CN100480423C - 无电镀方法和形成镀膜的非导电性被镀物 - Google Patents
无电镀方法和形成镀膜的非导电性被镀物 Download PDFInfo
- Publication number
- CN100480423C CN100480423C CNB2005800008197A CN200580000819A CN100480423C CN 100480423 C CN100480423 C CN 100480423C CN B2005800008197 A CNB2005800008197 A CN B2005800008197A CN 200580000819 A CN200580000819 A CN 200580000819A CN 100480423 C CN100480423 C CN 100480423C
- Authority
- CN
- China
- Prior art keywords
- conductive
- plated
- conductive medium
- medium
- electroless plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007747 plating Methods 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 54
- 238000007772 electroless plating Methods 0.000 title claims abstract description 29
- 229910052751 metal Inorganic materials 0.000 claims abstract description 41
- 239000002184 metal Substances 0.000 claims abstract description 40
- 230000003197 catalytic effect Effects 0.000 claims abstract description 27
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 238000000576 coating method Methods 0.000 claims abstract description 8
- 239000003638 chemical reducing agent Substances 0.000 claims abstract 10
- 230000001747 exhibiting effect Effects 0.000 claims abstract 3
- 238000007254 oxidation reaction Methods 0.000 claims abstract 3
- 229910052759 nickel Inorganic materials 0.000 claims description 24
- 229910052737 gold Inorganic materials 0.000 claims description 23
- 229910052697 platinum Inorganic materials 0.000 claims description 16
- 239000000956 alloy Substances 0.000 claims description 12
- 229910045601 alloy Inorganic materials 0.000 claims description 12
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 229910052709 silver Inorganic materials 0.000 claims description 9
- -1 aldehyde compounds Chemical class 0.000 claims description 8
- 150000001639 boron compounds Chemical class 0.000 claims description 7
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 6
- 150000002830 nitrogen compounds Chemical class 0.000 claims description 6
- 150000003016 phosphoric acids Chemical class 0.000 claims description 3
- 230000001603 reducing effect Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 230000002829 reductive effect Effects 0.000 abstract description 44
- 239000003054 catalyst Substances 0.000 abstract description 7
- 238000000151 deposition Methods 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 description 41
- 239000004020 conductor Substances 0.000 description 15
- 230000001376 precipitating effect Effects 0.000 description 15
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 14
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 230000001590 oxidative effect Effects 0.000 description 12
- 239000010949 copper Substances 0.000 description 10
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000615 nonconductor Substances 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 238000005844 autocatalytic reaction Methods 0.000 description 5
- 230000001464 adherent effect Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 229910018104 Ni-P Inorganic materials 0.000 description 3
- 229910018536 Ni—P Inorganic materials 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 230000005518 electrochemistry Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000012279 sodium borohydride Substances 0.000 description 2
- 229910000033 sodium borohydride Inorganic materials 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- 229910000521 B alloy Inorganic materials 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1637—Composition of the substrate metallic substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004279707 | 2004-09-27 | ||
JP279707/2004 | 2004-09-27 | ||
PCT/JP2005/015066 WO2006035556A1 (ja) | 2004-09-27 | 2005-08-18 | 無電解めっき方法、およびめっき皮膜が形成された非導電性被めっき物 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1842615A CN1842615A (zh) | 2006-10-04 |
CN100480423C true CN100480423C (zh) | 2009-04-22 |
Family
ID=36118709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005800008197A Expired - Fee Related CN100480423C (zh) | 2004-09-27 | 2005-08-18 | 无电镀方法和形成镀膜的非导电性被镀物 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4311449B2 (enrdf_load_stackoverflow) |
KR (1) | KR100760254B1 (enrdf_load_stackoverflow) |
CN (1) | CN100480423C (enrdf_load_stackoverflow) |
TW (1) | TW200619419A (enrdf_load_stackoverflow) |
WO (1) | WO2006035556A1 (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5445818B2 (ja) * | 2008-04-28 | 2014-03-19 | 日立化成株式会社 | 無電解めっき方法及び活性化前処理方法 |
JP5408462B2 (ja) * | 2008-04-28 | 2014-02-05 | 日立化成株式会社 | 無電解めっき方法及び活性化前処理方法 |
WO2015076549A1 (ko) * | 2013-11-22 | 2015-05-28 | 한국생산기술연구원 | 무전해 구리 도금액 조성물 및 이를 이용한 무전해 구리 도금방법 |
KR101612476B1 (ko) | 2013-11-22 | 2016-04-14 | 한국생산기술연구원 | 무전해 구리 도금액 조성물 및 이를 이용한 무전해 구리 도금방법 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50118931A (enrdf_load_stackoverflow) * | 1974-03-04 | 1975-09-18 | ||
DE3168835D1 (en) * | 1981-02-21 | 1985-03-21 | Enghofer Metallwaren | Combination spectacles |
US5227223A (en) * | 1989-12-21 | 1993-07-13 | Monsanto Company | Fabricating metal articles from printed images |
JP2000264761A (ja) * | 1999-03-16 | 2000-09-26 | Mitsuboshi Belting Ltd | セラミックス基材メッキ用表面処理剤および該処理剤を用いたメッキ方法 |
-
2005
- 2005-08-18 JP JP2006537647A patent/JP4311449B2/ja not_active Expired - Fee Related
- 2005-08-18 WO PCT/JP2005/015066 patent/WO2006035556A1/ja active Application Filing
- 2005-08-18 KR KR1020067004667A patent/KR100760254B1/ko not_active Expired - Fee Related
- 2005-08-18 CN CNB2005800008197A patent/CN100480423C/zh not_active Expired - Fee Related
- 2005-08-26 TW TW094129384A patent/TW200619419A/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20060069488A (ko) | 2006-06-21 |
TWI305238B (enrdf_load_stackoverflow) | 2009-01-11 |
JP4311449B2 (ja) | 2009-08-12 |
CN1842615A (zh) | 2006-10-04 |
JPWO2006035556A1 (ja) | 2008-05-15 |
WO2006035556A1 (ja) | 2006-04-06 |
TW200619419A (en) | 2006-06-16 |
KR100760254B1 (ko) | 2007-09-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100497077B1 (ko) | 전자부품의 제조방법 및 전자부품, 무전해 도금 방법 | |
JPS5913059A (ja) | 無電気めつきのための前処理方法 | |
US20020197404A1 (en) | Method of activating non-conductive substrate for use in electroless deposition | |
EP2034049A1 (en) | An electroless process for depositing a metal on a non-catalytic substrate | |
EP0680523A1 (en) | Preparation of alumina ceramic surfaces for electroless and electrochemical metal deposition | |
CN100480423C (zh) | 无电镀方法和形成镀膜的非导电性被镀物 | |
JP3678196B2 (ja) | チップ型電子部品の製造方法、及びチップ型電子部品 | |
JP4914012B2 (ja) | 構造体の製造方法 | |
JP5408462B2 (ja) | 無電解めっき方法及び活性化前処理方法 | |
CN101693992B (zh) | 自催化无电工艺的稳定和性能 | |
EP4204599A1 (en) | Method for electroless nickel deposition onto copper without activation with palladium | |
JP4232012B2 (ja) | めっき方法、及び電子部品の製造方法 | |
JP4670064B2 (ja) | 無電解めっき用触媒付与方法 | |
JP5445818B2 (ja) | 無電解めっき方法及び活性化前処理方法 | |
JP2002180260A (ja) | 無電解ニッケルめっきによるニッケル被膜の形成方法 | |
JPH06256961A (ja) | 無電解めっき用触媒、その製造方法及び無電解めっき法 | |
EP0070061B1 (en) | A solution for the electroless deposition of gold-alloys onto a substrate | |
JPH083752A (ja) | 電磁誘導加熱式無電解めっき方法 | |
JP5364880B2 (ja) | クロム酸−硫酸混液によるエッチング処理の後処理剤 | |
JP2003226981A (ja) | 電子部品のめっき方法、及び電子部品 | |
JP2003231972A (ja) | 電子部品の製造方法、及び電子部品 | |
WO2012158056A1 (ru) | Способ нанесения нанокристаллического покрытия из металлов и сплавов на металлические детали | |
Baudrand | Electroless Palladium, Past & Future | |
JP2009263745A (ja) | 無電解金めっき方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090422 |
|
CF01 | Termination of patent right due to non-payment of annual fee |