KR100760254B1 - 무전해 도금방법, 및 도금피막이 형성된 비도전성 피도금물 - Google Patents

무전해 도금방법, 및 도금피막이 형성된 비도전성 피도금물 Download PDF

Info

Publication number
KR100760254B1
KR100760254B1 KR1020067004667A KR20067004667A KR100760254B1 KR 100760254 B1 KR100760254 B1 KR 100760254B1 KR 1020067004667 A KR1020067004667 A KR 1020067004667A KR 20067004667 A KR20067004667 A KR 20067004667A KR 100760254 B1 KR100760254 B1 KR 100760254B1
Authority
KR
South Korea
Prior art keywords
conductive
plated
plating
conductive medium
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067004667A
Other languages
English (en)
Korean (ko)
Other versions
KR20060069488A (ko
Inventor
타츠오 쿠니시
Original Assignee
가부시키가이샤 무라타 세이사쿠쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 무라타 세이사쿠쇼 filed Critical 가부시키가이샤 무라타 세이사쿠쇼
Publication of KR20060069488A publication Critical patent/KR20060069488A/ko
Application granted granted Critical
Publication of KR100760254B1 publication Critical patent/KR100760254B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • C23C18/1637Composition of the substrate metallic substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • C23C18/44Coating with noble metals using reducing agents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48Coating with alloys

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
KR1020067004667A 2004-09-27 2005-08-18 무전해 도금방법, 및 도금피막이 형성된 비도전성 피도금물 Expired - Fee Related KR100760254B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004279707 2004-09-27
JPJP-P-2004-00279707 2004-09-27
PCT/JP2005/015066 WO2006035556A1 (ja) 2004-09-27 2005-08-18 無電解めっき方法、およびめっき皮膜が形成された非導電性被めっき物

Publications (2)

Publication Number Publication Date
KR20060069488A KR20060069488A (ko) 2006-06-21
KR100760254B1 true KR100760254B1 (ko) 2007-09-19

Family

ID=36118709

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067004667A Expired - Fee Related KR100760254B1 (ko) 2004-09-27 2005-08-18 무전해 도금방법, 및 도금피막이 형성된 비도전성 피도금물

Country Status (5)

Country Link
JP (1) JP4311449B2 (enrdf_load_stackoverflow)
KR (1) KR100760254B1 (enrdf_load_stackoverflow)
CN (1) CN100480423C (enrdf_load_stackoverflow)
TW (1) TW200619419A (enrdf_load_stackoverflow)
WO (1) WO2006035556A1 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015076549A1 (ko) * 2013-11-22 2015-05-28 한국생산기술연구원 무전해 구리 도금액 조성물 및 이를 이용한 무전해 구리 도금방법
KR101612476B1 (ko) 2013-11-22 2016-04-14 한국생산기술연구원 무전해 구리 도금액 조성물 및 이를 이용한 무전해 구리 도금방법

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5445818B2 (ja) * 2008-04-28 2014-03-19 日立化成株式会社 無電解めっき方法及び活性化前処理方法
JP5408462B2 (ja) * 2008-04-28 2014-02-05 日立化成株式会社 無電解めっき方法及び活性化前処理方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50118931A (enrdf_load_stackoverflow) 1974-03-04 1975-09-18
EP0058772B1 (de) * 1981-02-21 1985-02-06 Karl Enghofer Metallwarenfabrik GmbH Kombinationsbrille
JP2000264761A (ja) * 1999-03-16 2000-09-26 Mitsuboshi Belting Ltd セラミックス基材メッキ用表面処理剤および該処理剤を用いたメッキ方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5227223A (en) * 1989-12-21 1993-07-13 Monsanto Company Fabricating metal articles from printed images

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50118931A (enrdf_load_stackoverflow) 1974-03-04 1975-09-18
EP0058772B1 (de) * 1981-02-21 1985-02-06 Karl Enghofer Metallwarenfabrik GmbH Kombinationsbrille
JP2000264761A (ja) * 1999-03-16 2000-09-26 Mitsuboshi Belting Ltd セラミックス基材メッキ用表面処理剤および該処理剤を用いたメッキ方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015076549A1 (ko) * 2013-11-22 2015-05-28 한국생산기술연구원 무전해 구리 도금액 조성물 및 이를 이용한 무전해 구리 도금방법
KR101612476B1 (ko) 2013-11-22 2016-04-14 한국생산기술연구원 무전해 구리 도금액 조성물 및 이를 이용한 무전해 구리 도금방법

Also Published As

Publication number Publication date
CN100480423C (zh) 2009-04-22
KR20060069488A (ko) 2006-06-21
TWI305238B (enrdf_load_stackoverflow) 2009-01-11
JP4311449B2 (ja) 2009-08-12
CN1842615A (zh) 2006-10-04
JPWO2006035556A1 (ja) 2008-05-15
WO2006035556A1 (ja) 2006-04-06
TW200619419A (en) 2006-06-16

Similar Documents

Publication Publication Date Title
KR100497077B1 (ko) 전자부품의 제조방법 및 전자부품, 무전해 도금 방법
US6645557B2 (en) Metallization of non-conductive surfaces with silver catalyst and electroless metal compositions
EP1343921B1 (en) Method for electroless nickel plating
US6855191B2 (en) Electroless gold plating solution
US9228262B2 (en) Plating catalyst and method
US5212138A (en) Low corrosivity catalyst for activation of copper for electroless nickel plating
JPH0539580A (ja) 無電解パラジウムめつき液
JP2011225929A (ja) 無電解めっき法で用いる触媒溶液、その触媒溶液の調製方法及びその触媒溶液を用いた無電解めっき法並びにその無電解めっき法を用いて形成した金属皮膜を備える金属層付被めっき物
JPS60190571A (ja) 無電解銅めつき方法
KR100760254B1 (ko) 무전해 도금방법, 및 도금피막이 형성된 비도전성 피도금물
US5219815A (en) Low corrosivity catalyst containing ammonium ions for activation of copper for electroless nickel plating
EP2610365A2 (en) Plating catalyst and method
KR20230056751A (ko) 팔라듐에 의한 활성화가 없는 구리 상에서 무전해 니켈 증착 방법
JP4670064B2 (ja) 無電解めっき用触媒付与方法
JP4232012B2 (ja) めっき方法、及び電子部品の製造方法
JP2002309376A (ja) 無電解銅めっき用触媒付与方法
JP2002180260A (ja) 無電解ニッケルめっきによるニッケル被膜の形成方法
RU2382831C1 (ru) Способ нанесения покрытия из золота и его сплавов на металлические детали и композиции ингредиентов для осуществления способа
CA1169304A (en) Preparing substrate surface for electroless plating
JP5364880B2 (ja) クロム酸−硫酸混液によるエッチング処理の後処理剤
CA1176118A (en) Preparing substrate surface for electroless plating and products produced thereby
JPH06128751A (ja) 無電解金めっき方法
WO2012158056A1 (ru) Способ нанесения нанокристаллического покрытия из металлов и сплавов на металлические детали
JPH04228577A (ja) 銅または溶融タングステンのような表面へのニッケルの無電解メッキ
JPS62158882A (ja) 無電解銅めつき方法

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

G170 Re-publication after modification of scope of protection [patent]
PG1701 Publication of correction

St.27 status event code: A-5-5-P10-P19-oth-PG1701

Patent document republication publication date: 20080417

Republication note text: Request for Correction Notice (Document Request)

Gazette number: 1007602540000

Gazette reference publication date: 20070919

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20120821

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20130819

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20140826

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20150904

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

FPAY Annual fee payment

Payment date: 20160902

Year of fee payment: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

FPAY Annual fee payment

Payment date: 20170901

Year of fee payment: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

FPAY Annual fee payment

Payment date: 20190906

Year of fee payment: 13

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 13

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 14

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20210914

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20210914