CH650361A5 - Projektionsvorrichtung zum belichten einer siliziumwafer. - Google Patents
Projektionsvorrichtung zum belichten einer siliziumwafer. Download PDFInfo
- Publication number
- CH650361A5 CH650361A5 CH11384/79A CH1138479A CH650361A5 CH 650361 A5 CH650361 A5 CH 650361A5 CH 11384/79 A CH11384/79 A CH 11384/79A CH 1138479 A CH1138479 A CH 1138479A CH 650361 A5 CH650361 A5 CH 650361A5
- Authority
- CH
- Switzerland
- Prior art keywords
- mask
- wafer
- thermistor
- temperature
- air
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 7
- 229910052710 silicon Inorganic materials 0.000 title claims description 7
- 239000010703 silicon Substances 0.000 title claims description 7
- 235000012431 wafers Nutrition 0.000 claims description 69
- 238000010438 heat treatment Methods 0.000 claims description 33
- 230000003287 optical effect Effects 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 238000009966 trimming Methods 0.000 claims description 4
- 238000010926 purge Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 239000000356 contaminant Substances 0.000 claims 1
- 230000008602 contraction Effects 0.000 claims 1
- 238000001816 cooling Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 description 6
- 239000000428 dust Substances 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/001,991 US4202623A (en) | 1979-01-08 | 1979-01-08 | Temperature compensated alignment system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH650361A5 true CH650361A5 (de) | 1985-07-15 |
Family
ID=21698736
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH11384/79A CH650361A5 (de) | 1979-01-08 | 1979-12-21 | Projektionsvorrichtung zum belichten einer siliziumwafer. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4202623A (enExample) |
| JP (1) | JPS5593224A (enExample) |
| CA (1) | CA1131369A (enExample) |
| CH (1) | CH650361A5 (enExample) |
| DE (1) | DE2951233A1 (enExample) |
| GB (1) | GB2042197B (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4376581A (en) * | 1979-12-20 | 1983-03-15 | Censor Patent- Und Versuchs-Anstalt | Method of positioning disk-shaped workpieces, preferably semiconductor wafers |
| JPS57169244A (en) * | 1981-04-13 | 1982-10-18 | Canon Inc | Temperature controller for mask and wafer |
| JPS58116735A (ja) * | 1981-12-29 | 1983-07-12 | Canon Inc | 投影焼付方法 |
| DE3306999A1 (de) * | 1982-03-31 | 1983-10-06 | Censor Patent Versuch | Einrichtung zum festhalten eines werkstueckes |
| JPS5928337A (ja) * | 1982-08-09 | 1984-02-15 | Hitachi Ltd | プロジエクシヨンアライナ |
| JPS5946030A (ja) * | 1982-09-08 | 1984-03-15 | Canon Inc | ウェハの吸着固定方法 |
| JPS5978533A (ja) * | 1982-10-27 | 1984-05-07 | Canon Inc | 露光装置 |
| JPS5999722A (ja) * | 1982-11-29 | 1984-06-08 | Canon Inc | 半導体焼付露光制御方法 |
| JPS60158626A (ja) * | 1984-01-30 | 1985-08-20 | Canon Inc | 半導体露光装置 |
| DE3447488A1 (de) * | 1984-10-19 | 1986-05-07 | Canon K.K., Tokio/Tokyo | Projektionseinrichtung |
| JPS61160934A (ja) * | 1985-01-10 | 1986-07-21 | Canon Inc | 投影光学装置 |
| JPS62198122A (ja) * | 1986-02-26 | 1987-09-01 | Hitachi Ltd | 半導体処理装置 |
| JPS6381820A (ja) * | 1986-09-25 | 1988-04-12 | Toshiba Corp | レジストパタ−ン形成方法 |
| US5073796A (en) * | 1987-08-31 | 1991-12-17 | Kabushiki Kaisha Toshiba | Cooling system for an apparatus with a heat generating element therein |
| US4989031A (en) * | 1990-01-29 | 1991-01-29 | Nikon Corporation | Projection exposure apparatus |
| US6445439B1 (en) * | 1999-12-27 | 2002-09-03 | Svg Lithography Systems, Inc. | EUV reticle thermal management |
| US6961119B2 (en) * | 2003-10-27 | 2005-11-01 | Intel Corporation | Method and apparatus to facilitate separation of a mask and a mask platform |
| NL2003339A (en) * | 2008-09-08 | 2010-03-15 | Asml Netherlands Bv | Lithographic apparatus and alignment method. |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1542515A (fr) * | 1966-07-21 | Ibm | Montage à réglage automatique servant à réaliser un cadrage optique | |
| US3610750A (en) * | 1968-11-25 | 1971-10-05 | Teledyne Inc | Methods and apparatus for photo-optical manufacture of semiconductor products |
| GB1211839A (en) * | 1969-06-02 | 1970-11-11 | Movielab Inc | Cleaning and cooling system for photographic printing apparatus |
| JPS5724529B2 (enExample) * | 1972-03-03 | 1982-05-25 | ||
| US3937579A (en) * | 1972-11-20 | 1976-02-10 | Karl Suss Kg | Process for the double-sided exposure of a semiconductor or substrate plates, especially wafers, as well as apparatus for the purpose of parallel and rotational alignment of such a plate |
| US4011011A (en) * | 1973-03-09 | 1977-03-08 | The Perkin-Elmer Corporation | Optical projection apparatus |
| JPS5398782A (en) * | 1976-12-29 | 1978-08-29 | Fujitsu Ltd | Positioning method for exposure unit |
| GB1578259A (en) * | 1977-05-11 | 1980-11-05 | Philips Electronic Associated | Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby |
| US4147429A (en) * | 1978-01-31 | 1979-04-03 | Microx Corporation | Apparatus and process for photographically duplicating intelligence existing on photoplastic film |
-
1979
- 1979-01-08 US US06/001,991 patent/US4202623A/en not_active Expired - Lifetime
- 1979-12-11 CA CA341,599A patent/CA1131369A/en not_active Expired
- 1979-12-17 GB GB7943343A patent/GB2042197B/en not_active Expired
- 1979-12-19 DE DE19792951233 patent/DE2951233A1/de not_active Ceased
- 1979-12-21 CH CH11384/79A patent/CH650361A5/de not_active IP Right Cessation
-
1980
- 1980-01-08 JP JP36080A patent/JPS5593224A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5593224A (en) | 1980-07-15 |
| US4202623A (en) | 1980-05-13 |
| GB2042197A (enExample) | 1980-09-17 |
| CA1131369A (en) | 1982-09-07 |
| GB2042197B (enExample) | 1983-04-13 |
| DE2951233A1 (de) | 1980-07-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |