CH672037A5 - - Google Patents

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Publication number
CH672037A5
CH672037A5 CH342386A CH342386A CH672037A5 CH 672037 A5 CH672037 A5 CH 672037A5 CH 342386 A CH342386 A CH 342386A CH 342386 A CH342386 A CH 342386A CH 672037 A5 CH672037 A5 CH 672037A5
Authority
CH
Switzerland
Prior art keywords
chamber
rails
cooling
circuit boards
printed circuit
Prior art date
Application number
CH342386A
Other languages
German (de)
English (en)
Inventor
Richard Ehrenfeldner
Original Assignee
Voest Alpine Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Voest Alpine Ag filed Critical Voest Alpine Ag
Publication of CH672037A5 publication Critical patent/CH672037A5/de

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185Means for transferring objects between different enclosures of different pressure or atmosphere
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0017Etching of the substrate by chemical or physical means
    • H05K3/0041Etching of the substrate by chemical or physical means by plasma etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/09Treatments involving charged particles
    • H05K2203/095Plasma, e.g. for treating a substrate to improve adhesion with a conductor or for cleaning holes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0055After-treatment, e.g. cleaning or desmearing of holes

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
CH342386A 1985-08-28 1986-08-26 CH672037A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT251785A AT383147B (de) 1985-08-28 1985-08-28 Vorrichtung zum plasmaaetzen von leiterplatten od.dgl.

Publications (1)

Publication Number Publication Date
CH672037A5 true CH672037A5 (fr) 1989-10-13

Family

ID=3535699

Family Applications (1)

Application Number Title Priority Date Filing Date
CH342386A CH672037A5 (fr) 1985-08-28 1986-08-26

Country Status (4)

Country Link
JP (1) JPS6286184A (fr)
AT (1) AT383147B (fr)
CH (1) CH672037A5 (fr)
DE (1) DE3629054A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3731444A1 (de) * 1987-09-18 1989-03-30 Leybold Ag Vorrichtung zum beschichten von substraten
DE3935002A1 (de) * 1989-10-20 1991-04-25 Plasonic Oberflaechentechnik G Verfahren und vorrichtung zur kontinuierlichen bearbeitung von substraten
MY120869A (en) * 2000-01-26 2005-11-30 Matsushita Electric Ind Co Ltd Plasma treatment apparatus and method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104669A (en) * 1980-12-19 1982-06-29 Hitachi Ltd Multistage chemical vessel treating device

Also Published As

Publication number Publication date
DE3629054A1 (de) 1987-03-12
JPS6348950B2 (fr) 1988-10-03
AT383147B (de) 1987-05-25
ATA251785A (de) 1986-10-15
JPS6286184A (ja) 1987-04-20

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Legal Events

Date Code Title Description
PL Patent ceased