US4027160A
(en)
*
|
1971-05-18 |
1977-05-31 |
The United States Of America As Represented By The Secretary Of The Army |
Infrared detection system with parallel strip reticle means
|
NL7511581A
(nl)
*
|
1975-10-02 |
1977-04-05 |
Philips Nv |
Reflektor.
|
US4012119A
(en)
*
|
1975-12-12 |
1977-03-15 |
Xerox Corporation |
Direct current liquid crystal display with highly reflecting dielectric mirror
|
US4147409A
(en)
*
|
1976-11-22 |
1979-04-03 |
Optical Coating Laboratory, Inc. |
Laser reflector with reduced electric field intensity
|
DE2757750C3
(de)
*
|
1977-12-23 |
1982-04-01 |
Bfg Glassgroup, Paris |
Wärmereflektierende Scheibe mit TiO↓2↓-Schicht in Rutilmodifikation sowie Verfahren zu ihrer Herstellung
|
JPS6038681B2
(ja)
*
|
1978-09-27 |
1985-09-02 |
キヤノン株式会社 |
紫外用多層膜
|
DD146224A1
(de)
*
|
1979-04-27 |
1981-01-28 |
Hubert Pohlack |
Anordnung zur induzierten absorption elektromagnetischer strahlung
|
CH638055A5
(fr)
*
|
1979-06-07 |
1983-08-31 |
Siv Soc Italiana Vetro |
Miroir chauffant, destine a constituer un element de retroviseur exterieur pour vehicule.
|
US4309075A
(en)
*
|
1979-10-05 |
1982-01-05 |
Optical Coating Laboratory, Inc. |
Multilayer mirror with maximum reflectance
|
US4239338A
(en)
*
|
1979-10-22 |
1980-12-16 |
Corning Glass Works |
Silver halide optical information storage media
|
US4336439A
(en)
*
|
1980-10-02 |
1982-06-22 |
Coherent, Inc. |
Method and apparatus for laser scribing and cutting
|
JPS57181503A
(en)
*
|
1981-04-30 |
1982-11-09 |
Nippon Soken Inc |
Heat ray reflecting film
|
JPS58202408A
(ja)
*
|
1982-05-20 |
1983-11-25 |
Nippon Soken Inc |
熱線反射膜
|
JPS5945943A
(ja)
*
|
1982-09-07 |
1984-03-15 |
Nippon Soken Inc |
熱線遮断ガラス
|
US4673248A
(en)
*
|
1983-04-11 |
1987-06-16 |
Nippon Soken, Inc. |
Reflecting mirror for an automobile
|
JPS60124243A
(ja)
*
|
1983-12-09 |
1985-07-03 |
株式会社豊田中央研究所 |
熱線遮蔽積層体
|
JPS60178402A
(ja)
*
|
1984-02-27 |
1985-09-12 |
Nippon Denso Co Ltd |
ハ−フミラ−
|
JPS60195502A
(ja)
*
|
1984-03-19 |
1985-10-04 |
Canon Inc |
金属回転多面鏡
|
DE3527884A1
(de)
*
|
1984-08-22 |
1986-02-27 |
United Technologies Corp., Hartford, Conn. |
Flache anzeigetafel
|
US4755673A
(en)
*
|
1984-10-24 |
1988-07-05 |
Hughes Aircraft Company |
Selective thermal radiators
|
US4671613A
(en)
*
|
1985-11-12 |
1987-06-09 |
Gte Laboratories Inc. |
Optical beam splitter prism
|
US4821282A
(en)
*
|
1985-12-27 |
1989-04-11 |
Honeywell Inc. |
Mirror assembly for lasers
|
BR8707429A
(pt)
*
|
1986-08-20 |
1988-11-01 |
Libbey Owens Ford Co |
Montagem de vidro para controle de transmissao solar e processo de producao da mesma
|
JPH0812940B2
(ja)
*
|
1986-12-22 |
1996-02-07 |
ハネウエル・インコーポレーテツド |
レーザ用の反射鏡組立体
|
ES2077562T3
(es)
*
|
1987-07-22 |
1995-12-01 |
Philips Electronics Nv |
Filtro de interferencia optico.
|
US5179318A
(en)
*
|
1989-07-05 |
1993-01-12 |
Nippon Sheet Glass Co., Ltd. |
Cathode-ray tube with interference filter
|
US5073451A
(en)
*
|
1989-07-31 |
1991-12-17 |
Central Glass Company, Limited |
Heat insulating glass with dielectric multilayer coating
|
US5136479A
(en)
*
|
1990-06-19 |
1992-08-04 |
E-Systems, Inc. |
Device and method for creating an areal light source
|
US5275053A
(en)
*
|
1991-08-21 |
1994-01-04 |
Fiberoptic Sensor Technologies, Inc. |
Fiber optic pressure sensor systems
|
US5179468A
(en)
*
|
1991-11-05 |
1993-01-12 |
Gte Products Corporation |
Interleaving of similar thin-film stacks for producing optical interference coatings
|
US5814367A
(en)
*
|
1993-08-13 |
1998-09-29 |
General Atomics |
Broadband infrared and signature control materials and methods of producing the same
|
US6235105B1
(en)
|
1994-12-06 |
2001-05-22 |
General Atomics |
Thin film pigmented optical coating compositions
|
DE4444786C2
(de)
*
|
1994-12-15 |
1998-04-30 |
Fraunhofer Ges Forschung |
Interferenz-Bandpaßfilter
|
US5751466A
(en)
*
|
1996-01-11 |
1998-05-12 |
University Of Alabama At Huntsville |
Photonic bandgap apparatus and method for delaying photonic signals
|
US6262830B1
(en)
|
1997-09-16 |
2001-07-17 |
Michael Scalora |
Transparent metallo-dielectric photonic band gap structure
|
US5907427A
(en)
|
1997-10-24 |
1999-05-25 |
Time Domain Corporation |
Photonic band gap device and method using a periodicity defect region to increase photonic signal delay
|
US6028693A
(en)
*
|
1998-01-14 |
2000-02-22 |
University Of Alabama In Huntsville |
Microresonator and associated method for producing and controlling photonic signals with a photonic bandgap delay apparatus
|
US6337222B1
(en)
*
|
1998-02-18 |
2002-01-08 |
Seiko Epson Corporation |
Methods for fabricating distributed reflection multi-layer film mirrors
|
US6304366B1
(en)
|
1998-04-02 |
2001-10-16 |
Michael Scalora |
Photonic signal frequency conversion using a photonic band gap structure
|
US6744552B2
(en)
*
|
1998-04-02 |
2004-06-01 |
Michael Scalora |
Photonic signal frequency up and down-conversion using a photonic band gap structure
|
US6396617B1
(en)
|
1999-05-17 |
2002-05-28 |
Michael Scalora |
Photonic band gap device and method using a periodicity defect region doped with a gain medium to increase photonic signal delay
|
AU7734900A
(en)
|
1999-09-30 |
2001-04-30 |
Mark J. Bloemer |
Efficient non-linear phase shifting using a photonic band gap structure
|
US6414780B1
(en)
|
1999-12-23 |
2002-07-02 |
D'aguanno Giuseppe |
Photonic signal reflectivity and transmissivity control using a photonic band gap structure
|
US6339493B1
(en)
|
1999-12-23 |
2002-01-15 |
Michael Scalora |
Apparatus and method for controlling optics propagation based on a transparent metal stack
|
JP2003015175A
(ja)
|
2001-04-27 |
2003-01-15 |
Mitsubishi Electric Corp |
固体光源装置
|
US7065109B2
(en)
*
|
2002-05-08 |
2006-06-20 |
Melles Griot Inc. |
Laser with narrow bandwidth antireflection filter for frequency selection
|
FR2849195B1
(fr)
*
|
2002-12-20 |
2005-01-21 |
Commissariat Energie Atomique |
Biocapteur a substrat quelconque pouvant etre caracterise en deflexion photothermique
|
JP4837279B2
(ja)
*
|
2004-04-05 |
2011-12-14 |
オリンパス株式会社 |
落射顕微鏡および蛍光フィルターセット
|
JP4488299B2
(ja)
*
|
2004-07-22 |
2010-06-23 |
オリンパス株式会社 |
ダイクロイックミラー、蛍光フィルタセットおよび顕微鏡装置
|
US7750326B2
(en)
*
|
2005-06-13 |
2010-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and cleaning method therefor
|
US7349151B2
(en)
*
|
2005-07-12 |
2008-03-25 |
Hewlett-Packard Development Company, L.P. |
IR absorbing reflector
|
KR101149308B1
(ko)
*
|
2009-04-02 |
2012-05-24 |
삼성코닝정밀소재 주식회사 |
태양전지용 다층박막 구조
|
JP2012128135A
(ja)
*
|
2010-12-15 |
2012-07-05 |
Seiko Epson Corp |
光学物品およびその製造方法
|
CN104969099A
(zh)
|
2012-09-26 |
2015-10-07 |
8797625加拿大有限公司 |
多层光干涉滤片
|
US10158047B2
(en)
*
|
2015-04-03 |
2018-12-18 |
Semicon Light Co., Ltd. |
Semiconductor light emitting device
|
EP3282311B1
(de)
*
|
2015-04-30 |
2020-10-14 |
Huawei Technologies Co. Ltd. |
Raumphasenmodulator und verfahren zur herstellung davon
|
FR3132070B1
(fr)
|
2022-01-21 |
2023-12-15 |
Psa Automobiles Sa |
Procédé et dispositif de contrôle d’accélération d’un véhicule embarquant un système de régulation de vitesse
|