CH515341A - Ionenquelle für die Zerstäubung mit langsamen Ionen - Google Patents

Ionenquelle für die Zerstäubung mit langsamen Ionen

Info

Publication number
CH515341A
CH515341A CH1530770A CH1530770A CH515341A CH 515341 A CH515341 A CH 515341A CH 1530770 A CH1530770 A CH 1530770A CH 1530770 A CH1530770 A CH 1530770A CH 515341 A CH515341 A CH 515341A
Authority
CH
Switzerland
Prior art keywords
atomization
ion source
slow ions
ions
slow
Prior art date
Application number
CH1530770A
Other languages
English (en)
Inventor
Fritz Hansen Norbert Ernst
Konrad Littmann Walter Fritz
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH515341A publication Critical patent/CH515341A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
CH1530770A 1969-10-21 1970-10-16 Ionenquelle für die Zerstäubung mit langsamen Ionen CH515341A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1953659A DE1953659C3 (de) 1969-10-21 1969-10-21 Ionenquelle für die Zerstäubung mit langsamen Ionen

Publications (1)

Publication Number Publication Date
CH515341A true CH515341A (de) 1971-11-15

Family

ID=5749151

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1530770A CH515341A (de) 1969-10-21 1970-10-16 Ionenquelle für die Zerstäubung mit langsamen Ionen

Country Status (8)

Country Link
US (1) US3719582A (de)
JP (1) JPS513119B1 (de)
AU (1) AU2023570A (de)
CH (1) CH515341A (de)
DE (1) DE1953659C3 (de)
FR (1) FR2066179A5 (de)
GB (1) GB1270496A (de)
NL (1) NL7015117A (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
DE2621824C2 (de) * 1976-05-17 1982-04-29 Hitachi, Ltd., Tokyo Mikrowellen-Entladungs-Ionenquelle
JPS5623290U (de) * 1979-07-25 1981-03-02
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
JPS60190493U (ja) * 1984-05-30 1985-12-17 ダイセル化学工業株式会社 仮付治具
DE3707545A1 (de) * 1987-02-03 1988-08-11 Balzers Hochvakuum Anordnung zur stabilisierung eines lichtbogens zwischen einer anode und einer kathode
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
WO1999058737A1 (en) * 1998-05-14 1999-11-18 Kaufman & Robinson, Inc. Apparatus for sputter deposition
EA015719B1 (ru) * 2008-02-13 2011-10-31 Александр Криманов Метод и устройство управления потоком ионов

Also Published As

Publication number Publication date
DE1953659A1 (de) 1971-04-29
AU2023570A (en) 1972-03-30
DE1953659B2 (de) 1978-05-18
GB1270496A (en) 1972-04-12
JPS513119B1 (de) 1976-01-31
US3719582A (en) 1973-03-06
FR2066179A5 (de) 1971-08-06
DE1953659C3 (de) 1979-01-25
NL7015117A (de) 1971-04-23

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Legal Events

Date Code Title Description
PL Patent ceased