CN100528487C - 用于抛光制品的抛光垫及抛光方法 - Google Patents

用于抛光制品的抛光垫及抛光方法 Download PDF

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Publication number
CN100528487C
CN100528487C CNB2005800237463A CN200580023746A CN100528487C CN 100528487 C CN100528487 C CN 100528487C CN B2005800237463 A CNB2005800237463 A CN B2005800237463A CN 200580023746 A CN200580023746 A CN 200580023746A CN 100528487 C CN100528487 C CN 100528487C
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CN
China
Prior art keywords
polishing
grooves
axis
polishing pad
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2005800237463A
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English (en)
Chinese (zh)
Other versions
CN1984750A (zh
Inventor
R·V·帕拉帕思
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ROHM AND HAAS ELECTRONIC MATER
Original Assignee
ROHM AND HAAS ELECTRONIC MATER
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Application filed by ROHM AND HAAS ELECTRONIC MATER filed Critical ROHM AND HAAS ELECTRONIC MATER
Publication of CN1984750A publication Critical patent/CN1984750A/zh
Application granted granted Critical
Publication of CN100528487C publication Critical patent/CN100528487C/zh
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Expired - Fee Related legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CNB2005800237463A 2004-07-19 2005-06-30 用于抛光制品的抛光垫及抛光方法 Expired - Fee Related CN100528487C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/894,915 US6958002B1 (en) 2004-07-19 2004-07-19 Polishing pad with flow modifying groove network
US10/894,915 2004-07-19

Publications (2)

Publication Number Publication Date
CN1984750A CN1984750A (zh) 2007-06-20
CN100528487C true CN100528487C (zh) 2009-08-19

Family

ID=34993068

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005800237463A Expired - Fee Related CN100528487C (zh) 2004-07-19 2005-06-30 用于抛光制品的抛光垫及抛光方法

Country Status (5)

Country Link
US (2) US6958002B1 (enExample)
JP (1) JP2008507148A (enExample)
CN (1) CN100528487C (enExample)
TW (1) TW200609079A (enExample)
WO (1) WO2006019541A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7270595B2 (en) * 2004-05-27 2007-09-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad with oscillating path groove network
US7131895B2 (en) * 2005-01-13 2006-11-07 Rohm And Haas Electronic Materials Cmp Holdings, Inc. CMP pad having a radially alternating groove segment configuration
US7182677B2 (en) * 2005-01-14 2007-02-27 Applied Materials, Inc. Chemical mechanical polishing pad for controlling polishing slurry distribution
US7137872B1 (en) * 2005-09-30 2006-11-21 Tcg International Inc. Scratch removal device and method
JP4712539B2 (ja) * 2005-11-24 2011-06-29 ニッタ・ハース株式会社 研磨パッド
US7520798B2 (en) * 2007-01-31 2009-04-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad with grooves to reduce slurry consumption
US20080305719A1 (en) * 2007-06-05 2008-12-11 Tcg International, Inc., Scratch removal device and method
US9180570B2 (en) 2008-03-14 2015-11-10 Nexplanar Corporation Grooved CMP pad
JP5635194B2 (ja) 2010-09-15 2014-12-03 エルジー・ケム・リミテッド Ｃｍｐ用研磨パッド
EP2659951A4 (en) * 2010-12-27 2017-04-26 Asahi Kasei Chemicals Corporation Adsorption/separation membrane module, method for producing adsorption/separation membrane module, and partition member
TWI492818B (zh) * 2011-07-12 2015-07-21 Iv Technologies Co Ltd 研磨墊、研磨方法以及研磨系統
TWI599447B (zh) 2013-10-18 2017-09-21 卡博特微電子公司 具有偏移同心溝槽圖樣之邊緣排除區的ｃｍｐ拋光墊
TWI597125B (zh) 2014-09-25 2017-09-01 三芳化學工業股份有限公司 拋光墊及其製造方法
CN109922923B (zh) * 2016-11-08 2020-10-23 Abb瑞士股份有限公司 抛光工件的方法以及使用该方法的系统
WO2021090122A1 (en) * 2019-11-04 2021-05-14 3M Innovative Properties Company Polishing article, polishing system and method of polishing

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0811051A (ja) 1994-06-28 1996-01-16 Sony Corp 研磨布
US5690540A (en) * 1996-02-23 1997-11-25 Micron Technology, Inc. Spiral grooved polishing pad for chemical-mechanical planarization of semiconductor wafers
US5645469A (en) 1996-09-06 1997-07-08 Advanced Micro Devices, Inc. Polishing pad with radially extending tapered channels
JP3149807B2 (ja) * 1997-01-08 2001-03-26 三菱マテリアル株式会社 ウェーハ研磨装置
US6273806B1 (en) 1997-05-15 2001-08-14 Applied Materials, Inc. Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus
US5921855A (en) 1997-05-15 1999-07-13 Applied Materials, Inc. Polishing pad having a grooved pattern for use in a chemical mechanical polishing system
US6254456B1 (en) * 1997-09-26 2001-07-03 Lsi Logic Corporation Modifying contact areas of a polishing pad to promote uniform removal rates
US6093651A (en) 1997-12-23 2000-07-25 Intel Corporation Polish pad with non-uniform groove depth to improve wafer polish rate uniformity
US5990012A (en) * 1998-01-27 1999-11-23 Micron Technology, Inc. Chemical-mechanical polishing of hydrophobic materials by use of incorporated-particle polishing pads
KR20000025003A (ko) * 1998-10-07 2000-05-06 윤종용 반도체 기판의 화학 기계적 연마에 사용되는 연마 패드
GB2345255B (en) 1998-12-29 2000-12-27 United Microelectronics Corp Chemical-Mechanical Polishing Pad
US20020068516A1 (en) * 1999-12-13 2002-06-06 Applied Materials, Inc Apparatus and method for controlled delivery of slurry to a region of a polishing device
US6241596B1 (en) * 2000-01-14 2001-06-05 Applied Materials, Inc. Method and apparatus for chemical mechanical polishing using a patterned pad
US6838149B2 (en) * 2001-12-13 2005-01-04 3M Innovative Properties Company Abrasive article for the deposition and polishing of a conductive material
JP2003209077A (ja) * 2002-01-15 2003-07-25 Mitsubishi Electric Corp Ｃｍｐ装置及び半導体装置
US7125318B2 (en) * 2003-11-13 2006-10-24 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing pad having a groove arrangement for reducing slurry consumption
US7018274B2 (en) * 2003-11-13 2006-03-28 Rohm And Haas Electronic Materials Cmp Holdings, Inc Polishing pad having slurry utilization enhancing grooves
US6843709B1 (en) * 2003-12-11 2005-01-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing method for reducing slurry reflux
US6843711B1 (en) * 2003-12-11 2005-01-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc Chemical mechanical polishing pad having a process-dependent groove configuration
JP4563025B2 (ja) * 2003-12-19 2010-10-13 東洋ゴム工業株式会社 Ｃｍｐ用研磨パッド、及びそれを用いた研磨方法
US6955587B2 (en) * 2004-01-30 2005-10-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc Grooved polishing pad and method

Also Published As

Publication number Publication date
JP2008507148A (ja) 2008-03-06
CN1984750A (zh) 2007-06-20
US20060014477A1 (en) 2006-01-19
TW200609079A (en) 2006-03-16
US7156721B2 (en) 2007-01-02
WO2006019541A1 (en) 2006-02-23
US6958002B1 (en) 2005-10-25

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20090819

Termination date: 20200630