CH611938A5 - - Google Patents

Info

Publication number
CH611938A5
CH611938A5 CH623776A CH623776A CH611938A5 CH 611938 A5 CH611938 A5 CH 611938A5 CH 623776 A CH623776 A CH 623776A CH 623776 A CH623776 A CH 623776A CH 611938 A5 CH611938 A5 CH 611938A5
Authority
CH
Switzerland
Application number
CH623776A
Inventor
Bogdan Zega
Original Assignee
Battelle Memorial Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Battelle Memorial Institute filed Critical Battelle Memorial Institute
Priority to CH623776A priority Critical patent/CH611938A5/xx
Priority to DE19772722708 priority patent/DE2722708A1/de
Priority to AT352977A priority patent/AT354214B/de
Priority to SE7705766A priority patent/SE7705766L/
Priority to FR7715314A priority patent/FR2352393A1/fr
Priority to US05/798,160 priority patent/US4116791A/en
Priority to IT23725/77A priority patent/IT1085894B/it
Priority to NL7705483A priority patent/NL7705483A/xx
Priority to GB20857/77A priority patent/GB1548061A/en
Priority to BE177725A priority patent/BE854816A/xx
Priority to JP52057161A priority patent/JPS608303B2/ja
Publication of CH611938A5 publication Critical patent/CH611938A5/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
CH623776A 1976-05-19 1976-05-19 CH611938A5 (US20110009641A1-20110113-C00273.png)

Priority Applications (11)

Application Number Priority Date Filing Date Title
CH623776A CH611938A5 (US20110009641A1-20110113-C00273.png) 1976-05-19 1976-05-19
DE19772722708 DE2722708A1 (de) 1976-05-19 1977-05-16 Verfahren zur ablagerung unter vakuum bei einer glimmentladung und anordnung fuer die glimmentladung
AT352977A AT354214B (de) 1976-05-19 1977-05-17 Verfahren zur ablagerung bei einer glimment- ladung, sowie anordnung fuer die glimmentladung zur durchfuehrung des verfahrens
SE7705766A SE7705766L (sv) 1976-05-19 1977-05-17 Forfarande och anordning for att astadkomma en beleggning i en luminiscent urladdning
FR7715314A FR2352393A1 (fr) 1976-05-19 1977-05-18 Procede pour effectuer un depot dans une decharge luminescente sur au moins un substrat, et un decapage ionique de ce substrat et dispositif pour la mise en oeuvre de ce procede
US05/798,160 US4116791A (en) 1976-05-19 1977-05-18 Method and apparatus for forming a deposit by means of ion plating using a magnetron cathode target as source of coating material
IT23725/77A IT1085894B (it) 1976-05-19 1977-05-18 Procedimento per effettuare un deposito in una scarica luminescente su almeno un substrato e un decapaggio ionico di questo substrato e dispositivo per l'attuazione di questo procedimento
NL7705483A NL7705483A (nl) 1976-05-19 1977-05-18 Werkwijze voor het in een gloei-ontlading uit- voeren van een afzetting op een substraat, als- mede een afschuring door ionen van dit substraat, en inrichting voor het toepassen van deze werk- wijze.
GB20857/77A GB1548061A (en) 1976-05-19 1977-05-18 Method and apparatus for forming a deposit by means of a glow discharge
BE177725A BE854816A (fr) 1976-05-19 1977-05-18 Procede de depot dans une decharge luminescente sur un substrat et de dacapage ionique de celui-ci et dispositif de mise en oeuvre
JP52057161A JPS608303B2 (ja) 1976-05-19 1977-05-19 基板のイオンによる清浄化および被覆の方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH623776A CH611938A5 (US20110009641A1-20110113-C00273.png) 1976-05-19 1976-05-19

Publications (1)

Publication Number Publication Date
CH611938A5 true CH611938A5 (US20110009641A1-20110113-C00273.png) 1979-06-29

Family

ID=4306421

Family Applications (1)

Application Number Title Priority Date Filing Date
CH623776A CH611938A5 (US20110009641A1-20110113-C00273.png) 1976-05-19 1976-05-19

Country Status (11)

Country Link
US (1) US4116791A (US20110009641A1-20110113-C00273.png)
JP (1) JPS608303B2 (US20110009641A1-20110113-C00273.png)
AT (1) AT354214B (US20110009641A1-20110113-C00273.png)
BE (1) BE854816A (US20110009641A1-20110113-C00273.png)
CH (1) CH611938A5 (US20110009641A1-20110113-C00273.png)
DE (1) DE2722708A1 (US20110009641A1-20110113-C00273.png)
FR (1) FR2352393A1 (US20110009641A1-20110113-C00273.png)
GB (1) GB1548061A (US20110009641A1-20110113-C00273.png)
IT (1) IT1085894B (US20110009641A1-20110113-C00273.png)
NL (1) NL7705483A (US20110009641A1-20110113-C00273.png)
SE (1) SE7705766L (US20110009641A1-20110113-C00273.png)

Families Citing this family (76)

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FR2501727A1 (fr) * 1981-03-13 1982-09-17 Vide Traitement Procede de traitements thermochimiques de metaux par bombardement ionique
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DE3272083D1 (en) * 1982-03-31 1986-08-28 Ibm Deutschland Reactor for reactive ion etching, and etching process
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Also Published As

Publication number Publication date
JPS608303B2 (ja) 1985-03-01
IT1085894B (it) 1985-05-28
FR2352393A1 (fr) 1977-12-16
NL7705483A (nl) 1977-11-22
JPS5310384A (en) 1978-01-30
BE854816A (fr) 1977-11-18
AT354214B (de) 1979-12-27
US4116791A (en) 1978-09-26
GB1548061A (en) 1979-07-04
SE7705766L (sv) 1977-11-20
DE2722708A1 (de) 1977-12-08
FR2352393B1 (US20110009641A1-20110113-C00273.png) 1983-02-11
ATA352977A (de) 1979-05-15

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Owner name: ASU COMPOSANTS S.A.

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