CN100572088C - 用于制造能够激光蚀刻的印刷基底的方法 - Google Patents
用于制造能够激光蚀刻的印刷基底的方法 Download PDFInfo
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- CN100572088C CN100572088C CN200580003222.8A CN200580003222A CN100572088C CN 100572088 C CN100572088 C CN 100572088C CN 200580003222 A CN200580003222 A CN 200580003222A CN 100572088 C CN100572088 C CN 100572088C
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- 229940113165 trimethylolpropane Drugs 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- 239000004636 vulcanized rubber Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/18—Coating curved surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/02—Engraving; Heads therefor
- B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
- B41C1/05—Heat-generating engraving heads, e.g. laser beam, electron beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
在蚀刻之后(具有乙醇的BEMCOT)残渣的清除时间量 | 点部分的形状 | |
实例1 | ≤3 | 圆锥形并且优选的 |
实例2 | ≤3 | 圆锥形并且优选的 |
实例3 | ≤3 | 圆锥形并且优选的 |
实例4 | ≤3 | 圆锥形并且优选的 |
实例5 | ≤3 | 圆锥形并且优选的 |
实例6 | ≤3 | 圆锥形并且优选的 |
实例7 | ≤3 | 圆锥形并且优选的 |
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004018472 | 2004-01-27 | ||
JP018472/2004 | 2004-01-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1914048A CN1914048A (zh) | 2007-02-14 |
CN100572088C true CN100572088C (zh) | 2009-12-23 |
Family
ID=34805570
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200580003222.8A Expired - Fee Related CN100572088C (zh) | 2004-01-27 | 2005-01-26 | 用于制造能够激光蚀刻的印刷基底的方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7754415B2 (zh) |
EP (1) | EP1710094B1 (zh) |
JP (1) | JP4493600B2 (zh) |
CN (1) | CN100572088C (zh) |
AT (1) | ATE527109T1 (zh) |
WO (1) | WO2005070692A1 (zh) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090238984A1 (en) * | 2006-05-08 | 2009-09-24 | Yoko Tomita | Cushioning Material for Printing |
US20080229950A1 (en) * | 2007-03-19 | 2008-09-25 | Ping Mei | Seamless imprint roller and method of making |
EP2127896B1 (en) * | 2007-03-20 | 2011-08-17 | Asahi Kasei E-materials Corporation | Method for producing photosensitive resin plate or relief printing plate having recessed and projected pattern, and plate surface treating liquid used in the production method |
DE102007024653A1 (de) * | 2007-05-26 | 2008-12-04 | Forschungszentrum Karlsruhe Gmbh | Stempel für das Mikrokontaktdrucken und Verfahren zu seiner Herstellung |
JP5500831B2 (ja) | 2008-01-25 | 2014-05-21 | 富士フイルム株式会社 | レリーフ印刷版の作製方法及びレーザー彫刻用印刷版原版 |
JP5305793B2 (ja) * | 2008-03-31 | 2013-10-02 | 富士フイルム株式会社 | レリーフ印刷版及びレリーフ印刷版の製造方法 |
US20100075118A1 (en) * | 2008-09-24 | 2010-03-25 | Fujifilm Corporation | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same |
JP5419755B2 (ja) * | 2009-03-27 | 2014-02-19 | 富士フイルム株式会社 | レーザー彫刻用レリーフ印刷版原版、レーザー彫刻用樹脂組成物、レリーフ印刷版、およびレリーフ印刷版の製造方法 |
JP5650902B2 (ja) * | 2009-12-01 | 2015-01-07 | 旭化成イーマテリアルズ株式会社 | ナノインプリント用モールドの露光装置及びナノインプリント用モールドの製造方法 |
CN105504187A (zh) * | 2010-06-16 | 2016-04-20 | 旭硝子株式会社 | 固化性树脂组合物以及使用该组合物的层叠体及其制造方法 |
JP5842433B2 (ja) * | 2011-07-25 | 2016-01-13 | デクセリアルズ株式会社 | 粒子材料の動的粘弾性測定方法 |
US8603725B2 (en) * | 2011-07-28 | 2013-12-10 | Eastman Kodak Company | Laser-engraveable compositions and flexographic printing precursors |
US8941028B2 (en) * | 2012-04-17 | 2015-01-27 | Eastman Kodak Company | System for direct engraving of flexographic printing members |
CA2888186C (en) * | 2012-10-12 | 2018-03-06 | Intellectual Gorilla B.V. | Method for producing a substrate having an image on at least one surface |
EP2746058B1 (en) | 2012-12-18 | 2016-04-27 | Agfa Graphics Nv | Method of preparing a flexographic printing master |
JP6322871B2 (ja) * | 2014-05-16 | 2018-05-16 | 住友ゴム工業株式会社 | フレキソ印刷版とその製造方法、ならびに液晶表示素子の製造方法 |
KR102398130B1 (ko) * | 2014-10-31 | 2022-05-13 | 주식회사 쿠라레 | 연마층용 비다공성 성형체, 연마 패드 및 연마 방법 |
EP3412473B1 (en) * | 2016-02-02 | 2020-02-19 | FUJIFILM Corporation | Cylindrical printing plate, cylindrical printing master plate, method for manufacturing cylindrical printing master plate, and method for manufacturing cylindrical printing plate |
DE102019124814A1 (de) * | 2019-09-16 | 2021-03-18 | Leibniz-Institut für Oberflächenmodifizierung e.V. | Druckform und polymeres Beschichtungsmaterial dafür |
TWI797993B (zh) * | 2022-02-16 | 2023-04-01 | 長春人造樹脂廠股份有限公司 | 光阻膜及其應用 |
CN115431376A (zh) * | 2022-08-16 | 2022-12-06 | 华中科技大学 | 高强度大型复杂陶瓷素坯及其三维喷印成形方法和装备 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5664823A (en) | 1979-11-01 | 1981-06-02 | Asahi Chem Ind Co Ltd | Manufacture of synthetic resin roller having good surface accuracy |
US4641958A (en) * | 1983-09-12 | 1987-02-10 | Wally Joseph H | System and method for projecting multiple images directly onto printing plates |
WO1993003423A1 (en) * | 1991-08-09 | 1993-02-18 | Toyo Ink Manufacturing Co., Ltd. | Photosensitive resin composition, production thereof, and flexographic plate material |
JPH07110555B2 (ja) | 1991-08-30 | 1995-11-29 | 株式会社明治ゴム化成 | オフセット印刷用ブランケットの表面形状の形成方法 |
US5798202A (en) | 1992-05-11 | 1998-08-25 | E. I. Dupont De Nemours And Company | Laser engravable single-layer flexographic printing element |
US5804353A (en) | 1992-05-11 | 1998-09-08 | E. I. Dupont De Nemours And Company | Lasers engravable multilayer flexographic printing element |
JPH08216489A (ja) | 1995-02-10 | 1996-08-27 | General Kk | 印版およびその製造方法 |
US6352804B1 (en) * | 1998-11-06 | 2002-03-05 | Canon Kabushiki Kaisha | Black matrix of resin, method for producing the same, method for producing color filter using the same, and liquid crystal element produced by the same color filter production method |
JP2002079645A (ja) * | 2000-09-05 | 2002-03-19 | Asahi Kasei Corp | シームレスシリンダー印刷版の製造方法 |
US6737216B2 (en) * | 2000-12-08 | 2004-05-18 | E.I. Du Pont De Nemours And Company | Laser engravable flexographic printing element and a method for forming a printing plate from the element |
ATE395193T1 (de) * | 2001-09-05 | 2008-05-15 | Asahi Kasei Chemicals Corp | Lichtempfindliche harzzusammensetzung und lasergravierbares druckelement |
JP2003241397A (ja) * | 2002-02-22 | 2003-08-27 | Asahi Kasei Corp | 印刷用シームレススリーブ体の製造方法および装置 |
CA2435162A1 (en) * | 2002-07-16 | 2004-01-16 | Toyo Boseki Kabushiki Kaisha | Laminate for ir ablation |
EP1642715B1 (en) | 2003-07-09 | 2011-06-08 | Asahi Kasei Chemicals Corporation | Method and device for manufacturing relief printing plate terminal for seamless printing |
TW200532403A (en) * | 2004-02-24 | 2005-10-01 | Nippon Paint Co Ltd | Volume hologram recording photosensitive composition and its use |
-
2005
- 2005-01-26 CN CN200580003222.8A patent/CN100572088C/zh not_active Expired - Fee Related
- 2005-01-26 JP JP2005517307A patent/JP4493600B2/ja not_active Expired - Fee Related
- 2005-01-26 AT AT05704097T patent/ATE527109T1/de not_active IP Right Cessation
- 2005-01-26 EP EP05704097A patent/EP1710094B1/en not_active Not-in-force
- 2005-01-26 US US10/587,403 patent/US7754415B2/en not_active Expired - Fee Related
- 2005-01-26 WO PCT/JP2005/000954 patent/WO2005070692A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US20070178408A1 (en) | 2007-08-02 |
CN1914048A (zh) | 2007-02-14 |
US7754415B2 (en) | 2010-07-13 |
WO2005070692A1 (ja) | 2005-08-04 |
EP1710094A1 (en) | 2006-10-11 |
EP1710094B1 (en) | 2011-10-05 |
EP1710094A4 (en) | 2007-03-28 |
JPWO2005070692A1 (ja) | 2007-09-06 |
ATE527109T1 (de) | 2011-10-15 |
JP4493600B2 (ja) | 2010-06-30 |
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Owner name: ASAHI KASEI ELECTRONICS MATERIALS CO., LTD. Free format text: FORMER OWNER: ASAHI CHEMICAL CORP. Effective date: 20090626 |
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