SU1019681A1 - Apparatus for etching printed circuit boards with continuous regeneration of solution - Google Patents

Abstract

A device for etching a printed circuit board with continuous solution regeneration, containing chambers: for etching, a bath and an electrolyzer connected to an ejector placed in a bath (distinguished in order to improve the quality of etching of printed circuit boards, the bath is made in two sections , while one section is connected to an etching chamber, and the other to an electrolyzer and an ejector placed in the bath section connected to the chamber, to etch. (L / / aa 00

Description

The invention relates to the production of printed circuit boards for radio engineering, electrotechnical, and other industries, in particular, to the regeneration of spent pickling solutions, such as iron-copper-chloride or mb-chloride, that occurs with simultaneous extraction of etched copper.

The invention can be used in almost all fields of technology using etching jet plants for making patterns on printed circuit boards.

Closest to the invention is a device for etching printed circuit boards with continuous solution regeneration, comprising an etching chamber, a bath and an electrolyzer connected to the electrolyte located in the bath Ll.

A disadvantage of the known device is that the spent and working solutions are mixed in the same container, from which they again go to pickling. This pollutes the working solution and reduces the etching quality of the products, and also pollutes the environment.

The purpose of the invention is to improve the quality of etching printed circuit boards.

The goal is achieved by the fact that in a device for etching printed circuit boards with continuous regeneration of a solution comprising an etching chamber, a bath, and an electrolyzer connected to an ejector placed in the bath, the bath is made in two sections, with one section connected to the etching chamber, the other the section is connected to the electrolyzer and an ejector placed in the bath section connected to the etching chamber.

FIG. 1 shows a diagram of the device} in FIG. 2 - 5 is a block diagram of the technological arrangements of the device.

An etching device with continuous solution regeneration consists of an etching chamber 1, an electrolytic cell 2 and a bath consisting of sections 3 and 4 separated by a partition 5 in which is located the node b of leveling etching solution 7 in sections 3 and 4. Chamber 1 has an inclined bottom-tray 8 and is connected to bath section 4 by pipe 9. Chamber 1 has two rows of upper and lower sprayers 10 between which the board 11 moves. In sections 3 of the bath there is an ejector 12 located below minimum level of pickling A pump, and a pump 13, which is connected by a pipe 14 to the nozzles 10 and a sensor 15

the etching ability of the solution 7. Section 3 of the bath has holes for installation and the number of ejectors 12 with electrolyzers 2. In section 4 of the bath there is a pump 16, which

5 is connected by pipeline 17 to electrolysis 2 and ejector 12. Ejector 12 is also connected to electrolyzers 2 from pipe 14 and 18 (for sucking chlorine gas and 19 (for cleaned solution 7). Exit anode prosthesis in electrolyzer 2 and above The solution 7 in section 3 installed sensors 20 and 21, the presence of gaseous chlorine, which are connected by pipelines 22 and 23 to the gas analyzer 24.

The device works in the following way ..

In section 3 and 4 baths are poured

0 pickling solution 7, which through line 14 is supplied by pump 13 from section 3 of the bath through nozzles 10 to board 11 and in-sensor 15. Control of etching ability of solution 7, from where it is controlled, solution 7 goes by gravity to the bottom-tray 8 in the chamber 1. Solution 7, falling on the board 11, pits the copper from unprotected places from it and often loses its pickling ability, enclosing copper. Solution 7 from the sensor 15 and from the board 11 through the on-a-cloned bottom tray 8 of the chamber 1 and the pipeline 9 enters by gravity into

- section 4 baths. From section 4 solution

 7 is supplied by the pump 16 through the pipeline 17 to the electrolyzer 2 and to the ejector 12. From the part of the solution 7 that has entered the electrolyzer 2, in the latter, the extracted

0 from board 11 copper by electrochemical method. This releases chlorine gas, which through line 18 enters the ejector 12, where it is dissolved in part of solution 7,

5 post feed directly from section 4, ferrous oxide to trivalent oxide, which increases the degree of solution regeneration. Part of solution 7, passing through electrolysis unit 2, through pipeline 19 enters iB ejector 12 into the zone where chlorine gas is already absent. Thus, in section 3, and from there on 11, the solution 7 enters the fully restored etching capacity. If the electrolysis unit is not operating 2 or if the pipelines coming from the pump 16 are clogged, section 4 may contain an excessive amount of pickling solution 7. In order to avoid

In the partition 5 there is a level alignment node 6. In the case of the occurrence of gaseous chlorine above the anode space in the electrolyzer 2 or in section 3, which may

5 ($ due to overpressure.

gaseous chlorine in the anode space and a decrease in the level of grass; solution 7 below the ejector 12; gas analyzer 24 receives information through sensors 20 and 21 and pipelines 22 and 23. about the presence of gaseous chlorine and turns off the electrolyzer 2 or turns off the entire installation.

FIG. Figures 2-5 show the constructive x-card layout of the proposed 4-unit device. FIG. 2 shows an assembly of a device of the same production capacity of the chamber 1 and the ejector 12. In FIG. Figure 3 shows a layout that allows the use of several cameras of different types of chambers 1 and of different capacities with one electrolysis station 2 of the port of the piercer. On fih. 4 the layout was preset, according to the evolution of the Pkmesht several electrolyzerbv 2 different productions. The company has a high capacity. FIG. 5 1f a single booster, allowing the use of a series of electrolyzers 2 to provide several kg shears 1 of different types and different capacities.

The use of the invention makes it possible to improve the quality of etching due to the exclusion of the possibility of contact with spent, loss of etching ability of the solution; prevent contamination

0 environment due to the introduction of sensors for the presence of chlorine gas with gas analysis; to expand technological capabilities; no device with a maximum effect; . efficiency of use

5 compound ednifa.

In addition, the use of idob. reteni. allows you to more efficiently and safely use the production capacity of sections and workshops for the production of printed circuit boards by spreading electrolyzers 2 and sections 3 and 4 of the bath in separate rooms.

S

2U.

Claims (2)

DEVICE FOR ETCHING PRINTED CIRCUIT BOARDS WITH CONTINUOUS REGEN. & 2 ^. / -X g The solution solution containing, an etching chamber, a bath and an electrolyzer connected to an ejector placed in the bath _(I distinguish ¹ in that, in order to improve the etching quality of the printed circuit boards, the bath is made of two sections, while one section is connected with an etching chamber, and the other with an electrolyzer and an ejector placed in the bath section connected to the chamber for etching. 189.6'1'0i ⁰⁰ ns