CA1131369A - Temperature compensated alignment system - Google Patents

Temperature compensated alignment system

Info

Publication number
CA1131369A
CA1131369A CA341,599A CA341599A CA1131369A CA 1131369 A CA1131369 A CA 1131369A CA 341599 A CA341599 A CA 341599A CA 1131369 A CA1131369 A CA 1131369A
Authority
CA
Canada
Prior art keywords
mask
wafer
heater
thermistor
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA341,599A
Other languages
English (en)
French (fr)
Inventor
Theodore Watkin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Application granted granted Critical
Publication of CA1131369A publication Critical patent/CA1131369A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CA341,599A 1979-01-08 1979-12-11 Temperature compensated alignment system Expired CA1131369A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/001,991 US4202623A (en) 1979-01-08 1979-01-08 Temperature compensated alignment system
US001,991 1979-01-08

Publications (1)

Publication Number Publication Date
CA1131369A true CA1131369A (en) 1982-09-07

Family

ID=21698736

Family Applications (1)

Application Number Title Priority Date Filing Date
CA341,599A Expired CA1131369A (en) 1979-01-08 1979-12-11 Temperature compensated alignment system

Country Status (6)

Country Link
US (1) US4202623A (enExample)
JP (1) JPS5593224A (enExample)
CA (1) CA1131369A (enExample)
CH (1) CH650361A5 (enExample)
DE (1) DE2951233A1 (enExample)
GB (1) GB2042197B (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376581A (en) * 1979-12-20 1983-03-15 Censor Patent- Und Versuchs-Anstalt Method of positioning disk-shaped workpieces, preferably semiconductor wafers
JPS57169244A (en) * 1981-04-13 1982-10-18 Canon Inc Temperature controller for mask and wafer
JPS58116735A (ja) * 1981-12-29 1983-07-12 Canon Inc 投影焼付方法
DE3306999A1 (de) * 1982-03-31 1983-10-06 Censor Patent Versuch Einrichtung zum festhalten eines werkstueckes
JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
JPS5946030A (ja) * 1982-09-08 1984-03-15 Canon Inc ウェハの吸着固定方法
JPS5978533A (ja) * 1982-10-27 1984-05-07 Canon Inc 露光装置
JPS5999722A (ja) * 1982-11-29 1984-06-08 Canon Inc 半導体焼付露光制御方法
JPS60158626A (ja) * 1984-01-30 1985-08-20 Canon Inc 半導体露光装置
DE3447488A1 (de) * 1984-10-19 1986-05-07 Canon K.K., Tokio/Tokyo Projektionseinrichtung
JPS61160934A (ja) * 1985-01-10 1986-07-21 Canon Inc 投影光学装置
JPS62198122A (ja) * 1986-02-26 1987-09-01 Hitachi Ltd 半導体処理装置
JPS6381820A (ja) * 1986-09-25 1988-04-12 Toshiba Corp レジストパタ−ン形成方法
US5073796A (en) * 1987-08-31 1991-12-17 Kabushiki Kaisha Toshiba Cooling system for an apparatus with a heat generating element therein
US4989031A (en) * 1990-01-29 1991-01-29 Nikon Corporation Projection exposure apparatus
US6445439B1 (en) * 1999-12-27 2002-09-03 Svg Lithography Systems, Inc. EUV reticle thermal management
US6961119B2 (en) * 2003-10-27 2005-11-01 Intel Corporation Method and apparatus to facilitate separation of a mask and a mask platform
NL2003339A (en) * 2008-09-08 2010-03-15 Asml Netherlands Bv Lithographic apparatus and alignment method.

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1542515A (fr) * 1966-07-21 Ibm Montage à réglage automatique servant à réaliser un cadrage optique
US3610750A (en) * 1968-11-25 1971-10-05 Teledyne Inc Methods and apparatus for photo-optical manufacture of semiconductor products
GB1211839A (en) * 1969-06-02 1970-11-11 Movielab Inc Cleaning and cooling system for photographic printing apparatus
JPS5724529B2 (enExample) * 1972-03-03 1982-05-25
US3937579A (en) * 1972-11-20 1976-02-10 Karl Suss Kg Process for the double-sided exposure of a semiconductor or substrate plates, especially wafers, as well as apparatus for the purpose of parallel and rotational alignment of such a plate
US4011011A (en) * 1973-03-09 1977-03-08 The Perkin-Elmer Corporation Optical projection apparatus
JPS5398782A (en) * 1976-12-29 1978-08-29 Fujitsu Ltd Positioning method for exposure unit
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
US4147429A (en) * 1978-01-31 1979-04-03 Microx Corporation Apparatus and process for photographically duplicating intelligence existing on photoplastic film

Also Published As

Publication number Publication date
JPS5593224A (en) 1980-07-15
CH650361A5 (de) 1985-07-15
US4202623A (en) 1980-05-13
GB2042197A (enExample) 1980-09-17
GB2042197B (enExample) 1983-04-13
DE2951233A1 (de) 1980-07-17

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Legal Events

Date Code Title Description
MKEX Expiry
MKEX Expiry

Effective date: 19990907