CH556548A - Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem. - Google Patents

Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem.

Info

Publication number
CH556548A
CH556548A CH1371372A CH1371372A CH556548A CH 556548 A CH556548 A CH 556548A CH 1371372 A CH1371372 A CH 1371372A CH 1371372 A CH1371372 A CH 1371372A CH 556548 A CH556548 A CH 556548A
Authority
CH
Switzerland
Prior art keywords
reflective
low
loss
oxide layers
layer system
Prior art date
Application number
CH1371372A
Other languages
English (en)
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH1371372A priority Critical patent/CH556548A/de
Priority to NL727214041A priority patent/NL151516B/xx
Priority to DE2336049A priority patent/DE2336049C3/de
Priority to AT630773A priority patent/AT326929B/de
Priority to GB3846773A priority patent/GB1389630A/en
Priority to FR7331485A priority patent/FR2200532B1/fr
Priority to US00394574A priority patent/US3853386A/en
Priority to IT29059/73A priority patent/IT995425B/it
Priority to BE135798A priority patent/BE805036A/xx
Publication of CH556548A publication Critical patent/CH556548A/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Optical Elements (AREA)
CH1371372A 1972-09-19 1972-09-19 Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem. CH556548A (de)

Priority Applications (9)

Application Number Priority Date Filing Date Title
CH1371372A CH556548A (de) 1972-09-19 1972-09-19 Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem.
NL727214041A NL151516B (nl) 1972-09-19 1972-10-17 Spiegel, bestaande uit een uit oxydelagen met afwisselend hoge brekingsindex en lage brekingsindex opgebouwd multilagensysteem.
DE2336049A DE2336049C3 (de) 1972-09-19 1973-07-14 Verlustarmes, temperaturstabiles, hochreflektierendes Wechselschichtsystem
AT630773A AT326929B (de) 1972-09-19 1973-07-17 Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem
GB3846773A GB1389630A (en) 1972-09-19 1973-08-14 Multi-layer optical refraction systems
FR7331485A FR2200532B1 (de) 1972-09-19 1973-08-31
US00394574A US3853386A (en) 1972-09-19 1973-09-06 Low-loss, highly reflective multilayer coating system formed of alternate highly refractive and low-refractive oxide layers
IT29059/73A IT995425B (it) 1972-09-19 1973-09-18 Sistema a strati multipli altamenta riflettente e con scarsa dispersio ne costruito con strati di ossidi alternativamente ad alta e a bassa rifrangenza
BE135798A BE805036A (nl) 1972-09-19 1973-09-19 Verl'esarm sterk reflecterend multilagensysteem bestaande uit oxydelagen met afwisselend hoge en lage brekingsindex

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1371372A CH556548A (de) 1972-09-19 1972-09-19 Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem.

Publications (1)

Publication Number Publication Date
CH556548A true CH556548A (de) 1974-11-29

Family

ID=4394681

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1371372A CH556548A (de) 1972-09-19 1972-09-19 Aus abwechselnd hoch- und niederbrechenden oxidschichten aufgebautes verlustarmes, hochreflektierendes vielschichtsystem.

Country Status (9)

Country Link
US (1) US3853386A (de)
AT (1) AT326929B (de)
BE (1) BE805036A (de)
CH (1) CH556548A (de)
DE (1) DE2336049C3 (de)
FR (1) FR2200532B1 (de)
GB (1) GB1389630A (de)
IT (1) IT995425B (de)
NL (1) NL151516B (de)

Families Citing this family (57)

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US4027160A (en) * 1971-05-18 1977-05-31 The United States Of America As Represented By The Secretary Of The Army Infrared detection system with parallel strip reticle means
NL7511581A (nl) * 1975-10-02 1977-04-05 Philips Nv Reflektor.
US4012119A (en) * 1975-12-12 1977-03-15 Xerox Corporation Direct current liquid crystal display with highly reflecting dielectric mirror
US4147409A (en) * 1976-11-22 1979-04-03 Optical Coating Laboratory, Inc. Laser reflector with reduced electric field intensity
DE2757750C3 (de) * 1977-12-23 1982-04-01 Bfg Glassgroup, Paris Wärmereflektierende Scheibe mit TiO↓2↓-Schicht in Rutilmodifikation sowie Verfahren zu ihrer Herstellung
JPS6038681B2 (ja) * 1978-09-27 1985-09-02 キヤノン株式会社 紫外用多層膜
DD146224A1 (de) * 1979-04-27 1981-01-28 Hubert Pohlack Anordnung zur induzierten absorption elektromagnetischer strahlung
CH638055A5 (fr) * 1979-06-07 1983-08-31 Siv Soc Italiana Vetro Miroir chauffant, destine a constituer un element de retroviseur exterieur pour vehicule.
US4309075A (en) * 1979-10-05 1982-01-05 Optical Coating Laboratory, Inc. Multilayer mirror with maximum reflectance
US4239338A (en) * 1979-10-22 1980-12-16 Corning Glass Works Silver halide optical information storage media
US4336439A (en) * 1980-10-02 1982-06-22 Coherent, Inc. Method and apparatus for laser scribing and cutting
JPS57181503A (en) * 1981-04-30 1982-11-09 Nippon Soken Inc Heat ray reflecting film
JPS58202408A (ja) * 1982-05-20 1983-11-25 Nippon Soken Inc 熱線反射膜
JPS5945943A (ja) * 1982-09-07 1984-03-15 Nippon Soken Inc 熱線遮断ガラス
US4673248A (en) * 1983-04-11 1987-06-16 Nippon Soken, Inc. Reflecting mirror for an automobile
JPS60124243A (ja) * 1983-12-09 1985-07-03 株式会社豊田中央研究所 熱線遮蔽積層体
JPS60178402A (ja) * 1984-02-27 1985-09-12 Nippon Denso Co Ltd ハ−フミラ−
JPS60195502A (ja) * 1984-03-19 1985-10-04 Canon Inc 金属回転多面鏡
DE3527884A1 (de) * 1984-08-22 1986-02-27 United Technologies Corp., Hartford, Conn. Flache anzeigetafel
US4755673A (en) * 1984-10-24 1988-07-05 Hughes Aircraft Company Selective thermal radiators
US4671613A (en) * 1985-11-12 1987-06-09 Gte Laboratories Inc. Optical beam splitter prism
US4821282A (en) * 1985-12-27 1989-04-11 Honeywell Inc. Mirror assembly for lasers
BR8707429A (pt) * 1986-08-20 1988-11-01 Libbey Owens Ford Co Montagem de vidro para controle de transmissao solar e processo de producao da mesma
WO1988004847A1 (en) * 1986-12-22 1988-06-30 Honeywell Inc. Mirror assembly for lasers
ES2077562T3 (es) * 1987-07-22 1995-12-01 Philips Electronics Nv Filtro de interferencia optico.
US5179318A (en) * 1989-07-05 1993-01-12 Nippon Sheet Glass Co., Ltd. Cathode-ray tube with interference filter
US5073451A (en) * 1989-07-31 1991-12-17 Central Glass Company, Limited Heat insulating glass with dielectric multilayer coating
US5136479A (en) * 1990-06-19 1992-08-04 E-Systems, Inc. Device and method for creating an areal light source
US5275053A (en) * 1991-08-21 1994-01-04 Fiberoptic Sensor Technologies, Inc. Fiber optic pressure sensor systems
US5179468A (en) * 1991-11-05 1993-01-12 Gte Products Corporation Interleaving of similar thin-film stacks for producing optical interference coatings
US5814367A (en) * 1993-08-13 1998-09-29 General Atomics Broadband infrared and signature control materials and methods of producing the same
US6235105B1 (en) 1994-12-06 2001-05-22 General Atomics Thin film pigmented optical coating compositions
DE4444786C2 (de) * 1994-12-15 1998-04-30 Fraunhofer Ges Forschung Interferenz-Bandpaßfilter
US5751466A (en) * 1996-01-11 1998-05-12 University Of Alabama At Huntsville Photonic bandgap apparatus and method for delaying photonic signals
US6262830B1 (en) 1997-09-16 2001-07-17 Michael Scalora Transparent metallo-dielectric photonic band gap structure
US5907427A (en) 1997-10-24 1999-05-25 Time Domain Corporation Photonic band gap device and method using a periodicity defect region to increase photonic signal delay
US6028693A (en) * 1998-01-14 2000-02-22 University Of Alabama In Huntsville Microresonator and associated method for producing and controlling photonic signals with a photonic bandgap delay apparatus
DE69917388T2 (de) * 1998-02-18 2005-05-25 Seiko Epson Corp. Verfahren zur herstellung eines vielschichtspiegels mit verteilter reflektion
US6304366B1 (en) 1998-04-02 2001-10-16 Michael Scalora Photonic signal frequency conversion using a photonic band gap structure
US6744552B2 (en) * 1998-04-02 2004-06-01 Michael Scalora Photonic signal frequency up and down-conversion using a photonic band gap structure
US6396617B1 (en) 1999-05-17 2002-05-28 Michael Scalora Photonic band gap device and method using a periodicity defect region doped with a gain medium to increase photonic signal delay
WO2001023948A1 (en) 1999-09-30 2001-04-05 Aguanno Giuseppe D Efficient non-linear phase shifting using a photonic band gap structure
US6414780B1 (en) 1999-12-23 2002-07-02 D'aguanno Giuseppe Photonic signal reflectivity and transmissivity control using a photonic band gap structure
US6339493B1 (en) 1999-12-23 2002-01-15 Michael Scalora Apparatus and method for controlling optics propagation based on a transparent metal stack
JP2003015175A (ja) 2001-04-27 2003-01-15 Mitsubishi Electric Corp 固体光源装置
US7065109B2 (en) * 2002-05-08 2006-06-20 Melles Griot Inc. Laser with narrow bandwidth antireflection filter for frequency selection
FR2849195B1 (fr) * 2002-12-20 2005-01-21 Commissariat Energie Atomique Biocapteur a substrat quelconque pouvant etre caracterise en deflexion photothermique
JP4837279B2 (ja) * 2004-04-05 2011-12-14 オリンパス株式会社 落射顕微鏡および蛍光フィルターセット
JP4488299B2 (ja) * 2004-07-22 2010-06-23 オリンパス株式会社 ダイクロイックミラー、蛍光フィルタセットおよび顕微鏡装置
US7750326B2 (en) * 2005-06-13 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and cleaning method therefor
US7349151B2 (en) * 2005-07-12 2008-03-25 Hewlett-Packard Development Company, L.P. IR absorbing reflector
KR101149308B1 (ko) * 2009-04-02 2012-05-24 삼성코닝정밀소재 주식회사 태양전지용 다층박막 구조
JP2012128135A (ja) * 2010-12-15 2012-07-05 Seiko Epson Corp 光学物品およびその製造方法
US10007039B2 (en) 2012-09-26 2018-06-26 8797625 Canada Inc. Multilayer optical interference filter
WO2016159744A1 (ko) * 2015-04-03 2016-10-06 주식회사 세미콘라이트 반도체 발광소자
EP3282311B1 (de) * 2015-04-30 2020-10-14 Huawei Technologies Co. Ltd. Raumphasenmodulator und verfahren zur herstellung davon
FR3132070B1 (fr) 2022-01-21 2023-12-15 Psa Automobiles Sa Procédé et dispositif de contrôle d’accélération d’un véhicule embarquant un système de régulation de vitesse

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH358249A (de) * 1957-07-23 1961-11-15 Balzers Hochvakuum Wärmestrahlendurchlässiger Spiegel für Bildprojektoren

Also Published As

Publication number Publication date
ATA630773A (de) 1975-03-15
FR2200532B1 (de) 1977-02-25
IT995425B (it) 1975-11-10
DE2336049A1 (de) 1974-03-28
FR2200532A1 (de) 1974-04-19
GB1389630A (en) 1975-04-03
BE805036A (nl) 1974-03-19
NL7214041A (de) 1974-03-21
AT326929B (de) 1976-01-12
US3853386A (en) 1974-12-10
DE2336049B2 (de) 1979-03-01
DE2336049C3 (de) 1979-10-25
NL151516B (nl) 1976-11-15

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Legal Events

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PL Patent ceased