for performing photolithography using dynamic mask |
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2006
- 2006-08-30 JP JP2006233675A patent/JP2008058477A/en active Pending
-
2007
- 2007-08-10 KR KR1020070080558A patent/KR20080021497A/en not_active Application Discontinuation
- 2007-08-10 TW TW096129603A patent/TW200811619A/en unknown
- 2007-08-17 CN CNA2007101419830A patent/CN101135863A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104062859A (en) * | 2013-03-21 | 2014-09-24 | 上海微电子装备有限公司 | Lithography equipment aligning system |
| CN104062859B (en) * | 2013-03-21 | 2016-08-10 | 上海微电子装备有限公司 | A kind of photolithography equipment aligning system |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20080021497A (en) | 2008-03-07 |
| JP2008058477A (en) | 2008-03-13 |
| TW200811619A (en) | 2008-03-01 |
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