CN100475447C - 抛光垫的基垫和包括该基垫的多层垫 - Google Patents

抛光垫的基垫和包括该基垫的多层垫 Download PDF

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Publication number
CN100475447C
CN100475447C CNB2005800014836A CN200580001483A CN100475447C CN 100475447 C CN100475447 C CN 100475447C CN B2005800014836 A CNB2005800014836 A CN B2005800014836A CN 200580001483 A CN200580001483 A CN 200580001483A CN 100475447 C CN100475447 C CN 100475447C
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CN
China
Prior art keywords
base wad
polishing
pad
make
base
Prior art date
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Active
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CNB2005800014836A
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English (en)
Chinese (zh)
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CN1905993A (zh
Inventor
宋侑真
李宙悦
金成民
金载皙
李炫雨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Li Hong Yashi Co. Ltd. love
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SKC Co Ltd
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Publication of CN1905993A publication Critical patent/CN1905993A/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21J—FORGING; HAMMERING; PRESSING METAL; RIVETING; FORGE FURNACES
    • B21J13/00—Details of machines for forging, pressing, or hammering
    • B21J13/08—Accessories for handling work or tools
    • B21J13/10—Manipulators

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CNB2005800014836A 2004-02-17 2005-02-16 抛光垫的基垫和包括该基垫的多层垫 Active CN100475447C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020040010492 2004-02-17
KR20040010492 2004-02-17
KR1020040016402 2004-03-11

Publications (2)

Publication Number Publication Date
CN1905993A CN1905993A (zh) 2007-01-31
CN100475447C true CN100475447C (zh) 2009-04-08

Family

ID=37268614

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005800014836A Active CN100475447C (zh) 2004-02-17 2005-02-16 抛光垫的基垫和包括该基垫的多层垫

Country Status (3)

Country Link
KR (1) KR100545795B1 (ko)
CN (1) CN100475447C (ko)
AT (1) ATE509734T1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101850541B (zh) * 2009-04-02 2013-05-08 贝达先进材料股份有限公司 具有阻绝层的抛光垫和其制造方法
US10071461B2 (en) * 2014-04-03 2018-09-11 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same
CN108247529B (zh) * 2018-04-02 2020-11-10 上海欧柏森环境工程管理有限公司 一种石材抛光、结晶、研磨、清洁垫

Also Published As

Publication number Publication date
KR100545795B1 (ko) 2006-01-24
CN1905993A (zh) 2007-01-31
KR20050082142A (ko) 2005-08-22
ATE509734T1 (de) 2011-06-15

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Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
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Effective date of registration: 20160712

Address after: South Korea Sejong City

Patentee after: Li Hong Yashi Co. Ltd. love

Address before: Gyeonggi Do Korea Suwon

Patentee before: SKC Ltd.