CN100482853C - 溅射靶 - Google Patents

溅射靶 Download PDF

Info

Publication number
CN100482853C
CN100482853C CNB2005101381162A CN200510138116A CN100482853C CN 100482853 C CN100482853 C CN 100482853C CN B2005101381162 A CNB2005101381162 A CN B2005101381162A CN 200510138116 A CN200510138116 A CN 200510138116A CN 100482853 C CN100482853 C CN 100482853C
Authority
CN
China
Prior art keywords
film
aluminium alloy
precipitate
contact resistance
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2005101381162A
Other languages
English (en)
Chinese (zh)
Other versions
CN1804110A (zh
Inventor
后藤裕史
钉宫敏洋
中井淳一
富久胜文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Publication of CN1804110A publication Critical patent/CN1804110A/zh
Application granted granted Critical
Publication of CN100482853C publication Critical patent/CN100482853C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

CNB2005101381162A 2002-12-19 2003-12-19 溅射靶 Expired - Fee Related CN100482853C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002368786 2002-12-19
JP2002368786 2002-12-19
JP2003274288 2003-07-14

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNB2003101231240A Division CN1315003C (zh) 2002-12-19 2003-12-19 电子器件及其制造方法、溅射靶

Publications (2)

Publication Number Publication Date
CN1804110A CN1804110A (zh) 2006-07-19
CN100482853C true CN100482853C (zh) 2009-04-29

Family

ID=36866252

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005101381162A Expired - Fee Related CN100482853C (zh) 2002-12-19 2003-12-19 溅射靶

Country Status (2)

Country Link
JP (1) JP2011209756A (ja)
CN (1) CN100482853C (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5432550B2 (ja) * 2008-03-31 2014-03-05 株式会社コベルコ科研 Ａｌ基合金スパッタリングターゲットおよびその製造方法
JP2010135300A (ja) * 2008-11-10 2010-06-17 Kobe Steel Ltd 有機ｅｌディスプレイ用の反射アノード電極およびその製造方法
JP5778786B2 (ja) * 2012-01-17 2015-09-16 株式会社Ｊｏｌｅｄ 薄膜トランジスタアレイ装置及びそれを用いたｅｌ表示装置
JP6647898B2 (ja) * 2016-02-05 2020-02-14 株式会社コベルコ科研 紫外線反射膜およびスパッタリングターゲット
KR102398578B1 (ko) * 2017-12-04 2022-05-16 아크소프트 코포레이션 리미티드 지문인식 기능을 구비한 디스플레이

Also Published As

Publication number Publication date
JP2011209756A (ja) 2011-10-20
CN1804110A (zh) 2006-07-19

Similar Documents

Publication Publication Date Title
US7098539B2 (en) Electronic device, method of manufacture of the same, and sputtering target
JP4117002B2 (ja) 薄膜トランジスタ基板および表示デバイス
CN101335203B (zh) 层叠构造及其制造方法
CN100499137C (zh) 源极/漏极电极、晶体管衬底及其制造方法和显示装置
JP4542008B2 (ja) 表示デバイス
JP3961172B2 (ja) 酸化物透明導電膜と酸化物透明導電膜形成用ターゲットおよび先の酸化物透明導電膜を備えた基板の製造方法と電子機器および液晶表示装置
KR20080114573A (ko) 표시 장치 및 표시 장치의 제조 방법
CN101512622A (zh) 显示装置
WO2000036641A1 (en) Wiring, thin-film transistor substrate with the wiring, method of manufacture thereof, and liquid crystal display device
JP2009105424A (ja) 薄膜トランジスタ基板および表示デバイス
JPWO2008044757A1 (ja) 導電膜形成方法、薄膜トランジスタ、薄膜トランジスタ付パネル、及び薄膜トランジスタの製造方法
JP2007081385A (ja) ソース−ドレイン電極、トランジスタ基板およびその製造方法、並びに表示デバイス
KR100720087B1 (ko) 표시 소자용 배선 및 이를 이용한 박막 트랜지스터 기판및 그 제조 방법
CN103782374A (zh) 显示装置用配线结构
CN100482853C (zh) 溅射靶
JP4886285B2 (ja) 表示デバイス
KR20100060003A (ko) 표시 장치 및 이것에 사용하는 Ｃｕ 합금막
JP5368717B2 (ja) 表示装置およびこれに用いるＣｕ合金膜
JP4224661B2 (ja) 銅配線基板及びその製造方法並びに液晶表示装置
JPH0335524A (ja) 半導体装置
KR100799824B1 (ko) 소스/드레인 전극, 트랜지스터 기판 및 그의 제조 방법, 및표시 디바이스
JP2008124483A (ja) 薄膜トランジスタ基板および表示デバイス
JP2006339666A (ja) アルミニウム合金膜形成用スパッタリングターゲット

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20090429

Termination date: 20161219