JPS57104669A - Multistage chemical vessel treating device - Google Patents

Abstract

PURPOSE: To provide a multistage chemical vessel treating device which prevents mixing of chemicals (gases) in each chemical chamber and permits good treatment by providing a pair of partition walls between different chemical chambers to form buffer chambers, and terminating the bottom ends of the respective partition chambers within respectively different rinsing vessels.

CONSTITUTION: Wafers 25 contained in a cartridge 24 are immersed in a liquid vessel 12 and is thereby subjected to org. etching, after which they are immersed in a rinsing vessel 16 by the operation of a transfer device 21, thence they are placed on a plate 26b. Next, an underwater bus arm 26 is moved downward and in the uppermost position an arm 26a is turned laterally, by which the wafers 25 are passed under the partition wall 18, and are shifted to the right side of the vessel 16. The arm 26a is next moved upward to shift the wafers 25 to the upper part of the vessel 16 facing a buffer chamber 20, after which they are moved from the vessel 16 into a rinsing vessel 17. In the vessel 17, the wafers 25 are passed under the partition wall 19 and are moved to the right side by the operation similar to the above, whereby they are fed into an inorg. etching chamber 11, thence the wafers 25 are shifted from the vessel 17 into a liquid vessel 13, where they are immersed in the liquid and are thereby etched. The wafers 25 completed of the etching are shifted into a rinsing vessel 28 of the post process, where they are rinsed.

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