CH674201A5 - - Google Patents
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- Publication number
- CH674201A5 CH674201A5 CH4961/87A CH496187A CH674201A5 CH 674201 A5 CH674201 A5 CH 674201A5 CH 4961/87 A CH4961/87 A CH 4961/87A CH 496187 A CH496187 A CH 496187A CH 674201 A5 CH674201 A5 CH 674201A5
- Authority
- CH
- Switzerland
- Prior art keywords
- glass
- radiation
- less
- lines
- sheet
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
- G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
- G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
- G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
- G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
- G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
- G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
- G11B11/10584—Record carriers characterised by the selection of the material or by the structure or form characterised by the form, e.g. comprising mechanical protection elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/2457—Parallel ribs and/or grooves
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24595—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness and varying density
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Surface Treatment Of Glass (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LU86722A LU86722A1 (fr) | 1986-12-23 | 1986-12-23 | Feuille en matiere vitreuse portant un dessin grave et procede pour graver un dessin sur un substrat en matiere vitreuse |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH674201A5 true CH674201A5 (en:Method) | 1990-05-15 |
Family
ID=19730844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH4961/87A CH674201A5 (en:Method) | 1986-12-23 | 1987-12-18 |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US4797316A (en:Method) |
| JP (1) | JPS63170249A (en:Method) |
| KR (1) | KR880007389A (en:Method) |
| CN (1) | CN1024182C (en:Method) |
| AU (1) | AU590187B2 (en:Method) |
| BE (1) | BE1003081A3 (en:Method) |
| CA (1) | CA1329507C (en:Method) |
| CH (1) | CH674201A5 (en:Method) |
| DE (1) | DE3742374A1 (en:Method) |
| DK (1) | DK685887A (en:Method) |
| ES (1) | ES2005764A6 (en:Method) |
| FR (1) | FR2608589B1 (en:Method) |
| GB (1) | GB2200595B (en:Method) |
| IE (1) | IE60072B1 (en:Method) |
| IT (1) | IT1211588B (en:Method) |
| LU (1) | LU86722A1 (en:Method) |
| NL (1) | NL8703054A (en:Method) |
| SE (1) | SE467477B (en:Method) |
Families Citing this family (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1313792C (en) * | 1986-02-28 | 1993-02-23 | Junji Hirokane | Method of manufacturing photo-mask and photo-mask manufactured thereby |
| US4842633A (en) * | 1987-08-25 | 1989-06-27 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing molds for molding optical glass elements and diffraction gratings |
| JPS6486344A (en) * | 1987-09-29 | 1989-03-31 | Victor Company Of Japan | Information recording carrier and production thereof |
| JPH0770094B2 (ja) * | 1987-12-04 | 1995-07-31 | シャープ株式会社 | ディスク状光記録媒体の製造方法および製造用フォトマスク |
| DE3824889A1 (de) * | 1988-07-22 | 1990-01-25 | Leybold Ag | Optischer aufzeichnungstraeger |
| US5053106A (en) * | 1988-10-12 | 1991-10-01 | Occidental Chemical Corporation | Low friction, wear resistant plastic parts |
| US4909818A (en) * | 1988-11-16 | 1990-03-20 | Jones William F | System and process for making diffractive contact |
| JPH0692263B2 (ja) * | 1989-02-16 | 1994-11-16 | 伊藤忠商事株式会社 | 記録ディスク基板及びその製造方法 |
| US5238500A (en) * | 1990-05-15 | 1993-08-24 | Semitool, Inc. | Aqueous hydrofluoric and hydrochloric acid vapor processing of semiconductor wafers |
| US5357991A (en) * | 1989-03-27 | 1994-10-25 | Semitool, Inc. | Gas phase semiconductor processor with liquid phase mixing |
| FR2654864B1 (fr) * | 1989-11-21 | 1995-08-04 | Digipress Sa | Procede pour la fabrication d'un disque a lecture optique et disques obtenus par ce procede. |
| US6375741B2 (en) * | 1991-03-06 | 2002-04-23 | Timothy J. Reardon | Semiconductor processing spray coating apparatus |
| FR2663439A1 (fr) * | 1990-06-15 | 1991-12-20 | Digipress Sa | Procede pour le traitement et en particulier la gravure d'un substrat et substrat obtenu par ce procede. |
| DE4029099A1 (de) * | 1990-09-13 | 1992-04-09 | Technics Plasma Gmbh | Verfahren zum herstellen von spritzgussmatritzen |
| US5374291A (en) * | 1991-12-10 | 1994-12-20 | Director-General Of Agency Of Industrial Science And Technology | Method of processing photosensitive glass |
| DE4141869B4 (de) * | 1991-12-18 | 2005-11-10 | Director General Of Agency Of Industrial Science And Technology | Verfahren zur Bearbeitung von lichtempfindlichem Glas |
| US5246540A (en) * | 1992-04-01 | 1993-09-21 | Tru Vue, Inc. | Apparatus and method for etching glass |
| EP0579399A2 (en) * | 1992-07-09 | 1994-01-19 | Pilkington Plc | Glass substrate for a magnetic disc and manufacture thereof |
| US5417799A (en) * | 1993-09-20 | 1995-05-23 | Hughes Aircraft Company | Reactive ion etching of gratings and cross gratings structures |
| GB9400259D0 (en) * | 1994-01-07 | 1994-03-02 | Pilkington Plc | Substrate for a magnetic disc and manufacture thereof |
| US5954911A (en) * | 1995-10-12 | 1999-09-21 | Semitool, Inc. | Semiconductor processing using vapor mixtures |
| US6023318A (en) * | 1996-04-15 | 2000-02-08 | Canon Kabushiki Kaisha | Electrode plate, process for producing the plate, liquid crystal device including the plate and process for producing the device |
| DE19713014C2 (de) * | 1997-03-27 | 1999-01-21 | Heraeus Quarzglas | Bauteil aus Quarzglas für die Verwendung bei der Halbleiterherstellung |
| JPH10320835A (ja) * | 1997-05-19 | 1998-12-04 | Nikon Corp | 光ディスク |
| JP3938253B2 (ja) * | 1997-12-26 | 2007-06-27 | 日本板硝子株式会社 | 樹脂正立等倍レンズアレイおよびその製造方法 |
| US6687197B1 (en) * | 1999-09-20 | 2004-02-03 | Fujitsu Limited | High density information recording medium and slider having rare earth metals |
| JP4380004B2 (ja) * | 2000-02-28 | 2009-12-09 | ソニー株式会社 | 記録媒体の製造方法、および記録媒体製造用原盤の製造方法 |
| WO2001084242A1 (en) | 2000-05-03 | 2001-11-08 | Caliper Technologies Corp. | Multi depth substrate fabrication processes |
| US6872511B2 (en) * | 2001-02-16 | 2005-03-29 | Sharp Kabushiki Kaisha | Method for forming micropatterns |
| JP4610770B2 (ja) * | 2001-03-30 | 2011-01-12 | キヤノン株式会社 | 光ディスク原盤の製造方法 |
| US7666579B1 (en) * | 2001-09-17 | 2010-02-23 | Serenity Technologies, Inc. | Method and apparatus for high density storage of analog data in a durable medium |
| JP2004051393A (ja) * | 2002-07-17 | 2004-02-19 | Nippon Sheet Glass Co Ltd | 強化ガラスの製造方法、及びこれに用いるガラス板の強制冷却設備 |
| JP4994576B2 (ja) * | 2004-03-23 | 2012-08-08 | コバレントマテリアル株式会社 | シリカガラスルツボ |
| CN1297504C (zh) * | 2005-05-10 | 2007-01-31 | 李守进 | 能随视角变换图案的深度刻蚀玻璃的生产方法 |
| CN101198904B (zh) * | 2005-05-10 | 2011-04-13 | 陶氏康宁公司 | 亚微米印花转移光刻术 |
| DE102005049280A1 (de) * | 2005-10-14 | 2007-06-14 | Friedrich-Schiller-Universität Jena | Verfahren zur Erzeugung einer Nanostruktur und optisches Element mit einer Nanostruktur |
| JP4757339B2 (ja) * | 2009-09-18 | 2011-08-24 | 長瀬産業株式会社 | 表面に凹凸が形成されたガラス、及び、その製造方法 |
| CN102736294A (zh) * | 2011-04-13 | 2012-10-17 | 京东方科技集团股份有限公司 | 一种基板、液晶显示面板及其制造方法 |
| TWI547455B (zh) * | 2011-04-15 | 2016-09-01 | Asahi Glass Co Ltd | Antireflective glass matrix |
| JP5877705B2 (ja) * | 2011-12-27 | 2016-03-08 | 旭化成イーマテリアルズ株式会社 | 微細パターン構造体の製造方法 |
| US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| KR20170011979A (ko) * | 2015-07-24 | 2017-02-02 | (주)도 은 | 패턴을 갖는 투명 유리 |
| CN105712637A (zh) * | 2016-04-11 | 2016-06-29 | 广东欧珀移动通信有限公司 | 透明片材、制备方法以及电子设备 |
| KR101749598B1 (ko) | 2016-04-19 | 2017-06-22 | (주)유티아이 | 노출패턴이 구현된 카메라 윈도우의 제조방법 및 그에 의해 제조된 노출패턴이 구현된 카메라 윈도우 |
| TWI821234B (zh) | 2018-01-09 | 2023-11-11 | 美商康寧公司 | 具光改變特徵之塗覆製品及用於製造彼等之方法 |
| US20220073424A1 (en) * | 2018-11-14 | 2022-03-10 | Saint-Gobain Glass France | Method for the selective etching of a layer or a stack of layers on a glass substrate |
| JP7246663B2 (ja) | 2019-08-14 | 2023-03-28 | セラミック・データ・ソリューションズ・ゲーエムベーハー | 情報の長期記憶方法および同方法に用いる記憶媒体 |
| CA3184849A1 (en) | 2020-07-03 | 2022-01-06 | Martin Kunze | Information storage method and information storage medium with increased storage density by multi-bit coding |
| CA3184431A1 (en) | 2020-07-03 | 2022-01-06 | Christian Pflaum | Increased storage capacity for a method for long-term storage of information and storage medium therefor |
| US12147009B2 (en) | 2020-07-09 | 2024-11-19 | Corning Incorporated | Textured region to reduce specular reflectance including a low refractive index substrate with higher elevated surfaces and lower elevated surfaces and a high refractive index material disposed on the lower elevated surfaces |
| EP3955248B1 (en) | 2020-08-11 | 2025-12-17 | Ceramic Data Solutions GmbH | Data recording on ceramic material |
| EP4044182B1 (en) * | 2021-02-12 | 2025-12-31 | Ceramic Data Solutions GmbH | ULTRA-THIN DATA STORAGE |
| DE202022003246U1 (de) * | 2021-02-12 | 2025-08-11 | Ceramic Data Solutions GmbH | Ultradünner Datenträger |
| JP7737651B2 (ja) | 2021-03-16 | 2025-09-11 | セラミック・データ・ソリューションズ・ゲーエムベーハー | 超解像技術を利用したデータキャリア、読出方法およびシステム |
| CN113087405A (zh) * | 2021-04-07 | 2021-07-09 | 惠州市清洋实业有限公司 | 一种钢化玻璃小r角深度刻蚀液及其刻蚀方法 |
| CN113087404A (zh) * | 2021-04-07 | 2021-07-09 | 惠州市清洋实业有限公司 | 一种钢化玻璃大r角深度刻蚀液及其刻蚀方法 |
| EP4101154B1 (en) | 2021-04-29 | 2023-06-28 | Ceramic Data Solutions GmbH | Hybrid digital and analog data storage |
| EP4092464B1 (en) | 2021-05-17 | 2025-03-26 | Ceramic Data Solutions GmbH | High-speed reading by combining transmissive wide angle view with reflective focus view |
| CN114057411A (zh) * | 2021-11-05 | 2022-02-18 | 北京理工大学 | 一种降低石英表面粗糙度至亚纳米量级的方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3817730A (en) * | 1969-12-29 | 1974-06-18 | Nippon Electric Co | Method of making optical lines in dielectric body |
| CH589306A5 (en:Method) * | 1975-06-27 | 1977-06-30 | Bbc Brown Boveri & Cie | |
| US4046619A (en) * | 1976-05-03 | 1977-09-06 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of treating the surface of a glass member |
| US4544443A (en) * | 1983-05-13 | 1985-10-01 | Shap Kabushiki Kaisha | Method for manufacturing an optical memory element |
| JPH0648546B2 (ja) * | 1984-07-14 | 1994-06-22 | 日本ビクター株式会社 | 情報記録担体の製造法 |
| DE3511712C2 (de) * | 1985-03-29 | 1995-09-07 | Polygram Gmbh | Plattenförmiger Informationsträger und Verfahren zu seiner Herstellung |
| JPS62128944A (ja) * | 1985-11-27 | 1987-06-11 | Sharp Corp | 光メモリ素子 |
| JPS62187143A (ja) * | 1986-02-13 | 1987-08-15 | Asahi Glass Co Ltd | ガラスの加工方法 |
-
1986
- 1986-12-23 LU LU86722A patent/LU86722A1/fr unknown
-
1987
- 1987-11-26 IE IE321787A patent/IE60072B1/en not_active IP Right Cessation
- 1987-12-03 AU AU82076/87A patent/AU590187B2/en not_active Ceased
- 1987-12-04 US US07/129,962 patent/US4797316A/en not_active Expired - Fee Related
- 1987-12-10 IT IT8768055A patent/IT1211588B/it active
- 1987-12-11 CA CA000554161A patent/CA1329507C/en not_active Expired - Fee Related
- 1987-12-14 DE DE19873742374 patent/DE3742374A1/de not_active Withdrawn
- 1987-12-17 SE SE8705040A patent/SE467477B/sv not_active IP Right Cessation
- 1987-12-17 BE BE8701459A patent/BE1003081A3/fr not_active IP Right Cessation
- 1987-12-17 NL NL8703054A patent/NL8703054A/nl not_active Application Discontinuation
- 1987-12-17 KR KR870014627A patent/KR880007389A/ko not_active Ceased
- 1987-12-18 CH CH4961/87A patent/CH674201A5/fr not_active IP Right Cessation
- 1987-12-18 FR FR878717982A patent/FR2608589B1/fr not_active Expired - Lifetime
- 1987-12-22 JP JP62325173A patent/JPS63170249A/ja active Pending
- 1987-12-22 CN CN87108379A patent/CN1024182C/zh not_active Expired - Fee Related
- 1987-12-22 GB GB8729912A patent/GB2200595B/en not_active Expired - Lifetime
- 1987-12-23 DK DK685887A patent/DK685887A/da not_active Application Discontinuation
- 1987-12-23 ES ES8800191A patent/ES2005764A6/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL8703054A (nl) | 1988-07-18 |
| DE3742374A1 (de) | 1988-07-07 |
| AU8207687A (en) | 1988-06-23 |
| IE60072B1 (en) | 1994-06-01 |
| IE873217L (en) | 1988-06-23 |
| GB2200595A (en) | 1988-08-10 |
| CN1024182C (zh) | 1994-04-13 |
| BE1003081A3 (fr) | 1991-11-19 |
| DK685887A (da) | 1988-06-24 |
| FR2608589B1 (fr) | 1992-06-19 |
| IT1211588B (it) | 1989-11-03 |
| SE8705040D0 (sv) | 1987-12-17 |
| IT8768055A0 (it) | 1987-12-10 |
| ES2005764A6 (es) | 1989-03-16 |
| FR2608589A1 (fr) | 1988-06-24 |
| LU86722A1 (fr) | 1988-07-14 |
| CN87108379A (zh) | 1988-07-13 |
| CA1329507C (en) | 1994-05-17 |
| SE8705040L (sv) | 1988-06-24 |
| DK685887D0 (da) | 1987-12-23 |
| SE467477B (sv) | 1992-07-20 |
| JPS63170249A (ja) | 1988-07-14 |
| KR880007389A (ko) | 1988-08-27 |
| US4797316A (en) | 1989-01-10 |
| AU590187B2 (en) | 1989-10-26 |
| GB8729912D0 (en) | 1988-02-03 |
| GB2200595B (en) | 1990-10-24 |
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