JP4994576B2 - シリカガラスルツボ - Google Patents
シリカガラスルツボ Download PDFInfo
- Publication number
- JP4994576B2 JP4994576B2 JP2004085231A JP2004085231A JP4994576B2 JP 4994576 B2 JP4994576 B2 JP 4994576B2 JP 2004085231 A JP2004085231 A JP 2004085231A JP 2004085231 A JP2004085231 A JP 2004085231A JP 4994576 B2 JP4994576 B2 JP 4994576B2
- Authority
- JP
- Japan
- Prior art keywords
- silica glass
- glass crucible
- crucible
- silicon
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 67
- 239000010410 layer Substances 0.000 description 34
- 239000007788 liquid Substances 0.000 description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 27
- 229910052710 silicon Inorganic materials 0.000 description 27
- 239000010703 silicon Substances 0.000 description 27
- 239000013078 crystal Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- 238000009736 wetting Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Images
Landscapes
- Glass Melting And Manufacturing (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
実施例;内側を減圧にて溶融して気泡の発生を防止し、外側は大気圧にて溶融して、多孔質にしたルツボの内表面に、緑色レーザを用いて、図2に示すようなパターンで凹部を形成すると共に、この凹部の端面から突出する凸部を形成した。図4に示すように、半球状の凹部の大きさは、直径0.5mm、深さ0.5mm、間隔Pが500μmで交互に形成し、隣接する凹部が45°の角度をなす傾斜線上に設けられ、内面メルトライン帯域全面に配置させた。
2 不透明層
3 透明層
4 上部開口部
5 ストレート部
6 円弧部
7 底部
8 初期メルトライン帯域
10 凹部
Claims (1)
- 外側に気泡を含有する不透明層とこの不透明層の内側に全体的に滑らかな内表面を形成する透明層を有する2層構造に形成され、上部開口部からストレート部、円弧部及び底部からなる湾曲状のシリカガラスルツボにおいて、前記透明層の内表面の初期メルトライン帯域あるいはこれを含む上部域に、開口部が円形若しくは楕円形の多数の凹部が円周方向に沿って設けられ、この各凹部の端部に前記滑らかな内表面から20〜1000μm突出する凸部が設けられ、前記凹部の内面の傾斜が前記滑らかな内表面に対する垂直線に対して5〜60°に形成され、前記凹部の深さD、水平方向の幅W及び垂直方向の高さHの比が、D/W及びD/Hが共に0.3以上でありかつ、D、W及びHがそれぞれ200μm以上、30〜800μm、30〜800μmであることを特徴とするシリカガラスルツボ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004085231A JP4994576B2 (ja) | 2004-03-23 | 2004-03-23 | シリカガラスルツボ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004085231A JP4994576B2 (ja) | 2004-03-23 | 2004-03-23 | シリカガラスルツボ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005272178A JP2005272178A (ja) | 2005-10-06 |
JP4994576B2 true JP4994576B2 (ja) | 2012-08-08 |
Family
ID=35172236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004085231A Expired - Lifetime JP4994576B2 (ja) | 2004-03-23 | 2004-03-23 | シリカガラスルツボ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4994576B2 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100847500B1 (ko) | 2006-03-30 | 2008-07-22 | 코바렌트 마테리얼 가부시키가이샤 | 실리카 유리 도가니 |
JP4798714B2 (ja) * | 2007-03-28 | 2011-10-19 | コバレントマテリアル株式会社 | シリコン単結晶引上用シリカガラスルツボ |
US7993556B2 (en) * | 2007-08-08 | 2011-08-09 | Heraeus Shin-Etsu America, Inc. | Method for making a silica glass crucible |
JP4799536B2 (ja) | 2007-12-14 | 2011-10-26 | ジャパンスーパークォーツ株式会社 | 大径のシリコン単結晶インゴット中のピンホール欠陥の低減を可能とする大径シリコン単結晶インゴット引上げ用高純度石英ガラスルツボ |
JP5042971B2 (ja) * | 2008-11-28 | 2012-10-03 | 株式会社Sumco | シリコン単結晶引き上げ用石英ガラスルツボ及びその製造方法 |
JP5447946B2 (ja) * | 2009-11-18 | 2014-03-19 | 株式会社Sumco | シリコン単結晶引き上げ用石英ガラスルツボおよびその製造方法 |
JP5386330B2 (ja) * | 2009-12-11 | 2014-01-15 | 株式会社Sumco | ルツボ厚みの減肉量が目視判定可能な石英ガラス製ルツボ |
EP2385157B1 (en) * | 2009-12-11 | 2015-02-11 | Japan Super Quartz Corporation | Silica glass crucible |
TWI420002B (zh) | 2009-12-11 | 2013-12-21 | Japan Super Quartz Corp | 氧化矽玻璃坩堝 |
TWI414644B (zh) * | 2009-12-14 | 2013-11-11 | Japan Super Quartz Corp | 氧化矽玻璃坩堝及其製造方法 |
KR101293526B1 (ko) | 2011-01-28 | 2013-08-06 | 쟈판 스파 쿼츠 가부시키가이샤 | 실리콘 단결정 인상용 석영 유리 도가니 및 그의 제조 방법 |
JP5250097B2 (ja) * | 2011-12-12 | 2013-07-31 | 信越石英株式会社 | 単結晶シリコン引き上げ用シリカ容器及びその製造方法 |
CN103526280A (zh) * | 2013-10-12 | 2014-01-22 | 南通路博石英材料有限公司 | 一种内表面具有凹槽拉晶用石英玻璃坩埚的制备方法 |
JP6546721B2 (ja) * | 2014-05-19 | 2019-07-17 | 信越石英株式会社 | 単結晶シリコン引き上げ用石英ガラスるつぼ |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
LU86722A1 (fr) * | 1986-12-23 | 1988-07-14 | Glaverbel | Feuille en matiere vitreuse portant un dessin grave et procede pour graver un dessin sur un substrat en matiere vitreuse |
DE19713014C2 (de) * | 1997-03-27 | 1999-01-21 | Heraeus Quarzglas | Bauteil aus Quarzglas für die Verwendung bei der Halbleiterherstellung |
DE19917288C2 (de) * | 1999-04-16 | 2001-06-28 | Heraeus Quarzglas | Quarzglas-Tiegel |
JP2003212598A (ja) * | 2001-11-13 | 2003-07-30 | Tosoh Corp | 石英ガラス部品及びセラミック部品並びにそれらの製造方法 |
-
2004
- 2004-03-23 JP JP2004085231A patent/JP4994576B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2005272178A (ja) | 2005-10-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4994576B2 (ja) | シリカガラスルツボ | |
JP5034093B2 (ja) | ノズルを備えたシリカるつぼ及びその製造方法 | |
EP2476786B1 (en) | Silica glass crucible for pulling silicon single crystal and method for producing same | |
KR20110119732A (ko) | 실리카 유리 도가니 및 그 제조 방법 | |
KR20070098580A (ko) | 실리카 유리 도가니 | |
JP4814855B2 (ja) | シリカガラスルツボ | |
JP4717771B2 (ja) | シリカガラスルツボ | |
US8105514B2 (en) | Mold for producing silica crucible | |
WO2023051691A1 (zh) | 一种坩埚组件及拉晶炉 | |
US20140352605A1 (en) | Method for making barium-doped crucible and crucible made thereby | |
JP5447946B2 (ja) | シリコン単結晶引き上げ用石英ガラスルツボおよびその製造方法 | |
JP6631380B2 (ja) | ガラス材の製造方法及び製造装置 | |
JP4958203B2 (ja) | シリコン単結晶引上げ用石英ルツボ | |
JP6699293B2 (ja) | ガラス材の製造方法及び製造装置 | |
JP6641923B2 (ja) | ガラス材の製造方法及びガラス材の製造装置 | |
US9328009B2 (en) | Vitreous silica crucible for pulling silicon single crystal, and method for manufacturing the same | |
JP6546721B2 (ja) | 単結晶シリコン引き上げ用石英ガラスるつぼ | |
KR101293526B1 (ko) | 실리콘 단결정 인상용 석영 유리 도가니 및 그의 제조 방법 | |
KR101467075B1 (ko) | 잉곳 성장 장치 및 잉곳 성장 방법 | |
JP2006096616A (ja) | シリカガラスルツボ、シリカガラスルツボの製造方法 | |
JP6578906B2 (ja) | ガラス材の製造方法及びガラス材の製造装置 | |
JP6273549B2 (ja) | ガラス材の製造方法、ガラス材の製造装置及びガラス材 | |
JP6885435B2 (ja) | ガラス材の製造方法及びガラス材の製造装置 | |
WO2020031481A1 (ja) | 石英ガラスるつぼ | |
JP4693932B1 (ja) | 筒状シリコン結晶体製造方法及びその製造方法で製造される筒状シリコン結晶体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060906 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20070711 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090310 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090317 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090515 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20091117 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100217 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20100224 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20100402 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120509 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150518 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4994576 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |